NL1016959A1 - Jodoniumzouten als latente zuurdonoren. - Google Patents

Jodoniumzouten als latente zuurdonoren.

Info

Publication number
NL1016959A1
NL1016959A1 NL1016959A NL1016959A NL1016959A1 NL 1016959 A1 NL1016959 A1 NL 1016959A1 NL 1016959 A NL1016959 A NL 1016959A NL 1016959 A NL1016959 A NL 1016959A NL 1016959 A1 NL1016959 A1 NL 1016959A1
Authority
NL
Netherlands
Prior art keywords
iodonium salts
latent acid
acid donors
donors
latent
Prior art date
Application number
NL1016959A
Other languages
English (en)
Other versions
NL1016959C2 (nl
Inventor
Reinhard Schulz
Jean-Luc Birbaum
Jean-Pierre Wolf
Stephan Ilg
Hitoshi Yamato
Toshikage Asakura
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of NL1016959A1 publication Critical patent/NL1016959A1/nl
Application granted granted Critical
Publication of NL1016959C2 publication Critical patent/NL1016959C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C17/00—Preparation of halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/18—Polycyclic aromatic halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
NL1016959A 1999-12-21 2000-12-21 Jodoniumzouten als latente zuurdonoren. NL1016959C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH234399 1999-12-21
CH234399 1999-12-21

Publications (2)

Publication Number Publication Date
NL1016959A1 true NL1016959A1 (nl) 2001-06-25
NL1016959C2 NL1016959C2 (nl) 2002-08-27

Family

ID=4231594

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1016959A NL1016959C2 (nl) 1999-12-21 2000-12-21 Jodoniumzouten als latente zuurdonoren.

Country Status (22)

Country Link
US (1) US6306555B1 (nl)
JP (1) JP4966446B2 (nl)
KR (1) KR100753350B1 (nl)
CN (1) CN1213343C (nl)
AT (1) AT413103B (nl)
AU (1) AU778995B2 (nl)
BE (1) BE1013871A3 (nl)
BR (1) BR0006227B1 (nl)
CA (1) CA2328819C (nl)
CZ (1) CZ299309B6 (nl)
DE (1) DE10063066B4 (nl)
DK (1) DK176764B1 (nl)
ES (1) ES2181563B1 (nl)
FI (1) FI20002767A (nl)
FR (1) FR2802539B1 (nl)
GB (1) GB2357759B (nl)
IT (1) IT1319694B1 (nl)
MY (1) MY120646A (nl)
NL (1) NL1016959C2 (nl)
SE (1) SE522682C2 (nl)
SG (1) SG98433A1 (nl)
TW (1) TWI225183B (nl)

Families Citing this family (159)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6677390B1 (en) * 1999-08-02 2004-01-13 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
EP1136537A1 (en) * 2000-03-20 2001-09-26 Akzo Nobel N.V. Adhesive system
JP4156784B2 (ja) 2000-07-25 2008-09-24 富士フイルム株式会社 ネガ型画像記録材料及び画像形成方法
JP2002082429A (ja) * 2000-09-08 2002-03-22 Fuji Photo Film Co Ltd ネガ型画像記録材料
US6749987B2 (en) * 2000-10-20 2004-06-15 Fuji Photo Film Co., Ltd. Positive photosensitive composition
US6641971B2 (en) * 2001-06-15 2003-11-04 International Business Machines Corporation Resist compositions comprising silyl ketals and methods of use thereof
JP2003064135A (ja) * 2001-08-30 2003-03-05 Idemitsu Kosan Co Ltd 色変換材料組成物及びそれを用いた色変換膜
EP1289030A1 (en) * 2001-09-04 2003-03-05 Sony International (Europe) GmbH Doping of a hole transporting material
US6895156B2 (en) * 2001-10-09 2005-05-17 3M Innovative Properties Company Small diameter, high strength optical fiber
US6582886B1 (en) 2001-11-27 2003-06-24 Nupro Technologies, Inc. Developing solvent for photopolymerizable printing plates
US20050227183A1 (en) * 2002-01-11 2005-10-13 Mark Wagner Compositions and methods for image development of conventional chemically amplified photoresists
JP4557497B2 (ja) * 2002-03-03 2010-10-06 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物
WO2003087941A1 (fr) * 2002-04-18 2003-10-23 Nissan Chemical Industries, Ltd. Composition de resine positivement photosensible et procede de formation de motifs
CN100482694C (zh) * 2002-04-19 2009-04-29 西巴特殊化学品控股有限公司 等离子体诱发的涂层固化
JP4382364B2 (ja) * 2002-04-24 2009-12-09 株式会社東芝 液体インク
DE10224380A1 (de) * 2002-06-01 2003-12-18 Basf Coatings Ag Beschichtungsstoff, Verfahren zu seiner Herstellung und seine Verwendung zur Herstellung haftfester Beschichtungen
AT500298A1 (de) * 2002-06-14 2005-11-15 Agrolinz Melamin Gmbh Verfahren zur härtung von aminoplasten
DE10234369A1 (de) * 2002-07-27 2004-02-12 Henkel Kgaa Strahlungsvernetzbare Schmelzhaftklebstoffe
EP1550677B1 (en) * 2002-07-30 2007-02-28 Toagosei Co., Ltd. Composition for holography, method of curing the same, and cured article
JP4213925B2 (ja) * 2002-08-19 2009-01-28 富士フイルム株式会社 ネガ型レジスト組成物
TWI223736B (en) * 2002-12-19 2004-11-11 Ind Tech Res Inst Hybrid photoresist with multi reaction models and process for forming pattern using the same
US7160665B2 (en) * 2002-12-30 2007-01-09 International Business Machines Corporation Method for employing vertical acid transport for lithographic imaging applications
EP1605005B1 (en) * 2003-02-28 2013-12-04 Kuraray Co., Ltd. Curable resin composition
US7244473B2 (en) * 2003-04-22 2007-07-17 Konica Minolta Medical & Graphic, Inc. Active ray curable ink-jet composition, image forming method using the same, ink-jet recording apparatus, and triarylsulfonium salt compound
US7358408B2 (en) * 2003-05-16 2008-04-15 Az Electronic Materials Usa Corp. Photoactive compounds
US7122294B2 (en) * 2003-05-22 2006-10-17 3M Innovative Properties Company Photoacid generators with perfluorinated multifunctional anions
US20060222998A1 (en) * 2003-06-30 2006-10-05 Tsutomu Sato Positive photosensitive composition
US7235593B2 (en) 2003-08-04 2007-06-26 Rensselaer Polytechnic Institute Command-cure adhesives
KR100561842B1 (ko) * 2003-08-25 2006-03-16 삼성전자주식회사 단량체 광산발생제 조성물, 상기 조성물로 코팅된 기판,상기 단량체 광산발생제 조성물을 이용하여 기판상에서화합물을 합성하는 방법 및 상기 방법에 의하여 제조된마이크로어레이
JP2005105225A (ja) * 2003-10-02 2005-04-21 Konica Minolta Medical & Graphic Inc 活性光線硬化型インクジェットインク組成物
JP4037856B2 (ja) * 2003-10-28 2008-01-23 東芝テック株式会社 インクジェットインク
CN100523102C (zh) * 2003-10-28 2009-08-05 东芝泰格有限公司 喷墨油墨
JP4595311B2 (ja) * 2003-11-06 2010-12-08 コニカミノルタエムジー株式会社 活性光線硬化型インクジェットインク組成物、それを用いた画像形成方法及びインクジェット記録装置
JP2005153273A (ja) * 2003-11-25 2005-06-16 Nitto Denko Corp 樹脂シート、液晶セル基板、液晶表示装置、エレクトロルミネッセンス表示装置用基板、エレクトロルミネッセンス表示装置および太陽電池用基板
JP4384570B2 (ja) * 2003-12-01 2009-12-16 東京応化工業株式会社 厚膜用ホトレジスト組成物及びレジストパターンの形成方法
DE102004003143A1 (de) * 2004-01-21 2005-08-18 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen mit mercapto-funktionalisierten, radikalisch polymerisierbaren Monomeren
JP2007523974A (ja) * 2004-01-27 2007-08-23 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 熱安定性のカチオン光硬化性組成物
GB0411842D0 (en) * 2004-05-27 2004-06-30 Ici Plc Colour changing coating composition
JP4606136B2 (ja) 2004-06-09 2011-01-05 富士通株式会社 多層体、レジストパターン形成方法、微細加工パターンを有する装置の製造方法および電子装置
JP3910979B2 (ja) * 2004-07-29 2007-04-25 東芝テック株式会社 インクジェットインク組成物およびそれを用いた印刷物
JP4152928B2 (ja) * 2004-08-02 2008-09-17 株式会社シンク・ラボラトリー ポジ型感光性組成物
US7592376B2 (en) * 2004-08-23 2009-09-22 Rensselaer Polytechnic Institute Photopolymerizable epoxide and oxetane compositions
US20060046183A1 (en) * 2004-08-26 2006-03-02 Wang Yueh Photoresist formulation with surfactant additive
US20060093844A1 (en) * 2004-10-29 2006-05-04 Conklin Jeanine A Photochromic coating compositions, methods of making coated articles and articles thereof
US7927778B2 (en) * 2004-12-29 2011-04-19 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal
US7951522B2 (en) * 2004-12-29 2011-05-31 Tokyo Ohka Kogyo Co., Ltd. Chemically amplified positive photoresist composition for thick film, thick-film photoresist laminated product, manufacturing method for thick-film resist pattern, and manufacturing method for connection terminal
WO2006081534A1 (en) * 2005-01-28 2006-08-03 Micell Technologies, Inc. Compositions and methods for image development of conventional chemically amplified photoresists
US7410751B2 (en) * 2005-01-28 2008-08-12 Micell Technologies, Inc. Compositions and methods for image development of conventional chemically amplified photoresists
US20060172230A1 (en) 2005-02-02 2006-08-03 Dsm Ip Assets B.V. Method and composition for reducing waste in photo-imaging applications
EP1705007B1 (en) * 2005-03-23 2012-06-06 FUJIFILM Corporation Lithographic printing plate precursor and lithographic printing method
TWI332122B (en) * 2005-04-06 2010-10-21 Shinetsu Chemical Co Novel sulfonate salts and derivatives, photoacid generators, resist compositions and patterning process
CA2602628A1 (en) * 2005-04-07 2006-10-12 Alstom Technology Ltd. Method for repairing or renewing cooling holes of a coated component of a gas turbine
JP4724465B2 (ja) * 2005-05-23 2011-07-13 富士フイルム株式会社 感光性組成物及び該感光性組成物を用いたパターン形成方法
KR100732301B1 (ko) * 2005-06-02 2007-06-25 주식회사 하이닉스반도체 포토레지스트 중합체, 포토레지스트 조성물 및 이를 이용한반도체 소자의 제조 방법
CN1904736B (zh) * 2005-07-25 2012-06-13 日产化学工业株式会社 正型感光性树脂组合物和由其得到的固化膜
GB0516515D0 (en) * 2005-08-11 2005-09-21 Sun Chemical Bv A jet ink and ink jet printing process
JP5193041B2 (ja) * 2005-08-23 2013-05-08 ピーエスティ・センサーズ・（プロプライエタリー）・リミテッド 粒状半導体材料のドーピング
JP4979915B2 (ja) * 2005-09-09 2012-07-18 東京応化工業株式会社 高分子化合物、ネガ型レジスト組成物およびレジストパターン形成方法
US7695890B2 (en) * 2005-09-09 2010-04-13 Brewer Science Inc. Negative photoresist for silicon KOH etch without silicon nitride
JP4770354B2 (ja) * 2005-09-20 2011-09-14 日立化成工業株式会社 光硬化性樹脂組成物及びこれを用いたパターン形成方法
EP1780198B1 (en) * 2005-10-31 2011-10-05 Shin-Etsu Chemical Co., Ltd. Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
EP1780199B1 (en) * 2005-10-31 2012-02-01 Shin-Etsu Chemical Co., Ltd. Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
KR100777561B1 (ko) * 2005-11-24 2007-11-28 주식회사 엘지화학 알칼리 가용성 수지 및 이를 포함하는 감광성 수지 조성물
US7989517B2 (en) * 2005-11-28 2011-08-02 Konica Minolta Medical & Graphic, Inc. Actinic ray curable composition, actinic ray curable ink, and image formation process employing the same
US7696260B2 (en) * 2006-03-30 2010-04-13 Dsm Ip Assets B.V. Cationic compositions and methods of making and using the same
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
JP5124805B2 (ja) * 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP5124806B2 (ja) * 2006-06-27 2013-01-23 信越化学工業株式会社 光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
US7846639B2 (en) * 2006-06-30 2010-12-07 E. I. Du Pont De Nemours And Company Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element
KR101256301B1 (ko) * 2006-07-19 2013-04-18 히타치가세이가부시끼가이샤 유기 일렉트로닉스용 재료, 유기 일렉트로닉스 소자 및 유기 일렉트로루미네센스 소자
US7332253B1 (en) * 2006-07-27 2008-02-19 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
RU2453886C2 (ru) * 2006-08-24 2012-06-20 Циба Холдинг Инк. Индикаторы дозы уф-излучения
US7326521B1 (en) * 2006-08-31 2008-02-05 Eastman Kodak Company Method of imaging and developing negative-working elements
JP5430821B2 (ja) * 2006-09-19 2014-03-05 東京応化工業株式会社 レジストパターン形成方法
KR101035742B1 (ko) * 2006-09-28 2011-05-20 신에쓰 가가꾸 고교 가부시끼가이샤 신규 광산 발생제 및 이것을 이용한 레지스트 재료 및 패턴형성 방법
EP2076563B1 (en) * 2006-10-24 2016-08-17 Basf Se Thermally stable cationic photocurable compositions
US7491482B2 (en) * 2006-12-04 2009-02-17 Az Electronic Materials Usa Corp. Photoactive compounds
KR20080064456A (ko) * 2007-01-05 2008-07-09 주식회사 하이닉스반도체 반도체 소자의 미세 패턴 형성 방법
EP2109001B1 (en) * 2007-01-22 2012-01-11 Nissan Chemical Industries, Ltd. Positive photosensitive resin composition
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
JP5019071B2 (ja) 2007-09-05 2012-09-05 信越化学工業株式会社 新規光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
US8470518B2 (en) * 2007-09-14 2013-06-25 E I Du Pont De Nemours And Company Photosensitive element having reinforcing particles and method for preparing a printing form from the element
US8042976B2 (en) * 2007-11-30 2011-10-25 Taiyo Holdings Co., Ltd. White hardening resin composition, hardened material, printed-wiring board and reflection board for light emitting device
EP2098367A1 (en) 2008-03-05 2009-09-09 Eastman Kodak Company Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates
JP5245956B2 (ja) 2008-03-25 2013-07-24 信越化学工業株式会社 新規光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
US8084182B2 (en) 2008-04-29 2011-12-27 Eastman Kodak Company On-press developable elements and methods of use
JP4569786B2 (ja) 2008-05-01 2010-10-27 信越化学工業株式会社 新規光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
JP5199752B2 (ja) * 2008-06-30 2013-05-15 住友化学株式会社 有機薄膜トランジスタ及びその製造方法、並びにこの有機トランジスタを用いたディスプレイ用部材及びディスプレイ
US8168367B2 (en) * 2008-07-11 2012-05-01 Shin-Etsu Chemical Co., Ltd. Resist composition and patterning process
JP5106285B2 (ja) 2008-07-16 2012-12-26 富士フイルム株式会社 光硬化性組成物、インク組成物、及び該インク組成物を用いたインクジェット記録方法
TWI400226B (zh) * 2008-10-17 2013-07-01 Shinetsu Chemical Co 具有聚合性陰離子之鹽及高分子化合物、光阻劑材料及圖案形成方法
JP4813537B2 (ja) 2008-11-07 2011-11-09 信越化学工業株式会社 熱酸発生剤を含有するレジスト下層材料、レジスト下層膜形成基板及びパターン形成方法
EP2189845B1 (en) * 2008-11-19 2017-08-02 Rohm and Haas Electronic Materials LLC Compositions and processes for photolithography
DE102008058177A1 (de) * 2008-11-20 2010-06-24 Eos Gmbh Electro Optical Systems Verfahren zur Identifizierung von Lasersinterpulvern
WO2010061886A1 (ja) * 2008-11-28 2010-06-03 日産化学工業株式会社 薄膜トランジスタ用ゲート絶縁膜形成組成物
TWI417274B (zh) * 2008-12-04 2013-12-01 Shinetsu Chemical Co 鹽、酸發生劑及使用其之抗蝕劑材料、空白光罩，及圖案形成方法
GB0823282D0 (en) * 2008-12-20 2009-01-28 Univ Strathclyde Dose responsive UV indicator
JP2010181843A (ja) * 2009-02-09 2010-08-19 Seiko Epson Corp 印刷版の製造方法および印刷版製造用光硬化性液体
JP5368270B2 (ja) * 2009-02-19 2013-12-18 信越化学工業株式会社 新規スルホン酸塩及びその誘導体、光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
ES2621939T3 (es) 2009-03-24 2017-07-05 Igm Malta Limited Nuevos fotoiniciadores oligofuncionales
JP5287552B2 (ja) * 2009-07-02 2013-09-11 信越化学工業株式会社 光酸発生剤並びにレジスト材料及びパターン形成方法
EP2459519B1 (en) 2009-07-30 2017-11-29 Basf Se Macrophotoinitiators
US8772376B2 (en) * 2009-08-18 2014-07-08 International Business Machines Corporation Near-infrared absorbing film compositions
JP5584573B2 (ja) * 2009-12-01 2014-09-03 信越化学工業株式会社 ネガ型レジスト組成物及びパターン形成方法
US8993042B2 (en) * 2010-01-06 2015-03-31 Toyota Motor Engineering & Manufacturing North America, Inc. Method for determining the production parameters for a substrate coating process
JP5598350B2 (ja) * 2010-02-16 2014-10-01 信越化学工業株式会社 電子線用又はｅｕｖ用化学増幅ネガ型レジスト組成物及びパターン形成方法
CN103119080B (zh) * 2010-09-24 2015-07-29 电气化学工业株式会社 能量射线固化性树脂组合物与使用该组合物的粘合剂及固化体
CN102241562A (zh) * 2011-05-18 2011-11-16 常州大学 对称性芳基碘鎓盐酸盐的制备方法
BR112013032523B1 (pt) 2011-06-21 2021-02-02 Basf Se método para a formação de uma microestrutura de relevo de superfície
AU2013276625B2 (en) 2012-06-14 2017-09-14 Basf Se Method for manufacturing security elements and holograms
KR102091871B1 (ko) 2012-07-26 2020-03-20 덴카 주식회사 수지 조성물
WO2014041121A1 (en) 2012-09-17 2014-03-20 Basf Se Security elements and method for their manufacture
EP2909165B1 (en) 2012-10-19 2018-05-30 IGM Group B.V. Hybrid photoinitiators
EP2912011A4 (en) * 2012-10-27 2016-11-09 Ground Fluor Pharmaceuticals Inc METHODS AND REAGENTS FOR MANUFACTURING DIARYLIODONIUM SALTS
CN105051087A (zh) 2012-12-18 2015-11-11 巴斯夫欧洲公司 基于萘二酰亚胺-亚乙烯基-低聚噻吩-亚乙烯基聚合物的半导体材料
CN114181249A (zh) 2012-12-19 2022-03-15 Igm集团公司 双酰基次膦酸的衍生物、其制备及其作为光敏引发剂的用途
CN105392851B (zh) 2013-05-21 2018-09-11 巴斯夫欧洲公司 安全元件及其生产方法
US9796740B2 (en) 2013-07-08 2017-10-24 Basf Se Liquid bisacylphosphine oxide photoinitiator
KR102072599B1 (ko) * 2013-07-11 2020-02-04 동우 화인켐 주식회사 롤 프린팅용 잉크 조성물
EP3052701B1 (en) 2013-10-04 2017-06-28 Basf Se High gloss metal effect papers
CN104628517A (zh) * 2013-11-08 2015-05-20 上海予利化学科技有限公司 阳离子光引发剂4-异丙基苯基-4’-甲基苯基碘鎓对甲苯磺酸盐的制备方法
JP6046646B2 (ja) * 2014-01-10 2016-12-21 信越化学工業株式会社 オニウム塩、化学増幅型ポジ型レジスト組成物、及びパターン形成方法
CN105916937B (zh) 2014-01-23 2018-11-16 电化株式会社 树脂组合物
CN107428892B (zh) * 2015-03-23 2021-05-04 陶氏环球技术有限责任公司 用于三维打印的光固化性组合物
CN107429491A (zh) 2015-03-30 2017-12-01 巴斯夫欧洲公司 高光泽金属效应纸和板
US10106643B2 (en) * 2015-03-31 2018-10-23 3M Innovative Properties Company Dual-cure nanostructure transfer film
US20160319414A1 (en) * 2015-04-28 2016-11-03 Case Western Reserve University Poly (Acrylic Acid) Modified Cellulose Fiber Materials
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
WO2016200972A1 (en) * 2015-06-08 2016-12-15 Dsm Ip Assets B.V. Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
AT517626B1 (de) * 2015-09-02 2017-06-15 Technische Universität Wien Verwendung neuer Aryliodonium- und Sulfoniumsalze als Photoinitiatoren
CN105884570B (zh) * 2016-04-20 2019-04-05 华东理工大学 含氟二芳基碘盐及其用途
DE102016111590A1 (de) 2016-06-24 2017-12-28 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Einkomponentenmasse auf Basis von Alkoxysilanen und Verfahren zum Fügen oder Vergießen von Bauteilen unter Verwendung der Masse
JP7084402B2 (ja) * 2016-12-22 2022-06-14 イラミーナ インコーポレーテッド インプリント装置
DE102017126215A1 (de) 2017-11-09 2019-05-09 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren
EP3784499A1 (en) 2018-04-25 2021-03-03 Basf Se Process for the production of strongly adherent (embossed) films on flexible substrates
KR20210065126A (ko) 2018-09-24 2021-06-03 바스프 에스이 3d 인쇄에 사용하기 위한 uv 경화성 조성물
WO2020064522A1 (en) 2018-09-24 2020-04-02 Basf Se Photocurable composition for use in 3d printing
MX2021004736A (es) 2018-10-25 2021-06-04 Basf Se Composiciones, que comprenden nanoplaquetas de plata.
DE102018127854A1 (de) 2018-11-08 2020-05-14 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Feuchtigkeitshärtbare Einkomponentenmasse und Verfahren zum Fügen, Vergießen und Beschichten unter Verwendung der Masse
US20220064367A1 (en) 2018-12-10 2022-03-03 Delo Industrie Klebstoffe Gmbh & Co. Kgaa Cationically curable composition and method for the joining, casting and coating of substrates using the composition
JP7161392B2 (ja) * 2018-12-20 2022-10-26 クラレノリタケデンタル株式会社 エネルギー線硬化性立体造形用組成物
EP3680274A1 (en) 2019-01-14 2020-07-15 Basf Se Hydroxyurethane (meth)acrylate prepolymers for use in 3d printing
EP3680263A1 (en) 2019-01-14 2020-07-15 Basf Se Limonene-based (meth)acrylates for use in 3d printing
EP3914458B1 (en) 2019-01-21 2022-12-21 Basf Se Security element
US20220088957A1 (en) 2019-01-29 2022-03-24 Basf Se Security element
US20220220284A1 (en) 2019-05-06 2022-07-14 Basf Se Compositions, comprising silver nanoplatelets
WO2021020975A1 (en) * 2019-07-30 2021-02-04 Damar Industries Limited Rapid cure paint technology
JP2023500370A (ja) 2019-11-07 2023-01-05 ビーエーエスエフ ソシエタス・ヨーロピア ３ｄ印刷で使用するための水洗可能な組成物
KR20220101662A (ko) 2019-11-14 2022-07-19 메르크 파텐트 게엠베하 알칼리-가용성 아크릴 수지를 포함하는 dnq-타입 포토레지스트 조성물
CN115279518A (zh) 2020-04-23 2022-11-01 巴斯夫欧洲公司 包含片状过渡金属颗粒的组合物
FR3121623B1 (fr) * 2021-04-09 2023-06-16 S A S 3Dceram Sinto Composition durcissable pour la fabrication, par stereolithographie, de pieces crues en materiau ceramique ou metallique par voie photo-thermique
US20230017655A1 (en) * 2021-07-12 2023-01-19 Raytheon Company Ultraviolet curable epoxy dielectric ink
TWI820512B (zh) * 2021-11-10 2023-11-01 位元奈米科技股份有限公司 電容感應辨識標籤
DE102021006273A1 (de) * 2021-12-21 2023-06-22 Lohmann Gmbh & Co. Kg Indikatormischung
CN114315584A (zh) * 2021-12-30 2022-04-12 宁波南大光电材料有限公司 一种光敏剂及其制备方法
WO2023170132A1 (en) 2022-03-10 2023-09-14 Basf Se Casting lacquer for screen printing
KR20230143709A (ko) 2022-04-06 2023-10-13 이피캠텍 주식회사 광개시제용 디페닐요오도늄 염 및 그의 제조 방법

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2070614A (en) * 1935-05-22 1937-02-16 Melville Robert Braking mechanism
US5314929A (en) * 1992-08-10 1994-05-24 Isp Investments Inc. Rapidly curable vinyl ether release coatings
JPH07179511A (ja) * 1993-12-22 1995-07-18 Japan Carlit Co Ltd:The 光重合性樹脂組成物
JP3337827B2 (ja) * 1994-07-12 2002-10-28 富士写真フイルム株式会社 ポジ型感光性組成物
JP3384119B2 (ja) * 1994-07-22 2003-03-10 東洋インキ製造株式会社 光開始剤組成物、光重合性組成物および光重合方法
JPH08220762A (ja) * 1995-02-14 1996-08-30 Fuji Photo Film Co Ltd ポジ型感光性組成物
JPH09179305A (ja) * 1995-12-27 1997-07-11 Toshiba Corp 感光性組成物、パターン形成方法および着色膜の形成方法
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
FR2762001B1 (fr) * 1997-04-11 1999-07-02 Rhodia Chimie Sa Amorceurs non toxiques, resines a groupements organofonctionnels reticulables comprenant les amorceurs, et leur utilisation pour la preparation de polymeres stables et non toxiques
FR2766490B1 (fr) * 1997-07-23 1999-10-08 Rhodia Chimie Sa Nouveaux systemes amorceurs de polymerisation et/ou de reticulation comprenant un borate d'onium et une benzophenone
DE19736471A1 (de) * 1997-08-21 1999-02-25 Espe Dental Ag Lichtinduziert kationisch härtende Zusammensetzungen und deren Verwendung
DE19739299A1 (de) * 1997-09-08 1999-03-11 Agfa Gevaert Ag Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck
US6498200B1 (en) * 1999-01-12 2002-12-24 Namics Corporation Cationically polymerizable resin composition

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