WO2012057165A1 - Écran tactile - Google Patents

Écran tactile Download PDF

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Publication number
WO2012057165A1
WO2012057165A1 PCT/JP2011/074587 JP2011074587W WO2012057165A1 WO 2012057165 A1 WO2012057165 A1 WO 2012057165A1 JP 2011074587 W JP2011074587 W JP 2011074587W WO 2012057165 A1 WO2012057165 A1 WO 2012057165A1
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WO
WIPO (PCT)
Prior art keywords
metal
transparent electrode
touch panel
metal oxide
substrate
Prior art date
Application number
PCT/JP2011/074587
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English (en)
Japanese (ja)
Inventor
和輝 江口
慶太 村梶
賢一 元山
Original Assignee
日産化学工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by 日産化学工業株式会社 filed Critical 日産化学工業株式会社
Priority to JP2012540893A priority Critical patent/JP5920220B2/ja
Priority to KR1020137012941A priority patent/KR101871527B1/ko
Priority to CN201180062501.7A priority patent/CN103270477B/zh
Publication of WO2012057165A1 publication Critical patent/WO2012057165A1/fr

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes

Definitions

  • the present invention relates to a touch panel, and more particularly to a capacitive touch panel.
  • the touch panel detects the contact position of the operation surface touched by a finger or pen. Using this function, the touch panel is used as an input device.
  • Examples of the contact position detection method include a resistance film method and a capacitance method.
  • the resistance film method two substrates having transparent electrodes provided on the surface are arranged apart from each other so that the transparent electrodes face each other. That is, there is a problem that it is difficult to reduce the thickness because two substrates are required.
  • the transparent electrode provided on this substrate and the transparent electrode provided on the other substrate are short-circuited to detect the pressed position. Therefore, there is a problem that the substrate on the side pressed by the finger is easily worn and the durability of the touch panel is lowered.
  • the electrostatic capacity method can be said to be a method suitable for a portable device because it can be thinned by using a single substrate.
  • Patent Document 1 discloses a capacitive touch panel.
  • a first transparent electrode for detecting coordinates in the X direction and a second transparent electrode for detecting coordinates in the Y direction are arranged via glass as a dielectric.
  • a plurality of electrodes for detecting coordinates in the X direction are arranged on one surface of a single glass substrate, and a plurality of electrodes for detecting coordinates in the Y direction are separated on the other surface. Arranged. That is, each transparent electrode is provided on one substrate.
  • Patent Document 2 discloses a capacitive touch panel having another configuration.
  • a first transparent electrode for detecting coordinates in the X direction and a second transparent electrode for detecting coordinates in the Y direction are arranged on one surface of the transparent substrate, and intersect each other.
  • An insulating layer is interposed in the part so as not to conduct. Such a structure eliminates the need for electrode formation on both sides of the substrate.
  • the touch panel is incorporated in a display device such as a liquid crystal display device and is used as a display device with a touch panel function capable of detecting a touch position. Since a person who operates the touch panel visually recognizes the display device through the touch panel, a member having excellent light transmission characteristics is used for the transparent electrode. For example, an inorganic material such as ITO (Indium Tin Oxide) is used.
  • ITO Indium Tin Oxide
  • an acrylic layer made of an acrylic material is provided on a transparent electrode such as ITO.
  • the purpose of this acrylic layer is to protect the transparent electrode, and no consideration is given to the refractive index characteristics. For this reason, the effect of making the electrode pattern inconspicuous in the acrylic layer cannot be expected.
  • the acrylic layer is an organic material thin film, the hardness as a protective film is not sufficient. Adhesiveness with a transparent electrode such as ITO is also weak, which is a cause of lowering the reliability of the touch panel. Furthermore, in the case of an acrylic layer, it is difficult to form a film using a printing technique such as flexographic printing. For this reason, it is necessary to use a photolithography technique with complicated processes in forming the film.
  • an object of the present invention is to provide a capacitive touch panel that can reduce deterioration in display properties of a display device due to the visual recognition of a transparent electrode pattern.
  • Another object of the present invention is to provide a capacitance formed by forming on the transparent electrode a film that can be formed with high hardness, high adhesion with the transparent electrode, and film formation using printing technology. It is to provide a touch panel of the type.
  • the present invention is a capacitive touch panel in which a transparent electrode pattern is formed in an operation area of a transparent substrate,
  • the following general formula (I) M 1 (OR) n (I) (In the formula, M 1 represents a metal, R represents a C1-C5 alkyl group, and n represents a valence of M.)
  • a metal oxide layer formed from a coating composition obtained by hydrolysis / condensation in an organic solvent in the presence of a metal salt and further adding a precipitation inhibitor is placed on the transparent electrode. It is a feature.
  • the present invention is a capacitive touch panel in which a transparent electrode pattern is formed in an operation region of a transparent substrate,
  • M 1 represents a metal
  • R represents a C1-C5 alkyl group
  • n represents the valence of M 1.
  • the metal M 1 in the general formula (I) is silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg).
  • At least one selected from the group consisting of tin (Sn) and zinc (Zn) is preferable.
  • the metal M 2 in the general formulas (II) and (II-1) is aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum. It is preferably at least one selected from the group consisting of (La), tantalum (Ta), yttrium (Y) and cerium (Ce).
  • the metal oxide layer has a refractive index of 1.50 to 1.70, and a thickness of the metal oxide layer (hereinafter, the thickness of the layer is also referred to as a film thickness) is 40 nm to It is preferably 170 nm.
  • the metal oxide layer preferably has a refractive index of 1.54 to 1.68.
  • the metal alkoxide is preferably a mixture of silicon alkoxide or a partial condensate thereof and titanium alkoxide.
  • the precipitation inhibitor is at least one selected from the group consisting of N-methyl-pyrrolidone, ethylene glycol, dimethylformamide, dimethylacetamide, diethylene glycol, propylene glycol, hexylene glycol, and derivatives thereof. preferable.
  • the molar ratio of the metal atom (M 1 ) of the metal alkoxide contained in the coating composition to the metal atom (M 2 ) of the metal salt is: 0.01 ⁇ M 2 / (M 1 + M 2 ) ⁇ 0.7 It is preferable that
  • the metal salt includes metal nitrate, metal sulfate, metal acetate, metal chloride, metal oxalate, metal sphamate, metal sulfonate, metal acetoacetate, metal acetylacetonate, and these It is preferably at least one selected from the group consisting of basic salts.
  • the organic solvent preferably contains an alkylene glycol or a monoether derivative thereof.
  • the transparent electrode preferably includes a first transparent electrode and a second transparent electrode for detecting positions in at least two different directions.
  • the first transparent electrode and the second transparent electrode may be disposed on the same surface of the transparent substrate.
  • the first transparent electrode and the second transparent electrode may be disposed on different surfaces of the transparent substrate.
  • a capacitance type touch panel that can reduce deterioration in display properties of the display device due to the visual recognition of the transparent electrode pattern.
  • FIG. 2 is a cross-sectional view taken along the line A1-A1 'of FIG. (A)-(d) is process sectional drawing which shows the manufacturing method of the touchscreen which is the 1st example of this Embodiment. It is a top view which shows the touchscreen which is the 2nd example of this Embodiment.
  • FIG. 5 is a sectional view taken along line B1-B1 ′ of FIG. 4. It is sectional drawing which shows schematic structure of the touchscreen which is the 3rd example of this Embodiment. It is sectional drawing which shows schematic structure of the touchscreen which is the 4th example of this Embodiment. It is sectional drawing which shows schematic structure of the touchscreen which is the 5th example of this Embodiment.
  • the reason why the display performance of the display device is deteriorated when the transparent electrode pattern is visually recognized is that the refractive index of the transparent electrode is different from the refractive index of the substrate.
  • the transparent electrode is usually made of ITO (Indium Tin Oxide), which is an inorganic metal oxide.
  • ITO Indium Tin Oxide
  • the refractive index of ITO is about 1.8 to 2.1. Is about 1.5, which is very different from the refractive index of ITO because of the difference in the light reflection characteristics between the region where the transparent electrode is formed and the region where the transparent electrode is not formed. That is, the interfacial reflection characteristics with interference differ between the region where the transparent electrode is formed and the region where the transparent electrode is not formed, which results in conspicuous electrode patterns in the screen display.
  • the present inventor is controlled so that the refractive index and the film thickness are within a desired range on the transparent electrode arranged on the substrate. It was found that providing a layer was effective. By providing such a layer, a phenomenon in which an unintended electrode pattern is visually recognized on the touch panel can be suppressed.
  • a technique for providing an acrylic layer on a transparent electrode is known for touch panels.
  • the purpose of this acrylic layer is to protect the transparent electrode, and no consideration is given to the refractive index characteristics. For this reason, the effect of making the electrode pattern inconspicuous in the acrylic layer cannot be expected.
  • the acrylic layer is an organic material thin film, the mechanical strength is not sufficient because the acrylic layer has low hardness and low adhesion to ITO.
  • an insulating film must not be disposed on the wiring portion of the frame portion of the touch panel, patterning is necessary, but film formation using a printing technique such as flexographic printing is difficult. Therefore, in forming a film, it is necessary to use a photolithography technique having a complicated process.
  • the layer whose refractive index and film thickness are controlled to be within the desired ranges is preferably an acrylic layer. That is, it is desirable that the transparent electrode has a function of protecting the transparent electrode, specifically, excellent mechanical strength and can be protected from multiple pressings with a finger or the like. Moreover, it is preferable that a transparent electrode pattern can be easily formed on a substrate using a printing technique such as flexographic printing.
  • the present inventor uses a coating composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt and adding a precipitation inhibitor to form a layer satisfying the above performance. Has been found to be suitable. By providing a metal oxide layer formed using this coating composition on the transparent electrode (that is, covering the transparent electrode), in the touch panel, the transparent electrode is protected and the electrode pattern is made inconspicuous. Can do.
  • the touch panel of the present embodiment will be described.
  • a metal oxide layer applied to the touch panel and a coating composition used for forming the metal oxide layer will be described.
  • FIG. 1 and 2 are configuration diagrams of a touch panel as a first example of the present embodiment.
  • FIG. 1 is a plan view
  • FIG. 2 is a cross-sectional view taken along line A1-A1 ′ of FIG.
  • the touch panel 1 includes a transparent substrate 2, a first transparent electrode 3 for detecting coordinates in the X direction, and a second transparent electrode 4 for detecting coordinates in the Y direction.
  • the first transparent electrode 3 and the second transparent electrode 4 are formed from the same layer provided on the same surface of the substrate 2.
  • the substrate 2 is made of a transparent material such as glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, triacetyl cellulose resin, and polyethylene naphthalate resin. In particular, it is preferable to select a material having heat resistance and chemical resistance suitable for forming the metal oxide layers 5 and 6 described later.
  • the thickness of the substrate 2 is, for example, about 0.1 mm to 2 mm when glass is used, and is about 10 ⁇ m to 2000 ⁇ m, for example, when a resin film is used.
  • the first transparent electrode 3 and the second transparent electrode 4 are formed at positions corresponding to the operation surface of the touch panel 1.
  • the first transparent electrode 3 is provided separately in a plurality of regions along the X direction
  • the second transparent electrode 4 is provided separately in a plurality of regions along the Y direction. Yes. With such a structure, the accuracy of touch position detection can be increased.
  • each of the first transparent electrode 3 and the second transparent electrode 4 includes a plurality of pad portions 21, and each pad portion 21 is isolated in a planar manner, and each pad portion It arrange
  • the pad part 21 can be made into polygonal shapes, such as a rhombus, a rectangle, and a hexagon, for example, These are arrange
  • the first transparent electrode 3 and the second transparent electrode 4 are formed using a transparent electrode material having a high transmittance for at least visible light and having conductivity.
  • a transparent electrode material having conductivity include ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), and ZnO (Zinc Oxide).
  • ITO Indium Tin Oxide
  • IZO Indium Zinc Oxide
  • ZnO Zinc Oxide
  • the thickness is preferably 10 to 200 nm so as to ensure sufficient conductivity.
  • the first transparent electrode 3 and the second transparent electrode 4 are formed as follows, for example.
  • the transparent conductive film is selected by a method selected in consideration of the material of the substrate 2 as a base from sputtering, vacuum deposition, ion plating, spray, dip, or CVD (Chemical Vapor Deposition). Is deposited.
  • the transparent conductive film is patterned using a photolithography technique. Alternatively, a desired pattern may be formed by a printing method using a paint in which a conductive filler made of the above material is dispersed in an organic solvent.
  • the first transparent electrode 3 and the second transparent electrode 4 are formed on the same surface of the substrate 2 and form the same layer. For this reason, the 1st transparent electrode 3 and the 2nd transparent electrode 4 cross
  • FIG. 1 and FIG. 2 are formed on the same surface of the substrate 2 and form the same layer.
  • one of the first transparent electrode and the second transparent electrode is divided so as not to contact the other. That is, as shown in FIG. 2, the second transparent electrode 4 is connected at any of the plurality of intersecting portions 18, but the first transparent electrode 3 is divided. And in order to connect the parting part of the 1st transparent electrode 3, the bridging electrode 20 is provided and the interlayer insulation film 19 which consists of an insulating substance between the bridging electrode 20 and the 2nd transparent electrode 4 is provided. Is provided.
  • a light transmissive interlayer insulating film 19 is formed on the second transparent electrode 4 at the intersection 18.
  • an inorganic material such as SiO 2 or an organic material such as a photosensitive acrylic resin can be used.
  • SiO 2 for example, a structure in which an SiO 2 film is formed only on the second transparent electrode 4 at the intersection 18 by a sputtering method using a mask can be used.
  • a photosensitive acrylic resin the same structure can be formed using the photolithographic method.
  • a bridging electrode 20 is provided in the upper layer of the interlayer insulating film 19.
  • the bridging electrode 20 is for electrically connecting the first transparent electrodes 3 separated by the intersecting portion 18 and is formed of a light transmissive material. By providing the bridging electrode 20, the first transparent electrode 3 can be electrically connected in the Y direction.
  • the first transparent electrode 3 and the second transparent electrode 4 have a shape in which a plurality of rhombus pad portions 21 are arranged vertically or horizontally.
  • the connection portion located at the intersecting portion 18 has a shape narrower than the rhomboid pad portion 21 of the second transparent electrode 4.
  • the bridging electrode 20 is also formed in a strip shape having a narrower width than the diamond-shaped pad portion 21.
  • the first transparent electrode 3 and the second transparent electrode 4 are placed on the first transparent electrode 3 and the second transparent electrode 4 (that is, the first transparent electrode 3 and the second transparent electrode 4).
  • a metal oxide layer 5 is formed (covering the electrode 4). And the formation area and non-formation area
  • the metal oxide layer 5 has a high hardness and is excellent in adhesion with the first transparent electrode 3 and the second transparent electrode 4.
  • a coating composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and further adding a precipitation inhibitor is used. It is done. Details of the coating composition will be described later.
  • the refraction of the metal oxide layer 5 is performed so that the electrode patterns of the first transparent electrode 3 and the second transparent electrode 4 are not conspicuous based on the examination results described in the example column of this specification.
  • the rate and film thickness are selected.
  • the refractive index of the metal oxide layer 5 is preferably in the range of 1.50 to 1.70, more preferably in the range of 1.54 to 1.68.
  • the film thickness is preferably in the range of 40 nm to 170 nm. When the refractive index of the metal oxide layer 5 is 1.54 or more and less than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm.
  • the film thickness is more preferably in the range of 40 nm to 170 nm.
  • the metal oxide layer 5 is selected from metal oxide layers that are insulative and have high visible light transparency so that the first transparent electrode 3 and the second transparent electrode 4 do not conduct.
  • the metal oxide layer 5 is formed of a coating composition containing silicon alkoxide and titanium alkoxide, and has a refractive index of 1.60 and a film thickness of 80 nm.
  • the touch panel 1 has an adhesive layer using an acrylic photocurable resin or the like on the surface on which the first transparent electrode 3 and the like are formed and the uppermost layer on the viewing side of the display panel 10.
  • the adhesive layer 9 is provided on the metal oxide layer 5.
  • the display device described above includes the touch panel 1 and the display panel 10, and may have a backlight as necessary. Although details are omitted in FIG. 2, the display panel 10 can have the same configuration as a known display device.
  • the display panel 10 can have a structure in which a liquid crystal layer is sandwiched between two transparent substrates.
  • a polarizing plate can be provided on the side of each transparent substrate opposite to the side in contact with the liquid crystal layer.
  • a segment electrode or a common electrode can be formed on each transparent substrate in order to control the state of the liquid crystal.
  • the liquid crystal layer is sealed with each transparent substrate and a sealing material.
  • terminals are provided at end portions of the first transparent electrode 3 and the second transparent electrode 4, and a plurality of lead wires 11 are provided from the terminals. Is pulled out.
  • the lead-out wiring 11 can be an opaque metal wiring using silver, aluminum, chromium, copper, molybdenum, or an alloy containing these metals such as Mo—Nb (molybdenum-niobium) alloy.
  • the lead-out wiring 11 is connected to a control circuit (not shown) that detects voltage application and a touch position to the first transparent electrode 3 and the second transparent electrode 4.
  • a voltage is sequentially applied to the plurality of first transparent electrodes 3 and the second transparent electrodes 4 to give an electric charge.
  • a capacitor is formed by capacitive coupling between the fingertip and the first transparent electrode 3 and the second transparent electrode 4. Therefore, it is possible to detect which part of the finger touched by capturing the change in the charge at the contact position of the fingertip.
  • the touch panel 1 can also selectively apply a voltage to either the first transparent electrode 3 or the second transparent electrode 4 under the control of a control circuit (not shown).
  • a control circuit not shown
  • an electric field is formed on the transparent electrode to which a voltage is applied, and when a finger or the like touches in this state, the contact position is grounded via the capacitance of the human body.
  • a change in resistance value occurs between the terminal (not shown) of the target first transparent electrode 3 or second transparent electrode 4 and the contact position. Since this resistance value is proportional to the distance between the contact position and the terminal of the first transparent electrode 3 or the second transparent electrode 4 as a target, the contact position and the first transparent electrode 3 or the first transparent electrode 3 as a target.
  • the coordinates of the contact position can be obtained by the control circuit detecting the current value flowing between the two transparent electrodes 4.
  • the conspicuous electrode pattern on the operation surface is suppressed by the effect of the metal oxide layer 5 provided on the first and second transparent electrodes 3 and 4.
  • 3 (a) to 3 (d) are process cross-sectional views illustrating a manufacturing method of a touch panel as a first example of the present embodiment.
  • a transparent substrate 2 such as a glass substrate is prepared.
  • the substrate 2 is cut into a desired shape and washed as necessary. Further, an intermediate layer such as SiOx, SiNx, or SiON may be formed between the substrate 2 and the transparent conductive film.
  • a transparent conductive film is formed on one surface of the substrate 2.
  • the transparent conductive film is, for example, ITO, and is formed to a thickness of 10 to 200 nm using a sputtering method, a vacuum deposition method, or the like.
  • the transparent conductive film is etched in a state where an etching mask made of a photosensitive resin or the like is formed on the upper layer side of the transparent conductive film, and the first transparent electrode 3 and the second transparent electrode 4 are formed by patterning. By removing the etching mask, a transparent conductive film substrate 14 as shown in FIG. 3A is obtained.
  • the second transparent electrode 4 is connected through the connection portion, but the first transparent electrode 3 is divided.
  • a photosensitive resin is applied to the side on which the first transparent electrode 3 and the second transparent electrode 4 are provided, and then exposed and developed, whereby an interlayer insulation is formed at the connection portion of the second transparent electrode 4.
  • a film 19 is formed (FIG. 3B).
  • the photosensitive resin for forming the interlayer insulating film 19 a resin having transparency and heat resistance is used.
  • an acrylic resin can be used.
  • the interlayer insulating film 19 is formed using SiO 2 , the same structure can be obtained by sputtering using a mask.
  • the transparent conductive film is etched with an etching mask made of a photosensitive resin formed on the surface of the transparent conductive film. Thereafter, the etching mask is removed, and the bridging electrode 20 is formed on the interlayer insulating film 19 so as to connect the divided portions of the first transparent electrode 3. Thereby, the structure shown in FIG. 3C is obtained.
  • An example of the transparent conductive film formed on the interlayer insulating film 19 is an ITO film. In that case, the bridging electrode 20 is also preferably formed of ITO.
  • the above-described lead-out wiring 11 is formed using silver ink or the like in a later process. However, when the transparent conductive film is etched in the above step, the transparent conductive film is left along the outer peripheral edges of the first transparent electrode 3 and the second transparent electrode 4 to form the lead-out wiring 11. Is possible.
  • a coating composition for forming a metal oxide layer is applied on the first transparent electrode 3, the second transparent electrode 4, and the bridging electrode 20 by flexographic printing.
  • the coating composition is obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and further adding a precipitation inhibitor.
  • the substrate 2 on which the coating film of the coating composition has been formed is dried on, for example, a hot plate at 40 to 150 ° C. (eg, 60 ° C.).
  • the metal oxide layer 5 is formed on the first transparent electrode 3, the second transparent electrode 4, and the bridging electrode 20 by heating in, for example, an oven at 100 to 300 ° C.
  • a lead-out wiring 11 is formed with silver ink or the like from terminals (not shown) at the ends of the first transparent electrode 3 and the second transparent electrode 4 to form the touch panel 1.
  • the touch panel 1 is connected to a control circuit (not shown) of the touch panel via the lead wiring 11.
  • the completed touch panel 1 is attached to the front surface of the display panel 10 through an adhesive layer 9 such as an acrylic transparent adhesive.
  • an adhesive layer 9 such as an acrylic transparent adhesive.
  • alignment is performed by providing alignment marks at the corners of the substrate 2 and the display panel 10 as necessary.
  • the electrode pattern of the first transparent electrode 3 and the second transparent electrode 4 is visually recognized on the operation surface of the touch panel 1 by providing the metal oxide layer 5. It becomes difficult.
  • FIG. 4 and 5 show a touch panel as a second example of the present embodiment, FIG. 4 is a plan view, and FIG. 5 is a cross-sectional view taken along line B1-B1 'of FIG.
  • the touch panel 101 is formed on a transparent substrate 102, a first transparent electrode 103 for detecting coordinates in the X direction formed on one surface of the substrate 102, and the other surface of the substrate 102. And a second transparent electrode 104 for detecting coordinates in the Y direction.
  • one surface of the substrate 102 is upward and the other surface of the substrate 102 is downward.
  • the other surface of the substrate 102 is a surface on which the display panel 110 is mounted.
  • the substrate 102 is a dielectric substrate.
  • transparent materials such as glass, acrylic resin, polyester resin, polyethylene terephthalate resin, polycarbonate resin, polyvinylidene chloride resin, polymethyl methacrylate resin, and polyethylene naphthalate resin are used.
  • the thickness of the substrate 102 can be about 0.1 mm to 2 mm for glass, and can be 10 ⁇ m to 2000 ⁇ m for a resin film.
  • the first transparent electrode 103 and the second transparent electrode 104 are each composed of an elongated rectangular electrode.
  • the first transparent electrode 103 extends in the X direction
  • the second transparent electrode 104 extends in the Y direction.
  • the first transparent electrode 103 is arranged in a stripe shape at regular intervals. Further, the first transparent electrode 103 and the second transparent electrode 104 are disposed so as to be orthogonal to each other, and are in a lattice shape as a whole.
  • the first transparent electrode 103 and the second transparent electrode 104 are formed using a transparent electrode material that has high transmittance for at least visible light and has conductivity.
  • a transparent electrode material having conductivity for example, ITO or ZnO can be used.
  • the thickness is preferably 5 to 100 nm so that sufficient conductivity can be secured.
  • the first transparent electrode 103 and the second transparent electrode 104 are optimal in consideration of the transparent substrate 102 as a base from sputtering method, vacuum deposition method, ion plating method, spray method, dip method or CVD method. It is formed by selecting a proper method.
  • a transparent electrode formed in a planar shape is patterned by an etching method using photolithography, or directly by a printing method using a paint in which a conductive filler made of the above material is dispersed in an organic solvent.
  • a method of forming the pattern What is important in the process of forming the transparent electrode is whether the film thickness can be controlled with high precision. Therefore, it is preferable to select a method that can form a desired film thickness and that can form a low-resistance film excellent in transparency.
  • a metal oxide layer 105 is formed on the first transparent electrode 103.
  • the metal oxide layer 105 covers a region where the first transparent electrode is formed and a region where the first transparent electrode is not formed, corresponding to the operation surface of the touch panel 101.
  • a metal oxide layer 106 is also formed on the second transparent electrode 104 (below in the drawing).
  • the metal oxide layer 106 covers the transparent electrode forming region and the non-forming region corresponding to the operation surface of the touch panel 101.
  • the metal oxide layers 105 and 106 have high hardness and excellent adhesion to the first transparent electrode 103 and the second transparent electrode 104.
  • a coating composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and further adding a precipitation inhibitor. Is used. Details of this coating composition will be described later.
  • the metal oxide layers 105 and 106 are formed so that the electrode patterns of the first transparent electrode 103 and the second transparent electrode 104 are not conspicuous based on the examination results described in the example column of this specification.
  • the refractive index and film thickness are selected.
  • the refractive indexes of the metal oxide layers 105 and 106 are each preferably in the range of 1.50 to 1.70, and more preferably in the range of 1.54 to 1.68.
  • the film thickness is preferably in the range of 40 nm to 170 nm.
  • the film thickness is more preferably in the range of 60 nm to 150 nm.
  • the film thickness is more preferably in the range of 40 nm to 170 nm.
  • the metal oxide layers 105 and 106 are insulative so as not to be electrically connected to the first transparent electrode 103 and the second transparent electrode 104, respectively, and have high visible light transparency. Selected from metal oxide layers.
  • the first transparent electrode 103 and the second transparent electrode 104 are preferably ITO films each having a thickness of 10 to 200 nm.
  • the first transparent electrode 103 and the second transparent electrode 104 are each made of an ITO film having a thickness of 28 nm, and the metal oxide layers 105 and 106 are made of silicon alkoxide and titanium alkoxide, respectively.
  • the film was formed from a coating composition prepared using a material having a refractive index of 1.6 and a film thickness of 80 nm.
  • an adhesive layer 108 made of an acrylic transparent adhesive is provided on one surface of the substrate 102.
  • a cover film 107 made of a transparent resin is bonded on the adhesive layer 108.
  • the cover film 107 is omitted.
  • the cover film 107 functions as a protective film for the first transparent electrode 103 and the metal oxide layer 105. Instead of the cover film 107, a transparent resin may be coated. In this case, the adhesive layer 108 can be omitted.
  • a display panel 110 is attached to the other surface of the substrate 102 via an adhesive layer 109 made of an acrylic transparent adhesive.
  • the display panel 110 can have the same configuration as a known display device.
  • the display panel 110 can have a structure in which a liquid crystal layer is sandwiched between two transparent substrates.
  • a polarizing plate can be provided on the side of each transparent substrate opposite to the side in contact with the liquid crystal layer.
  • a segment electrode or a common electrode can be formed on each transparent substrate in order to control the state of the liquid crystal.
  • the liquid crystal layer is sealed with each transparent substrate and a sealing material.
  • terminals are provided at end portions of the first transparent electrode 103 and the second transparent electrode 104, and a plurality of lead wires (not shown) are drawn from the terminals.
  • the lead-out wiring can be an opaque metal wiring using silver, aluminum, chromium, copper or an alloy containing these.
  • the lead-out wiring is connected to a control circuit (not shown) that detects voltage application to the first transparent electrode 103 and the second transparent electrode 104 and a touch position.
  • the touch panel 101 having the above configuration, when a finger that is a conductor touches any part of the operation surface, capacitive coupling between the fingertip and the first transparent electrode 103 and the second transparent electrode 104 is performed. To form a capacitor. Therefore, it is possible to detect which part of the finger touched by capturing the change in charge at the contact position of the fingertip.
  • the effect of the metal oxide layers 105 and 106 provided on the first transparent electrode 103 and the second transparent electrode 104 is suppressed from conspicuous on the operation surface.
  • FIG. 6 is a cross-sectional view showing a schematic configuration of a touch panel as a third example of the present embodiment.
  • the display panel 210 is regarded as a first substrate, and a first transparent electrode 203 is provided on the surface of the display 210.
  • a second transparent electrode 204 is provided on one surface of the second substrate 212 prepared separately.
  • one surface of the second substrate 212 is upward and the other surface is downward.
  • the other surface of the second substrate 212 is a side on which the display panel 210 is attached.
  • the display panel 210 can have the same configuration as a known display device.
  • the display panel 210 can have a structure in which a liquid crystal layer is sandwiched between two transparent substrates.
  • a polarizing plate can be provided on the side of each transparent substrate opposite to the side in contact with the liquid crystal layer.
  • a segment electrode or a common electrode can be formed on each transparent substrate in order to control the state of the liquid crystal.
  • the liquid crystal layer is sealed with each transparent substrate and a sealing material.
  • a metal oxide layer 205 is provided on the first transparent electrode 203.
  • the metal oxide layer 205 covers the transparent electrode formation region and the non-formation region corresponding to the operation surface of the touch panel 201.
  • a metal oxide layer 206 is formed on the second transparent electrode 204.
  • the metal oxide layer 206 covers the transparent electrode forming region and the non-forming region corresponding to the operation surface of the touch panel 201.
  • the metal oxide layers 205 and 206 have high hardness and excellent adhesion to the first transparent electrode 203 and the second transparent electrode 204.
  • a coating composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and further adding a precipitation inhibitor. Is used. Details of this coating composition will be described later.
  • the metal oxide layers 205 and 206 are formed so that the electrode patterns of the first transparent electrode 203 and the second transparent electrode 204 are not conspicuous based on the examination results described in the example column of this specification.
  • the refractive index and film thickness are selected. Specifically, the refractive indexes of the metal oxide layers 205 and 206 are each preferably in the range of 1.50 to 1.70, more preferably in the range of 1.54 to 1.68.
  • the film thickness is preferably in the range of 40 nm to 170 nm. When the refractive indexes of the metal oxide layers 205 and 206 are 1.54 or more and less than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm.
  • the film thickness is more preferably in the range of 40 nm to 170 nm.
  • the metal oxide layers 205 and 206 are insulative so as not to be electrically connected to the first transparent electrode 203 and the second transparent electrode 204, respectively, and are further transparent to visible light. Selected from high metal oxide layers.
  • each of the first transparent electrode 203 and the second transparent electrode 204 is preferably an ITO film having a thickness of 10 to 200 nm.
  • the first transparent electrode 203 and the second transparent electrode 204 are each made of an ITO film having a thickness of 28 nm, and the metal oxide layers 205 and 206 are made of silicon alkoxide and titanium alkoxide, respectively.
  • the film has a refractive index of 1.6 and a film thickness of 80 nm.
  • an adhesive layer 208 made of an acrylic transparent adhesive is provided on one surface of the second substrate 212.
  • a cover film 207 made of a transparent resin is bonded on the adhesive layer 208.
  • the cover film 207 functions as a protective film.
  • a transparent resin may be coated.
  • the adhesive layer 208 can be omitted.
  • the first transparent electrode 203 and the second transparent electrode 204 are the same as those described with reference to FIGS.
  • the electrode pattern is suppressed from being noticeable on the operation surface.
  • FIG. 7 is a cross-sectional view showing a schematic configuration of a touch panel as a fourth example of the present embodiment.
  • the display panel 310 is regarded as a first substrate, and a first transparent electrode 303 is provided on the surface of the display 310.
  • a second transparent electrode 304 is provided on one surface of a second substrate 312 prepared separately.
  • one surface of the second substrate 312 is downward and the other surface is upward.
  • the other surface of the second substrate 312 is a surface on which the touch panel 301 is touched.
  • the display panel 310 can have the same configuration as a known display device.
  • the display panel 310 can have a structure in which a liquid crystal layer is sandwiched between two transparent substrates.
  • a polarizing plate can be provided on the side of each transparent substrate opposite to the side in contact with the liquid crystal layer.
  • a segment electrode or a common electrode can be formed on each transparent substrate in order to control the state of the liquid crystal.
  • the liquid crystal layer is sealed with each transparent substrate and a sealing material.
  • a metal oxide layer 305 is provided on the first transparent electrode 303.
  • the metal oxide layer 305 covers the transparent electrode formation region and the non-formation region corresponding to the operation surface of the touch panel 201.
  • a metal oxide layer 306 is also formed on the second transparent electrode 304 (shown on the lower side in FIG. 7).
  • the metal oxide layer 306 covers the transparent electrode forming region and the non-forming region corresponding to the operation surface of the touch panel 301.
  • the metal oxide layers 305 and 306 have high hardness and excellent adhesion to the first transparent electrode 303 and the second transparent electrode 304.
  • a coating composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and further adding a precipitation inhibitor. Is used. Details of this coating composition will be described later.
  • An adhesive layer 308 made of an acrylic transparent adhesive is provided between the metal oxide layer 305 and the metal oxide layer 306. With this adhesive layer 308, the second substrate 312 is attached to the display panel 310.
  • the metal oxide layers 305 and 306 are formed so that the electrode patterns of the first transparent electrode 303 and the second transparent electrode 304 are not conspicuous based on the examination results described in the example column of this specification.
  • the refractive index and film thickness are selected.
  • the refractive indexes of the metal oxide layers 305 and 306 are each preferably in the range of 1.50 to 1.70, more preferably in the range of 1.54 to 1.68.
  • the film thickness is preferably in the range of 40 nm to 170 nm.
  • the film thickness is more preferably in the range of 60 nm to 150 nm.
  • the film thickness is more preferably in the range of 40 nm to 170 nm.
  • the metal oxide layers 305 and 306 are insulative so as not to be electrically connected to the first transparent electrode 303 and the second transparent electrode 304, respectively, and visible light transparent. Selected from high metal oxide layers.
  • each of the first transparent electrode 303 and the second transparent electrode 304 is preferably an ITO film having a thickness of 10 to 200 nm.
  • the first transparent electrode 303 and the second transparent electrode 304 are each made of an ITO film having a thickness of 28 nm, and the metal oxide layers 305 and 306 are made of silicon alkoxide and titanium alkoxide, respectively.
  • the film has a refractive index of 1.6 and a film thickness of 80 nm.
  • the effect of the metal oxide layers 305 and 306 provided on the first transparent electrode 303 and the second transparent electrode 304 is suppressed from conspicuous on the operation surface.
  • FIG. 8 is a cross-sectional view showing a schematic configuration of a touch panel as a fifth example of the present embodiment.
  • the touch panel 401 includes a transparent substrate 402.
  • a first transparent electrode 403 and a second transparent electrode 404 for detecting positions in two different directions are provided on the upper layer of the substrate 402.
  • the first transparent electrode 403 and the second transparent electrode 404 are formed using a transparent electrode material that has high transmittance for at least visible light and has conductivity.
  • a transparent electrode material having conductivity for example, ITO or ZnO can be used.
  • the thickness is preferably 5 to 100 nm so that sufficient conductivity can be secured.
  • the first transparent electrode 403 and the second transparent electrode 404 can be formed by sputtering, vacuum deposition, ion plating, spraying, dipping, CVD, or the like from a transparent substrate 102 or an overcoat described later. An optimum method is selected in consideration of the layer 407.
  • a transparent electrode formed in a planar shape is patterned by an etching method using photolithography, or directly by a printing method using a paint in which a conductive filler made of the above material is dispersed in an organic solvent.
  • a method of forming the pattern What is important in the process of forming the transparent electrode is whether the film thickness can be controlled with high precision. Therefore, it is preferable to select a method that can form a desired film thickness and that can form a low-resistance film excellent in transparency.
  • the first transparent electrode 403 is disposed on the substrate 402.
  • a metal oxide layer 405 is formed on the first transparent electrode 403.
  • the metal oxide layer 405 covers a formation region and a non-formation region of the first transparent electrode 403 corresponding to the operation surface of the touch panel 401.
  • An overcoat layer 407 is provided on the metal oxide layer 405.
  • a highly transparent acrylic resin is used for the overcoat layer 407.
  • the second transparent electrode 404 is disposed on the overcoat layer 407.
  • a metal oxide layer 406 is formed on the second transparent electrode 404.
  • the metal oxide layer 406 covers the transparent electrode forming region and the non-forming region corresponding to the operation surface of the touch panel 401.
  • the metal oxide layers 405 and 406 have high hardness and excellent adhesion to the first transparent electrode 403 and the second transparent electrode 404.
  • a coating composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt (for example, an aluminum salt) and further adding a precipitation inhibitor. Is used. Details of this coating composition will be described later.
  • the metal oxide layers 405 and 406 are formed so that the electrode patterns of the first transparent electrode 403 and the second transparent electrode 404 are not visible based on the examination results described in the example column of this specification.
  • the refractive index and film thickness are selected.
  • the refractive indexes of the metal oxide layers 405 and 406 are each preferably in the range of 1.50 to 1.70, more preferably in the range of 1.54 to 1.68.
  • the film thickness is preferably in the range of 40 nm to 170 nm. When the refractive indexes of the metal oxide layers 405 and 406 are 1.54 or more and smaller than 1.60, the film thickness is more preferably in the range of 60 nm to 150 nm.
  • the film thickness is more preferably in the range of 40 nm to 170 nm.
  • the metal oxide layers 305 and 306 are insulative so as not to be electrically connected to the first transparent electrode 303 and the second transparent electrode 304, respectively, and visible light transparent. Selected from high metal oxide layers.
  • the first transparent electrode 403 and the second transparent electrode 404 are each preferably an ITO film having a thickness of 10 to 200 nm.
  • the first transparent electrode 303 and the second transparent electrode 304 are each made of an ITO film having a thickness of 28 nm, and the metal oxide layers 405 and 406 are made of silicon alkoxide and titanium alkoxide, respectively.
  • the refractive index is 1.60 and the film thickness is 80 nm.
  • an adhesive layer 408 made of an acrylic transparent adhesive is provided on the metal oxide layer 406.
  • the display panel 110 is attached to the touch panel 401 through the adhesive layer 408.
  • the touch panel 401 having the above configuration, when a finger as a conductor touches any part of the operation surface, capacitive coupling between the fingertip and the first transparent electrode 403 and the second transparent electrode 404 is achieved. To form a capacitor. Therefore, it is possible to detect which part of the finger touched by capturing the change in charge at the contact position of the fingertip.
  • the effect of the metal oxide layers 405 and 406 provided on the first transparent electrode 403 and the second transparent electrode 404 is suppressed from conspicuous on the operation surface.
  • the touch panel of this Embodiment was demonstrated, this invention is not limited to the said embodiment.
  • touch panels that use transparent electrodes such as ITO
  • the same effect as described above can be obtained by providing a metal oxide layer selected so that the refractive index and the film thickness are suitable on the transparent electrode. Is obtained.
  • the coating composition used to form the metal oxide layer is a composition obtained by hydrolyzing and condensing a metal alkoxide in an organic solvent in the presence of a metal salt and further adding a precipitation inhibitor. .
  • Examples of the metal alkoxide used in the coating composition include silicon (Si), titanium (Ti), tantalum (Ta), zirconium (Zr), boron (B), aluminum (Al), magnesium (Mg), and tin (Sn). And alkoxides of metals such as zinc (Zn).
  • silicon alkoxide, partial condensate of silicon alkoxide, and titanium alkoxide is preferable from the viewpoint of easy availability and storage stability of the coating composition.
  • the coating composition is a composition obtained by hydrolyzing and condensing these metal alkoxides in an organic solvent in the presence of a metal salt.
  • the coating composition includes a precipitation inhibitor.
  • the precipitation inhibitor has an effect of preventing the metal salt from being precipitated in the coating film when the coating film is formed.
  • the coating composition contains a titanium alkoxide component
  • the titanium alkoxide when preparing a coating composition containing a titanium alkoxide component, in order to stabilize the titanium alkoxide and improve the storage stability of the coating composition, after mixing and stabilizing the titanium alkoxide and alkylene glycol or monoether thereof, the titanium alkoxide alone Alternatively, it is mixed with silicon alkoxide and hydrolyzed / condensed in the presence of a metal salt.
  • the silicon alkoxide is hydrolyzed in the presence of a metal salt, and then mixed with a titanium alkoxide in which glycols or monoethers thereof are mixed and stabilized in advance. It is preferable to do.
  • the metal alkoxide used in the coating composition is represented by the general formula (I).
  • M (OR) n — (I) (Wherein, M represents a metal, R represents a C1-C5 alkyl group, and n represents the valence of M.)
  • silicon alkoxide or the partial condensate thereof at least one selected from one or more compounds represented by the general formula (III) and a partial condensate (pentamer or less) is used.
  • Si (OR ') 4 & (III) In the formula, R ′ represents a C1-C5 alkyl group.
  • Ti (OR ") 4 ; (IV) In the formula, R ′′ represents a C1-C5 alkyl group.
  • metal salt used for coating composition at least 1 sort (s) chosen from the compound shown by general formula (II) is mentioned.
  • M 2 (X) m — (II) (Wherein M 2 is a metal, X is chlorine, nitric acid, sulfuric acid, acetic acid, succinic acid, sfamic acid, sulfonic acid, acetoacetic acid, acetylacetonate or a basic salt thereof, and m is the valence of M 2.
  • Particularly preferred metal salts used in the coating composition include those containing at least one selected from the compounds represented by the following (II-1) and metal oxalates used in the following (II-1): .
  • M 2 (X) m (II-1) (In the formula, M 2 represents a metal, X represents chlorine, nitric acid, sulfuric acid, acetic acid, sfamic acid, sulfonic acid, acetoacetic acid, acetylacetonate or a basic salt thereof, and m represents the valence of M 2 .
  • Examples of the metal M 2 of the metal salt represented by the general formula (II) include aluminum (Al), indium (In), zinc (Zn), zirconium (Zr), bismuth (Bi), lanthanum (La), tantalum ( At least one selected from the group consisting of Ta), yttrium (Y) and cerium (Ce) is preferred.
  • metal nitrates such as aluminum, indium, and cerium are particularly preferable.
  • metal nitrates such as aluminum, indium, and cerium are preferred from the viewpoints of availability and storage stability of the coating composition.
  • organic solvent used in the coating composition examples include alcohols such as methanol, ethanol, n-propanol, i-propanol, n-butanol, i-butanol and t-butanol; esters such as ethyl acetate; ethylene glycol and the like Glycols and ester derivatives thereof; ethers such as diethyl ether; ketones such as acetone, methyl ethyl ketone and cyclohexanone; or aromatic hydrocarbons such as benzene and toluene, etc., which are used alone or in combination .
  • alcohols such as methanol, ethanol, n-propanol, i-propanol, n-butanol, i-butanol and t-butanol
  • esters such as ethyl acetate
  • ethylene glycol and the like Glycols and ester derivatives thereof examples include ethers such as dieth
  • examples of the alkylene glycol or monoether thereof contained in the organic solvent include ethylene glycol, diethylene glycol, propylene glycol, hexylene glycol and their monomethyl, monoethyl, Examples thereof include monopropyl, monobutyl, and monophenyl ether.
  • the molar ratio of the glycols or monoethers contained in the organic solvent used in the coating composition is less than 1 with respect to the titanium alkoxide, the stability of the titanium alkoxide is less effective, and the storage stability of the coating composition is reduced. Sexuality gets worse.
  • all of the organic solvents used in the coating composition can be the above-described glycols or monoethers thereof.
  • the coating composition does not contain titanium alkoxide, it is not necessary to specifically contain the above-mentioned glycol and / or its monoether.
  • the precipitation inhibitor contained in the coating composition prevents the metal salt from being deposited in the coating film when the coating film is formed.
  • the precipitation inhibitor include at least one selected from the group consisting of N-methyl-pyrrolidone, dimethylformamide, dimethylacetamide, ethylene glycol, diethylene glycol, propylene glycol, hexylene glycol, and derivatives thereof. More than seeds can be used.
  • the precipitation inhibitor is used at a ratio of (precipitation inhibitor) / (metal oxide) ⁇ 1 (weight ratio) by converting the metal of the metal salt into a metal oxide.
  • weight ratio is less than 1, the effect of preventing precipitation of the metal salt during formation of the coating film is reduced.
  • the use of a large amount of a precipitation inhibitor has no effect on the coating composition.
  • the precipitation inhibitor may be added when a metal alkoxide, particularly silicon alkoxide, titanium alkoxide, or silicon alkoxide and titanium alkoxide undergoes hydrolysis / condensation reaction in the presence of a metal salt. It may be added after completion of the reaction.
  • a metal alkoxide particularly silicon alkoxide, titanium alkoxide, or silicon alkoxide and titanium alkoxide undergoes hydrolysis / condensation reaction in the presence of a metal salt. It may be added after completion of the reaction.
  • the metal atom (M 1 ) means the sum of plural kinds of metal atoms
  • the metal of the metal salt contained in the coating composition When there are plural kinds of atoms, the metal atom (M 2 ) means the sum of plural kinds of metal atoms.
  • the solid content concentration in the coating composition is preferably in the range of 0.5 to 20 wt% as the solid content when the metal alkoxide and the metal salt are converted as metal oxides.
  • the solid content exceeds 20 wt%, the storage stability of the coating composition is deteriorated and the film thickness control of the metal oxide layer becomes difficult.
  • the solid content is 0.5 wt% or less, the thickness of the obtained metal oxide layer becomes thin, and many coatings are required to obtain a predetermined film thickness.
  • the coating composition is obtained by hydrolyzing and condensing a metal alkoxide represented by M (OR) n in an organic solvent in the presence of a metal salt (for example, an aluminum salt).
  • a metal salt for example, an aluminum salt.
  • the amount of water used for hydrolysis of silicon alkoxide, titanium alkoxide, or silicon alkoxide and titanium alkoxide is 2 in terms of molar ratio with respect to the total number of moles of silicon alkoxide, titanium alkoxide, or silicon alkoxide and titanium alkoxide. It is preferable to set to 24. More preferably, it is 2-20.
  • the molar ratio (amount of water (mole) / (total number of moles of metal alkoxide)) is 2 or less, the hydrolysis of the metal alkoxide becomes insufficient and the film formability is lowered or the metal obtained This is not preferable because the strength of the oxide film is lowered.
  • the molar ratio is more than 24, polycondensation continues to proceed, which is not preferable because storage stability is lowered. The same applies when other metal alkoxides are used.
  • the coexisting metal salt for example, aluminum salt
  • the moisture content is involved in the reaction. Therefore, it is necessary to consider the moisture content of metal salts (for example, aluminum salts).
  • the coating composition is produced by hydrolyzing and condensing a metal alkoxide.
  • the refractive index of the obtained metal oxide layer can be adjusted within a predetermined range. Is possible. For example, when silicon alkoxide and titanium alkoxide are selected as the metal alkoxide, it can be obtained within a predetermined range described later, specifically within a range of 1.45 to 2.1 by adjusting the mixing ratio. It is possible to adjust the refractive index of the resulting metal oxide layer.
  • the composition molar ratio of silicon alkoxide and titanium alkoxide can be determined according to the refractive index. is there.
  • this composition molar ratio is arbitrary, for example, the refractive index of the metal oxide layer from the coating composition obtained by hydrolyzing only silicon alkoxide is a value of about 1.45. And the refractive index of the metal oxide layer from the coating composition obtained by hydrolyzing only a titanium alkoxide is a value of about 2.1.
  • a coating composition is formed using silicon alkoxide and titanium alkoxide at a predetermined ratio according to the refractive index value within the range. Can be manufactured.
  • the refractive index of the obtained metal oxide layer can be adjusted by using other metal alkoxides.
  • the refractive index of the metal oxide layer can be adjusted by selecting film forming conditions in addition to the composition conditions. In this way, it is possible to realize a high hardness of the metal oxide layer and a desired refractive index value.
  • the firing temperature is preferably in the range of 100 ° C. to 300 ° C., more preferably in the range of 150 ° C. to 250 ° C.
  • the refractive index of the metal oxide layer obtained will fluctuate. Specifically, the refractive index of the metal oxide layer can be increased as the amount of ultraviolet irradiation is increased. Therefore, it is possible to select the presence or absence of ultraviolet irradiation in order to achieve a desired refractive index.
  • a desired refractive index can be realized by selecting conditions such as composition, ultraviolet irradiation is not necessary. And when performing ultraviolet irradiation, it is possible to adjust the refractive index of a metal oxide layer by selecting the irradiation amount.
  • a high-pressure mercury lamp when ultraviolet irradiation is necessary to obtain a desired refractive index, for example, a high-pressure mercury lamp can be used. Then, using a high-pressure mercury lamp, total light irradiation 1000 mJ / cm 2 or more dose is preferably at 365nm terms, the dose of 3000mJ / cm 2 ⁇ 10000mJ / cm 2 is more preferable.
  • the UV light source is not particularly specified, and another UV light source can be used. When using another light source, it is only necessary to irradiate the same amount of accumulated light as when using the high-pressure mercury lamp.
  • the coating composition contains a titanium alkoxide component
  • it has a property that the viscosity gradually increases under room temperature storage.
  • careful control over temperature and the like is necessary when precisely controlling the thickness of the metal oxide layer.
  • Such an increase in viscosity becomes more significant as the composition ratio of titanium alkoxide in the coating composition increases. This is presumably because titanium alkoxide has a higher hydrolysis rate than silicon alkoxide and the like, and the condensation reaction is fast.
  • the coating composition contains a titanium alkoxide component
  • the following two production methods are effective for reducing the viscosity change.
  • the production method of 1) is effective because when titanium alkoxide is mixed with glycols, heat is generated, so transesterification occurs between the alkoxide group of titanium alkoxide and the glycols, resulting in hydrolysis / condensation reactions. This is considered to be stabilized.
  • a silicon alkoxide is preliminarily hydrolyzed in the presence of a metal salt, and then mixed with a titanium alkoxide solution mixed with glycols to perform a condensation reaction to obtain a coating composition.
  • a coating composition having a small viscosity change can be obtained.
  • the production method of 2) is effective for the following reasons. That is, the hydrolysis reaction of silicon alkoxide is performed at a high rate, but the subsequent condensation reaction is slower than titanium alkoxide. Therefore, when titanium alkoxide is added quickly after finishing the hydrolysis reaction, the silanol group of the hydrolyzed silicon alkoxide and the titanium alkoxide react uniformly. Thereby, it is thought that the hydrolyzed silicon alkoxide stabilizes the condensation reactivity of titanium alkoxide.
  • a method for mixing silicon alkoxide hydrolyzed in advance and titanium alkoxide has already been attempted.
  • the organic solvent used in the reaction does not contain glycols, a coating composition having excellent storage stability cannot be obtained.
  • the method shown in 2) is also useful when a coating composition is obtained from another metal alkoxide having a high hydrolysis rate and silicon alkoxide.
  • the coating composition described above can be formed into a metal oxide layer by applying a commonly applied coating method to form a coating film.
  • a coating method for example, a dip coating method, a spin coating method, a spray coating method, a brush coating method, a roll transfer method, a screen printing method, an ink jet method, or a flexographic printing method is used.
  • the inkjet method and flexographic printing method suitable for pattern printing are particularly preferred.
  • TEOS Tetraethoxysilane
  • TIPT Tetraisopropoxy titanium
  • ZTB Zirconium tetra-n-butoxide
  • AN Aluminum nitrate nonahydrate CeN: Cerium nitrate hexahydrate
  • InN Indium nitrate trihydrate
  • EG Ethylene glycol
  • HG 2-Methyl-2,4-pentanediol (also known as hexylene glycol)
  • BCS 2-Butoxyethanol (Alternative name: Butyl cellosolve)
  • TIPT 14.4g was put as a titanium alkoxide in a 300 mL capacity
  • the above-mentioned liquid I and liquid J were mixed and stirred at room temperature for 30 minutes.
  • a coating composition K-1 was obtained as a metal alkoxide.
  • ⁇ Film Formation Method I> Using the coating composition described above, pressure filtration is performed with a membrane filter having a pore diameter of 0.5 ⁇ m, and a coating film is formed on the substrate by a spin coating method. The substrate is heated for 3 minutes on a hot plate set to 60 ° C. and dried. Next, it is transferred into a hot air circulation oven set at 200 ° C. and baked for 30 minutes. In this manner, a metal oxide film (that is, the metal oxide layer is also referred to as a metal oxide film; hereinafter the same) is formed over the substrate.
  • a metal oxide film that is, the metal oxide layer is also referred to as a metal oxide film; hereinafter the same
  • ⁇ Film Formation Method II> Using the coating composition described above, pressure filtration is performed with a membrane filter having a pore diameter of 0.5 ⁇ m, and a coating film is formed on the substrate by a spin coating method. The substrate is heated for 3 minutes on a hot plate set to 60 ° C. and dried. Next, ultraviolet rays are irradiated for 2 minutes at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). The amount of ultraviolet irradiation is 6000 mJ / cm 2 . After the ultraviolet irradiation, it is transferred into a hot air circulation oven set at 200 ° C. and baked for 30 minutes. Thus, a metal oxide film is formed on the substrate.
  • the film formation method III is a method of forming an acrylic film as a comparison target of a metal oxide film on a substrate.
  • an acrylic material composition (K7) for forming an acrylic film pressure filtration is performed with a membrane filter having a pore diameter of 0.5 ⁇ m, and a coating film is formed on the substrate by a spin coating method.
  • This substrate is heated for 2 minutes on a hot plate set at 90 ° C. and dried. Next, it is transferred into a hot air circulation oven set at 200 ° C. and baked for 30 minutes. Thus, an acrylic film is formed on the substrate.
  • an acrylic film (KM3) was formed on the silicon substrate by using the acrylic material composition K7, using the silicon substrate (100) as the substrate, and applying the above-described film forming method III.
  • the refractive index at a wavelength of 633 nm was measured using an ellipsometer (DVA-FLVW, manufactured by Mizoji Optical Co., Ltd.).
  • Table 1 shows the evaluation results of the refractive indexes of the metal oxide films (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) and the acrylic film (KM3). . From this table, it can be seen that the refractive index of the acrylic film is 1.50.
  • the description in the film formation method column in Table 1 shows the film formation methods (I to III) applied to the film formation of each film.
  • Pencil hardness was evaluated for the hardness of the metal oxide film.
  • a metal oxide film on the substrate KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KL5, KM1, and KM2 were formed.
  • an acrylic film (KM3) was formed on the glass substrate with ITO by using the acrylic material composition K7, using a glass substrate with ITO as the substrate, and applying the above-described film forming method III.
  • the pencil hardness was evaluated according to the test method (JIS K5400).
  • Table 1 shows the pencil hardness evaluation results of the metal oxide films (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) and the acrylic film (KM3). . From this table, the pencil hardness of the acrylic film (KM3) is 3H, and the metal oxide films (KL1, KL2, KL3, KL4, KL5, KL5-1, KL5-2, KL5-3, KM1 and KM2) It can be seen that the hardness is low.
  • Transparent conductive film substrate A transparent conductive film substrate on which a patterned transparent conductive film is formed on a substrate is prepared.
  • a glass substrate is used as the substrate, and ITO is used as the transparent conductive film.
  • the transparent conductive film substrate 14 used in the touch panel 1 of the present embodiment described above can be used.
  • two types of transparent conductive film substrates having the same ITO pattern and different film thicknesses of 28 nm and 75 nm were prepared.
  • Example 1 A substrate in which a metal oxide film KL1 was formed to a thickness of 70 nm on a transparent conductive film substrate having an ITO thickness of 28 nm was produced. An optical adhesive was applied on this substrate, and a 0.7 mm soda lime glass substrate was bonded thereto. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 2 A touch panel for evaluation was produced in the same manner as in Example 1 except that the thickness of the metal oxide film KL1 was 80 nm (Example 2) and 90 nm (Example 3).
  • Example 4 A substrate in which a metal oxide film KL2 was formed to a thickness of 70 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 5 A touch panel for evaluation was produced in the same manner as in Example 4 except that the thickness of the metal oxide film KL2 was 80 nm (Example 5) and 90 nm (Example 6).
  • Example 7 A substrate in which a metal oxide film KL3 was formed to a thickness of 50 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 8 Except for the thickness of the metal oxide film KL3 being 70 nm (Example 8), 80 nm (Example 9), 120 nm (Example 10) and 150 nm (Example 11), the same method as in Example 7 was used. A touch panel for evaluation was produced.
  • Example 12 A substrate in which a metal oxide film KL4 was formed to a thickness of 80 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 13 A touch panel for evaluation was produced in the same manner as in Example 12 except that the thickness of the metal oxide film KL4 was 100 nm.
  • Example 14 A substrate in which a metal oxide film KL4 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 75 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 15 A substrate in which a metal oxide film KL5 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 75 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 16 A substrate in which a metal oxide film KL5-1 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 17 A substrate in which a metal oxide film KL5-2 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 18 A substrate in which a metal oxide film KL5-3 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • Example 3 A touch panel for evaluation was produced in the same manner as in Example 12 except that the thickness of the metal oxide film KL4 was 30 nm.
  • ⁇ Comparative example 4> A substrate in which a metal oxide film KM1 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • ⁇ Comparative Example 5> A substrate in which a metal oxide film KM2 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 28 nm was produced. An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded. Next, UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). . Thereby, the optical adhesive was hardened and the touch panel for evaluation was produced.
  • a substrate in which a metal oxide film KM2 was formed to a thickness of 100 nm on a transparent conductive film substrate having an ITO film thickness of 75 nm was produced.
  • An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded.
  • UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). .
  • the optical adhesive was hardened and the touch panel for evaluation was produced.
  • a substrate was prepared by forming an acrylic film KM3 with a thickness of 2 ⁇ m on a transparent conductive film substrate with an ITO film thickness of 75 nm.
  • An optical adhesive was applied onto the substrate, and 0.7 mm of raw glass was bonded.
  • UV irradiation was performed for 80 seconds at a light intensity of 50 mW / cm 2 (converted to a wavelength of 365 nm) using a high-pressure mercury lamp (input power supply 1000 W) using an ultraviolet irradiation device (UB011-3A type manufactured by Eye Graphic). .
  • the optical adhesive was hardened, and the touch panel for evaluation in which the acrylic film was formed was produced.
  • the result of the electrode pattern appearance evaluation is good, and the electrode pattern is not visible, or even if it is visible, it does not have a metal oxide film. It turns out that the degree has improved. Therefore, it has been found that by forming a metal oxide film having a refractive index and a film thickness adjusted on the transparent electrode, the appearance of the electrode pattern is improved and the electrode can be made inconspicuous. It was also found that the adhesion of each metal oxide film was higher than that of the acrylic film.
  • the electrode pattern does not stand out, and the adhesion between the constituent members is good. Therefore, it is useful as a touch panel for a display device that requires excellent appearance and high reliability.

Abstract

L'invention concerne un écran tactile capacitif permettant d'atténuer la diminution des propriétés d'affichage d'un dispositif d'affichage par visualisation d'un motif d'électrode transparente. L'écran tactile (1) est agencé d'une couche d'oxyde de métal (5), sur une première électrode transparente (3) et une seconde électrode transparente (4). La couche d'oxyde de métal (5) est formée à partir d'une composition de revêtement obtenue par hydrolyse et condensation d'un alcoxyde métallique de formule M(OR)n (M représente un métal, R un groupe alkyle en C1 à C5, et n la valence de M), dans un solvant organique et en présence d'un sel de métal de formule M2(X)m (M2 représente un métal; X un chlore, un acide nitrique, un acide sulfurique, un acide acétique, un acide oxalique, un acide sulfamique, un acide sulfonique, un acide acéto-acétique, un acétylacétonate, ou un sel basique de ceux-ci, et m la valence de M2); puis par adjonction d'un inhibiteur de précipitation. De préférence, l'alcoxyde métallique consiste en un produit mélangé d'un alcoxyde de silicium ou d'un condensat partiel de celui-ci, et d'un alcoxyde de titane.
PCT/JP2011/074587 2010-10-26 2011-10-25 Écran tactile WO2012057165A1 (fr)

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JP2012540893A JP5920220B2 (ja) 2010-10-26 2011-10-25 静電容量方式のタッチパネルの製造方法
KR1020137012941A KR101871527B1 (ko) 2010-10-26 2011-10-25 터치 패널
CN201180062501.7A CN103270477B (zh) 2010-10-26 2011-10-25 触控面板

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JP2015141605A (ja) * 2014-01-29 2015-08-03 株式会社アルバック タッチパネル
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CN103270477A (zh) 2013-08-28
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CN103270477B (zh) 2016-11-09
TWI535830B (zh) 2016-06-01
JP5920220B2 (ja) 2016-05-18
TW201231632A (en) 2012-08-01
JPWO2012057165A1 (ja) 2014-05-12

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