200540563 (1) 九、發明說明 【發明所屬之技術領域】 本發明是有關經由光罩來將光照射於基板，藉此使描 繪於光罩的圖案複製於基板之曝光裝置，特別是有關供以 使附著有感光材的可撓性帶狀基板曝光之曝光裝置。 【先前技術】 # 就曝光用的曝光裝置而言，例如有在可撓性的帶狀基 板被捲成圓筒狀的發出用捲軸與將該帶狀基板捲取成圓筒 狀的捲取捲軸之間，一邊使帶狀基板沿著其長度方向來間 歇性傳送，一邊使該帶狀基板曝光於每個特定長度的區域 者。在帶狀基板的至少一面形成附著有感光材的曝光面。 經由光罩來將光照射於曝光面，藉此描繪於光罩之例如電 路的圖案會被複製於基板上。在該以往的曝光裝置中，帶 狀基板是在水平狀態下被曝光。 【發明內容】 (發明所欲解決的課題） 在上述以往的曝光裝置中，水平狀態的帶狀基板會因 爲自重而有向下方彎曲的傾向。此彎曲在進行曝光時會使 發生較大的問題。在使帶狀基板間歇性傳送於長度方向 時，及，使光罩對帶狀基板對位時，或使光罩彼此之間對 位時，帶狀基板與光罩不會接觸，而使得兩者間形成有間 隙。對位時，由於必須同時藉由一台c CD攝影機來讀取 200540563 (2) 帶狀基板與光罩，或光罩彼此間雙方所形成的對位標記， 因此上述間隙必須形成CCD攝影機的焦點深度以内的狹 小距離。於是，在曝光部，對帶狀基板施加長度方向之較 大的張力，縮小自重所造成帶狀基板的彎曲，但藉由該長 度方向之較大的張力來使帶狀基板伸展於長度方向，與無 張力的狀態相較之下，會產生尺寸變化。若在此狀態下進 行對位，則會難以精度佳地使帶狀基板與光罩對位，而提 Φ 供均一品質的製品。 以往的曝光裝置之另一問題是塵埃的附著。在水平狀 態的帶狀基板容易附著塵埃。一旦在帶狀基板的曝光面附 著塵埃的狀況下進行曝光，則會容易引起曝光不良。並 且，在配置於帶狀基板下方的光罩或光源的反射鏡上，容 易滞留從帶狀基板落下的塵埃。如此被積存的塵埃是造成 多數曝光不良製品產生的最大原因。 ® (用以解決課題的手段） 爲了解決上述以往的問題點，本發明之曝光裝置，係 用以一邊使帶狀基板沿著其長度方向來間歇性傳送，一邊 使該帶狀基板曝光於特定長度區域，其特徵係具備： 發出用捲軸，其係至少一面具有附著感光材的曝光面 之可撓性的帶狀基板會被捲成圓筒狀； 捲取用捲軸，其係用以將上述帶狀基板捲取成圓筒 狀，且取一特定的距離，離開上述發出用捲軸來設置； 驅動裝置，其係用以從上述發出用捲軸到上述捲取用 -5- 200540563 (3) 捲軸，間歇性傳送上述帶狀基板； 曝光部，其係設置於上述發出用捲軸與上述捲取用捲 軸之間，且具有可接近或接觸於上述曝光面的至少1個光 罩；及 光源，其係用以將描繪於上述光罩的圖案複製於上述 帶狀基板的上述曝光面， 並且，在上述發出用捲軸與上述捲取用捲軸之間，形 • 成有上述帶狀基板會成垂直狀態之處的垂直路徑， 上述曝光部會被設置於上述垂直路徑。 又，上述垂直路徑會被設置成沿著上述帶狀基板的移 動方向而垂直延伸。 又，可在上述曝光部中，使分別對向於上述帶狀基板 的兩面的上述曝光面來配置一對的上述光罩， 該一對的光罩在互相對向的位置具有對位用標記，且 更具備= • 至少1個CCD攝影機，其係用以讀取該對位用標 記；及 移動機構，其係用以根據該CCD攝影機之上述對位 用標記的讀取資料，使上述光罩中至少一方在其面内移動 於X，Y，Θ方向，進行對位。 又，爲了進行上述帶狀基板與上述光罩的對位，而於 上述帶狀基板形成有可與設置於上述光罩的對位用標記進 行對位的對位用標記。 又，形成於上述帶狀基板的上述對位用標記可由上述 -6- 200540563 (4) 帶狀基板的側緣來取代。 [發明的效果] 若利用本發明的曝光裝置，則帶狀基板會在成垂直狀 態之處的垂直路徑中被曝光，所以不會發生自重所造成的 帶狀基板彎曲。因此，不必爲了縮小彎曲，而對帶狀基板 施加較大的張力，所以不會有因爲帶狀基板的伸展而造成 # 尺寸變化之問題發生。 又，由於在垂直路徑中形成垂直狀態的帶狀基板只要 些微的張力便可維持充分的平面性，因此可對光罩取得良 好的平行性，其結果，兩者間的對位精度會提升。 又，垂直狀態的帶狀基板與水平狀態的帶狀基板相較 之下’塵埃難以附著。又，由於構造上光罩及光源的反射 鏡亦可設成垂直狀態，因此可大幅度地降低因爲附著或積 存於帶狀基板，光罩及光源的反射鏡的塵埃所引起的曝光 _ 不良。 又，由於來自光源的光並非是發射於垂直方向，而是 發射於水平方向，因此在施設内容易確保較長的光路。若 利用較長的光路，則平行光的光質會變佳，解像度會提 升，因此可使描繪於光罩上的圖案能夠忠實地複製於帶狀 基板。 結果，若利用本發明，則有關帶狀基板的曝光，可取 得比以往更高的品質及生產性。 200540563 (5) 【實施方式】 圖1是表示本發明的曝光裝置之一實施形態的槪略縱 剖面圖。曝光裝置具備：基底18，及設置於該基底18上 的框體26。在基底18的右端部設有發出用捲軸14。在發 出用捲軸1 4，可撓性的帶狀基板1會被捲成圓筒1 2狀。 另一方面，在基底18的左端部設有捲取用捲軸15。 在發出用捲軸14與捲取用捲軸15之間設有傳送驅動 # 滾筒19。傳送驅動滾筒19是特定長度來間歇性引出被捲 於發出用捲軸1 4上的帶狀基板1。從發出用捲軸1 4所引 出的帶狀基板1是經由引導滾筒16，17，27，28來進入 垂直路徑，形成垂直狀態。帶狀基板1形成垂直狀態的區 域會成爲曝光部。以垂直狀態通過曝光部的帶狀基板1會 經由引導滾筒29，30及傳送驅動滾筒19來圓筒13狀捲 取於捲取用捲軸1 5上。沿著如此的帶狀基板1的長度方 向之間歇性的傳送是藉由驅動裝置的傳送驅動滾筒1 9來 •進行。 在帶狀基板1的路徑途中，亦可設置一在進行帶狀基 板1的接合作業等時使用的作業台20，或用以去除帶狀 基板1表面的塵埃之黏著滾筒。又，最好將帶狀基板1用 的蛇行防止裝置設置於發出用捲軸14，捲取用捲軸15及 引導滾筒的其中至少一個。 帶狀基板1的至少一面是形成附著有感光材的曝光 面。在曝光部中，在對應於曝光面的位置配置有光罩單元 U1，或U2。圖示的實施形態是在兩面形成有曝光面。因 200540563 (6) 此，在曝光部中，夾著垂直狀態的帶狀基板1，在兩側配 置有光罩單兀U1及光罩單元U2。在光罩單元U1及光罩 單元U2分別以能夠對向於帶狀基板1的曝光面之方式來 設有光罩21，22。在光罩21，22，例如描繪有電路之類 的圖案，在與光罩2 1，22的帶狀基板1呈相反的一側配 置有將來自光源（未圖示）的光予以導入帶狀基板1的反射 鏡1 1，3 1。來自光源的光1 0會經由反射鏡1 1，3 1，且通 9 過光罩2 1，22來照射至帶狀基板1的曝光面，藉此圖案 會被複製於帶狀基板1上。光10最好爲平行光，且包含 反射鏡1 1的曝光部最好藉由框體26來覆蓋。 在光罩單元U 1，U2的至少一個安裝有供以使對他方 接近及遠離的機構（未圖示）。光罩21具備框架狀的基板 6。在基板6安裝有保持光罩21，22，且具備使光罩21， 22在其面内移動於口，Υ，Θ方向的移動機構5之框架3。 在框架3的至少一方之朝向帶狀基板1的面的外周部設有 Φ 環狀的密封構件4。環狀的密封構件4是在曝光時使光罩 單元Ul，U2互相接近時，可形成由包含帶狀基板1的框 架3，密封構件4及光罩21，22所構成的密閉空間。藉 由減壓該密封空間内，可使帶狀基板1與光罩2 1，22互 相密著。 在光罩單元Ul，U2的至少一方具備CCD攝影機7， 其係使用於光罩2 1與22彼此之間對位時’或者各光罩與 帶狀基板對位時。攝影機7可藉由安裝於框架3的移動機 構8，9在與光罩的面平行的面内移動於□，Y方向。 200540563 (7) 以下，一邊參照圖2，一邊說明有關使用本發明的曝 光裝置之曝光方法。圖2是表示在曝光部中垂直路徑内形 成垂直狀態的帶狀基板1與光罩2 1，22的相對位置的槪 略圖，由圖1的箭號A的方向所見的圖。帶狀基板1是 在二點虛線所示的特定長度的區域2 5進行曝光。因此， 傳送驅動滾筒19會以包含該區域25的長度之長度P作爲 間距來間歇性傳送帶狀基板1。在帶狀基板1被傳送的期 # 間，如圖1所示，光罩單元U1，U2會處於後退位置，在 光罩2 1，22與帶狀基板1之間形成有特定的間隙。 一旦帶狀基板1的傳送停止於特定的位置，則光罩單 元U 1，U2的至少一方會使對他方接近。其結果，光罩 21，22會對呈對向的帶狀基板的區域25接近，而進入對 位的態勢。在光罩2 1，22的各個對向的位置設有對位用 標記23，23。對位用標記23，23是位於離開帶狀基板】 的位置。藉由CCD攝影機7來讀取對位用標記23，23的 ® 位置，根據讀取後的資料來使光罩21，22中的至少一方 移動於X，Y，Θ方向，進行光罩21與22的對位。 帶狀基板1有：在其上具有對位用標記24者及未具 有對位用標記24者。當帶狀基板1具有對位用標記24 時，只要藉由CCD攝影機7來同時讀取光罩21，22之對 向於對位用標記24的位置所設置的對位標記（未圖示）與 帶狀基板1的對位標記24之位置，而根據讀取後的資料 來進行光罩2 1，22與帶狀基板1的對位即可。 當帶狀基板1在其上未具有對位用標記24時，只要 -10- 200540563 (8) 藉由CCD攝影機7來讀取帶狀基板1的側緣及設置於對 向的位置之光罩2 1，2 2的對位用標記（未圖示）之位置， 而根據雙方的相對關係來進行帶狀基板1與光罩2 1，22 的對位即可。此情況，帶狀基板1的側緣爲取代對位用標 記24 〇 若光罩21，22相互間及光罩21，22與帶狀基板1之 間的對位終了，則會使光罩單元U 1，U2更接近，形成由 # 包含帶狀基板1的框架3，密封構件4及光罩21，22所 構成的密閉空間。若藉由減壓裝置（未圖示）來減壓此密閉 空間，則可使光罩2 1，22與帶狀基板1互相在減壓下密 著。 其次，使來自光源的光1 0經由反射鏡1 1，3 1，通過 光罩21，22來照射於帶狀基板1的區域25上。藉此，描 繪於光罩21，22的圖案會被複製於帶狀基板1的區域25 上。 • 又，光1 〇亦可對帶狀基板1的兩面同時照射，或者 照射於一面。 若一次的曝光終了，則會解除密閉空間的減壓狀態， 使光罩單元Ul，112遠離，如圖1所示，在光罩21，22與 帶狀基板1之間形成特定的間隙。之後，只以長度P來間 歇性傳送帶狀基板1，而重複進行曝光的動作。 此外，在圖示的實施形態中，帶狀基板1雖是在垂直 路徑中由下往上移動，但亦可由上往下移動。 -11 - 200540563 (9) 【圖式簡單說明】 圖1是表示本發明的曝光裝置之一實施形態的槪略縱 剖面圖。 圖2是表示在曝光部中形成垂直狀態的帶狀基板與光 罩的相對位置的槪略圖，由圖1的箭號A的方向所見的 圖。 【主要元件符號說明】 1 帘 狀 基 板 3 光 罩 用 框架 4 密 封 構 件 5 移 動 機 構 6 基 板 7 CCD 攝 影機 8 移 動 機 構 9 移 動 機 構 1 0 平 行 光 11 反 射 鏡 1 2 圓 筒 13 圓 筒 14 發 出 用 捲軸 15 捲 取 用 捲軸 16 引 導 滾 筒 17 引 導 滾 筒 •12- 200540563 (10) 18 基底 19 傳送驅動滾筒 20 作業台 2 1 光罩 22 光罩 23 光罩的對位用標記 24 帶狀基板的對位用標記 25 被曝光的區域 26 框體 27 引導滾筒 28 引導滾筒 29 引導滾筒 30 引導滾筒 3 1 反射鏡 U1 光罩單元 U2 光罩單元 Ρ 間距 -13-200540563 (1) IX. Description of the invention [Technical field to which the invention belongs] The present invention relates to an exposure device that irradiates light onto a substrate through a photomask, thereby making a pattern drawn on the photomask to the substrate, and particularly relates to an exposure device An exposure apparatus for exposing a flexible belt-shaped substrate to which a photosensitive material is attached. [Prior art] # For an exposure device for exposure, for example, there is a reel for delivery which is wound on a flexible strip substrate and a take-up reel for winding the strip substrate into a cylindrical shape. In between, while the strip substrate is intermittently conveyed along its length direction, the strip substrate is exposed to each specific length area. An exposed surface to which a photosensitive material is attached is formed on at least one surface of the belt-shaped substrate. The light is irradiated to the exposure surface through the photomask, whereby a pattern such as a circuit drawn on the photomask is copied on the substrate. In this conventional exposure apparatus, the strip substrate is exposed in a horizontal state. [Summary of the Invention] (Problems to be Solved by the Invention) In the above-mentioned conventional exposure apparatus, the strip substrate in a horizontal state tends to bend downward due to its own weight. This curvature can cause major problems during exposure. When the strip substrate is intermittently transported in the longitudinal direction, and when the photomask is aligned with the strip substrate, or when the photomasks are aligned with each other, the strip substrate and the photomask do not contact each other. There is a gap between them. During the alignment, since a c CD camera must be used to read 200540563 (2) the alignment marks formed by the strip substrate and the photomask, or the photomask, the gap must form the focus of the CCD camera. Narrow distance within depth. Therefore, in the exposure section, a large tension in the length direction is applied to the strip substrate to reduce the bending of the strip substrate caused by its own weight, but the strip substrate is stretched in the length direction by the large tension in the length direction. Compared with a state without tension, a dimensional change occurs. If the alignment is performed in this state, it will be difficult to align the strip substrate with the photomask with high accuracy, and it will provide uniform quality products. Another problem with conventional exposure devices is the adhesion of dust. Dust adheres easily to a horizontal strip substrate. Exposure to dust on the exposed surface of the strip substrate can easily cause poor exposure. In addition, on a photomask or a reflector of a light source arranged below the strip substrate, it is easy to trap dust falling from the strip substrate. This accumulated dust is the biggest cause of most poorly exposed products. ® (Means to Solve the Problems) In order to solve the above-mentioned conventional problems, the exposure device of the present invention is for exposing the strip substrate to a specific one while intermittently conveying the strip substrate along its length direction. The length area is characterized by: a reel for sending out, a flexible strip substrate having at least one side having an exposed surface to which a photosensitive material is adhered is rolled into a cylindrical shape; a reel for winding is used for winding the above-mentioned The strip-shaped substrate is wound into a cylindrical shape and is set at a specific distance away from the above-mentioned sending-out reel; a driving device is used to move from the above-mentioned sending-out reel to the above-mentioned winding-out -5- 200540563 (3) reel Intermittently conveying the above-mentioned strip-shaped substrate; an exposure unit, which is provided between the sending-out reel and the winding-up reel, and has at least one photomask accessible or in contact with the exposure surface; and a light source, which It is used to copy the pattern drawn on the photomask to the exposed surface of the strip substrate, and the strip-shaped base is formed between the delivery reel and the reel. The board will have a vertical path where the plate is in a vertical state, and the exposure portion will be provided in the vertical path. The vertical path may be provided to extend vertically along the moving direction of the strip substrate. Further, in the exposure section, a pair of the photomasks may be arranged to face the exposure surfaces facing both sides of the strip substrate, respectively, and the pair of photomasks may have alignment marks at positions facing each other. And more equipped with: • at least 1 CCD camera for reading the registration mark; and a moving mechanism for reading the light based on the reading data of the registration mark of the CCD camera At least one of the covers is moved in the X, Y, and Θ directions within its surface to perform alignment. In addition, in order to perform alignment between the strip substrate and the photomask, alignment marks are formed on the strip substrate that can be aligned with the alignment marks provided on the photomask. The alignment mark formed on the strip substrate may be replaced by the side edge of the strip substrate described above -6-200540563 (4). [Effects of the Invention] According to the exposure apparatus of the present invention, since the strip substrate is exposed in a vertical path in a vertical state, the strip substrate does not bend due to its own weight. Therefore, it is not necessary to apply a large tension to the strip substrate in order to reduce the bending, so that there is no problem of # dimensional change caused by the stretch of the strip substrate. In addition, since the strip-shaped substrate formed in the vertical state in the vertical path can maintain sufficient flatness with a slight tension, it can obtain good parallelism to the photomask. As a result, the alignment accuracy between the two can be improved. In addition, compared with the horizontal strip substrate, the strip substrate is difficult to adhere to dust. In addition, since the mirrors of the photomask and the light source can be arranged in a vertical state, it is possible to greatly reduce the exposure _ defective caused by dust attached to or accumulated on the strip substrate, the photomask and the mirror of the light source. In addition, since the light from the light source is emitted not in the vertical direction but in the horizontal direction, it is easy to ensure a long optical path in the facility. If a longer optical path is used, the light quality of the parallel light will be improved, and the resolution will be improved. Therefore, the pattern drawn on the photomask can be faithfully reproduced on the strip substrate. As a result, according to the present invention, it is possible to achieve higher quality and productivity than the conventional exposure of the strip substrate. 200540563 (5) [Embodiment] Fig. 1 is a schematic vertical sectional view showing an embodiment of an exposure apparatus according to the present invention. The exposure device includes a base 18 and a frame 26 provided on the base 18. At the right end of the base 18, a reel 14 for emission is provided. On the output reel 14, the flexible strip-shaped substrate 1 is wound into a cylindrical shape 12. On the other hand, a winding reel 15 is provided at a left end portion of the base 18. Between the delivery reel 14 and the take-up reel 15, a transfer drive # drum 19 is provided. The conveyance driving roller 19 is a strip-shaped substrate 1 which is intermittently drawn out on the delivery reel 14 by a predetermined length. The strip-shaped substrate 1 taken out from the delivery reel 14 is brought into a vertical path via the guide rollers 16, 17, 27, and 28 to form a vertical state. An area where the strip substrate 1 is formed in a vertical state becomes an exposure portion. The belt-shaped substrate 1 that has passed through the exposure section in a vertical state is taken up in a cylinder 13 shape by a guide roller 29, 30 and a conveyance drive roller 19 on a take-up reel 15. The intermittent conveyance along the length direction of such a belt-like substrate 1 is performed by the drive driving roller 19 of the conveying device. In the course of the path of the strip-shaped substrate 1, a work table 20 used for the bonding operation of the strip-shaped substrate 1 or the like, or an adhesion roller for removing dust on the surface of the strip-shaped substrate 1 may be provided. Further, it is preferable that the meandering prevention device for the strip-shaped substrate 1 is provided on at least one of the reel 14 for delivery, the reel 15 for winding, and the guide roller. At least one surface of the strip-shaped substrate 1 is an exposed surface on which a photosensitive material is attached. In the exposure section, a mask unit U1 or U2 is arranged at a position corresponding to the exposure surface. In the illustrated embodiment, the exposed surfaces are formed on both sides. 200540563 (6) Therefore, in the exposure section, the mask unit U1 and the mask unit U2 are arranged on both sides of the strip-shaped substrate 1 in a vertical state. The photomask unit U1 and the photomask unit U2 are respectively provided with photomasks 21 and 22 so as to be able to face the exposure surface of the strip substrate 1. In the photomasks 21 and 22, for example, a pattern such as a circuit is drawn, and on the side opposite to the strip substrate 1 of the photomasks 2 and 22, light from a light source (not shown) is introduced into the strip. Reflectors 1 1, 3 1 of the substrate 1. The light 10 from the light source is irradiated to the exposure surface of the strip-shaped substrate 1 through the mirrors 1, 1, 3, and 9 through the masks 2, 1, 22, whereby the pattern is copied on the strip-shaped substrate 1. The light 10 is preferably parallel light, and the exposure portion including the mirror 11 is preferably covered by a frame 26. At least one of the photomask units U1 and U2 is provided with a mechanism (not shown) for making it approach to and away from the other. The photomask 21 includes a frame-shaped substrate 6. A frame 3 is mounted on the substrate 6 to hold the photomasks 21 and 22 and includes a moving mechanism 5 for moving the photomasks 21 and 22 in the mouth, Υ, and Θ directions. An outer circumferential portion of at least one side of the frame 3 facing the strip-shaped substrate 1 is provided with a Φ annular seal member 4. The ring-shaped sealing member 4 is a closed space composed of the frame 3 including the strip-shaped substrate 1, the sealing member 4 and the masks 21 and 22 when the mask units Ul and U2 are brought close to each other during exposure. By reducing the pressure in the sealed space, the strip substrate 1 and the photomasks 2 and 22 can be brought into close contact with each other. At least one of the photomask units Ul and U2 is provided with a CCD camera 7 which is used when the photomasks 21 and 22 are aligned with each other 'or when each photomask is aligned with the strip substrate. The camera 7 can be moved in the □, Y direction in a plane parallel to the surface of the mask by the moving mechanisms 8, 9 mounted on the frame 3. 200540563 (7) Hereinafter, an exposure method using the exposure apparatus of the present invention will be described with reference to FIG. 2. Fig. 2 is a schematic view showing the relative positions of the strip-shaped substrate 1 and the masks 2 and 22 formed in a vertical state in the vertical path in the exposure section, as seen from the direction of arrow A in Fig. 1. The strip-shaped substrate 1 is exposed in a region 25 having a specific length shown by a two-dot chain line. Therefore, the transfer driving roller 19 intermittently transfers the belt-shaped substrate 1 with the length P including the length of the region 25 as a pitch. During the period # during which the strip substrate 1 is being conveyed, as shown in FIG. 1, the photomask units U1 and U2 are in a retracted position, and a specific gap is formed between the photomasks 2, 22 and the strip substrate 1. Once the transfer of the strip substrate 1 is stopped at a specific position, at least one of the mask units U1 and U2 will be approached to the other side. As a result, the photomasks 21 and 22 approach the region 25 of the opposing strip-shaped substrate and enter a state of alignment. Positioning marks 23 and 23 are provided at the positions where the masks 2 and 22 face each other. The alignment marks 23 and 23 are located away from the strip substrate. The position of the registration marks 23 and 23 is read by the CCD camera 7, and at least one of the photomasks 21 and 22 is moved in the X, Y, and θ directions based on the read data. Counterpoint of 22. The strip substrate 1 includes those having a registration mark 24 thereon and those without a registration mark 24. When the strip substrate 1 has the alignment mark 24, as long as the alignment marks (not shown) provided at the positions of the photomasks 21 and 22 facing the alignment mark 24 are read by the CCD camera 7 at the same time. The position of the alignment mark 24 with the strip-shaped substrate 1 can be aligned with the strip-shaped substrate 1 based on the read data. When the strip-shaped substrate 1 does not have the alignment mark 24 thereon, as long as -10- 200540563 (8) the side edge of the strip-shaped substrate 1 and the photomask provided at the opposite position are read by the CCD camera 7 The position of the alignment mark (not shown) for 2 1, 2 2 can be aligned with the strip substrate 1 and the photomask 2 1, 22 according to the relative relationship between the two. In this case, the side edge of the strip substrate 1 is used instead of the alignment mark 24. If the alignment between the photomasks 21 and 22 and between the photomasks 21 and 22 and the strip substrate 1 is terminated, the photomask unit will be used. U 1 and U 2 are closer to each other to form a closed space composed of the frame 3 including the strip-shaped substrate 1, the sealing member 4, and the photomasks 21 and 22. If the closed space is decompressed by a decompression device (not shown), the photomasks 2 and 22 and the strip substrate 1 can be brought into close contact with each other under reduced pressure. Next, the light 10 from the light source is irradiated onto the region 25 of the strip-shaped substrate 1 through the masks 21 and 22 through the mirrors 11 and 31. Thereby, the patterns drawn on the photomasks 21 and 22 are copied on the region 25 of the strip substrate 1. • Light 10 may be irradiated to both sides of the strip substrate 1 at the same time, or may be irradiated to one side. When a single exposure is completed, the decompressed state of the closed space is released, and the mask units Ul, 112 are separated from each other. As shown in FIG. 1, a specific gap is formed between the masks 21 and 22 and the strip substrate 1. Thereafter, the belt-shaped substrate 1 is intermittently conveyed only by the length P, and the exposure operation is repeated. In the illustrated embodiment, the strip-shaped substrate 1 is moved from bottom to top in a vertical path, but may be moved from top to bottom. -11-200540563 (9) [Brief description of the drawings] Fig. 1 is a schematic vertical sectional view showing an embodiment of an exposure apparatus of the present invention. Fig. 2 is a schematic view showing a relative position of a strip substrate and a photomask formed in a vertical state in an exposure section, as seen from the direction of arrow A in Fig. 1. [Description of main component symbols] 1 Curtain substrate 3 Photomask frame 4 Sealing member 5 Moving mechanism 6 Substrate 7 CCD camera 8 Moving mechanism 9 Moving mechanism 1 0 Parallel light 11 Reflector 1 2 Cylinder 13 Cylinder 14 Reel for emission 15 Reeling shaft 16 Guide roller 17 Guide roller • 12- 200540563 (10) 18 Base 19 Conveyor drive roller 20 Work table 2 1 Photomask 22 Photomask 23 Positioning mark for photomask 24 Positioning for strip substrate Mark 25 exposed area 26 frame 27 guide roller 28 guide roller 29 guide roller 30 guide roller 3 1 reflector U1 mask unit U2 mask unit P pitch -13-