TW202046019A - Direct-drawing light exposure device exactly perform vacuum suction even if the substrate is bent and prevent exposure precision from being reduced - Google Patents
Direct-drawing light exposure device exactly perform vacuum suction even if the substrate is bent and prevent exposure precision from being reduced Download PDFInfo
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- TW202046019A TW202046019A TW109111921A TW109111921A TW202046019A TW 202046019 A TW202046019 A TW 202046019A TW 109111921 A TW109111921 A TW 109111921A TW 109111921 A TW109111921 A TW 109111921A TW 202046019 A TW202046019 A TW 202046019A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
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Abstract
Description
本申請的發明，係有關於對基板不通過遮罩照射預定圖案的光進行曝光的直描式曝光裝置。以下，將曝光中的光的預定圖案稱為曝光圖案。The invention of the present application relates to a direct-drawing type exposure apparatus that exposes a substrate without irradiating a predetermined pattern with light through a mask. Hereinafter, the predetermined pattern of light during exposure is referred to as an exposure pattern.
將在表面形成感光層的對象物進行曝光使感光層感光的曝光技術，作為光微影的主要技術在各種微細電路及微細構造的形成等廣泛地被利用。代表的曝光技術，為對與曝光圖案形成同樣的圖案的遮罩照射光，將遮罩的像投影至對象物的表面，讓曝光圖案的光照射至對象物的技術。The exposure technology of exposing the object on which the photosensitive layer is formed on the surface to make the photosensitive layer sensitive is widely used as the main technology of photolithography in the formation of various fine circuits and fine structures. The representative exposure technique is a technique in which light is irradiated to a mask that forms the same pattern as the exposure pattern, the masked image is projected on the surface of the object, and the light of the exposure pattern is irradiated to the object.
與使用這種遮罩的曝光技術不同，已知有使用空間光調變器對對象物的表面直接形成像進行曝光的技術。以下，將該技術在本說明書稱呼為直描式曝光。 在直描式曝光中，典型的空間光調變器為DMD (Digital Mirror Device)。DMD具有微小的方形的反射鏡配設成直角格子狀的構造。各反射鏡獨立控制相對於光軸的角度，能取將來自光源的光反射使其到達對象物的姿勢、及使來自光源的光不到達對象物的姿勢。DMD具備控制各反射鏡的控制器，控制器依照曝光圖案控制各反射鏡，在對象物的表面照射曝光圖案的光。Unlike the exposure technology using such a mask, there is known a technology that uses a spatial light modulator to directly form an image on the surface of an object and expose it. Hereinafter, this technique is referred to as direct exposure exposure in this specification. In direct-travel exposure, the typical spatial light modulator is DMD (Digital Mirror Device). DMD has a structure in which tiny square mirrors are arranged in a right-angled grid. Each mirror independently controls the angle with respect to the optical axis, and can take a posture to reflect the light from the light source to reach the object, and a posture to prevent the light from the light source from reaching the object. The DMD has a controller that controls each mirror. The controller controls each mirror in accordance with the exposure pattern, and irradiates the surface of the object with light of the exposure pattern.
直描式曝光的情形，因為未使用遮罩，在多品種少量生產中發揮優位性。使用遮罩的曝光的情形，有在各品種準備遮罩的必要，包含遮罩的保管等成本需要極大成本。又，為了不同品種的生產在交換遮罩時，有停止裝置的運轉的必要，到再度開始為止需要勞力和時間。因此，成為生產性降低的要因。另一方面，直描式曝光的情形，因為僅對各品種先準備各反射鏡的控制程式即可，不同品種的製造時僅需變更控制程式就能夠對應，成本上、生產性上的優位性顯著。又，也能夠因應必要對各基板微調整曝光圖案，在製程的柔軟性中也佳。In the case of direct-travel exposure, because no mask is used, it is advantageous in low-volume production of multiple varieties. In the case of exposure using a mask, it is necessary to prepare a mask for each type, and the cost including the storage of the mask is extremely costly. In addition, it is necessary to stop the operation of the device when exchanging masks for different types of production, and labor and time are required to restart. Therefore, it becomes a major cause of reduced productivity. On the other hand, in the case of direct-travel exposure, it is only necessary to prepare the control program of each mirror for each product, and it can be handled by only changing the control program when manufacturing different products, which is advantageous in terms of cost and productivity. Significant. In addition, the exposure pattern can be finely adjusted for each substrate as necessary, which is also good in flexibility of the manufacturing process.
在這種直描式曝光裝置中，為了相對於內藏空間光調變器的曝光單元的光軸將基板設為垂直姿勢，使用載置基板的載台。曝光單元為在設定的區域(以下，稱為曝光區域。)照射曝光圖案的光，載置基板的載台，藉由搬送系統通過曝光區域移動，通過曝光區域時將基板曝光。 [先前技術文獻] [專利文獻]In such a direct-drawing exposure apparatus, a stage on which the substrate is placed is used in order to set the substrate in a vertical posture with respect to the optical axis of the exposure unit in which the spatial light modulator is built-in. The exposure unit irradiates the light of the exposure pattern in a set area (hereinafter referred to as exposure area.), a stage on which the substrate is placed, moves through the exposure area by a conveyor system, and exposes the substrate when passing the exposure area. [Prior Technical Literature] [Patent Literature]
[專利文獻1] 特開2008-191303號公報[Patent Document 1] JP 2008-191303 A
[發明所欲解決的問題][The problem to be solved by the invention]
上述直描式曝光裝置中，為了提高曝光精度，採用將基板真空吸附於載台的構造。在載台形成多數真空吸附孔，各真空吸附孔連接至真空泵。使真空泵動作而讓基板真空吸附於載台。In the above-mentioned direct-drawing exposure apparatus, in order to improve the exposure accuracy, a structure in which the substrate is vacuum sucked to the stage is adopted. A plurality of vacuum adsorption holes are formed on the carrier, and each vacuum adsorption hole is connected to a vacuum pump. The vacuum pump is operated to vacuum the substrate to the stage.
基板的真空吸附有二個目的。一個是為了防止基板的位置偏差。多數的情形，基板以被對準(對位)的狀態載置於載台。對準之後基板在載台上若有偏差，無法在正確的位置形成曝光圖案，曝光精度會降低。因此，將基板真空吸附於載台。真空吸附的另一個目的是為了基板的變形矯正。在基板有產生如彎曲這種的變形的情形。若就這樣曝光，形成的曝光圖案也會變形，有成為製品不良的原因的情形。因此，真空吸附於載台以矯正變形，以該狀態進行曝光。The vacuum adsorption of the substrate serves two purposes. One is to prevent positional deviation of the substrate. In most cases, the substrate is placed on the stage in an aligned state. After alignment, if the substrate has a deviation on the stage, the exposure pattern cannot be formed in the correct position, and the exposure accuracy will be reduced. Therefore, the substrate is vacuum sucked to the stage. Another purpose of vacuum adsorption is to correct the deformation of the substrate. The substrate may be deformed such as bending. If it is exposed as it is, the formed exposure pattern may also be deformed, which may cause product defects. Therefore, the vacuum is sucked on the stage to correct the deformation, and exposure is performed in this state.
進行這種真空吸附的直描式曝光裝置中，在與適合多品種少量生產的這種優位性間的關聯產生特有的課題。以下，說明該點。 多品種少量生產代表作為曝光的對象物的基板有各種尺寸。關於各種尺寸的基板進行良好的真空吸附在技術上是困難的。In the direct-drawing exposure apparatus that performs such vacuum adsorption, a unique problem arises in the connection with the superiority suitable for low-volume production of a variety of products. Hereinafter, this point will be explained. Multi-variety and low-volume production means that there are various sizes of substrates to be exposed. It is technically difficult to perform good vacuum adsorption on substrates of various sizes.
對各種尺寸的基板進行真空吸附同時進行曝光處理時，通常，採用一致於最小尺寸的基板將真空吸附孔設於載台的構造。一致於大尺寸的基板設置真空吸附孔後，在處理小尺寸的基板時，會有不被基板塞住的真空吸附孔。若真空吸附孔未被塞住，在排氣系統無法得到充分的負壓，在被基板塞住的真空吸附孔中也無法得到充分的吸附力。因此，一致於最小尺寸的基板設置真空吸附孔。When vacuum suction is performed on substrates of various sizes at the same time for exposure processing, generally, a structure in which the vacuum suction holes are provided on the stage is adopted for the substrate with the smallest size. After the vacuum suction holes are set in line with the large-size substrates, there will be vacuum suction holes that are not blocked by the substrate when processing small-sized substrates. If the vacuum suction hole is not plugged, sufficient negative pressure cannot be obtained in the exhaust system, and sufficient suction force cannot be obtained in the vacuum suction hole blocked by the substrate. Therefore, a vacuum suction hole is provided in accordance with the smallest size substrate.
但是，若一致於最小尺寸的基板設置真空吸附孔，在處理比其還大的尺寸的基板時，在基板的周邊部會無法進行真空吸附。此時成為問題的是在基板的周邊部有彎曲的情形。因為彎曲而基板在周邊部從載台離間，其結果，從該部分可能會有真空洩漏。若這樣，同樣會造成真空吸附的不充分。又，從提高實裝密度等的理由來看，到基板的周邊部為止作為製品利用時，在周邊部雖然也形成曝光圖案，但若未解消彎曲則容易招致製品缺陷。再來，一致於最小尺寸的基板設置真空吸附孔，在處理大尺寸的基板時，相對於基板的尺寸真空吸附的面積會較小，作為全體的吸附力也會相對降低。However, if a vacuum suction hole is provided for a substrate with a minimum size, when a substrate of a larger size is processed, vacuum suction cannot be performed on the periphery of the substrate. What becomes a problem at this time is that the periphery of the substrate is bent. The substrate is separated from the stage at the periphery due to the bending, and as a result, there may be a vacuum leak from this part. If so, it will also cause insufficient vacuum adsorption. In addition, for reasons such as increasing the mounting density, when used as a product up to the peripheral portion of the substrate, although an exposure pattern is also formed in the peripheral portion, product defects are likely to occur if the warp is not eliminated. Furthermore, if a vacuum suction hole is provided for a substrate of the smallest size, when processing a large-sized substrate, the vacuum suction area will be smaller relative to the size of the substrate, and the overall suction force will be relatively reduced.
作為解決上述課題的構造，考慮到將載台內的真空排氣路的系統分成複數系統，因應基板的尺寸將各系統個別地控制真空的開啟關閉的構造。但是，在該構造中，載台內的構造會複雜化，又真空排氣的構造也會煩雜化。又，若是2~3種類程度的基板尺寸的差異則能夠對應，但關於其以上的差異會過於複雜化、煩雜化，裝置成本也上升，故無法說是實用的裝置。 該申請的發明，係為了解決與基板的真空吸附關聯的直描式曝光裝置的上述課題而完成者，目的為提供實用的直描式曝光裝置，能夠將各種尺寸的基板充分地真空吸附於載台同時進行曝光。 [解決問題的手段]As a structure to solve the above-mentioned problems, it is considered that the system of the vacuum exhaust path in the stage is divided into a plurality of systems, and each system is individually controlled to open and close the vacuum according to the size of the substrate. However, in this structure, the structure in the stage is complicated, and the vacuum exhaust structure is also complicated. In addition, it is possible to cope with differences in substrate sizes of about 2 to 3 types, but the above differences will be too complicated and complicated, and the device cost will also increase, so it cannot be said to be a practical device. The invention of this application was completed in order to solve the above-mentioned problems of the direct-drawing exposure apparatus related to the vacuum adsorption of substrates. The purpose is to provide a practical direct-drawing exposure apparatus that can sufficiently vacuum-suction substrates of various sizes on the carrier. The stage is exposed at the same time. [Means to solve the problem]
為了解決上述課題，本申請的發明為一種直描式曝光裝置，係以無遮罩的方式對基板照射預定圖案的光進行曝光，具備：將預定圖案的光照射至曝光區域的曝光頭；形成多數將載置的基板進行真空吸附的真空吸附孔的載台；使載置基板的載台通過曝光區域移動的搬送系統；將吸附孔進行真空吸引而將基板真空吸附至載台的排氣系統；將多數吸附孔之中不被基板塞住的吸附孔塞住的吸附孔封鎖機構。吸附孔封鎖機構，包含捲成滾輪狀的長條片材、及進行片材的送出及捲繞的片材機構，片材機構為使片材成為不阻礙基板的真空吸附的狀態的機構；片材及片材機構，以藉由搬送系統與載台一體移動的方式對載台安裝。 又，為了解決上述課題，能夠於片材，以不阻礙基板的真空吸附的方式，形成與基板塞住的真空吸附孔重疊的吸附孔或對應基板的大小的開口。 又，為了解決上述課題，直描式曝光裝置能夠具有：於片材，形成由複數吸附孔形成且全體的配置區域的尺寸不同的複數孔群組或對應基板的不同尺寸的不同尺寸的複數開口；複數孔群組或複數開口沿著片材的長度方向形成；設置控制片材機構的控制部，當複數孔群組之中的一個或複數開口的一個一致於基板的尺寸被選擇時，使得該被選擇的孔群組或被選擇的開口，相對於載台位於預定位置的構造。 又，為了解決上述課題，直描式曝光裝置能夠具有：於片材，形成由複數吸附孔形成且全體的配置區域的尺寸不同的複數孔群組；複數孔群組沿著片材的長度方向形成；設置控制片材機構的控制部，當複數孔群組之中的一個一致於基板的尺寸被選擇時，使得該被選擇的孔群組的各吸附孔位於與前述載台的各真空吸附孔重疊的位置的構造。 又，為了解決上述課題，直描式曝光裝置能夠具有：於片材，形成對應基板的不同尺寸的不同尺寸的複數開口；複數開口沿著片材的長度方向形成；各開口為比對應的基板的尺寸還大的開口；於載台，設定設定載置位置作為載置基板的位置；設置控制片材機構的控制部，當對應基板的尺寸選擇一個開口時，使得載置於設定載置位置的基板位於該被選擇的開口內的構造。 又，為了解決上述課題，直描式曝光裝置能夠具有：於片材，形成對應基板的不同尺寸的不同尺寸的複數開口；複數開口沿著片材的長度方向形成；各開口為比對應的基板的尺寸還小的開口；於載台，設定設定載置位置作為載置基板的位置；設置控制片材機構的控制部，當對應基板的尺寸選擇一個開口時，使得該被選擇的開口的周緣乘載在載置於設定載置位置的基板的周邊部的構造。 又，為了解決上述課題，直描式曝光裝置能夠具有：除了比對應的基板的尺寸還小的開口以外，還在前述片材設置裝脫用開口；裝脫用開口為比最大的尺寸的基板還大的開口；控制部，在進行向載台的基板的載置及從載台將基板移走時，使裝脫用開口位於臨近載台的設定載置位置的位置的構造。 [發明的效果]In order to solve the above-mentioned problems, the invention of the present application is a direct-drawing exposure device that exposes a substrate with a predetermined pattern of light in a maskless manner, and includes: an exposure head that irradiates the predetermined pattern of light to the exposure area; forming Many stages of vacuum suction holes for vacuum suction of substrates; a conveying system that moves the stage on which substrates are placed through the exposure area; an exhaust system that vacuum sucks the suction holes to vacuum the substrate to the stage ; A suction hole blocking mechanism that blocks most of the suction holes that are not blocked by the substrate. The suction hole blocking mechanism includes a long sheet rolled into a roller shape, and a sheet mechanism for feeding and winding the sheet. The sheet mechanism is a mechanism that makes the sheet not hinder the vacuum suction of the substrate; The material and sheet mechanism are installed on the carrier in a way that the conveying system and the carrier move integrally. In addition, in order to solve the above-mentioned problems, it is possible to form suction holes overlapping with the vacuum suction holes plugged by the substrate or openings corresponding to the size of the substrate in the sheet so as not to hinder the vacuum suction of the substrate. In addition, in order to solve the above-mentioned problems, the direct-travel exposure apparatus can have a plurality of hole groups formed by a plurality of suction holes and the size of the overall arrangement area is formed on the sheet, or a plurality of openings of different sizes corresponding to different sizes of the substrate A plurality of hole groups or a plurality of openings are formed along the length direction of the sheet; a control unit that controls the sheet mechanism is provided, when one of the plurality of hole groups or one of the plurality of openings is selected to be consistent with the size of the substrate, so that The selected hole group or the selected opening is located at a predetermined position with respect to the carrier. In addition, in order to solve the above-mentioned problems, the direct-travel exposure apparatus can have: a sheet is formed with a plurality of hole groups formed of a plurality of suction holes and the overall arrangement area has different sizes; the plurality of hole groups are along the length direction of the sheet Formation; a control unit that controls the sheet mechanism is provided. When one of the plurality of hole groups is selected to match the size of the substrate, the suction holes of the selected hole group are located in the vacuum suction of the aforementioned stage The structure where the holes overlap. In addition, in order to solve the above-mentioned problems, the direct-travel exposure apparatus can have: a sheet is formed with a plurality of openings of different sizes corresponding to different sizes of the substrate; the plurality of openings are formed along the length direction of the sheet; and each opening is a corresponding substrate The size of the opening is still large; on the stage, set the set placement position as the position where the substrate is placed; set a control section that controls the sheet mechanism, and when an opening is selected corresponding to the size of the substrate, it is placed at the set placement position The substrate is located in the selected opening structure. In addition, in order to solve the above-mentioned problems, the direct-travel exposure apparatus can have: a sheet is formed with a plurality of openings of different sizes corresponding to different sizes of the substrate; the plurality of openings are formed along the length direction of the sheet; and each opening is a corresponding substrate The size of the opening is still small; on the stage, set the set placement position as the position of the substrate; set the control section to control the sheet mechanism, when an opening is selected corresponding to the size of the substrate, the periphery of the selected opening The structure is mounted on the periphery of the substrate placed in the set placement position. In addition, in order to solve the above-mentioned problems, the direct-travel exposure apparatus can have: in addition to openings smaller than the size of the corresponding substrate, an opening for attaching and detaching is also provided on the aforementioned sheet; A still large opening; the control unit is configured to position the attachment/detachment opening at a position close to the set placement position of the stage when the substrate is placed on the stage and when the substrate is removed from the stage. [Effects of the invention]
如同以下說明，根據本申請的直描式曝光裝置，因為處理小的基板時能夠將不被基板塞住的真空吸附孔以吸附孔封鎖機構塞住，進行充分的真空吸附。因此，提供了對應多品種少量生產，同時進行精度高的曝光處理的實用的直描式曝光裝置。又，因為設置片材機構，片材的配置能簡便、迅速地進行，生產性不會降低。再來，因為片材及片材機構相對於載台安裝，與載台的移動有關聯的機構不會變得複雜且大規模。 又，比對應的基板的尺寸還小的開口設於片材，在控制片材機構，使得該被選擇的開口的周緣乘載在載置於設定載置位置的該基板的周邊部的構造中，除了上述效果以外，因為片材壓住基板的周邊部，即便基板具有彎曲也確實地被真空吸附，又防止了曝光精度的降低。As explained below, according to the direct-drawing exposure apparatus of the present application, when processing small substrates, the vacuum suction holes that are not blocked by the substrate can be plugged with the suction hole blocking mechanism to perform sufficient vacuum suction. Therefore, it is possible to provide a practical direct-tracing exposure device that can handle high-precision exposure processing in response to low-volume production of various types. In addition, because the sheet material mechanism is provided, the sheet material can be arranged easily and quickly, and the productivity is not reduced. Furthermore, because the sheet and the sheet mechanism are mounted on the stage, the mechanism related to the movement of the stage does not become complicated and large-scale. In addition, an opening smaller than the size of the corresponding substrate is provided in the sheet, and the sheet mechanism is controlled so that the periphery of the selected opening is placed on the periphery of the substrate at the set placement position. In addition to the above effects, since the sheet is pressed against the peripheral portion of the substrate, even if the substrate has a curve, it is surely sucked by the vacuum, and the reduction in exposure accuracy is prevented.
接著，說明關於用來實施本申請的發明的形態(實施形態)。
圖1為第一實施形態的直描式曝光裝置的正面概略圖。該裝置為以無遮罩的方式對基板照射曝光圖案的光進行曝光的裝置。如圖1所示，直描式曝光裝置具備：將曝光圖案的光照射至曝光區域的曝光頭1、載置基板S的載台2、使載置基板S的載台2通過曝光區域移動的搬送系統3。Next, a description will be given of a mode (embodiment) for implementing the invention of this application.
Fig. 1 is a schematic front view of the direct-drawing exposure apparatus of the first embodiment. This device is a device that irradiates a substrate with light of an exposure pattern in a maskless manner to perform exposure. As shown in FIG. 1, the direct-travel exposure apparatus includes: an
圖2為搭載於圖1的裝置的曝光頭1的概略圖。曝光頭1作為全體為圓筒形，以垂直立起的狀態配置，向下方出射光。圖2為表示曝光頭1的內部構造的概略圖。如圖2所示，曝光頭1具備：光源11、將來自光源11的光進行空間調變的空間光調變器12、將藉由空間光調變器12調變的光所致的像投影的光學系統(以下，投影光學系統)13等。FIG. 2 is a schematic view of the
光源11使用因應基板S中的感光層的感光波長輸出最適合的波長的光者。光阻薄膜的感光波長多為從可見短波長域至紫外光域的情形，作為光源11，使用輸出從405nm或365nm的可見短波長域至紫外光域的光者。又，為了活用空間光調變器12的性能，輸出同調光者較佳，因此適合使用雷射光源11。例如，使用氮化鎵(GaN)系的半導體雷射。The
作為空間光調變器12，在該實施形態中使用DMD。如同前述，DMD中各畫素為微小的反射鏡。反射鏡(以下，稱為畫素反射鏡。)例如為13.68μm角程度的正方形反射鏡，作為多數畫素反射鏡配列成直角格子狀的構造。配列數例如為1024×768個。As the spatial
空間光調變器12具備控制各畫素反射鏡的調變器控制器121。實施形態的曝光裝置具備控制全體的主控制部9。調變器控制器121依照來自主控制部9的信號控制各畫素反射鏡。此外，各畫素反射鏡，能將配列各畫素反射鏡的平面作為基準面，取沿著該基準面的第一姿勢、及相對於該基準面例如以11~13°程度傾斜的第二姿勢。該實施形態中，第一姿勢為關閉狀態、第二姿勢為開啟狀態。
空間光調變器12包含驅動各畫素反射鏡的驅動機構，調變器控制器121就各畫素反射鏡能夠獨立控制取第一姿勢或取第二姿勢。這種空間光調變器12可以從德州儀器公司得到。The spatial
如圖2所示，曝光頭1具備對這種空間光調變器12照射來自光源11的光的照射光學系統14。在該實施形態，照射光學系統14包含光纖141。為了以更高照度進行像形成，一個曝光頭1具備複數光源11，就各光源11設置光纖141。作為光纖141，例如使用石英系的多模光纖。As shown in FIG. 2, the
為了使用DMD即空間光調變器12進行高精度的像形成，使平行光入射於各畫素反射鏡反射較佳、又對各畫素反射鏡使光斜向入射較佳。因此，照射光学系14，如圖2所示，包含使從各光纖141出射擴大的光準直成為平行光的準直器透鏡142。In order to perform high-precision image formation using the DMD, that is, the spatial
投影光學系統13由二個投影透鏡群131、132、及配置於投影透鏡群131、132之間的微透鏡陣列(以下，略稱為MLA。)133等構成。MLA133為了進行更高形狀精度的曝光，補助地配置。MLA133為將多數微小透鏡配列成直角格子狀的光學元件。各透鏡元件以1對1對應空間光調變器12的各畫素反射鏡。The projection
在上述曝光頭1中，來自光源11的光，由光纖141導引後，藉由照射光學系統14入射至空間光調變器12。此時，空間光調變器12的各畫素反射鏡藉由調變器控制器121控制，成為因應曝光圖案選擇地傾斜的姿勢。亦即，依照曝光圖案，位於應使光到達曝光區域的位置的畫素反射鏡呈開啟狀態，除此以外的畫素反射鏡呈關閉狀態。在關閉狀態的畫素反射鏡反射的光未到達曝光區域，僅有在開啟狀態的畫素反射鏡反射的光到達。因此，曝光圖案的光照射至曝光區域。In the above-mentioned
這種曝光頭1複數設置。如圖2所示，該實施形態中設有8個曝光頭1。由8個曝光頭1，作為全體形成一個曝光圖案。此外，各曝光頭1為相同構造。
關於曝光區域參照圖3補足。圖3為表示關於曝光區域的斜視概略圖。圖3中，以1個曝光頭1能照射光的區域(以下，稱為個別區域。)E以四角框表示。個別區域E的集合為曝光區域。
基板S向以圖3中箭頭所示的方向移動，同時在各個別區域E受到光照射。此時，因為二列曝光頭1相互偏差配置，在垂直移動方向的水平方向也一樣，進行無間隙曝光。This type of
實際上，各個別區域E內成為微小照射圖案(以下，稱為微小圖案。)的集合。1個微小圖案為1個畫素反射鏡所致的圖案。載置於載台2的基板S雖伴隨載台2的移動而移動曝光區域，但一致於該移動的時機以預定的序列進行微小圖案的開啟關閉。藉此，形成所期望的曝光圖案於基板S。Actually, each individual area E becomes a collection of minute irradiation patterns (hereinafter referred to as minute patterns). A minute pattern is a pattern caused by a pixel mirror. Although the substrate S placed on the
如圖1所示，該實施形態的直描式曝光裝置具備二個載台2。圖4表示載台2的構造的概略圖。載台2為在平坦的上面載置基板S的台狀構件。如圖4所示，在載台2的上面形成真空吸附孔21。各真空吸附孔21通過形成於載台2內的排氣路22連接至排氣系統4。排氣系統4包含真空泵，排氣系統4動作後，通過排氣路22吸引各真空吸附孔21，將載置的基板S真空吸附至載台2。As shown in FIG. 1, the direct-drawing type exposure apparatus of this embodiment includes two
搬送系統3具備通過曝光區域配設的線性軌道31、及沿著線性軌道31使各載台2直線移動的未圖示的直線驅動源。如圖1所示，各載台2搭載於台座32。台座32能沿著線性軌道31移動。各台座32設有未圖示的直線驅動源。作為直線驅動源例如使用線性馬達，能採用線性馬達載台的構造。直線驅動源動作後，載台2與台座32一體移動，藉此搬送載台2上的基板S。在此例中，一對載台2共用線性軌道31，各台座32在相同軌道上移動。The
此外，從曝光區域遠離的兩側，分別設定待機位置(左待機位置、右待機位置)。各待機位置配置移載單元5。在此例中，應曝光的基板S被輸送帶50搬運，曝光後的基板S被收容至未圖示的載架。移載單元5進行從輸送帶50將基板S載置於載台2的載入、及將曝光完的基板S從載台2移走並收容至載架的卸載。In addition, the standby positions (left standby position and right standby position) are respectively set from the two sides away from the exposure area. The
兩側的移載單元5為同樣的構造，具備具有吸附墊片51的移載手部52、及使移載手部52在上下及前後程度移動的手部驅動機構53。吸附墊片51以向下方的姿勢複數設置，能藉由真空吸引將基板S吸附保持。The
又，直描式曝光裝置包含用來在基板S上的預定位置形成曝光圖案的對準機構。對準機構，包含相對於各載台2在預定位置載置基板S的預對準機構、及以預對準的狀態檢出基板S的載置位置的對準用感測器。
對準用感測器為攝影基板S上的對準標記的攝像元件6。預對準機構為用來在攝像元件6能攝像的區域內定位對準標記的機構。作為預對準機構兼用移載單元5。例如，藉由將基板S抵壓至設定在預定位置的擋板，移載手部52將基板S重新保持，進行預對準。藉由預對準，將基板S以相對於載台2定位的狀態載置。In addition, the direct-travel exposure apparatus includes an alignment mechanism for forming an exposure pattern at a predetermined position on the substrate S. The alignment mechanism includes a pre-alignment mechanism for placing the substrate S at a predetermined position with respect to each
如圖1所示，直描式曝光裝置具備控制各部的主控制部9。於主控制部9實裝使各部以預定的序列動作的主序列程式91。
又，主控制部9實裝對各調變器控制器121發送控制信號的曝光圖案程式92，以達成預定的曝光圖案。曝光圖案程式92，以要將何種電路形成於基板S的這種設計資訊為基礎預先作成，記憶於主控制部9的記憶部90。As shown in FIG. 1, the direct-drawing exposure apparatus is equipped with the
再來，主控制部9實裝構成對準機構的未圖示的對準程式。作為對準用感測器的攝像元件6攝影的對準標記的攝影資料被送至主控制部9。對準程式處理攝像資料算出曝光圖案的形成位置，因應其改寫曝光圖案程式92。
此外，主控制部9具備輸入部901。在輸入部901中，輸入關於進行曝光處理的基板S的品種的資訊等的各種資訊。Furthermore, the
這種實施形態的直描式曝光裝置，為了成為對應多品種少量生產的實用的真空吸附的構造，具備吸附孔封鎖機構。吸附孔封鎖機構，包含捲成滾輪狀的長條片材71、及進行片材71的送出及捲繞的片材機構72。以下，說明關於吸附孔封鎖機構。The direct-drawing type exposure apparatus of this embodiment is equipped with a suction hole blocking mechanism in order to have a practical vacuum suction structure suitable for low-volume production of various types. The suction hole blocking mechanism includes a
首先，說明關於實施形態的裝置中的多數真空吸附孔21的佈局。圖5表示關於實施形態的裝置中的多數真空吸附孔的佈局的平面概略圖。 如同前述，對應多品種少量生產時，通常，一致於最小尺寸的基板形成真空吸附孔21。亦即，有尺寸不同的三個基板S1、S2、S3時，如圖5(1)所示，一致於最小尺寸的基板S3佈局多數真空吸附孔21。亦即，在比基板S3的尺寸還稍微小的方形區域中以均等的間隔設置多數真空吸附孔21。First, the layout of many vacuum suction holes 21 in the apparatus of the embodiment will be described. Fig. 5 shows a schematic plan view of the layout of many vacuum suction holes in the apparatus of the embodiment. As mentioned above, in response to low-volume production of multiple varieties, generally, the vacuum suction holes 21 are formed on the substrate with the smallest size. That is, when there are three substrates S1, S2, S3 with different sizes, as shown in FIG. 5(1), a large number of vacuum suction holes 21 are arranged in accordance with the minimum size substrate S3. That is, a large number of vacuum suction holes 21 are provided at equal intervals in a square area slightly smaller than the size of the substrate S3.
相對於此，在實施形態的直描式曝光裝置中，如圖5(2)所示，一致於最大的基板S1佈局多數真空吸附孔21。亦即，在比基板S1的尺寸還稍微小的方形區域中以均等的間隔設置多數真空吸附孔21。
因此，在實施形態的直描式曝光裝置中，雖一致於最大尺寸的基板設置真空吸附孔21，但在該構造中，如同前述，處理小尺寸的基板時會造成真空洩露。為了解決該問題，實施形態的直描式曝光裝置具備吸附孔封鎖機構。吸附孔封鎖機構，如圖1所示，包含捲成滾輪狀的長條片材71、及進行片材71的送出及捲繞的片材機構72。In contrast, in the direct-drawing exposure apparatus of the embodiment, as shown in FIG. 5(2), a large number of vacuum suction holes 21 are arranged in line with the largest substrate S1. That is, a large number of vacuum suction holes 21 are provided at equal intervals in a square area slightly smaller than the size of the substrate S1.
Therefore, in the direct-drawing exposure apparatus of the embodiment, although the vacuum suction holes 21 are provided corresponding to the largest-size substrate, in this structure, as described above, vacuum leakage may occur when processing small-size substrates. In order to solve this problem, the direct-drawing exposure apparatus of the embodiment is equipped with a suction hole blocking mechanism. The suction hole blocking mechanism, as shown in FIG. 1, includes a
片材71作為塞住基板S未塞住的真空吸附孔21者被採用。亦即，因為處理小尺寸的基板S時未被基板S塞住的真空吸附孔21會露出，片材71為將其塞住者。以下，將片材71改稱為閉鎖片材。若是柔軟且氣密的材料的片材，雖沒有特別限制能作為閉鎖片材71使用，但例如能夠使用PET(Polyethyleneterephthalate)製的片材。厚度例如為0.15mm～0.3mm程度即可。The
圖6表示關於第一實施形態中的閉鎖片材的構造的平面概略圖。閉鎖片材71為捲成滾輪的長條物，但圖6中為了構造的說明描繪成長長地拉出的狀態。
在該實施形態中，閉鎖片材71必須是未阻害基板S的真空吸附者。成為未阻害的構造有幾種考慮，但在該實施形態中，以與載台2的真空吸附孔21一樣的位置關係形成同樣的孔73。以下，因為該閉鎖片材71的孔73也是吸附用的孔，稱為片材吸附孔73。Fig. 6 shows a schematic plan view of the structure of the locking sheet in the first embodiment. The locking
如圖6所示，在閉鎖片材71形成多數片材吸附孔73。多數片材吸附孔73分成複數群組73G。以下，將片材吸附孔73的群組73G稱為孔群組。圖6中，將各孔群組73G以虛線包圍，但其是為了理解用，在閉鎖片材71並未描繪這種線。As shown in FIG. 6, a plurality of sheet suction holes 73 are formed in the
如圖6所示，各孔群組73G，片材吸附孔73的個數不同。各孔群組73G，由在方形的配置區域內以均等間隔形成的片材吸附孔73構成。在各孔群組73G中，片材吸附孔73的離間間隔雖相同，但因為方形的配置區域的尺寸不同，片材吸附孔73的個數不同。又，也存在方形的配置區域的縱橫比不同的孔群組73G。此外，「配置區域」指的是各孔群組73G中的多數片材吸附孔73的全體的配置區域。也可以捉所有片材吸附孔73進入內部的最小的一個方形的區域。As shown in FIG. 6, each
這樣的各孔群組73G，是考慮處理的基板S的尺寸不同而設置者。亦即，各孔群組73G中，形成片材吸附孔73的配置區域的尺寸，對應處理的基板S的尺寸。亦即，在圖6中，表示各孔群組73G的虛線，成為相當於基板S的尺寸(縱橫的長度)者。
這種閉鎖片材71，選擇任一孔群組73G且被定位使用。關於此點參照圖7說明。圖7表示關於第一實施形態中的閉鎖片材71中的孔群組73G的選擇與定位的斜視概略圖。如圖1所示，實際雖呈從下方依序接觸載台2、閉鎖片材71、基板S的狀態，但在圖7中，為了容易理解，描繪分離的狀態。又，圖6及圖7中，為了理解，將真空吸附孔21及片材吸附孔73擴大描繪，實際比圖示的狀態還小。表示真空吸附孔21及片材吸附孔73的大小的一例，為直徑0.5mm～3.0mm程度。This kind of locking
圖7中，某尺寸的基板S為了處理而載置於載台2。如同前述，基板S相對於載台2以預對準的狀態載置。亦即，相對於載台2的基準位置以預定的位置關係載置。將在預對準狀態的基板S的載置位置於圖7中以虛線S’表示。
接著，閉鎖片材71一致於基板S的尺寸選擇一個孔群組73G，被選擇的孔群組73G呈相對於載台2定位的狀態。定位，如圖7所示，為設於被選擇的孔群組73G的各片材吸附孔73與載台2的真空吸附孔21重疊的位置。In FIG. 7, a substrate S of a certain size is placed on the
在該實施形態中，定位藉由片材機構72進行。亦即，片材機構72除了片材71的送出及捲繞，也成為進行片材71的定位的機構。
如圖1所示，片材機構72為以滾輪對滾輪進行閉鎖片材71的送出與捲繞的機構。因為將閉鎖片材71設為不以水平姿勢鬆弛的狀態，片材機構72包含一對導引滾輪723。In this embodiment, positioning is performed by the
圖8表示片材機構72的構成與閉鎖片材71及片材機構72的安裝構造的側面概略圖。片材機構72在兩側的滾輪呈幾乎一樣的構造，圖8例示一側的構造。從圖1及圖8可理解，片材機構72具備捲繞閉鎖片材71的圓棒狀的一對滾輪棒721、及驅動各滾輪棒721的滾輪驅動源722。滾輪驅動源722，例如可以是一者為轉矩馬達，另一者為相反於該轉矩使滾輪棒721旋轉的伺服馬達或步進馬達等。FIG. 8 shows a schematic side view of the structure of the
各滾輪驅動源722藉由主控制部9控制進行閉鎖片材71的定位。具體說明，各滾輪驅動源722連接至主控制部9，在主控制部9實裝片材定位程式93。
關於上述各孔群組73G，將其附加識別ID(以下，孔群組ID)。於閉鎖片材71，在長條方向設定特定的基準位置(以下，片材基準位置)。各孔群組73G，形成於閉鎖片材71的哪個位置，是由從片材基準位置的距離來特定出。主控制部9的記憶部90，記憶有記錄各孔群組73G的位置的孔群組資訊檔案94。孔群組資訊檔案94，為使各孔群組73G的形成位置(從片材基準位置的距離)對應至孔群組ID記錄的檔案。Each
片材定位程式93中，將相對於載台2片材基準位置現在在哪個位置的資訊作為參數傳遞。載台2中，設定對片材定位程式93來說的原點位置(以下，載台原點)，片材基準位置以與載台原點的關係特定位置。例如，將前次的片材定位程式93的執行時選擇的孔群組73G保持於記憶部90，將其讀出，求出相對於載台原點的片材基準位置的現在位置。裝置最初運轉時，設為片材基準位置＝載台原點。In the
相對於片材定位程式93，再來，孔群組ID作為參數傳遞。片材71定位程式，從片材基準位置的現在位置與孔群組ID，算出使閉鎖片材71向哪個方向以何種距離移動的值。亦即，參照孔群組資訊檔案94，若有向哪個方向以何種距離移動，則算出該孔群組ID的孔群組73G是否相對於載台2定位。接著，將算出的值送至片材機構72後，程式結束。其結果，控制片材機構72，如圖7所示，成為選擇的孔群組73G相對於載台2定位的狀態。With respect to the
上述閉鎖片材71及片材機構72，對載台2安裝。閉鎖片材71及片材機構72與升降機構74一同安裝於台座32。如圖8所示，升降機構74由保持片材機構72的能伸縮的一對支柱741、及使各支柱伸縮的上下驅動源742等構成。The
滾輪棒721通過軸承固定於支柱741。又，滾輪驅動源722也藉由支柱741保持，成為閉鎖片材71及片材機構72全體隔介著升降機構74安裝於台座32的狀態。導引滾輪723也通過軸承保持於支柱741。因此，搬送系統3動作而台座32移動後，閉鎖片材71及片材機構72也一體移動。The
以下說明有關這種第一實施形態的直描式曝光裝置的動作。
在裝置的動作之前，作業者在輸入部901中進行必要的資訊輸入。在這裡的資訊中，包含處理的基板S的品種資訊，在品種的資訊中，包含基板S的尺寸資訊。The operation of the direct-tracing exposure apparatus of the first embodiment will be described below.
Before the operation of the device, the operator inputs necessary information in the
主控制部9在曝光處理之前，向片材機構72發送控制信號。亦即，主序列程式91，叫出片材定位程式93並執行。主序列程式91，依照輸入的品種資訊特定孔群組ID，與片材基準位置的現在位置的資訊一同傳遞至片材定位程式93。片材定位程式93，依照該等品種資訊，算出閉鎖片材71的必要移動量(方向與距離)，輸出至片材機構72。其結果，被選擇的孔群組73G相對於載台2定位。The
此外，閉鎖片材71的送出及捲繞時，升降機構74動作，將閉鎖片材71及片材機構72稍微向上方抬升。接著，如同上述進行定位後，升降機構74使閉鎖片材71及片材機構72下降，以被定位的狀態使閉鎖片材71接觸或密著載台2。In addition, during the feeding and winding of the locking
接著，一移載單元5動作，將基板S載置至一載台2。此時，進行預對準，基板S相對於載台2載置於預定位置。接著，排氣系統4動作，基板S真空吸附至載台2。此時，如同上述閉鎖片材71成為孔群組73G被定位，載台2的真空吸附孔21與片材吸附孔73重疊的狀態。因此，基板S的真空吸附不會被阻害。Next, a
再來，在閉鎖片材71中，因為因應基板S的尺寸被選擇的孔群組73G相對於載台2定位，除了不阻害載置的基板S的真空吸附以外，基板S的周圍的不使用的真空吸附孔21也因閉鎖片材71成為被塞住的狀態。
保持該狀態，同時搬送系統3使載台2移動。接著，載台2上的基板S到達攝像元件6下方時，藉由攝像元件6攝影對準標記，攝影資料被送至主控制部9，進行曝光圖案程式92的改寫。Furthermore, in the locking
再來搬送系統3使載台2移動，通過曝光單元1下方的曝光區域時，曝光單元1動作，進行以曝光圖案的基板S曝光。通過曝光區域後，搬送系統3使載台2反轉，使載台2返回當初的待機位置。接著，於待機位置移載單元5動作，將曝光完的基板S搬出至輸送帶50。Then, when the
此期間，另一移載單元5相對於另一載台2進行預對準後的基板S的載置動作。接著，一載台2回到待機位置後，搬送系統3使另一載台2從相反側移動，在通過曝光區域時，曝光單元1同樣進行曝光。此時，一樣向片材機構72發送控制信號，在對應輸入的品種的孔群組73G被定位的狀態下閉鎖片材71覆蓋另一載台2，在其上載置基板S進行真空吸附，以該狀態進行曝光。During this period, the
交互重複這種動作，對各基板S進行曝光。1批量的基板S的曝光處理結束，處理下個批量的基板S時，當品種不同時，在輸入部901中輸入品種資訊。主序列程式91在開始下個批量的處理前，執行片材定位程式93，依照輸入的品種資訊進行對應的孔群組73G的定位。此時，升降機構74動作，使閉鎖片材71些微上升從載台2遠離，在定位之後使其下降接觸或密著至載台2。藉此進行孔群組73G的定位後，同樣對各基板S施予曝光處理。This action is repeated alternately, and each substrate S is exposed. The exposure processing of the substrate S of one batch is completed, and when the substrate S of the next batch is processed, if the product is different, the product information is input into the
根據上述構造及動作的實施形態的直描式曝光裝置，以對應最大尺寸的基板S的佈局將多數真空吸附孔21設於載台2，藉此在處理更小的基板S時因為吸附孔封鎖單元塞住了不被基板S塞住的真空吸附孔21，成為進行充分真空吸附的裝置。亦即，提供了對應多品種少量生產，同時進行精度高的曝光處理的實用的直描式曝光裝置。According to the direct-drawing exposure apparatus according to the embodiment of the above-mentioned structure and operation, a large number of vacuum suction holes 21 are provided on the
上述構造中，片材機構72雖是使閉鎖片材71成為不阻害基板S的真空吸附的狀態的機構，但該動作，也可以讓作業者以手動作業進行。但是，因為煩雑，且每當變更品種則成為必要的作業，使生產性顯著地降低。片材機構72為能將伴隨著品種的變更的孔群組73G的變更迅速省略化進行，有不使生產性降低的意義。
此外，閉鎖片材71及片材機構72相對於載台2安裝而與載台2一體移動這點，有與載台2的移動關聯的機構不會變得複雜的意義。雖是使閉鎖片材71及片材機構72相對於與載台2分離的構件安裝而不一體移動的構造也可以，但閉鎖片材71有維持閉鎖不使用的真空吸附孔31的狀態的必要，有與載台2同步(相同速度相同方向)移動的必要。機構上雖然可能，但成為複雜且大規模。In the above-mentioned structure, the
此外，在上述動作中，曝光時通過曝光區域時的載台2的移動方向，在二個載台2中互相相反。載台2的移動方向若不同，因各畫素反射鏡的開啟關閉的圖案也會不同，就各者實裝曝光圖案程式92。但是，若在一載台2中於往路進行曝光，在另一載台2在復路進行曝光，則因為曝光時的移動方向變得相同，執行相同曝光圖案程式92進行曝光。In addition, in the above-mentioned operation, the moving direction of the
接著，說明有關第二實施形態的直描式曝光裝置。
在第二實施形態的直描式曝光裝置中也一樣，各載台2的真空吸附孔21以對應最大尺寸的基板S的佈局多數設置。接著，設置將不被基板S塞住的真空吸附孔21塞住的吸附孔封鎖機構，吸附孔封鎖機構具備閉鎖片材71、片材機構72。第二實施形態與第一實施形態不同的點是在作為不阻害基板S的真空吸附的閉鎖片材71的構造，並非片材吸附孔73而是具有開口75。Next, the direct-drawing exposure apparatus of the second embodiment will be described.
In the direct-drawing type exposure apparatus of the second embodiment, the vacuum suction holes 21 of each
圖9表示關於第二實施形態中的閉鎖片材71的構造的平面概略圖。在第二實施形態也一樣，閉鎖片材71為長條帶狀，在捲繞至一對滾輪的狀態下藉由片材機構72送出及捲繞。
如圖9所示，第二實施形態中開口75為方形，尺寸雖不同但沿著閉鎖片材71的長度方向多數形成。各開口75為對應尺寸不同的各基板S的該不同尺寸形成者。在該實施形態中，各開口75以比對應的基板S還稍微大的尺寸形成。FIG. 9 shows a schematic plan view of the structure of the locking
各開口75與第一實施形態中的孔群組73G一樣，賦予ID(以下，開口ID)。接著，使各開口75的形成位置(相對於片材基準位置的位置)對應開口ID記憶的開口資訊檔案95記憶於主控制部9的記憶部90。
此外，在該實施形態中也一樣，片材機構72具備一對滾輪棒721、驅動各滾輪棒721進行閉鎖片材71的送出及捲繞的一對滾輪驅動源722。接著，閉鎖片材71及片材機構72相對於搭載載台2的台座32與升降機構74一同安裝，成為與載台2一體移動者。Like the
圖10及圖11表示關於第二實施形態中的吸附孔封鎖機構的動作的概略圖，圖10為斜視概略圖，圖11為正面剖面概略圖。圖10中，與圖7一樣，為了容易理解，載台2、閉鎖片材71、基板S雖以分別離間描繪，但實際上重合接觸。
第二實施形態中也一樣，在主控制部9實裝片材定位程式93。片材定位程式93，依照於輸入部901輸入的品種資訊，算出用來定位對應的開口75片材71的移動量(方向與距離)，送至片材機構72進行定位。此時，同樣地升降機構74動作，使閉鎖片材71先些微上升，在定位之後使其下降接觸至載台2。10 and 11 show schematic views of the operation of the suction hole blocking mechanism in the second embodiment. FIG. 10 is a schematic perspective view, and FIG. 11 is a schematic front sectional view. In FIG. 10, as in FIG. 7, for easy understanding, the
圖11中，如同上述描繪定位閉鎖片材71接觸載台2後，將基板S預對準並載置的狀態。如圖11所示，進行預對準並載置的基板S，位於定位的閉鎖片材71的開口75內。接著，開口75對應處理對象的基板S尺寸選擇，如圖11所示開口75為比基板S還稍微大的尺寸。將開口75與基板S的大小差異稱為開口界限，在圖11中以m表示。In FIG. 11, after the positioning and locking
開口界限m中重要的是，比載台2的真空吸附孔21的間距(鄰接真空吸附孔21的距離)p還充分小。這是因為開口界限m若比真空吸附孔21的間距p還大，則會變成不被基板S塞住的真空吸附孔21也不會被閉鎖片材71塞住的狀態，則真空會洩漏。另一方面，開口界限m若過小，則因預對準的精度容易成為基板S不位於開口75內的狀態。若基板S不位於開口75內，基板S會乘載於開口75之緣，還是會成為真空吸附錯誤的原因。因此，開口界限m，較佳為真空吸附孔21的間距p的例如1/2以下且2.0mm以上。It is important for the opening limit m to be sufficiently smaller than the pitch p of the vacuum suction holes 21 of the stage 2 (the distance adjacent to the vacuum suction holes 21). This is because if the opening limit m is larger than the pitch p of the vacuum suction holes 21, the vacuum suction holes 21 that are not blocked by the substrate S will not be blocked by the blocking
第二實施形態的直描式曝光裝置，如同上述僅有吸附孔閉鎖機構的構造不同，除此以外與第一實施形態的裝置一樣。
在第二實施形態中也一樣，以對應最大尺寸的基板S的佈局將多數真空吸附孔21設於載台2，藉此在處理更小的基板S時因為吸附孔封鎖單元塞住了不被基板S塞住的真空吸附孔21，成為進行充分真空吸附的裝置。因此，提供了對應多品種少量生產，同時進行精度高的曝光處理的實用的直描式曝光裝置。The direct-drawing exposure apparatus of the second embodiment is the same as the apparatus of the first embodiment except for the above-mentioned structure with only the suction hole closing mechanism.
In the second embodiment as well, a large number of vacuum suction holes 21 are provided on the
接著，說明有關第三實施形態的直描式曝光裝置。
在第三實施形態中也一樣，以對應最大尺寸的基板S的佈局將多數真空吸附孔21設於載台2，藉此在處理更小的基板S時設置塞住了不被基板S塞住的真空吸附孔21的吸附孔封鎖機構。第三實施形態中，吸附孔封鎖機構，除了塞住不被基板S塞住的真空吸附孔21的機能以外，也具有壓住基板S的周邊部的機能。Next, the direct-drawing exposure apparatus of the third embodiment will be described.
In the third embodiment as well, a large number of vacuum suction holes 21 are provided on the
圖12表示關於第三實施形態中的閉鎖片材71的構造的平面概略圖。在第三實施形態也一樣，片材71為長條帶狀，在捲繞至一對滾輪的狀態下藉由片材機構72送出及捲繞。接著，與第二實施形態一樣，複數尺寸不同的開口76沿著長度方向形成。
各開口75對應處理的基板S的尺寸形成。該點中與第二實施形態一樣。第三實施形態與第二實施形態不同的點是相對於對應的基板S的尺寸，開口76成為比其還小的尺寸。以下，將該開口76稱為小開口。FIG. 12 shows a schematic plan view of the structure of the locking
如圖12所示，該實施形態的閉鎖片材71，與對應基板S的各尺寸的小開口76不同，具有大的一個開口77。該開口77，為向載台2的從基板S的載置及載台2的基板S的回收(以下，稱為基板裝脫。)時利用的開口。以下，將該開口77稱為裝脫用開口。裝脫用開口77為比最大尺寸的基板S還稍微大的尺寸的方形開口。
在該實施形態中也一樣，在小開口76及裝脫用開口77賦予開口ID。接著，將各小開口76及裝脫用開口77的形成位置的資訊，作為相對於片材基準位置的距離取得，記錄於開口資訊檔案95。As shown in FIG. 12, the locking
圖13表示關於第三實施形態中的吸附孔封鎖機構的動作的正面剖面概略圖。第三實施形態中，基板S的裝脫時，成為移載單元5、片材機構72及升降機構74協動的序列，成為與第一第二實施形態不同的序列。Fig. 13 is a schematic front sectional view of the operation of the suction hole blocking mechanism in the third embodiment. In the third embodiment, when attaching and detaching the substrate S, it is a sequence in which the
具體說明，如圖13(1)所示，以首先將裝脫用開口77定位的方式，主序列程式91對片材機構72發送控制信號。載台2中，載置進行預對準的基板S的位置作為預定位置被設定(以下，設定載置位置)。裝脫用開口77的位置，載置於設定載置位置的基板S所占的區域在平面視中成為裝脫用開口77內側的位置。以成為該位置的方式控制片材機構72。Specifically, as shown in FIG. 13(1), the
裝脫用開口77被定位後，主序列程式91對移載單元5發送控制信號，如圖13(2)所示，使進行預對準的基板S載置於載台2。此時，閉鎖片材71可以接觸載台2，些微浮起也可以。After the
接著，基板S的載置結束後，主序列程式91對片材機構72發送控制信號，如圖13(3)所示，進行對應該基板S尺寸的小開口76的定位。此時，升降機構74使閉鎖片材71比基板S還稍微上方的位置。
接著，主序列程式91，對升降機構74發送控制信號，使閉鎖片材71下降並密著於載台2。在該狀態，如圖14(4)所示，成為小開口76之緣乘載於基板S的周邊部的狀態。Next, after the placement of the substrate S is completed, the
在該狀態下，主序列程式91，對排氣系統4發送控制信號，使真空吸附開始。藉由各真空吸附孔21的真空吸引，基板S被真空吸附至載台2，並且閉鎖片材71也被真空吸附至載台2。此時，從圖13(4)可理解，成為小開口76之緣按壓基板S的周邊部的狀態。因此，即便在基板S有彎曲，閉鎖片材71也會壓住該彎曲，使其密著於載台2。因此，不會產生真空洩漏，又基板S成為平坦的姿勢而以該狀態被曝光。In this state, the
曝光結束後從載台2將基板S移走時的動作與上述相反。亦即，停止排氣系統4的動作解除真空吸附後，升降機構74使閉鎖片材71稍微上升。接著，片材機構72動作進行裝脫用開口77的定位。之後，移載單元5的吸附墊片51將基板S吸附，移載手部52將基板S抬起搬出至輸送帶50。The operation when the substrate S is removed from the
根據該第三實施形態的直描式曝光裝置，因為將不被基板S塞住的真空吸附孔21以吸附孔封鎖機構塞住，對應多品種少量生產同時進行高精度的曝光處理。還有，因為閉鎖片材71壓住基板S的周邊部，即便在基板S有彎曲也確實地被真空吸附，又防止了曝光精度的降低。According to the direct-drawing type exposure apparatus of the third embodiment, since the vacuum suction holes 21 that are not blocked by the substrate S are plugged by the suction hole blocking mechanism, high-precision exposure processing is simultaneously performed in response to low-volume production of various types. In addition, since the locking
第三實施形態中，閉鎖片材71具有適度的彈性較佳。閉鎖片材71若是剛性高者，在基板S的厚度的部分，閉鎖片材71會從載台2浮起，無法充分被真空吸附。相反地，若閉鎖片材71過於柔軟，按壓基板S的周邊部解消彎曲的力無法產生。考慮該等，使用適度的彈性閉鎖片材71。例如，閉鎖片材71為PET製時，設為0.3mm～0.5mm程度的厚度時，沒有上述的問題。In the third embodiment, it is preferable that the locking
又，基板S的尺寸相對於小開口76的尺寸的差(圖13(4)中以m’表示。)設為3.0～5.0mm程度較佳。若比3.0mm還小，有解消彎曲不足的情形。又，若大於5.0mm則作為彎曲解消效果沒什麼變化，相反地有阻害對於基板S的曝光圖案的形成的情形。In addition, the difference between the size of the substrate S and the size of the small opening 76 (indicated by m'in Fig. 13(4)) is preferably about 3.0 to 5.0 mm. If it is smaller than 3.0mm, there may be insufficient debending. In addition, if it is larger than 5.0 mm, there is no change as a deflection effect, but on the contrary, the formation of the exposure pattern to the substrate S may be hindered.
此外，在各實施形態中，設於載台2的真空吸附孔21，雖說明以均等間隔配置，但也有部分不是均等間隔的情形。例如，因為在基板S的周邊部提高真空吸附力較佳，關於一致於各基板S的尺寸位於周邊部的真空吸附孔21也可以是窄化間隔緊密配置的情形。
又，第一實施形態中，雖說明片材機構72以各片材吸附孔73重疊於載台2的真空吸附孔21定位，但此時的「重疊」不只是完全重疊的情形，以至少1/2以上的面積重疊也可以。亦即，真空吸附孔21的1/2以上的面積不被阻塞(若連通片材吸附孔73)即可。又，各片材吸附孔73是與載台2的真空吸附孔21相同的大小即可，但稍微大較佳。這是因為若稍微大，對於片材機構72不會要求嚴密的定位精度。例如，片材吸附孔73面積比設為真空吸附孔21的1.2倍～1.5倍程度較佳。In addition, in each embodiment, although the vacuum suction holes 21 provided in the
又，上述各實施形態，為搭載二個載台2的雙載台構造，但實施該出願的發明時，能夠採用僅使用1個載台的單載台構造。
又，本申請的直描式曝光裝置也可以用於將基板的兩面曝光的製程。兩面曝光的情形，可以採用例如縱設二台單載台的構造的裝置，將上下翻面基板的反轉機構設於其間的構造。
此外，在直描式曝光裝置中，「基板」有板狀曝光對象物的程度的意思，未必表示製品的基底構件。即便是組裝至最後製品的構件，也可以是「基板」。In addition, each of the above-described embodiments has a dual-stage structure in which two
1:曝光單元
2:載台
21:真空吸附孔
3:搬送系統
4:排氣系統
5:移載單元
6:攝像元件
71:閉鎖片材
72:片材機構
721:滾輪棒
722:滾輪驅動源
73:片材吸附孔
73G:孔群組
74:升降機構
75:開口
76:小開口
77:裝脫用開口
9:主控制部
91:主序列程式
92:曝光圖案程式
93:片材定位程式
94:孔群組資訊檔案
95:開口資訊檔案
S:基板1: Exposure unit
2: carrier
21: Vacuum adsorption hole
3: Conveying system
4: Exhaust system
5: Transfer unit
6: Camera element
71: Locking sheet
72: sheet mechanism
721: Roller Rod
722: Wheel drive source
73:
[圖1]第一實施形態的直描式曝光裝置的正面概略圖。 [圖2]搭載於圖1的裝置的曝光頭的概略圖。 [圖3]表示關於曝光區域的斜視概略圖。 [圖4]表示載台的構造的概略圖。 [圖5]表示關於實施形態的裝置中的多數真空吸附孔的佈局的平面概略圖。 [圖6]表示關於第一實施形態中的閉鎖片材的構造的平面概略圖。 [圖7]表示關於第一實施形態中的閉鎖片材中的孔群組的選擇與定位的斜視概略圖。 [圖8]表示片材機構的構成與閉鎖片材及片材機構的安裝構造的側面概略圖。 [圖9]表示關於第二實施形態中的閉鎖片材的構造的平面概略圖。 [圖10]表示關於第二實施形態中的吸附孔封鎖機構的動作的斜視概略圖。 [圖11]表示關於第二實施形態中的吸附孔封鎖機構的動作的正面剖面概略圖。 [圖12]表示關於第三實施形態中的閉鎖片材的構造的平面概略圖。 [圖13]表示關於第三實施形態中的吸附孔封鎖機構的動作的正面剖面概略圖。[Fig. 1] A schematic front view of the direct-drawing exposure apparatus of the first embodiment. [Fig. 2] A schematic view of an exposure head mounted in the apparatus of Fig. 1. [Fig. [Fig. 3] A schematic diagram showing a perspective view of the exposure area. [Fig. 4] A schematic diagram showing the structure of the stage. [Fig. 5] A schematic plan view showing the layout of many vacuum suction holes in the apparatus of the embodiment. [Fig. 6] A schematic plan view showing the structure of the locking sheet in the first embodiment. [Fig. 7] A schematic perspective view showing the selection and positioning of the hole group in the locking sheet in the first embodiment. [Fig. 8] A schematic side view showing the structure of the sheet mechanism and the mounting structure of the locking sheet and the sheet mechanism. [Fig. 9] A schematic plan view showing the structure of the locking sheet in the second embodiment. Fig. 10 is a schematic perspective view showing the operation of the suction hole blocking mechanism in the second embodiment. [Fig. 11] A schematic front sectional view showing the operation of the suction hole blocking mechanism in the second embodiment. [Fig. 12] A schematic plan view showing the structure of the locking sheet in the third embodiment. [Fig. 13] A schematic front sectional view showing the operation of the suction hole blocking mechanism in the third embodiment.
1:曝光單元 1: Exposure unit
2:載台 2: carrier
3:搬送系統 3: Conveying system
5:移載單元 5: Transfer unit
6:攝像元件 6: Camera element
9:主控制部 9: Main control department
31:真空吸附孔 31: Vacuum adsorption hole
32:台座 32: Pedestal
50:輸送帶 50: Conveyor belt
51:吸附墊片 51: Adsorption pad
52:移載手部 52: transfer hands
53:手部驅動機構 53: Hand drive mechanism
71:閉鎖片材 71: Locking sheet
72:片材機構 72: sheet mechanism
90:記憶部 90: Memory Department
91:主序列程式 91: main sequence program
92:曝光圖案程式 92: Exposure pattern program
93:片材定位程式 93: Sheet positioning program
94:孔群組資訊檔案 94: Hole Group Information File
95:開口資訊檔案 95: Opening Information File
723:導引滾輪 723: guide roller
901:輸入部 901: Input
S:基板 S: substrate
Claims (7)
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| JP2019089185A JP7239388B2 (en) | 2019-05-09 | 2019-05-09 | Direct exposure system |
| JP2019-089185 | 2019-05-09 |
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| Publication Number | Publication Date |
|---|---|
| TW202046019A true TW202046019A (en) | 2020-12-16 |
| TWI834858B TWI834858B (en) | 2024-03-11 |
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| KR (1) | KR20200130181A (en) |
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| JP6925921B2 (en) * | 2017-09-26 | 2021-08-25 | 株式会社アドテックエンジニアリング | Exposure equipment and exposure method |
-
2019
- 2019-05-09 JP JP2019089185A patent/JP7239388B2/en active Active
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2020
- 2020-04-09 TW TW109111921A patent/TWI834858B/en active
- 2020-05-08 CN CN202010380624.6A patent/CN111913363B/en active Active
- 2020-05-08 KR KR1020200055102A patent/KR20200130181A/en active Search and Examination
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| KR20200130181A (en) | 2020-11-18 |
| CN111913363A (en) | 2020-11-10 |
| JP7239388B2 (en) | 2023-03-14 |
| JP2020184045A (en) | 2020-11-12 |
| CN111913363B (en) | 2024-05-17 |
| TWI834858B (en) | 2024-03-11 |
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