CN104884920B - 压敏传感器 - Google Patents

压敏传感器 Download PDF

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Publication number
CN104884920B
CN104884920B CN201480003666.0A CN201480003666A CN104884920B CN 104884920 B CN104884920 B CN 104884920B CN 201480003666 A CN201480003666 A CN 201480003666A CN 104884920 B CN104884920 B CN 104884920B
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CN
China
Prior art keywords
electrode
substrate
mentioned
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Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201480003666.0A
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English (en)
Chinese (zh)
Other versions
CN104884920A (zh
Inventor
立川泰之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujikura Ltd
Original Assignee
Fujikura Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujikura Ltd filed Critical Fujikura Ltd
Publication of CN104884920A publication Critical patent/CN104884920A/zh
Application granted granted Critical
Publication of CN104884920B publication Critical patent/CN104884920B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
    • G01L9/0044—Constructional details of non-semiconductive diaphragms
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)
CN201480003666.0A 2013-02-04 2014-01-30 压敏传感器 Expired - Fee Related CN104884920B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013-019176 2013-02-04
JP2013019176 2013-02-04
PCT/JP2014/052083 WO2014119658A1 (ja) 2013-02-04 2014-01-30 感圧センサ

Publications (2)

Publication Number Publication Date
CN104884920A CN104884920A (zh) 2015-09-02
CN104884920B true CN104884920B (zh) 2017-03-15

Family

ID=51262369

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480003666.0A Expired - Fee Related CN104884920B (zh) 2013-02-04 2014-01-30 压敏传感器

Country Status (4)

Country Link
JP (1) JP5938111B2 (ja)
CN (1) CN104884920B (ja)
TW (1) TWI586946B (ja)
WO (1) WO2014119658A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6316371B2 (ja) * 2016-10-13 2018-04-25 Ｎｉｓｓｈａ株式会社 圧力センサ
WO2019200463A1 (en) * 2018-04-16 2019-10-24 Orpyx Medical Technologies Inc. High-resistance sensor and method for using same
CN117109782A (zh) * 2023-08-31 2023-11-24 广州埔慧科技有限公司 压力传感器及其制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001165788A (ja) * 1999-12-06 2001-06-22 Alps Electric Co Ltd 感圧装置
CN1440504A (zh) * 2000-07-04 2003-09-03 株式会社山武 电容式压力传感器及其制造方法
CN1605870A (zh) * 2002-05-13 2005-04-13 株式会社和广 加速度传感器及其制造方法
CN1789940A (zh) * 2004-12-17 2006-06-21 电子科技大学 一种复合封装的箔式锰铜超高压力传感器
EP1775738A2 (en) * 2000-09-07 2007-04-18 Fujikura Ltd. Film pressure sensitive resistor and pressure sensitive sensor
CN101079342A (zh) * 2007-05-28 2007-11-28 上海神沃电子有限公司 表面贴装型高分子esd保护元件及其制备方法
WO2009075403A1 (en) * 2007-12-10 2009-06-18 Korea Research Institute Of Standards And Science High-temperature tactile sensor and method of manufacturing the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4978775U (ja) * 1972-10-26 1974-07-08
JP2002131155A (ja) * 2000-10-30 2002-05-09 Denso Corp 感圧抵抗センサ
JP2004028883A (ja) * 2002-06-27 2004-01-29 Denso Corp 感圧センサ
JP2004205377A (ja) * 2002-12-25 2004-07-22 Kyocera Corp 圧力検出装置用パッケージ
JP2008175570A (ja) * 2007-01-16 2008-07-31 Fujikura Ltd 感圧メンブレンセンサ
CN102483363B (zh) * 2009-08-28 2014-05-07 日本写真印刷株式会社 压力检测单元以及压力检测装置

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001165788A (ja) * 1999-12-06 2001-06-22 Alps Electric Co Ltd 感圧装置
CN1440504A (zh) * 2000-07-04 2003-09-03 株式会社山武 电容式压力传感器及其制造方法
EP1775738A2 (en) * 2000-09-07 2007-04-18 Fujikura Ltd. Film pressure sensitive resistor and pressure sensitive sensor
CN1605870A (zh) * 2002-05-13 2005-04-13 株式会社和广 加速度传感器及其制造方法
CN1789940A (zh) * 2004-12-17 2006-06-21 电子科技大学 一种复合封装的箔式锰铜超高压力传感器
CN101079342A (zh) * 2007-05-28 2007-11-28 上海神沃电子有限公司 表面贴装型高分子esd保护元件及其制备方法
WO2009075403A1 (en) * 2007-12-10 2009-06-18 Korea Research Institute Of Standards And Science High-temperature tactile sensor and method of manufacturing the same

Also Published As

Publication number Publication date
TW201447249A (zh) 2014-12-16
JPWO2014119658A1 (ja) 2017-01-26
CN104884920A (zh) 2015-09-02
WO2014119658A1 (ja) 2014-08-07
JP5938111B2 (ja) 2016-06-22
TWI586946B (zh) 2017-06-11

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Granted publication date: 20170315

Termination date: 20210130