KR102383698B1 - 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 - Google Patents

착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 Download PDF

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Publication number
KR102383698B1
KR102383698B1 KR1020160036568A KR20160036568A KR102383698B1 KR 102383698 B1 KR102383698 B1 KR 102383698B1 KR 1020160036568 A KR1020160036568 A KR 1020160036568A KR 20160036568 A KR20160036568 A KR 20160036568A KR 102383698 B1 KR102383698 B1 KR 102383698B1
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KR
South Korea
Prior art keywords
resin composition
photosensitive resin
colored photosensitive
pigment
rhodamine
Prior art date
Application number
KR1020160036568A
Other languages
English (en)
Korean (ko)
Other versions
KR20170111323A (ko
Inventor
김한선
윤종원
이상범
Original Assignee
동우 화인켐 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 동우 화인켐 주식회사 filed Critical 동우 화인켐 주식회사
Priority to KR1020160036568A priority Critical patent/KR102383698B1/ko
Priority to TW105139404A priority patent/TWI685713B/zh
Priority to JP2016252876A priority patent/JP6654556B2/ja
Priority to CN201710016692.2A priority patent/CN107239004B/zh
Publication of KR20170111323A publication Critical patent/KR20170111323A/ko
Application granted granted Critical
Publication of KR102383698B1 publication Critical patent/KR102383698B1/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B41/00—Special methods of performing the coupling reaction
    • C09B41/001—Special methods of performing the coupling reaction characterised by the coupling medium
    • C09B41/005—Special methods of performing the coupling reaction characterised by the coupling medium containing low molecular weight dispersing agents; containing surface active polythylene gylcols
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
KR1020160036568A 2016-03-28 2016-03-28 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치 KR102383698B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020160036568A KR102383698B1 (ko) 2016-03-28 2016-03-28 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치
TW105139404A TWI685713B (zh) 2016-03-28 2016-11-30 著色感光性樹脂組合物、使用其製造的濾色器和圖像顯示裝置
JP2016252876A JP6654556B2 (ja) 2016-03-28 2016-12-27 着色感光性樹脂組成物、これを用いて製造されたカラーフィルタ及び画像表示装置
CN201710016692.2A CN107239004B (zh) 2016-03-28 2017-01-10 着色感光性树脂组合物、使用其制造的滤色器和图像显示装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020160036568A KR102383698B1 (ko) 2016-03-28 2016-03-28 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Publications (2)

Publication Number Publication Date
KR20170111323A KR20170111323A (ko) 2017-10-12
KR102383698B1 true KR102383698B1 (ko) 2022-04-05

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KR1020160036568A KR102383698B1 (ko) 2016-03-28 2016-03-28 착색 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치

Country Status (4)

Country Link
JP (1) JP6654556B2 (ja)
KR (1) KR102383698B1 (ja)
CN (1) CN107239004B (ja)
TW (1) TWI685713B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021162854A (ja) * 2020-03-31 2021-10-11 住友化学株式会社 ネガ型レジスト組成物
CN113201017B (zh) * 2021-04-29 2022-07-01 宁波中苑颜料有限公司 一种基于三嗪衍生物的有机颜料分散剂及其制备方法

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JP2013041145A (ja) * 2011-08-17 2013-02-28 Toyo Ink Sc Holdings Co Ltd カラーフィルタ用着色組成物、およびカラーフィルタ
US20150168415A1 (en) 2013-12-12 2015-06-18 Academia Sinica Compounds and methods for analysis and synthesis of saccharide compounds

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CN1977221A (zh) * 2004-05-31 2007-06-06 富士胶片株式会社 图案形成方法及滤色片的制造方法以及滤色片及液晶显示装置
JP5353519B2 (ja) * 2009-07-21 2013-11-27 Ｊｓｒ株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
WO2011065228A1 (ja) * 2009-11-30 2011-06-03 株式会社タムラ製作所 硬化性組成物、その硬化物及びその用途
KR101505671B1 (ko) * 2010-08-30 2015-03-25 주식회사 알파켐 안료 분산 조성물, 컬러 레지스트 및 이를 이용하여 제조된 컬러필터
JP5737078B2 (ja) * 2011-02-28 2015-06-17 東洋インキＳｃホールディングス株式会社 カラーフィルタ用赤色着色組成物、およびカラーフィルタ
JP4911253B1 (ja) * 2011-04-28 2012-04-04 大日本印刷株式会社 染料分散液、カラーフィルター用感光性樹脂組成物、カラーフィルター、液晶表示装置及び、有機発光表示装置
JP2012246393A (ja) * 2011-05-27 2012-12-13 Dainippon Printing Co Ltd 顔料分散剤、顔料分散液、カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機発光表示装置。
JP2013061619A (ja) 2011-08-24 2013-04-04 Toray Ind Inc カラーフィルター用青色着色剤組成物およびそれを用いたカラーフィルター基板。
JP5789847B2 (ja) * 2011-10-12 2015-10-07 東洋インキＳｃホールディングス株式会社 カラーフィルタ用着色組成物、およびカラーフィルタ
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KR102116438B1 (ko) * 2012-05-21 2020-05-29 토요잉크Sc홀딩스주식회사 컬러 필터용 착색 조성물 및 컬러 필터
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KR20140112228A (ko) * 2013-03-13 2014-09-23 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 컬러 필터
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WO2016006738A1 (ko) * 2014-07-10 2016-01-14 전북대학교산학협력단 액정 수직배향 유도제 및 이를 이용하여 제조된 액정 표시장치

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US20150168415A1 (en) 2013-12-12 2015-06-18 Academia Sinica Compounds and methods for analysis and synthesis of saccharide compounds

Also Published As

Publication number Publication date
TWI685713B (zh) 2020-02-21
TW201802585A (zh) 2018-01-16
KR20170111323A (ko) 2017-10-12
JP6654556B2 (ja) 2020-02-26
JP2017182044A (ja) 2017-10-05
CN107239004A (zh) 2017-10-10
CN107239004B (zh) 2021-07-13

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