SG177321A1 - Water-soluble working fluid for fixed abrasive grain wire saw - Google Patents
Water-soluble working fluid for fixed abrasive grain wire saw Download PDFInfo
- Publication number
- SG177321A1 SG177321A1 SG2011095171A SG2011095171A SG177321A1 SG 177321 A1 SG177321 A1 SG 177321A1 SG 2011095171 A SG2011095171 A SG 2011095171A SG 2011095171 A SG2011095171 A SG 2011095171A SG 177321 A1 SG177321 A1 SG 177321A1
- Authority
- SG
- Singapore
- Prior art keywords
- water
- working fluid
- mass
- abrasive grain
- wire saw
- Prior art date
Links
- 239000012530 fluid Substances 0.000 title claims abstract description 113
- 239000006061 abrasive grain Substances 0.000 title claims abstract description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 32
- 150000002334 glycols Chemical class 0.000 claims abstract description 29
- 238000005520 cutting process Methods 0.000 claims description 43
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 14
- 238000004090 dissolution Methods 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 7
- 239000002210 silicon-based material Substances 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 abstract description 51
- 239000010703 silicon Substances 0.000 abstract description 51
- 238000012545 processing Methods 0.000 abstract description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 50
- 150000007514 bases Chemical class 0.000 description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 15
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 15
- 239000000463 material Substances 0.000 description 10
- 239000000203 mixture Substances 0.000 description 8
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 8
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000004034 viscosity adjusting agent Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- -1 polyethylene Polymers 0.000 description 4
- 239000001384 succinic acid Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000003002 pH adjusting agent Substances 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229940113115 polyethylene glycol 200 Drugs 0.000 description 2
- 229940068886 polyethylene glycol 300 Drugs 0.000 description 2
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- 101100491335 Caenorhabditis elegans mat-2 gene Proteins 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920000604 Polyethylene Glycol 200 Polymers 0.000 description 1
- 229920002556 Polyethylene Glycol 300 Polymers 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 229940086066 potassium hydrogencarbonate Drugs 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M173/00—Lubricating compositions containing more than 10% water
- C10M173/02—Lubricating compositions containing more than 10% water not containing mineral or fatty oils
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2207/00—Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
- C10M2207/02—Hydroxy compounds
- C10M2207/021—Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms
- C10M2207/022—Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms containing at least two hydroxy groups
- C10M2207/0225—Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms containing at least two hydroxy groups used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2209/00—Organic macromolecular compounds containing oxygen as ingredients in lubricant compositions
- C10M2209/10—Macromolecular compoundss obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- C10M2209/103—Polyethers, i.e. containing di- or higher polyoxyalkylene groups
- C10M2209/104—Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing two carbon atoms only
- C10M2209/1045—Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing two carbon atoms only used as base material
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2030/00—Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
- C10N2030/02—Pour-point; Viscosity index
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10N—INDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
- C10N2040/00—Specified use or application for which the lubricating composition is intended
- C10N2040/20—Metal working
- C10N2040/22—Metal working with essential removal of material, e.g. cutting, grinding or drilling
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Lubricants (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009166962A JP5679642B2 (ja) | 2009-07-15 | 2009-07-15 | 固定砥粒ワイヤソー用水溶性加工液 |
PCT/JP2010/052095 WO2011007590A1 (ja) | 2009-07-15 | 2010-02-12 | 固定砥粒ワイヤソー用水溶性加工液 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG177321A1 true SG177321A1 (en) | 2012-02-28 |
Family
ID=43449200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2011095171A SG177321A1 (en) | 2009-07-15 | 2010-02-12 | Water-soluble working fluid for fixed abrasive grain wire saw |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5679642B2 (ja) |
KR (1) | KR20120049216A (ja) |
CN (1) | CN102471723B (ja) |
SG (1) | SG177321A1 (ja) |
WO (1) | WO2011007590A1 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9522481B2 (en) | 2009-08-31 | 2016-12-20 | Sanyo Chemical Industries, Ltd. | Water-soluble cutting fluid for slicing silicon ingots |
JP5624904B2 (ja) * | 2011-01-31 | 2014-11-12 | 三洋化成工業株式会社 | シリコンインゴット用水溶性切削液 |
JP2012172117A (ja) * | 2011-02-23 | 2012-09-10 | Yushiro Chemical Industry Co Ltd | 固定砥粒ワイヤソー用水溶性加工液 |
JP5755479B2 (ja) * | 2011-03-31 | 2015-07-29 | 三洋化成工業株式会社 | 含水切削液組成物およびその製造方法 |
CN103013638B (zh) * | 2011-09-20 | 2014-09-17 | 浙江瑞翌新材料科技有限公司 | 一种用于固定磨料线切割的水溶性冷却液及其制备方法 |
JP6039935B2 (ja) * | 2012-06-29 | 2016-12-07 | 出光興産株式会社 | 水性加工液 |
JP6204029B2 (ja) | 2013-03-06 | 2017-09-27 | 出光興産株式会社 | 水性加工液 |
TWI640619B (zh) * | 2015-02-10 | 2018-11-11 | 達興材料股份有限公司 | 一種切割製程用的水性切割液的添加劑及其製備方法 |
JP6232480B2 (ja) * | 2016-08-31 | 2017-11-15 | 出光興産株式会社 | 水性加工液 |
JP6819619B2 (ja) * | 2018-01-22 | 2021-01-27 | 信越半導体株式会社 | ワーク切断方法及びワイヤソー |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04216897A (ja) * | 1990-12-19 | 1992-08-06 | Nippon Steel Corp | ワイヤソーによる切断法および加工液 |
JPH04218594A (ja) * | 1990-12-19 | 1992-08-10 | Nippon Steel Corp | ワイヤソーによる切断法および加工液 |
JP2000160185A (ja) * | 1998-12-02 | 2000-06-13 | Kyodo Yushi Co Ltd | 切断加工用水溶性油剤 |
JP2002096251A (ja) * | 1999-09-17 | 2002-04-02 | Sumitomo Special Metals Co Ltd | 希土類合金の切断方法および切断装置 |
JP4497767B2 (ja) * | 2001-09-06 | 2010-07-07 | ユシロ化学工業株式会社 | 固定砥粒ワイヤソー用水溶性加工液組成物 |
JP4601221B2 (ja) * | 2001-09-06 | 2010-12-22 | ユシロ化学工業株式会社 | 固定砥粒ワイヤソー用不水溶性加工油剤組成物 |
JP4601220B2 (ja) * | 2001-09-06 | 2010-12-22 | ユシロ化学工業株式会社 | 固定砥粒ワイヤソー用不水溶性加工油剤組成物 |
JP4497768B2 (ja) * | 2001-09-06 | 2010-07-07 | ユシロ化学工業株式会社 | 固定砥粒ワイヤソー用水溶性加工液組成物 |
JP4656804B2 (ja) * | 2001-10-17 | 2011-03-23 | 日立金属株式会社 | ワイヤソーを用いる切断方法および希土類磁石の製造方法 |
JP2006096951A (ja) * | 2004-09-30 | 2006-04-13 | Kyodo Yushi Co Ltd | 水溶性切断加工用油剤、スラリー、及び切断加工方法 |
JP4481898B2 (ja) * | 2005-07-25 | 2010-06-16 | ユシロ化学工業株式会社 | 水性砥粒分散媒組成物 |
JP5639996B2 (ja) * | 2009-03-31 | 2014-12-10 | 出光興産株式会社 | 脆性材料用加工液及び硬質材料用加工液 |
JP2010275537A (ja) * | 2009-04-28 | 2010-12-09 | Sanyo Chem Ind Ltd | 水溶性切削液 |
-
2009
- 2009-07-15 JP JP2009166962A patent/JP5679642B2/ja active Active
-
2010
- 2010-02-12 CN CN201080030425.7A patent/CN102471723B/zh active Active
- 2010-02-12 KR KR1020127000416A patent/KR20120049216A/ko active Search and Examination
- 2010-02-12 SG SG2011095171A patent/SG177321A1/en unknown
- 2010-02-12 WO PCT/JP2010/052095 patent/WO2011007590A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2011007590A1 (ja) | 2011-01-20 |
KR20120049216A (ko) | 2012-05-16 |
JP5679642B2 (ja) | 2015-03-04 |
JP2011021096A (ja) | 2011-02-03 |
CN102471723B (zh) | 2015-06-03 |
CN102471723A (zh) | 2012-05-23 |
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