TWI737781B - 剝離層形成用組成物及剝離層 - Google Patents

剝離層形成用組成物及剝離層 Download PDF

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Publication number
TWI737781B
TWI737781B TW106126261A TW106126261A TWI737781B TW I737781 B TWI737781 B TW I737781B TW 106126261 A TW106126261 A TW 106126261A TW 106126261 A TW106126261 A TW 106126261A TW I737781 B TWI737781 B TW I737781B
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TW
Taiwan
Prior art keywords
composition
forming
resin substrate
peeling layer
substrate
Prior art date
Application number
TW106126261A
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English (en)
Chinese (zh)
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TW201817775A (zh
Inventor
江原和也
進藤和也
Original Assignee
日商日產化學工業股份有限公司
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Application filed by 日商日產化學工業股份有限公司 filed Critical 日商日產化學工業股份有限公司
Publication of TW201817775A publication Critical patent/TW201817775A/zh
Application granted granted Critical
Publication of TWI737781B publication Critical patent/TWI737781B/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/34Layered products comprising a layer of synthetic resin comprising polyamides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003Preparatory processes
    • C08G73/1007Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C08G73/1028Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous
    • C08G73/1032Preparatory processes from tetracarboxylic acids or derivatives and diamines characterised by the process itself, e.g. steps, continuous characterised by the solvent(s) used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Paints Or Removers (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
TW106126261A 2016-08-03 2017-08-03 剝離層形成用組成物及剝離層 TWI737781B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2016152507 2016-08-03
JP2016152549 2016-08-03
JP2016-152549 2016-08-03
JP2016-152507 2016-08-03

Publications (2)

Publication Number Publication Date
TW201817775A TW201817775A (zh) 2018-05-16
TWI737781B true TWI737781B (zh) 2021-09-01

Family

ID=61073040

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106126261A TWI737781B (zh) 2016-08-03 2017-08-03 剝離層形成用組成物及剝離層

Country Status (5)

Country Link
JP (1) JP7063266B2 (ko)
KR (2) KR20190037265A (ko)
CN (1) CN109476951B (ko)
TW (1) TWI737781B (ko)
WO (1) WO2018025953A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021132383A1 (ja) * 2019-12-25 2021-07-01 日産化学株式会社 剥離層形成用組成物及び剥離層

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012040836A (ja) * 2010-08-23 2012-03-01 Kaneka Corp 積層体、及びその利用
TW201610021A (zh) * 2014-07-17 2016-03-16 Asahi Kasei E Materials Corp 樹脂前驅物及含有其之樹脂組合物、聚醯亞胺樹脂膜、樹脂薄膜及其製造方法
JP2016086158A (ja) * 2014-10-22 2016-05-19 セントラル硝子株式会社 ウエハ加工用積層体、ウエハ加工用仮接着材および薄型ウエハの製造方法

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JP4619462B2 (ja) 1996-08-27 2011-01-26 セイコーエプソン株式会社 薄膜素子の転写方法
JP3809681B2 (ja) 1996-08-27 2006-08-16 セイコーエプソン株式会社 剥離方法
JP4619461B2 (ja) 1996-08-27 2011-01-26 セイコーエプソン株式会社 薄膜デバイスの転写方法、及びデバイスの製造方法
GB0327093D0 (en) 2003-11-21 2003-12-24 Koninkl Philips Electronics Nv Active matrix displays and other electronic devices having plastic substrates
JP2008070480A (ja) 2006-09-12 2008-03-27 Az Electronic Materials Kk フォトレジスト用溶媒とそれを用いたスリットコーティング用フォトレジスト組成物
TWI354854B (en) 2008-09-15 2011-12-21 Ind Tech Res Inst Substrate structures applied in flexible electrica
CN102549497B (zh) 2009-09-10 2013-07-31 东丽株式会社 感光性树脂组合物及感光性树脂膜的制造方法
JPWO2011122198A1 (ja) * 2010-03-31 2013-07-08 Jsr株式会社 ポリイミド前駆体、該前駆体を含む樹脂組成物および樹脂組成物を用いた膜形成方法
US20140083624A1 (en) * 2012-09-24 2014-03-27 Akron Polymer Systems, Inc. Solution of aromatic polyamide for producing display element, optical element, or illumination element
CN110256671A (zh) * 2013-01-16 2019-09-20 日产化学工业株式会社 显示器基板用树脂薄膜的制造方法及显示器基板用树脂薄膜形成用组合物
KR20140122207A (ko) 2013-04-09 2014-10-17 주식회사 엘지화학 적층체 및 이를 이용하여 제조된 기판을 포함하는 소자
JP6094353B2 (ja) 2013-04-17 2017-03-15 Jsr株式会社 保護膜形成用組成物、保護膜形成方法、保護膜及び保護膜除去方法
JP6185283B2 (ja) * 2013-05-10 2017-08-23 ユニチカ株式会社 フレキシブルデバイス用積層体
JP2015078254A (ja) 2013-10-15 2015-04-23 東レ株式会社 樹脂組成物、それを用いたポリイミド樹脂膜、それを含むカラーフィルタ、tft基板、表示デバイスおよびそれらの製造方法
JP2016120630A (ja) * 2014-12-24 2016-07-07 株式会社カネカ 剥離層の製造方法及びポリイミド積層体
KR102528185B1 (ko) 2015-02-10 2023-05-03 닛산 가가쿠 가부시키가이샤 박리층 형성용 조성물
CN107406675B (zh) 2015-03-31 2020-11-06 日产化学工业株式会社 剥离层形成用组合物和剥离层
KR102358122B1 (ko) 2016-03-31 2022-02-04 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 플렉시블 기판의 제조 방법

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012040836A (ja) * 2010-08-23 2012-03-01 Kaneka Corp 積層体、及びその利用
TW201610021A (zh) * 2014-07-17 2016-03-16 Asahi Kasei E Materials Corp 樹脂前驅物及含有其之樹脂組合物、聚醯亞胺樹脂膜、樹脂薄膜及其製造方法
JP2016086158A (ja) * 2014-10-22 2016-05-19 セントラル硝子株式会社 ウエハ加工用積層体、ウエハ加工用仮接着材および薄型ウエハの製造方法

Also Published As

Publication number Publication date
TW201817775A (zh) 2018-05-16
CN109476951B (zh) 2022-07-29
CN109476951A (zh) 2019-03-15
JPWO2018025953A1 (ja) 2019-06-06
WO2018025953A1 (ja) 2018-02-08
KR20230020011A (ko) 2023-02-09
KR20190037265A (ko) 2019-04-05
JP7063266B2 (ja) 2022-05-09

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