TWI586946B - Sensing detectors - Google Patents

Sensing detectors Download PDF

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Publication number
TWI586946B
TWI586946B TW103103434A TW103103434A TWI586946B TW I586946 B TWI586946 B TW I586946B TW 103103434 A TW103103434 A TW 103103434A TW 103103434 A TW103103434 A TW 103103434A TW I586946 B TWI586946 B TW I586946B
Authority
TW
Taiwan
Prior art keywords
electrode
electrode layer
substrate
spacer
thickness
Prior art date
Application number
TW103103434A
Other languages
English (en)
Chinese (zh)
Other versions
TW201447249A (zh
Inventor
Yasuyuki Tachikawa
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Publication of TW201447249A publication Critical patent/TW201447249A/zh
Application granted granted Critical
Publication of TWI586946B publication Critical patent/TWI586946B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
    • G01L9/0044—Constructional details of non-semiconductive diaphragms
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)
TW103103434A 2013-02-04 2014-01-29 Sensing detectors TWI586946B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013019176 2013-02-04

Publications (2)

Publication Number Publication Date
TW201447249A TW201447249A (zh) 2014-12-16
TWI586946B true TWI586946B (zh) 2017-06-11

Family

ID=51262369

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103103434A TWI586946B (zh) 2013-02-04 2014-01-29 Sensing detectors

Country Status (4)

Country Link
JP (1) JP5938111B2 (ja)
CN (1) CN104884920B (ja)
TW (1) TWI586946B (ja)
WO (1) WO2014119658A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6316371B2 (ja) * 2016-10-13 2018-04-25 Ｎｉｓｓｈａ株式会社 圧力センサ
WO2019200463A1 (en) * 2018-04-16 2019-10-24 Orpyx Medical Technologies Inc. High-resistance sensor and method for using same
CN117109782A (zh) * 2023-08-31 2023-11-24 广州埔慧科技有限公司 压力传感器及其制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4978775U (ja) * 1972-10-26 1974-07-08
JP2004205377A (ja) * 2002-12-25 2004-07-22 Kyocera Corp 圧力検出装置用パッケージ
JP2008175570A (ja) * 2007-01-16 2008-07-31 Fujikura Ltd 感圧メンブレンセンサ
WO2009075403A1 (en) * 2007-12-10 2009-06-18 Korea Research Institute Of Standards And Science High-temperature tactile sensor and method of manufacturing the same
TW201140014A (en) * 2009-08-28 2011-11-16 Nissha Printing Pressure detecting unit and pressure detecting device

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3664622B2 (ja) * 1999-12-06 2005-06-29 アルプス電気株式会社 感圧装置
JP3771425B2 (ja) * 2000-07-04 2006-04-26 株式会社山武 容量式圧力センサおよびその製造方法
JP3980300B2 (ja) * 2000-09-07 2007-09-26 株式会社フジクラ 膜状感圧抵抗体および感圧センサ
JP2002131155A (ja) * 2000-10-30 2002-05-09 Denso Corp 感圧抵抗センサ
JP4216525B2 (ja) * 2002-05-13 2009-01-28 株式会社ワコー 加速度センサおよびその製造方法
JP2004028883A (ja) * 2002-06-27 2004-01-29 Denso Corp 感圧センサ
CN100346143C (zh) * 2004-12-17 2007-10-31 电子科技大学 一种复合封装的箔式锰铜超高压力传感器
CN101079342B (zh) * 2007-05-28 2010-09-08 上海神沃电子有限公司 表面贴装型高分子esd保护元件及其制备方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4978775U (ja) * 1972-10-26 1974-07-08
JP2004205377A (ja) * 2002-12-25 2004-07-22 Kyocera Corp 圧力検出装置用パッケージ
JP2008175570A (ja) * 2007-01-16 2008-07-31 Fujikura Ltd 感圧メンブレンセンサ
WO2009075403A1 (en) * 2007-12-10 2009-06-18 Korea Research Institute Of Standards And Science High-temperature tactile sensor and method of manufacturing the same
TW201140014A (en) * 2009-08-28 2011-11-16 Nissha Printing Pressure detecting unit and pressure detecting device

Also Published As

Publication number Publication date
TW201447249A (zh) 2014-12-16
JPWO2014119658A1 (ja) 2017-01-26
CN104884920B (zh) 2017-03-15
CN104884920A (zh) 2015-09-02
WO2014119658A1 (ja) 2014-08-07
JP5938111B2 (ja) 2016-06-22

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MM4A Annulment or lapse of patent due to non-payment of fees