WO2001075501A1 - Procede et dispositif de soutien d'un element optique, dispositif optique, appareil d'exposition, et procede de fabrication d'un dispositif - Google Patents
Procede et dispositif de soutien d'un element optique, dispositif optique, appareil d'exposition, et procede de fabrication d'un dispositif Download PDFInfo
- Publication number
- WO2001075501A1 WO2001075501A1 PCT/JP2001/002593 JP0102593W WO0175501A1 WO 2001075501 A1 WO2001075501 A1 WO 2001075501A1 JP 0102593 W JP0102593 W JP 0102593W WO 0175501 A1 WO0175501 A1 WO 0175501A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lens
- flange part
- optical
- plane
- exposure apparatus
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 230000006866 deterioration Effects 0.000 abstract 1
- 230000007935 neutral effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/022—Mountings, adjusting means, or light-tight connections, for optical elements for lenses lens and mount having complementary engagement means, e.g. screw/thread
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Engineering & Computer Science (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lens Barrels (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP01917566A EP1279984A4 (en) | 2000-03-31 | 2001-03-28 | METHOD AND DEVICE FOR HOLDING AN OPTICAL LINK, OPTICAL DEVICE, EXPOSURE DEVICE, AND COMPONENT PRODUCTION METHOD |
AU44597/01A AU4459701A (en) | 2000-03-31 | 2001-03-28 | Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
US10/259,385 US6791766B2 (en) | 2000-03-31 | 2002-09-30 | Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000098042 | 2000-03-31 | ||
JP2000-98093 | 2000-03-31 | ||
JP2000-98042 | 2000-03-31 | ||
JP2000098093 | 2000-03-31 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/259,385 Continuation US6791766B2 (en) | 2000-03-31 | 2002-09-30 | Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2001075501A1 true WO2001075501A1 (fr) | 2001-10-11 |
WO2001075501A9 WO2001075501A9 (fr) | 2003-02-27 |
Family
ID=26589158
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2001/002593 WO2001075501A1 (fr) | 2000-03-31 | 2001-03-28 | Procede et dispositif de soutien d'un element optique, dispositif optique, appareil d'exposition, et procede de fabrication d'un dispositif |
Country Status (6)
Country | Link |
---|---|
US (1) | US6791766B2 (ja) |
EP (1) | EP1279984A4 (ja) |
KR (1) | KR20030051421A (ja) |
CN (1) | CN1440512A (ja) |
AU (1) | AU4459701A (ja) |
WO (1) | WO2001075501A1 (ja) |
Cited By (5)
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---|---|---|---|---|
WO2004021419A1 (ja) * | 2002-08-29 | 2004-03-11 | Nikon Corporation | 投影光学系及び露光装置 |
JP2010519761A (ja) * | 2007-02-27 | 2010-06-03 | カール・ツァイス・エスエムティー・アーゲー | 光学結像装置 |
JP2010156734A (ja) * | 2008-12-26 | 2010-07-15 | Rohm Co Ltd | レンズモジュールおよびカメラモジュール |
JP2014006360A (ja) * | 2012-06-22 | 2014-01-16 | Canon Inc | 光学部材、光学装置、露光装置、およびデバイスの製造方法 |
JP2015007784A (ja) * | 2004-10-08 | 2015-01-15 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 投影光学系 |
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US7050149B2 (en) * | 2002-06-11 | 2006-05-23 | Nikon Corporation | Exposure apparatus and exposure method |
WO2004086148A1 (de) * | 2003-03-26 | 2004-10-07 | Carl Zeiss Smt Ag | Vorrichtung zur deformationsarmen austauschbaren lagerung eines optischen elements |
CN100576003C (zh) † | 2003-06-06 | 2009-12-30 | 株式会社尼康 | 光学元件保持装置、镜筒、曝光装置及设备的制造方法 |
DE10339879A1 (de) * | 2003-08-29 | 2005-03-24 | Hella Kgaa Hueck & Co. | Opto-elektronische Vorrichtung für ein Kraftfahrzeug |
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US20050113849A1 (en) * | 2003-11-26 | 2005-05-26 | Nicholas Popadiuk | Prosthetic repair device |
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DE102004018659A1 (de) * | 2004-04-13 | 2005-11-03 | Carl Zeiss Smt Ag | Abschlussmodul für eine optische Anordnung |
US7369332B2 (en) * | 2004-04-13 | 2008-05-06 | Carl Zeiss Smt Gmbh | Closing module for an optical arrangement |
KR20160085375A (ko) | 2004-05-17 | 2016-07-15 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
JP4557211B2 (ja) * | 2004-07-06 | 2010-10-06 | 富士フイルム株式会社 | レンズ装置のレンズ支持枠及びその調整方法 |
US7561350B2 (en) * | 2004-12-17 | 2009-07-14 | Panasonic Corporation | Optical unit and its manufacturing method |
US7944628B2 (en) | 2005-03-09 | 2011-05-17 | Carl Zeiss Smt Gmbh | Optical element unit |
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JPWO2006134910A1 (ja) * | 2005-06-14 | 2009-01-08 | 株式会社ニコン | 光学素子、光学素子保持装置、露光装置、及びデバイス製造方法 |
JP5243957B2 (ja) | 2005-08-16 | 2013-07-24 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 液浸リソグラフィー用オブジェクティブ |
EP1952188A1 (en) * | 2005-11-04 | 2008-08-06 | Bookham Technology plc | Housing with a removable sealed module comprising a tilt stage for an optic element |
DE102006036488A1 (de) * | 2006-08-04 | 2008-02-07 | Carl Zeiss Smt Ag | Optisches System, insbesondere Projektionsobjektiv in der Mikrolithographie |
JP2008276071A (ja) * | 2007-05-02 | 2008-11-13 | Olympus Corp | 顕微鏡対物レンズおよびその調整方法 |
CN101329436A (zh) * | 2007-06-22 | 2008-12-24 | 鸿富锦精密工业(深圳)有限公司 | 镜头模组 |
US7664159B2 (en) * | 2007-07-31 | 2010-02-16 | Coherent, Inc. | Thermal distortion compensation for laser mirrors |
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NL1036543A1 (nl) * | 2008-02-20 | 2009-08-24 | Asml Netherlands Bv | Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method. |
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04103039A (ja) * | 1990-12-21 | 1992-04-06 | Toshiba Corp | 対物レンズ駆動装置 |
JPH06201968A (ja) * | 1992-12-25 | 1994-07-22 | Olympus Optical Co Ltd | レンズの心出し装置 |
JPH1114876A (ja) * | 1997-06-19 | 1999-01-22 | Nikon Corp | 光学構造体、その光学構造体を組み込んだ投影露光用光学系及び投影露光装置 |
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US4690528A (en) * | 1983-10-05 | 1987-09-01 | Nippon Kogaku K. K. | Projection exposure apparatus |
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JPH08327895A (ja) | 1995-05-26 | 1996-12-13 | Nikon Corp | 投影光学装置 |
US5883704A (en) * | 1995-08-07 | 1999-03-16 | Nikon Corporation | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
JPH1054932A (ja) | 1996-08-08 | 1998-02-24 | Nikon Corp | 投影光学装置及びそれを装着した投影露光装置 |
US6043863A (en) * | 1996-11-14 | 2000-03-28 | Nikon Corporation | Holder for reflecting member and exposure apparatus having the same |
JP3037163B2 (ja) * | 1996-11-26 | 2000-04-24 | キヤノン株式会社 | 光学素子支持装置、光学機器及びステッパー |
JPH10270333A (ja) | 1997-03-27 | 1998-10-09 | Nikon Corp | 露光装置 |
IL133422A0 (en) | 1997-06-10 | 2001-04-30 | Nikon Corp | Optical device, method of cleaning the same, projection aligner, and method of producing the same |
EP1030351A1 (en) | 1997-11-12 | 2000-08-23 | Nikon Corporation | Exposure apparatus, apparatus for manufacturing devices, and method of manufacturing exposure apparatuses |
JPH11224839A (ja) | 1998-02-04 | 1999-08-17 | Canon Inc | 露光装置とデバイス製造方法、ならびに該露光装置の光学素子クリーニング方法 |
JP3031375B2 (ja) * | 1998-04-23 | 2000-04-10 | キヤノン株式会社 | レンズ鏡筒及びそれを用いた投影露光装置 |
US6118599A (en) | 1998-11-03 | 2000-09-12 | Nikon Corporation | Hybrid optical barrel |
US6239924B1 (en) | 1999-08-31 | 2001-05-29 | Nikon Corporation | Kinematic lens mounting with distributed support and radial flexure |
US6571057B2 (en) * | 2000-03-27 | 2003-05-27 | Nikon Corporation | Optical instrument, gas replacement method and cleaning method of optical instrument, exposure apparatus, exposure method and manufacturing method for devices |
-
2001
- 2001-03-28 WO PCT/JP2001/002593 patent/WO2001075501A1/ja not_active Application Discontinuation
- 2001-03-28 EP EP01917566A patent/EP1279984A4/en not_active Withdrawn
- 2001-03-28 AU AU44597/01A patent/AU4459701A/en not_active Abandoned
- 2001-03-28 KR KR1020027013087A patent/KR20030051421A/ko not_active Application Discontinuation
- 2001-03-28 CN CN01807675A patent/CN1440512A/zh active Pending
-
2002
- 2002-09-30 US US10/259,385 patent/US6791766B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04103039A (ja) * | 1990-12-21 | 1992-04-06 | Toshiba Corp | 対物レンズ駆動装置 |
JPH06201968A (ja) * | 1992-12-25 | 1994-07-22 | Olympus Optical Co Ltd | レンズの心出し装置 |
JPH1114876A (ja) * | 1997-06-19 | 1999-01-22 | Nikon Corp | 光学構造体、その光学構造体を組み込んだ投影露光用光学系及び投影露光装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004021419A1 (ja) * | 2002-08-29 | 2004-03-11 | Nikon Corporation | 投影光学系及び露光装置 |
JP2015007784A (ja) * | 2004-10-08 | 2015-01-15 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 投影光学系 |
US9557653B2 (en) | 2004-10-08 | 2017-01-31 | Carl Zeiss Smt Gmbh | Optical projection system |
US9891535B2 (en) | 2004-10-08 | 2018-02-13 | Carl Zeiss Smt Gmbh | Optical projection system |
JP2010519761A (ja) * | 2007-02-27 | 2010-06-03 | カール・ツァイス・エスエムティー・アーゲー | 光学結像装置 |
JP2010156734A (ja) * | 2008-12-26 | 2010-07-15 | Rohm Co Ltd | レンズモジュールおよびカメラモジュール |
JP2014006360A (ja) * | 2012-06-22 | 2014-01-16 | Canon Inc | 光学部材、光学装置、露光装置、およびデバイスの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2001075501A9 (fr) | 2003-02-27 |
EP1279984A4 (en) | 2004-11-24 |
KR20030051421A (ko) | 2003-06-25 |
EP1279984A1 (en) | 2003-01-29 |
US6791766B2 (en) | 2004-09-14 |
CN1440512A (zh) | 2003-09-03 |
AU4459701A (en) | 2001-10-15 |
US20030076602A1 (en) | 2003-04-24 |
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