TW349887B - Support jig for thin circular objects, solution-processing bath equipped with the same and retaining jig comprising the same - Google Patents
Support jig for thin circular objects, solution-processing bath equipped with the same and retaining jig comprising the sameInfo
- Publication number
- TW349887B TW349887B TW086107630A TW86107630A TW349887B TW 349887 B TW349887 B TW 349887B TW 086107630 A TW086107630 A TW 086107630A TW 86107630 A TW86107630 A TW 86107630A TW 349887 B TW349887 B TW 349887B
- Authority
- TW
- Taiwan
- Prior art keywords
- same
- jig
- thin circular
- circular objects
- solution
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Jigs For Machine Tools (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Packaging Frangible Articles (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16678496A JP3623315B2 (ja) | 1996-06-06 | 1996-06-06 | 円形薄板状物の支持治具 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW349887B true TW349887B (en) | 1999-01-11 |
Family
ID=15837619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW086107630A TW349887B (en) | 1996-06-06 | 1997-06-03 | Support jig for thin circular objects, solution-processing bath equipped with the same and retaining jig comprising the same |
Country Status (4)
Country | Link |
---|---|
US (1) | US5791357A (zh) |
EP (1) | EP0812008A3 (zh) |
JP (1) | JP3623315B2 (zh) |
TW (1) | TW349887B (zh) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6767840B1 (en) | 1997-02-21 | 2004-07-27 | Canon Kabushiki Kaisha | Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method |
SG63810A1 (en) * | 1997-02-21 | 1999-03-30 | Canon Kk | Wafer processing apparatus wafer processing method and semiconductor substrate fabrication method |
US5988191A (en) * | 1997-11-19 | 1999-11-23 | Coburn Optical Industries, Inc. | Holder for ophthalmic lenses and lens blocks |
US6047717A (en) * | 1998-04-29 | 2000-04-11 | Scd Mountain View, Inc. | Mandrel device and method for hard disks |
US6340090B1 (en) * | 1999-01-07 | 2002-01-22 | Tooltek Engineering Corporation | Substrate fixturing device |
US6418945B1 (en) * | 2000-07-07 | 2002-07-16 | Semitool, Inc. | Dual cassette centrifugal processor |
US7201639B2 (en) * | 2001-04-24 | 2007-04-10 | Hitachi Global Storage Technologies Netherlands B.V. | Powder for disks |
US7415985B2 (en) * | 2003-09-24 | 2008-08-26 | Dainippon Screen Mfg. Co., Ltd. | Substrate cleaning and drying apparatus |
JP4999808B2 (ja) * | 2008-09-29 | 2012-08-15 | 東京エレクトロン株式会社 | 基板処理装置 |
JP5774341B2 (ja) * | 2011-03-28 | 2015-09-09 | 株式会社Screenホールディングス | 基板保持具および基板処理装置 |
JP2015504479A (ja) * | 2011-11-08 | 2015-02-12 | トーソー エスエムディー,インク. | 特別な表面処理及び優れた粒子性能を有するシリコンスパッターターゲット及びその製造方法 |
CN108213017B (zh) * | 2018-01-17 | 2021-01-08 | 安徽机电职业技术学院 | 一种双工位浇灌清洗用运载装置 |
TWI786544B (zh) * | 2021-02-18 | 2022-12-11 | 日商華爾卡股份有限公司 | 支撐治具、支撐治具組及桶槽物件的清洗方法 |
CN114310367B (zh) * | 2021-12-23 | 2023-08-01 | 上海新力动力设备研究所 | 一种大长径比薄壁壳体减振工装 |
CN114589150B (zh) * | 2022-01-14 | 2023-03-24 | 浙江阿凡特精密设备制造有限公司 | 一种油缸活塞杆清洗装置及其使用方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2555594A (en) * | 1948-09-13 | 1951-06-05 | Victor S Markovitz | Phonograph disk record package |
US3923156A (en) * | 1974-04-29 | 1975-12-02 | Fluoroware Inc | Wafer basket |
JPS53144265A (en) * | 1977-05-23 | 1978-12-15 | Hitachi Ltd | Etching device |
US4669612A (en) * | 1985-02-20 | 1987-06-02 | Empak Inc. | Disk processing cassette |
JPS61284927A (ja) * | 1985-06-11 | 1986-12-15 | Toshiba Corp | 半導体ウエ−ハ洗滌方法 |
JPS62283632A (ja) * | 1986-05-31 | 1987-12-09 | Toshiba Corp | ウエハ処理装置 |
JPH03116731A (ja) * | 1989-09-28 | 1991-05-17 | Dan Kagaku:Kk | 半導体ウエハ用移送装置 |
JPH03233930A (ja) * | 1990-02-08 | 1991-10-17 | Fujitsu Ltd | 半導体装置の洗浄方法 |
JPH0456321A (ja) * | 1990-06-26 | 1992-02-24 | Fujitsu Ltd | 半導体ウエハの洗浄装置 |
JPH0547738A (ja) * | 1991-07-15 | 1993-02-26 | Fujitsu Ltd | 基板のウエツト処理方法 |
JP2696017B2 (ja) * | 1991-10-09 | 1998-01-14 | 三菱電機株式会社 | 洗浄装置及び洗浄方法 |
JP3110218B2 (ja) * | 1992-09-25 | 2000-11-20 | 三菱電機株式会社 | 半導体洗浄装置及び方法、ウエハカセット、専用グローブ並びにウエハ受け治具 |
JP2609815B2 (ja) * | 1994-07-22 | 1997-05-14 | 九州日本電気株式会社 | ウェット処理装置 |
-
1996
- 1996-06-06 JP JP16678496A patent/JP3623315B2/ja not_active Expired - Lifetime
-
1997
- 1997-06-02 US US08/867,450 patent/US5791357A/en not_active Expired - Fee Related
- 1997-06-03 TW TW086107630A patent/TW349887B/zh active
- 1997-06-05 EP EP97303878A patent/EP0812008A3/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP0812008A2 (en) | 1997-12-10 |
EP0812008A3 (en) | 2001-04-18 |
JP3623315B2 (ja) | 2005-02-23 |
JPH09323233A (ja) | 1997-12-16 |
US5791357A (en) | 1998-08-11 |
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