CN106773552B - Without the real-time micro-nano stamp system of exposure mask - Google Patents
Without the real-time micro-nano stamp system of exposure mask Download PDFInfo
- Publication number
- CN106773552B CN106773552B CN201710064032.1A CN201710064032A CN106773552B CN 106773552 B CN106773552 B CN 106773552B CN 201710064032 A CN201710064032 A CN 201710064032A CN 106773552 B CN106773552 B CN 106773552B
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- CN
- China
- Prior art keywords
- fpc substrate
- real
- stamp
- light engine
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710064032.1A CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710064032.1A CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
Publications (2)
Publication Number | Publication Date |
---|---|
CN106773552A CN106773552A (en) | 2017-05-31 |
CN106773552B true CN106773552B (en) | 2019-01-22 |
Family
ID=58956579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710064032.1A Active CN106773552B (en) | 2017-02-04 | 2017-02-04 | Without the real-time micro-nano stamp system of exposure mask |
Country Status (1)
Country | Link |
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CN (1) | CN106773552B (en) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1347501A4 (en) * | 2000-12-22 | 2006-06-21 | Nikon Corp | Wavefront aberration measuring instrument, wavefront aberration measuring method, exposure apparatus, and method for manufacturing microdevice |
JP2005326550A (en) * | 2004-05-13 | 2005-11-24 | Sanee Giken Kk | Exposure device |
CN100492179C (en) * | 2007-07-10 | 2009-05-27 | 上海微电子装备有限公司 | Interferometer |
CN202693995U (en) * | 2012-06-01 | 2013-01-23 | 中山新诺科技有限公司 | Visual system |
CN102722304B (en) * | 2012-06-21 | 2015-09-16 | 中山新诺科技有限公司 | A kind of joint way prepares the method for touch-screen |
CN103246177B (en) * | 2013-05-03 | 2015-06-03 | 中山新诺科技有限公司 | Continuous mask-free photoetching method for flexible panel and device for method |
CN104865800A (en) * | 2015-05-27 | 2015-08-26 | 中山新诺科技股份有限公司 | Synchronous pulse exposure method for maskless lithography equipment and digital laser direct-writing system |
CN106324996B (en) * | 2015-06-15 | 2017-10-20 | 中国科学院上海光学精密机械研究所 | Litho machine original position multi channel imaging quality detection device and method |
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2017
- 2017-02-04 CN CN201710064032.1A patent/CN106773552B/en active Active
Also Published As
Publication number | Publication date |
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CN106773552A (en) | 2017-05-31 |
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Legal Events
Date | Code | Title | Description |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20201030 Address after: Room 4606, block B, China Resources Building, 1366 Qianjiang Road, Jianggan District, Hangzhou City, Zhejiang Province Patentee after: Hangzhou Xinnuo Microelectronics Co.,Ltd. Address before: 518000 Incubator No. 8, Huajing Park, Tongji Group, 28 Langshan Road, Xili Street, Nanshan District, Shenzhen City, Guangdong Province (1-A) Patentee before: SHENZHEN YOUSHENG TECHNOLOGY Co.,Ltd. |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Maskless real-time micro nano coding system Effective date of registration: 20210901 Granted publication date: 20190122 Pledgee: Bank of Jiangsu Limited by Share Ltd. Hangzhou branch Pledgor: Hangzhou Xinnuo Microelectronics Co.,Ltd. Registration number: Y2021330001333 |
|
PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20220914 Granted publication date: 20190122 Pledgee: Bank of Jiangsu Limited by Share Ltd. Hangzhou branch Pledgor: Hangzhou Xinnuo Microelectronics Co.,Ltd. Registration number: Y2021330001333 |