WO2013008639A1 - Process for producing glass product - Google Patents

Process for producing glass product Download PDF

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Publication number
WO2013008639A1
WO2013008639A1 PCT/JP2012/066598 JP2012066598W WO2013008639A1 WO 2013008639 A1 WO2013008639 A1 WO 2013008639A1 JP 2012066598 W JP2012066598 W JP 2012066598W WO 2013008639 A1 WO2013008639 A1 WO 2013008639A1
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Prior art keywords
glass
manganese
abrasive grains
polishing
cleaning
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PCT/JP2012/066598
Other languages
French (fr)
Japanese (ja)
Inventor
宮谷　克明
Original Assignee
旭硝子株式会社
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Application filed by 旭硝子株式会社 filed Critical 旭硝子株式会社
Priority to CN201280034544.9A priority Critical patent/CN103747917B/en
Publication of WO2013008639A1 publication Critical patent/WO2013008639A1/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se

Definitions

  • the present invention relates to a method for manufacturing a glass product.
  • Polishing abrasive grains mainly composed of cerium oxide have been widely used as polishing agents for glass polishing.
  • ceria abrasive grains due to the recent rise in rare earth oxides, ceria abrasive grains cannot be obtained at conventional costs, and alternative materials are being actively studied.
  • various oxides such as zirconia or alumina have been studied.
  • Non-Patent Document 1 Manganese oxides include manganese dioxide, manganese dioxide, and manganese oxide.
  • Non-Patent Document 2 discloses that manganese dioxide abrasive grains and trioxide 2 manganese abrasive grains used as abrasives in a CMP process in a semiconductor process can be cleaned with a cleaning solution containing hydrogen peroxide. Yes.
  • the average particle size used for semiconductor CMP is usually 30 to 40 nm in the cleaning of manganese dioxide abrasive grains and trioxide 2 manganese abrasive grains with a cleaning liquid containing hydrogen peroxide described in Non-Patent Document 2.
  • 3 manganese dioxide abrasive grains used for polishing glass having an average particle diameter large and stable compared with these abrasive grains are effective for the manganese dioxide oxide grains of about 3 and 2 manganese oxide abrasive grains. It has been found that the cleaning effect is low depending on the cleaning liquid containing hydrogen peroxide solution.
  • the cleaning liquid containing hydrogen peroxide solution is resistant to acid resistance because the trimanganese 2 manganese abrasive grains are difficult to dissolve when the pH of the cleaning liquid becomes high, and the trimanganese 2 manganese abrasive grains hardly dissolve when the pH of the cleaning liquid exceeds 4. It is considered difficult to apply to weak glass.
  • trimanganese 2 manganese abrasive grains is also desired for cleaning after polishing.
  • the present invention has been made in view of such problems, and after the polishing step of polishing the glass using a polishing agent containing 2 manganese oxide abrasive grains, the 3 oxide 2 adhered to the glass using a cleaning liquid. It aims at providing the manufacturing method of the glass product including the process of wash
  • the aqueous solution containing at least one of ascorbic acid and erythorbic acid is a trioxide 2 manganese abrasive having a large average particle size used for polishing glass. Based on this finding, the present invention has been completed.
  • the gist of the present invention is as follows.
  • a method for producing a glass product comprising: a polishing step of polishing glass using a polishing agent containing trioxide 2 manganese abrasive grains; and a cleaning step of cleaning the glass using a cleaning liquid thereafter,
  • a method for producing a glass product wherein the cleaning liquid is a cleaning liquid containing at least one of ascorbic acid and erythorbic acid.
  • the method for producing a glass product of the present invention after polishing glass with an abrasive containing trimanganese 2 manganese abrasive grains, by washing the glass with a cleaning liquid containing at least one of ascorbic acid and erythorbic acid, It is possible to wash effectively while melting the trioxide 2 manganese abrasive grains adhering to the glass.
  • the method for producing a glass product of the present invention is applied to a glass having weak acid resistance. It is possible to apply.
  • the manufacturing method of the glass product of this invention includes the grinding
  • Trioxide 2 manganese abrasive grains can be used for polishing glass as an alternative material for ceria abrasive grains.
  • the concentration of the trioxide 2 manganese abrasive grains in the polishing agent is usually preferably 1% by mass or more and 20% by mass or less, and more preferably 3% by mass or more and 15% by mass or less.
  • concentration of the trioxide 2 manganese abrasive grains in the abrasive is usually preferably 1% by mass or more and 20% by mass or less, and more preferably 3% by mass or more and 15% by mass or less.
  • the abrasive may contain a surfactant, a dispersant and the like.
  • the surfactant include non-foaming surfactants such as alkylene diols.
  • the content of the surfactant in the abrasive is preferably 0.01 to 1% by mass.
  • examples of the dispersing agent include sodium polyacrylate, sodium phosphate, sodium phosphonate and sodium citrate.
  • the content of the dispersant in the abrasive is preferably 0.5 to 2% by mass.
  • the polishing method in the present invention is not particularly limited.
  • the polishing cloth and the glass are relatively moved while the glass and the polishing cloth are brought into contact with each other while supplying the polishing agent containing the trimanganese 2 manganese abrasive grains.
  • the glass is preferably polished into a mirror surface.
  • a urethane polishing pad can be used as the polishing cloth.
  • the method for producing a glass product of the present invention comprises a polishing agent containing trimanganese 2 manganese abrasive grains adhering to glass using a cleaning solution containing at least one of ascorbic acid and erythorbic acid (hereinafter also referred to as a cleaning solution used in the present invention).
  • a cleaning solution used in the present invention a cleaning solution used in the present invention.
  • Ascorbic acid and erythorbic acid have a high dissolving power with respect to trimanganese 2 manganese abrasive grains and also play a role as a pH adjuster.
  • the total content of ascorbic acid and erythorbic acid in the cleaning liquid used in the present invention is preferably 0.1 to 1% by mass, and more preferably 0.25 to 0.75% by mass.
  • the cleaning liquid used in the present invention preferably contains a cleaning auxiliary.
  • the cleaning aid include a surfactant for lowering the surface tension, and an acid having a buffering effect for stably maintaining pH.
  • the surfactant include nonionic surfactants such as acetylene diol and anionic surfactants such as sodium polyacrylate.
  • an acid having a buffering effect for stably maintaining pH for example, an acid having a pKa of 2 to 5 and having one or more carboxylic acids can be mentioned.
  • citric acid can be cited as an acid that can be expected to have a buffering effect, but many other organic acids can be used.
  • the cleaning liquid used in the present invention preferably contains water as a solvent.
  • water examples include deionized water, ultrapure water, charged ion water, hydrogen water, and ozone water. Since water has a function of controlling the fluidity of the cleaning liquid used in the present invention, its content can be appropriately set according to the target cleaning characteristics such as the cleaning speed, but usually 55 to 98 mass. % Is preferable.
  • the cleaning liquid containing at least one of ascorbic acid and erythorbic acid used in the present invention has a certain solubility or higher with respect to trimanganese 2 manganese abrasive grains in a wide pH range, but the pH of the cleaning liquid is preferably 2 or more and 5 or less. .
  • the pH of the cleaning liquid is preferably 2 or more and 5 or less.
  • Ascorbic acid or erythorbic acid is easily dissolved, which is preferable from the viewpoint of operation and safety.
  • cleaning liquid with respect to trioxide 2 manganese abrasive grain can be improved by making pH of a washing
  • the cleaning liquid used in the present invention has a builder effect.
  • Zeolite and the like may be included.
  • the content of zeolite in the cleaning liquid is not particularly limited, but is preferably 1% by mass or less.
  • the cleaning step it is preferable to perform cleaning by bringing the cleaning liquid into direct contact with glass.
  • the method of bringing the cleaning liquid into direct contact with the glass include, for example, dip cleaning in which the cleaning liquid is filled in a cleaning tank, and glass is placed in the cleaning tank, a method of spraying the cleaning liquid onto the glass from a nozzle, and scrub cleaning using a sponge made of polyvinyl alcohol Etc.
  • the cleaning liquid used in the present invention can be applied to any of the above methods, but dip cleaning using ultrasonic cleaning is preferred because more efficient cleaning can be performed.
  • the temperature of the washing solution may be room temperature, and may be used after being heated to about 40 to 80 ° C., but is preferably 80 ° C. or less.
  • the temperature of the cleaning liquid By setting the temperature of the cleaning liquid to 80 ° C. or lower, it is possible to prevent thermal decomposition of ascorbic acid. Further, because of the configuration of the apparatus, when the cleaning liquid reaches a temperature close to 100 ° C., it becomes difficult to control pH by evaporation of water, and therefore, the temperature is preferably 80 ° C. or lower.
  • the glass product is a glass substrate for a magnetic disk or a high-quality glass substrate for a liquid crystal display
  • the main surface of the glass is subjected to colloidal silica polishing after the cleaning step. It is preferable to include a final polishing step of polishing using a slurry containing grains.
  • glass products produced by the production method of the present invention include glass substrates for magnetic disks, glass substrates such as photomask substrates and display substrates, lenses, and blue filter glass and cover glass for CCDs.
  • a magnetic disk can be manufactured by forming a magnetic recording layer on the main surface of a glass substrate for a magnetic disk manufactured by the manufacturing method of the present invention.
  • the aqueous solution containing the ascorbic acid derivative was also evaluated for the elution amount of the trimanganese 2 manganese abrasive grains, but the effect of promoting the elution of the trioxide 2 manganese abrasive grains was not observed.
  • ascorbic acid derivatives such as magnesium ascorbyl phosphate and glucoside ascorbic acid have a structure that suppresses oxidation of ascorbic acid, and thus cannot reduce dimanganese trioxide. It is considered that the elution of oxidized 2 manganese abrasive grains is not promoted.
  • Method 1 After drying, the trioxide 2 manganese abrasive grains remaining on the glass plate were visually examined. When the residue was confirmed, it was set as x, and when it was not confirmed, it was marked as ⁇ .
  • Method 2 After drying, the trioxide 2 manganese abrasive grains remaining on the glass plate were examined while irradiating the glass plate with a high-intensity light source. When the residue was confirmed, it was marked as “X”, and when it was not confirmed, it was marked as “ ⁇ ”.
  • the step of polishing the glass with a cleaning liquid containing at least one of ascorbic acid and erythorbic acid after the step of polishing the glass with an abrasive containing trimanganese 2 manganese abrasive grains is included. According to the method, it was found that trimanganese 2 manganese abrasive grains can be effectively removed from the surface of the glass.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Detergent Compositions (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Surface Treatment Of Glass (AREA)
  • Cleaning In General (AREA)

Abstract

The purpose of the present invention is to provide a process for glass product production which includes, after the step of polishing a glass using a polishing agent that contains dimanganese trioxide abrasive grains, the step of effectively removing the polishing agent which contains dimanganese trioxide abrasive grains and has adhered to the glass. The process for producing a glass product comprises a polishing step in which a glass is polished using a polishing agent that contains dimanganese trioxide abrasive grains and a cleaning step in which the glass is thereafter cleaned using a cleaning fluid, wherein the cleaning fluid is a cleaning fluid containing ascorbic acid and/or erythorbic acid.

Description

ガラス製品の製造方法Manufacturing method of glass products
　本発明はガラス製品の製造方法に関する。 The present invention relates to a method for manufacturing a glass product.
　ガラス研磨向けの研磨剤として酸化セリウムを主成分とする研磨砥粒（以下、セリア砥粒）が幅広く使用されてきた。しかしながら、近年の希土類酸化物の高騰により、セリア砥粒も従来のコストで入手できなくなり、盛んに代替材料が検討されている。代替材料としては、ジルコニアまたはアルミナなど数々の酸化物について検討されている。 Polishing abrasive grains mainly composed of cerium oxide (hereinafter, ceria abrasive grains) have been widely used as polishing agents for glass polishing. However, due to the recent rise in rare earth oxides, ceria abrasive grains cannot be obtained at conventional costs, and alternative materials are being actively studied. As an alternative material, various oxides such as zirconia or alumina have been studied.
　近年、ガラス基板の加工に用いる研磨砥粒として、限られた特定の条件下においてではあるが、マンガン酸化物である３酸化２マンガン砥粒がセリア砥粒に近い研磨特性が出ることが明らかになり、注目されている（非特許文献１）。マンガン酸化物には、２酸化マンガン、３酸化２マンガンおよび４酸化３マンガンが存在する。 In recent years, it has become clear that, under limited specific conditions, polishing oxides used for processing glass substrates exhibit polishing characteristics similar to ceria abrasives, which are manganese oxide trioxide and manganese oxide abrasive grains. Therefore, it is attracting attention (Non-Patent Document 1). Manganese oxides include manganese dioxide, manganese dioxide, and manganese oxide.
　前記マンガン酸化物の中で、従来より研磨剤として一般的に知られてきたものは２酸化マンガンであり、２酸化マンガン砥粒を用いた研磨砥粒が半導体プロセスの中のＣＭＰ工程において検討されている。非特許文献２には、半導体プロセス中のＣＭＰ工程において研磨剤として用いられる２酸化マンガン砥粒および３酸化２マンガン砥粒は、過酸化水素水を含む洗浄液によって洗浄可能であることが開示されている。 Among the manganese oxides, manganese dioxide that has been generally known as an abrasive is conventionally manganese dioxide, and polishing abrasive grains using manganese dioxide abrasive grains have been studied in the CMP process in the semiconductor process. ing. Non-Patent Document 2 discloses that manganese dioxide abrasive grains and trioxide 2 manganese abrasive grains used as abrasives in a CMP process in a semiconductor process can be cleaned with a cleaning solution containing hydrogen peroxide. Yes.
　しかしながら、本発明者らは、非特許文献２に記載の過酸化水素を含む洗浄液による２酸化マンガン砥粒および３酸化２マンガン砥粒の洗浄は、半導体ＣＭＰに用いる平均粒子径が通常３０～４０ｎｍ程度の２酸化マンガン砥粒および３酸化２マンガン砥粒に対して効果的であり、これらの砥粒と比較して平均粒子径が大きく安定であるガラスの研磨に用いる３酸化２マンガン砥粒は、過酸化水素水を含む洗浄液によっては洗浄効果が低いことを見出した。 However, the present inventors have found that the average particle size used for semiconductor CMP is usually 30 to 40 nm in the cleaning of manganese dioxide abrasive grains and trioxide 2 manganese abrasive grains with a cleaning liquid containing hydrogen peroxide described in Non-Patent Document 2. 3 manganese dioxide abrasive grains used for polishing glass having an average particle diameter large and stable compared with these abrasive grains are effective for the manganese dioxide oxide grains of about 3 and 2 manganese oxide abrasive grains. It has been found that the cleaning effect is low depending on the cleaning liquid containing hydrogen peroxide solution.
　また、過酸化水素水を含む洗浄液は、洗浄液のｐＨが高くなると３酸化２マンガン砥粒が溶けにくく、洗浄液のｐＨが４を超えると３酸化２マンガン砥粒がほぼ溶けないことから、耐酸性の弱いガラスには適用しにくいと考えられる。 In addition, the cleaning liquid containing hydrogen peroxide solution is resistant to acid resistance because the trimanganese 2 manganese abrasive grains are difficult to dissolve when the pH of the cleaning liquid becomes high, and the trimanganese 2 manganese abrasive grains hardly dissolve when the pH of the cleaning liquid exceeds 4. It is considered difficult to apply to weak glass.
　ガラスの研磨後の洗浄に対する要求は年々高まっており、特に磁気ディスクガラス基板またはフォトマスクの分野ではそのような要求の高まりは顕著であり、セリア砥粒の代替物として３酸化２マンガン砥粒を用いた研磨後の洗浄にも、３酸化２マンガン砥粒の高い除去効果が望まれる。 The demand for cleaning after polishing glass has been increasing year by year, especially in the field of magnetic disk glass substrates or photomasks, and such demand is remarkable. A high removal effect of trimanganese 2 manganese abrasive grains is also desired for cleaning after polishing.
　したがって、本発明はかかる問題点を鑑みてなされたものであり、３酸化２マンガン砥粒を含む研磨剤を用いてガラスを研磨する研磨工程の後に、洗浄液を用いてガラスに付着した３酸化２マンガン砥粒を含む研磨剤を効果的に洗浄する工程を含むガラス製品の製造方法を提供することを目的とする。 Accordingly, the present invention has been made in view of such problems, and after the polishing step of polishing the glass using a polishing agent containing 2 manganese oxide abrasive grains, the 3 oxide 2 adhered to the glass using a cleaning liquid. It aims at providing the manufacturing method of the glass product including the process of wash | cleaning the abrasive | polishing agent containing a manganese abrasive grain effectively.
　本発明者は、３酸化２マンガン砥粒が可溶である水溶液について検討した結果、アスコルビン酸およびエリソルビン酸の少なくとも一方を含む水溶液は、ガラスの研磨に用いる平均粒子径が大きい３酸化２マンガン砥粒に対する溶解力が高いことを見出し、この知見に基づいて本発明を完成させた。 As a result of examining the aqueous solution in which the trimanganese 2 manganese abrasive grains are soluble, the aqueous solution containing at least one of ascorbic acid and erythorbic acid is a trioxide 2 manganese abrasive having a large average particle size used for polishing glass. Based on this finding, the present invention has been completed.
　すなわち、本発明の要旨は以下である。
〔１〕３酸化２マンガン砥粒を含む研磨剤を用いてガラスを研磨する研磨工程と、その後に洗浄液を用いて該ガラスを洗浄する洗浄工程とを含むガラス製品の製造方法であって、該洗浄液がアスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液であるガラス製品の製造方法。
〔２〕３酸化２マンガン砥粒の平均粒子径が０．３μｍ以上３μｍ以下である〔１〕に記載のガラス製品の製造方法。
〔３〕洗浄液のｐＨが２以上５以下である〔１〕または〔２〕に記載のガラス製品の製造方法。 That is, the gist of the present invention is as follows.
[1] A method for producing a glass product, comprising: a polishing step of polishing glass using a polishing agent containing trioxide 2 manganese abrasive grains; and a cleaning step of cleaning the glass using a cleaning liquid thereafter, A method for producing a glass product, wherein the cleaning liquid is a cleaning liquid containing at least one of ascorbic acid and erythorbic acid.
[2] The method for producing a glass product according to [1], wherein the average particle diameter of the trioxide 2 manganese abrasive grains is 0.3 μm or more and 3 μm or less.
[3] The method for producing a glass product according to [1] or [2], wherein the pH of the cleaning liquid is 2 or more and 5 or less.
　本発明のガラス製品の製造方法によれば、３酸化２マンガン砥粒を含む研磨剤でガラスを研磨した後、アスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液を用いてガラスを洗浄することにより、ガラスに付着した３酸化２マンガン砥粒を溶かしながら効果的に洗浄することができる。 According to the method for producing a glass product of the present invention, after polishing glass with an abrasive containing trimanganese 2 manganese abrasive grains, by washing the glass with a cleaning liquid containing at least one of ascorbic acid and erythorbic acid, It is possible to wash effectively while melting the trioxide 2 manganese abrasive grains adhering to the glass.
　アスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液は３酸化２マンガン砥粒に対して広いｐＨ範囲で一定以上の溶解度を有するため、本発明のガラス製品の製造方法は、耐酸性の弱いガラスにも適用することが可能である。 Since the cleaning liquid containing at least one of ascorbic acid and erythorbic acid has a certain degree of solubility in a wide pH range with respect to the trioxide 2 manganese abrasive grains, the method for producing a glass product of the present invention is applied to a glass having weak acid resistance. It is possible to apply.
（研磨工程）
　本発明のガラス製品の製造方法は、３酸化２マンガン砥粒を含む研磨剤を用いてガラスを研磨する研磨工程を含む。３酸化２マンガン砥粒は、セリア砥粒の代替材料としてガラスの研磨に用いることができる。 (Polishing process)
The manufacturing method of the glass product of this invention includes the grinding | polishing process of grind | polishing glass using the abrasive | polishing agent containing a trioxide 2 manganese abrasive grain. Trioxide 2 manganese abrasive grains can be used for polishing glass as an alternative material for ceria abrasive grains.
　本発明において、３酸化２マンガン砥粒の平均粒子径は、０．３μｍ以上３μｍ以下であることが好ましい。３酸化２マンガン砥粒の平均粒子径は、レーザー散乱を用いて実施例において後述する方法により測定する。３酸化２マンガン砥粒の平均粒子径を０．３μｍ以上とすることにより充分な研磨レートを得ることができ、３μｍ以下とすることにより砥粒が傷の原因となるのを防ぐことができる。 In the present invention, the average particle diameter of the trimanganese 2 manganese abrasive grains is preferably 0.3 μm or more and 3 μm or less. The average particle diameter of the trioxide 2 manganese abrasive grains is measured by a method described later in Examples using laser scattering. A sufficient polishing rate can be obtained by setting the average particle diameter of the trioxide 2 manganese abrasive grains to 0.3 μm or more, and it can be prevented that the abrasive grains cause scratches by setting the average particle diameter to 3 μm or less.
　研磨剤における３酸化２マンガン砥粒の濃度は、通常１質量％以上、２０質量％以下であることが好ましく、３質量％以上１５質量％以下であることがより好ましい。研磨剤における３酸化２マンガン砥粒の濃度を１質量％以上とすることにより、充分な研磨レートを得ることができる。また、２０質量％以下とすることにより、研磨中にスラリーに混入するガラス成分の影響で、スラリー粘度が上昇するのを防ぎ、研磨レートを向上することができる。 The concentration of the trioxide 2 manganese abrasive grains in the polishing agent is usually preferably 1% by mass or more and 20% by mass or less, and more preferably 3% by mass or more and 15% by mass or less. By setting the concentration of the trioxide 2 manganese abrasive grains in the abrasive to 1% by mass or more, a sufficient polishing rate can be obtained. Moreover, by setting it as 20 mass% or less, it can prevent that a slurry viscosity raises under the influence of the glass component mixed in a slurry during grinding | polishing, and can improve a polishing rate.
　また、研磨剤には界面活性剤および分散剤等を含んでもよい。界面活性剤としては、例えば、アルキレンジオールをはじめとする非泡性の界面活性剤が挙げられる。研磨剤における界面活性剤の含有量は０．０１～１質量％であることが好ましい。 Further, the abrasive may contain a surfactant, a dispersant and the like. Examples of the surfactant include non-foaming surfactants such as alkylene diols. The content of the surfactant in the abrasive is preferably 0.01 to 1% by mass.
　また、分散剤としては、例えば、ポリアクリル酸ナトリウム、２リン酸ナトリウム、ホスホン酸ナトリウムおよびクエン酸ナトリウムが挙げられる。研磨剤における分散剤の含有量は０．５～２質量％であることが好ましい。 Further, examples of the dispersing agent include sodium polyacrylate, sodium phosphate, sodium phosphonate and sodium citrate. The content of the dispersant in the abrasive is preferably 0.5 to 2% by mass.
　本発明における研磨の方法は特に限定されないが、例えば、ガラスと研磨布とを接触させ、３酸化２マンガン砥粒を含む研磨剤を供給しながら、研磨布とガラスとを相対的に移動させて、ガラスを鏡面状に研磨することが好ましい。研磨布としては、例えば、ウレタン製研磨パッドを用いることができる。 The polishing method in the present invention is not particularly limited. For example, the polishing cloth and the glass are relatively moved while the glass and the polishing cloth are brought into contact with each other while supplying the polishing agent containing the trimanganese 2 manganese abrasive grains. The glass is preferably polished into a mirror surface. As the polishing cloth, for example, a urethane polishing pad can be used.
（洗浄工程）
　本発明のガラス製品の製造方法は、アスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液（以下、本発明に用いる洗浄液ともいう）を用いて、ガラスに付着した３酸化２マンガン砥粒を含む研磨剤を洗浄する工程を含む。アスコルビン酸およびエリソルビン酸は、３酸化２マンガン砥粒に対する溶解力が高く、またｐＨ調整剤としての役割を担っている。 (Washing process)
The method for producing a glass product of the present invention comprises a polishing agent containing trimanganese 2 manganese abrasive grains adhering to glass using a cleaning solution containing at least one of ascorbic acid and erythorbic acid (hereinafter also referred to as a cleaning solution used in the present invention). A step of washing. Ascorbic acid and erythorbic acid have a high dissolving power with respect to trimanganese 2 manganese abrasive grains and also play a role as a pH adjuster.
　本発明に用いる洗浄液におけるアスコルビン酸およびエリソルビン酸の含有量は合計で、０．１～１質量％であることが好ましく、０．２５～０．７５質量％であることがより好ましい。洗浄液におけるアスコルビン酸およびエリソルビン酸の含有量を合計で０．１質量％以上とすることにより、溶出量を維持しやすい。また、１質量％以下とすることにより、３酸化２マンガン砥粒を含む研磨剤の分散性を維持しやすい。 The total content of ascorbic acid and erythorbic acid in the cleaning liquid used in the present invention is preferably 0.1 to 1% by mass, and more preferably 0.25 to 0.75% by mass. By making the contents of ascorbic acid and erythorbic acid in the cleaning liquid 0.1% by mass or more in total, it is easy to maintain the elution amount. Moreover, it is easy to maintain the dispersibility of the abrasive | polishing agent containing a trioxide 2 manganese abrasive grain by setting it as 1 mass% or less.
　本発明に用いる洗浄液は、洗浄補助剤を含むことが好ましい。洗浄補助剤としては、例えば、表面張力を下げるための界面活性剤、およびｐＨを安定的に保持する為の緩衝効果のある酸が挙げられる。界面活性剤としては、例えば、アセチレンジオールなどのノニオン性界面活性剤、及びポリアクリル酸ナトリウムなどのアニオン界面活性剤などが挙げられる。 The cleaning liquid used in the present invention preferably contains a cleaning auxiliary. Examples of the cleaning aid include a surfactant for lowering the surface tension, and an acid having a buffering effect for stably maintaining pH. Examples of the surfactant include nonionic surfactants such as acetylene diol and anionic surfactants such as sodium polyacrylate.
　また、ｐＨを安定的に保持する為の緩衝効果のある酸としては、例えば、ｐＫａが２～５にあり、１つ以上のカルボン酸をもつ酸が挙げられる。具体的には、例えば、緩衝効果が期待できる酸としてクエン酸が挙げられるが、それ以外にも数多くの有機酸が使用可能である。 Further, as an acid having a buffering effect for stably maintaining pH, for example, an acid having a pKa of 2 to 5 and having one or more carboxylic acids can be mentioned. Specifically, for example, citric acid can be cited as an acid that can be expected to have a buffering effect, but many other organic acids can be used.
　本発明に用いる洗浄液は、溶媒として水を含むことが好ましい。水としては、例えば、脱イオン水、超純水、電荷イオン水、水素水およびオゾン水などが挙げられる。なお、水は、本発明に用いる洗浄液の流動性を制御する機能を有するので、その含有量は洗浄速度等の目標とする洗浄特性に合わせて適宜設定することができるが、通常５５～９８質量％とすることが好ましい。 The cleaning liquid used in the present invention preferably contains water as a solvent. Examples of water include deionized water, ultrapure water, charged ion water, hydrogen water, and ozone water. Since water has a function of controlling the fluidity of the cleaning liquid used in the present invention, its content can be appropriately set according to the target cleaning characteristics such as the cleaning speed, but usually 55 to 98 mass. % Is preferable.
　本発明に用いるアスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液は広いｐＨ範囲において３酸化２マンガン砥粒に対して一定以上の溶解度を有するが、洗浄液のｐＨは２以上５以下であることが好ましい。洗浄液のｐＨを２以上とすることにより、アスコルビン酸またはエリソルビン酸が溶けやすく、操作および安全性の観点からも好ましい。また、洗浄液のｐＨを５以下とすることにより、３酸化２マンガン砥粒に対する洗浄液の除去能力を向上することができる。なお、耐酸性の弱いガラスに本発明を適用する場合は洗浄液のｐＨは典型的には４以下とすることが好ましい。 The cleaning liquid containing at least one of ascorbic acid and erythorbic acid used in the present invention has a certain solubility or higher with respect to trimanganese 2 manganese abrasive grains in a wide pH range, but the pH of the cleaning liquid is preferably 2 or more and 5 or less. . By setting the pH of the cleaning liquid to 2 or more, ascorbic acid or erythorbic acid is easily dissolved, which is preferable from the viewpoint of operation and safety. Moreover, the removal capability of the washing | cleaning liquid with respect to trioxide 2 manganese abrasive grain can be improved by making pH of a washing | cleaning liquid into 5 or less. In addition, when applying this invention to glass with weak acid resistance, it is preferable that pH of a washing | cleaning liquid shall be 4 or less typically.
　ガラスを洗浄液に浸漬した場合に出てくるアルカリ・アルカリ土類によってアスコルビン酸またはエリソルビン酸の３酸化２マンガン砥粒に対する溶解効果が低下することを防ぐために、本発明に用いる洗浄液にビルダー効果のあるゼオライトなどを含んでもよい。
洗浄液におけるゼオライトの含有量は、特に限定されないが、１質量％以下とすることが好ましい。 In order to prevent the dissolution effect of ascorbic acid or erythorbic acid on trioxide 2 manganese abrasive grains from being lowered when the glass is immersed in the cleaning liquid, the cleaning liquid used in the present invention has a builder effect. Zeolite and the like may be included.
The content of zeolite in the cleaning liquid is not particularly limited, but is preferably 1% by mass or less.
　洗浄工程では、前記洗浄液をガラスに直接接触させて洗浄することが好ましい。洗浄液をガラスに直接接触させる方法としては、例えば、洗浄液を洗浄槽に満たし、その中にガラスを入れるディップ式洗浄、ノズルからガラスに洗浄液を噴射する方法、およびポリビニルアルコール製のスポンジを用いるスクラブ洗浄などが挙げられる。本発明に用いる洗浄液は上記のいずれの方法にも適応できるが、より効率的な洗浄ができることから、超音波洗浄を併用したディップ式洗浄が好ましい。 In the cleaning step, it is preferable to perform cleaning by bringing the cleaning liquid into direct contact with glass. Examples of the method of bringing the cleaning liquid into direct contact with the glass include, for example, dip cleaning in which the cleaning liquid is filled in a cleaning tank, and glass is placed in the cleaning tank, a method of spraying the cleaning liquid onto the glass from a nozzle, and scrub cleaning using a sponge made of polyvinyl alcohol Etc. The cleaning liquid used in the present invention can be applied to any of the above methods, but dip cleaning using ultrasonic cleaning is preferred because more efficient cleaning can be performed.
　洗浄工程において、洗浄液とガラスとを接触させる時間は、３０秒間以上であることが好ましい。３０秒間以上とすることにより、十分な洗浄効果を得ることができる。 In the cleaning step, the time for bringing the cleaning liquid into contact with the glass is preferably 30 seconds or more. By setting it to 30 seconds or more, a sufficient cleaning effect can be obtained.
　洗浄工程において、洗浄液の温度は室温でもよく、４０～８０℃程度に加温して使用してもよいが、８０℃以下とすることが好ましい。洗浄液の温度を８０℃以下とすることにより、アスコルビン酸が熱分解を起こすのを防ぐことができる。また、装置の構成上、洗浄液が１００℃に近い温度になると、水の蒸発によるｐＨコントロールが難しくなることから、８０℃以下とすることが好ましい。 In the washing step, the temperature of the washing solution may be room temperature, and may be used after being heated to about 40 to 80 ° C., but is preferably 80 ° C. or less. By setting the temperature of the cleaning liquid to 80 ° C. or lower, it is possible to prevent thermal decomposition of ascorbic acid. Further, because of the configuration of the apparatus, when the cleaning liquid reaches a temperature close to 100 ° C., it becomes difficult to control pH by evaporation of water, and therefore, the temperature is preferably 80 ° C. or lower.
　本発明の洗浄後に、水またはアルカリ洗剤を用いた洗浄を行うと、より効果的である。
また、本発明の洗浄の前に水を用いた洗浄を組み合わせてもよい。 It is more effective to carry out washing with water or an alkaline detergent after the washing of the present invention.
Moreover, you may combine the washing | cleaning using water before the washing | cleaning of this invention.
（その他の工程）
　本発明の製造方法は、ガラス製品が磁気ディスク用ガラス基板、高品質な液晶ディスプレイ用ガラス基板である場合などにはその他の工程として、前記洗浄工程の後に、ガラスの主表面を、コロイダルシリカ砥粒を含むスラリーを用いて研磨する仕上げ研磨工程を含むことが好ましい。 (Other processes)
When the glass product is a glass substrate for a magnetic disk or a high-quality glass substrate for a liquid crystal display, the main surface of the glass is subjected to colloidal silica polishing after the cleaning step. It is preferable to include a final polishing step of polishing using a slurry containing grains.
　本発明の製造方法により製造されるガラス製品としては、例えば、磁気ディスク用ガラス基板、フォトマスク基板およびディスプレイ基板などのガラス基板、レンズ、並びにＣＣＤ向けブルーフィルタガラスおよびカバーガラスなどが挙げられる。本発明の製造方法により製造される磁気ディスク用ガラス基板の主表面に磁気記録層を形成することにより磁気ディスクを製造することができる。 Examples of glass products produced by the production method of the present invention include glass substrates for magnetic disks, glass substrates such as photomask substrates and display substrates, lenses, and blue filter glass and cover glass for CCDs. A magnetic disk can be manufactured by forming a magnetic recording layer on the main surface of a glass substrate for a magnetic disk manufactured by the manufacturing method of the present invention.
　以下に本発明の実施例について具体的に説明するが、本発明はこれらに限定されない。 Examples of the present invention will be specifically described below, but the present invention is not limited to these.
（１）３酸化２マンガン砥粒の溶解性調査　
　３酸化２マンガン砥粒が溶解する水溶液は、３酸化２マンガン砥粒を含む研磨剤の洗浄液として使用可能であると考えられる。この為、予備調査として、３酸化２マンガン砥粒（平均粒子径　１μｍφ）の溶解試験を実施した。３酸化２マンガン砥粒の平均粒子径は、レーザー回折式の粒度分布測定器（日機装製ＭＴ３３００ＥＸ－ＩＩ）にて測定した。 (1) Investigation of solubility of trioxide 2 manganese abrasive grains
It is considered that the aqueous solution in which the trioxide 2 manganese abrasive grains dissolve can be used as a cleaning liquid for an abrasive containing the trioxide 2 manganese abrasive grains. Therefore, as a preliminary investigation, a dissolution test of trimanganese 2 manganese abrasive grains (average particle diameter 1 μmφ) was performed. The average particle diameter of the trioxide 2 manganese abrasive grains was measured with a laser diffraction type particle size distribution analyzer (MT3300EX-II manufactured by Nikkiso).
　表１に示す組成となるように酸を添加後、ｐＨを調整した各種水溶液を調製した。各水溶液４０ｍｌに３酸化２マンガン砥粒を０．０４ｇ添加し、２５℃にて６０分間振とうした。その後、遠心分離機（日立工機製ＣＦ１５－ＲＸＩＩ）を用いて、室温にて１００００ｒｐｍで３０分間処理し、上澄みを除去後、７０℃にて２時間乾燥させた。乾燥後、３酸化２マンガン砥粒の残留量を測定した。この値から、水溶液に溶解した３酸化２マンガン砥粒の割合（溶出量）を求めた。 After adding an acid so as to have the composition shown in Table 1, various aqueous solutions with adjusted pH were prepared. 0.040 g of trimanganese 2 manganese abrasive grains were added to 40 ml of each aqueous solution and shaken at 25 ° C. for 60 minutes. Thereafter, using a centrifuge (CF15-RXII manufactured by Hitachi Koki Co., Ltd.), the mixture was treated at 10,000 rpm for 30 minutes at room temperature, and the supernatant was removed, followed by drying at 70 ° C. for 2 hours. After drying, the residual amount of trimanganese 2 manganese abrasive grains was measured. From this value, the ratio (elution amount) of trioxide 2 manganese abrasive grains dissolved in the aqueous solution was determined.
　すなわち、３酸化２マンガン砥粒の各種水溶液への溶出量は、３酸化２マンガン砥粒の各水溶液への添加量から、残留量を引いた値とし、百分率（％）にて表記した。その結果を表１に示す。 That is, the amount of elution of trioxide 2 manganese abrasive grains into various aqueous solutions was expressed as a percentage (%) with the residual amount subtracted from the amount of trioxide 2 manganese abrasive grains added to each aqueous solution. The results are shown in Table 1.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
　表１に示すように、実施例１～１０のアスコルビン酸およびエリソルビン酸の少なくとも一方を含む水溶液によれば、各ｐＨ範囲で添加した３酸化２マンガン砥粒の３０％程度は溶出した。この結果から、アスコルビン酸およびエリソルビン酸の少なくとも一方を含む水溶液は、広いｐＨ範囲で３酸化２マンガン砥粒に対する一定以上の溶解度を示すことが分かった。 As shown in Table 1, according to the aqueous solutions containing at least one of ascorbic acid and erythorbic acid of Examples 1 to 10, about 30% of the trioxide 2 manganese abrasive grains added in each pH range were eluted. From this result, it was found that an aqueous solution containing at least one of ascorbic acid and erythorbic acid showed a certain degree of solubility in a trioxide 2 manganese abrasive grain in a wide pH range.
　また、実施例１～３および６～８の結果から、アスコルビン酸およびエリソルビン酸の少なくとも一方を含む水溶液のｐＨを２～５とすることにより、３酸化２マンガン砥粒を溶解する能力がより向上することが分かった。 From the results of Examples 1 to 3 and 6 to 8, the ability to dissolve the trimanganese 2 manganese abrasive grains is further improved by setting the pH of the aqueous solution containing at least one of ascorbic acid and erythorbic acid to 2 to 5. I found out that
　一方、比較例１～５のクエン酸を含む水溶液では、同じｐＨで比較すると、アスコルビン酸またはエリソルビン酸を含む水溶液により溶出される３酸化２マンガン砥粒の２５％程度しか溶出しなかった。また、比較例７のマレイン酸を含む溶液では、３酸化２マンガン砥粒の溶出量が著しく低かった。さらに、比較例６、８～１１の過酸化水素水を含む水溶液では、ｐＨ４以上では３酸化２マンガン砥粒の溶出量が著しく低下した。マレイン酸においては３酸化２マンガン砥粒への還元力がなく、溶出量が著しく低かったものと考えられる。 On the other hand, in the aqueous solutions containing citric acid of Comparative Examples 1 to 5, only about 25% of the trioxide 2 manganese abrasive grains eluted with the aqueous solution containing ascorbic acid or erythorbic acid were eluted when compared at the same pH. Further, in the solution containing maleic acid of Comparative Example 7, the elution amount of trimanganese 2 manganese abrasive grains was remarkably low. Further, in the aqueous solutions containing the hydrogen peroxide solutions of Comparative Examples 6 and 8 to 11, the elution amount of the trioxide 2 manganese abrasive grains was remarkably reduced at pH 4 or higher. It is considered that maleic acid has no reducing power to trioxide 2 manganese abrasive grains and the amount of elution is extremely low.
　なお、アスコルビン酸誘導体を含有する水溶液についても３酸化２マンガン砥粒の溶出量について評価したが、３酸化２マンガン砥粒の溶出を促進する効果は見られなかった。これは、リン酸アスコルビンマグネシウム、アスコルビン酸グルコシドをはじめとするアスコルビン酸誘導体は、アスコルビン酸が酸化されることを抑制する構造になっているため、３酸化２マンガンを還元することが出来ず、３酸化２マンガン砥粒の溶出が促進されないものと考えられる。 The aqueous solution containing the ascorbic acid derivative was also evaluated for the elution amount of the trimanganese 2 manganese abrasive grains, but the effect of promoting the elution of the trioxide 2 manganese abrasive grains was not observed. This is because ascorbic acid derivatives such as magnesium ascorbyl phosphate and glucoside ascorbic acid have a structure that suppresses oxidation of ascorbic acid, and thus cannot reduce dimanganese trioxide. It is considered that the elution of oxidized 2 manganese abrasive grains is not promoted.
（２）３酸化２マンガン砥粒の洗浄性評価
　５０ｍｍ角のアルミノシリケートガラス板を、平均粒子径１μｍφの３酸化２マンガン砥粒を１０質量％と分散剤としてアクリル酸－マレイン酸共重合体のナトリウム塩を０．１質量％含むスラリーと硬質ウレタンパッドにより、片面研磨機（スピードファム製ＦＡＭ１２Ｂ）を用いて片面を研磨加工した。研磨後、ガラス板を、予備洗浄として純水により浸漬洗浄し、表２に示す条件にて超音波洗浄し、その後純水により浸漬洗浄した。その後、ガラス板を純水によりリンスした。その後、ガラス板を乾燥させた。　 (2) Detergency Evaluation of Trioxide 2 Manganese Abrasive Grains A 50 mm square aluminosilicate glass plate, 10 mass% of trioxide 2 manganese abrasive grains having an average particle diameter of 1 μmφ, and an acrylic acid-maleic acid copolymer as a dispersant. One side was polished with a slurry containing 0.1% by mass of sodium salt and a hard urethane pad using a single-side polishing machine (FAM12B manufactured by Speedfam). After polishing, the glass plate was subjected to immersion cleaning with pure water as preliminary cleaning, ultrasonic cleaning was performed under the conditions shown in Table 2, and then immersion cleaning was performed with pure water. Thereafter, the glass plate was rinsed with pure water. Thereafter, the glass plate was dried.
　乾燥後、以下の方法１または方法２で３酸化２マンガン砥粒の残留状況を調べた。その結果を表２に示す。 After drying, the remaining state of the trioxide 2 manganese abrasive grains was examined by the following method 1 or method 2. The results are shown in Table 2.
（方法１）乾燥後、目視によりガラス板に残留する３酸化２マンガン砥粒を調べた。残渣が確認できた場合は、×、確認できなかった場合は○とした。
（方法２）乾燥後、高輝度光源をガラス板に照射しながら、ガラス板に残留する３酸化２マンガン砥粒を調べた。残渣が確認できた場合は×、確認できなかった場合は○とした。 (Method 1) After drying, the trioxide 2 manganese abrasive grains remaining on the glass plate were visually examined. When the residue was confirmed, it was set as x, and when it was not confirmed, it was marked as ○.
(Method 2) After drying, the trioxide 2 manganese abrasive grains remaining on the glass plate were examined while irradiating the glass plate with a high-intensity light source. When the residue was confirmed, it was marked as “X”, and when it was not confirmed, it was marked as “◯”.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
　表２に示すように、アスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液によりガラス板を洗浄した実施例１１～１４に関しては、超音波槽の底に３酸化２マンガン砥粒残渣が存在せず、洗浄液に３酸化２マンガン砥粒が溶解していることが確認できた。一方、アスコルビン酸およびエリソルビン酸のいずれも含まない洗浄液によりガラス板を洗浄した比較例１２～１７に関しては３酸化２マンガン砥粒がガラス板に残留していることが確認できた。 As shown in Table 2, with respect to Examples 11 to 14 where the glass plate was cleaned with a cleaning liquid containing at least one of ascorbic acid and erythorbic acid, there was no trioxide 2 manganese abrasive grain residue at the bottom of the ultrasonic bath, It was confirmed that the trioxide 2 manganese abrasive grains were dissolved in the cleaning liquid. On the other hand, in Comparative Examples 12 to 17 in which the glass plate was cleaned with a cleaning solution containing neither ascorbic acid nor erythorbic acid, it was confirmed that trimanganese 2 manganese abrasive grains remained on the glass plate.
　この結果から、３酸化２マンガン砥粒を含む研磨剤を用いてガラスを研磨する工程の後に、アスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液を用いてガラスを洗浄する洗浄工程を含む本発明の方法によれば、ガラスの表面から３酸化２マンガン砥粒を効果的に除去できることがわかった。 From this result, the step of polishing the glass with a cleaning liquid containing at least one of ascorbic acid and erythorbic acid after the step of polishing the glass with an abrasive containing trimanganese 2 manganese abrasive grains is included. According to the method, it was found that trimanganese 2 manganese abrasive grains can be effectively removed from the surface of the glass.
　本発明を特定の態様を用いて詳細に説明したが、本発明の意図と範囲を離れることなく様々な変更および変形が可能であることは、当業者にとって明らかである。なお本出願は、２０１１年７月１２日付で出願された日本特許出願（特願２０１１－１５４３１２）に基づいており、その全体が引用により援用される。
  Although the invention has been described in detail using specific embodiments, it will be apparent to those skilled in the art that various modifications and variations can be made without departing from the spirit and scope of the invention. Note that this application is based on a Japanese patent application filed on July 12, 2011 (Japanese Patent Application No. 2011-155431), which is incorporated by reference in its entirety.

Claims (3)

  1. 　３酸化２マンガン砥粒を含む研磨剤を用いてガラスを研磨する研磨工程と、その後に洗浄液を用いて該ガラスを洗浄する洗浄工程とを含むガラス製品の製造方法であって、該洗浄液がアスコルビン酸およびエリソルビン酸の少なくとも一方を含む洗浄液であるガラス製品の製造方法。 A method for producing a glass product, comprising: a polishing step of polishing glass using a polishing agent containing trioxide 2 manganese abrasive grains; and a cleaning step of cleaning the glass using a cleaning solution thereafter, wherein the cleaning solution is ascorbine. A method for producing a glass product, which is a cleaning liquid containing at least one of an acid and erythorbic acid.
  2. 　３酸化２マンガン砥粒の平均粒子径が０．３μｍ以上３μｍ以下である請求項１に記載のガラス製品の製造方法。 The method for producing a glass product according to claim 1, wherein the average particle diameter of the trioxide 2 manganese abrasive grains is 0.3 µm or more and 3 µm or less.
  3. 　洗浄液のｐＨが２以上５以下である請求項１または２に記載のガラス製品の製造方法。 The method for producing a glass product according to claim 1 or 2, wherein the pH of the cleaning liquid is 2 or more and 5 or less.
PCT/JP2012/066598 2011-07-12 2012-06-28 Process for producing glass product WO2013008639A1 (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000268348A (en) * 1999-03-18 2000-09-29 Nippon Sheet Glass Co Ltd Glass substrate for information recording medium and production thereof
WO2002098812A1 (en) * 2001-06-04 2002-12-12 Nippon Sheet Glass Co., Ltd. Method of producing transparent substrate and trasparent substrate, and organic electroluminescence element having the transparent substrate
JP2004335896A (en) * 2003-05-09 2004-11-25 Jsr Corp Aqueous solution for non-chemical mechanical polishing, abrasive set, and chemical mechanical polishing method
JP2006099847A (en) * 2004-09-29 2006-04-13 Hoya Corp Manufacturing methods of glass substrate for magnetic disk and of magnetic disk
JP2009215093A (en) * 2008-03-07 2009-09-24 Asahi Glass Co Ltd Detergent for glass substrate, and method for producing glass substrate
JP2009295914A (en) * 2008-06-09 2009-12-17 Ebara Corp Polishing pad, electrolytic compound polishing device, and electrolytic compound polishing method

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000268348A (en) * 1999-03-18 2000-09-29 Nippon Sheet Glass Co Ltd Glass substrate for information recording medium and production thereof
WO2002098812A1 (en) * 2001-06-04 2002-12-12 Nippon Sheet Glass Co., Ltd. Method of producing transparent substrate and trasparent substrate, and organic electroluminescence element having the transparent substrate
JP2004335896A (en) * 2003-05-09 2004-11-25 Jsr Corp Aqueous solution for non-chemical mechanical polishing, abrasive set, and chemical mechanical polishing method
JP2006099847A (en) * 2004-09-29 2006-04-13 Hoya Corp Manufacturing methods of glass substrate for magnetic disk and of magnetic disk
JP2009215093A (en) * 2008-03-07 2009-09-24 Asahi Glass Co Ltd Detergent for glass substrate, and method for producing glass substrate
JP2009295914A (en) * 2008-06-09 2009-12-17 Ebara Corp Polishing pad, electrolytic compound polishing device, and electrolytic compound polishing method

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