TWI685713B - 著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置 - Google Patents

著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置 Download PDF

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Publication number
TWI685713B
TWI685713B TW105139404A TW105139404A TWI685713B TW I685713 B TWI685713 B TW I685713B TW 105139404 A TW105139404 A TW 105139404A TW 105139404 A TW105139404 A TW 105139404A TW I685713 B TWI685713 B TW I685713B
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TW
Taiwan
Prior art keywords
photosensitive resin
resin composition
rhodamine
color filter
pigment
Prior art date
Application number
TW105139404A
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English (en)
Chinese (zh)
Other versions
TW201802585A (zh
Inventor
金韓善
尹鍾元
李商範
Original Assignee
韓商東友精細化工有限公司
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Publication of TW201802585A publication Critical patent/TW201802585A/zh
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Publication of TWI685713B publication Critical patent/TWI685713B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B41/00—Special methods of performing the coupling reaction
    • C09B41/001—Special methods of performing the coupling reaction characterised by the coupling medium
    • C09B41/005—Special methods of performing the coupling reaction characterised by the coupling medium containing low molecular weight dispersing agents; containing surface active polythylene gylcols
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
TW105139404A 2016-03-28 2016-11-30 著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置 TWI685713B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR1020160036568A KR102383698B1 (ko) 2016-03-28 2016-03-28 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
??10-2016-0036568 2016-03-28
KR10-2016-0036568 2016-03-28

Publications (2)

Publication Number Publication Date
TW201802585A TW201802585A (zh) 2018-01-16
TWI685713B true TWI685713B (zh) 2020-02-21

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW105139404A TWI685713B (zh) 2016-03-28 2016-11-30 著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置

Country Status (4)

Country Link
JP (1) JP6654556B2 (ja)
KR (1) KR102383698B1 (ja)
CN (1) CN107239004B (ja)
TW (1) TWI685713B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021162854A (ja) * 2020-03-31 2021-10-11 住友化学株式会社 ネガ型レジスト組成物
CN113201017B (zh) * 2021-04-29 2022-07-01 宁波中苑颜料有限公司 一种基于三嗪衍生物的有机颜料分散剂及其制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011022542A (ja) * 2009-07-21 2011-02-03 Jsr Corp 着色組成物、カラーフィルタ及びカラー液晶表示素子
TW201134840A (en) * 2009-11-30 2011-10-16 Tamura Seisakusho Kk Curable composition, cured material therefrom, and use thereof
TW201350544A (zh) * 2012-04-10 2013-12-16 Sumitomo Chemical Co 著色劑分散液
TW201400553A (zh) * 2012-05-21 2014-01-01 Toyo Ink Sc Holdings Co Ltd 濾色器用著色組成物及濾色器
CN104428331A (zh) * 2012-07-11 2015-03-18 东洋油墨Sc控股株式会社 活性能量射线聚合性树脂组合物、以及使用该树脂组合物的层叠体
TW201518422A (zh) * 2013-10-03 2015-05-16 Sumitomo Chemical Co 染料分散液
WO2016006738A1 (ko) * 2014-07-10 2016-01-14 전북대학교산학협력단 액정 수직배향 유도제 및 이를 이용하여 제조된 액정 표시장치

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CN1977221A (zh) * 2004-05-31 2007-06-06 富士胶片株式会社 图案形成方法及滤色片的制造方法以及滤色片及液晶显示装置
KR101505671B1 (ko) * 2010-08-30 2015-03-25 주식회사 알파켐 안료 분산 조성물, 컬러 레지스트 및 이를 이용하여 제조된 컬러필터
JP5737078B2 (ja) * 2011-02-28 2015-06-17 東洋インキＳｃホールディングス株式会社 カラーフィルタ用赤色着色組成物、およびカラーフィルタ
JP4911253B1 (ja) * 2011-04-28 2012-04-04 大日本印刷株式会社 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置及び、有機発光表示装置
JP2012246393A (ja) * 2011-05-27 2012-12-13 Dainippon Printing Co Ltd 顔料分散剤、顔料分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機発光表示装置。
JP2013041145A (ja) * 2011-08-17 2013-02-28 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用着色組成物、およびカラーフィルタ
JP2013061619A (ja) 2011-08-24 2013-04-04 Toray Ind Inc カラーフィルター用青色着色剤組成物およびそれを用いたカラーフィルター基板。
JP5789847B2 (ja) * 2011-10-12 2015-10-07 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
KR20140112228A (ko) * 2013-03-13 2014-09-23 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 컬러 필터
TWI547486B (zh) * 2013-12-12 2016-09-01 中央研究院 用於醣類分析及合成的化合物及方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011022542A (ja) * 2009-07-21 2011-02-03 Jsr Corp 着色組成物、カラーフィルタ及びカラー液晶表示素子
TW201134840A (en) * 2009-11-30 2011-10-16 Tamura Seisakusho Kk Curable composition, cured material therefrom, and use thereof
TW201350544A (zh) * 2012-04-10 2013-12-16 Sumitomo Chemical Co 著色劑分散液
TW201400553A (zh) * 2012-05-21 2014-01-01 Toyo Ink Sc Holdings Co Ltd 濾色器用著色組成物及濾色器
CN104428331A (zh) * 2012-07-11 2015-03-18 东洋油墨Sc控股株式会社 活性能量射线聚合性树脂组合物、以及使用该树脂组合物的层叠体
TW201518422A (zh) * 2013-10-03 2015-05-16 Sumitomo Chemical Co 染料分散液
WO2016006738A1 (ko) * 2014-07-10 2016-01-14 전북대학교산학협력단 액정 수직배향 유도제 및 이를 이용하여 제조된 액정 표시장치

Also Published As

Publication number Publication date
KR102383698B1 (ko) 2022-04-05
TW201802585A (zh) 2018-01-16
KR20170111323A (ko) 2017-10-12
JP6654556B2 (ja) 2020-02-26
JP2017182044A (ja) 2017-10-05
CN107239004A (zh) 2017-10-10
CN107239004B (zh) 2021-07-13

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