MX2015011729A - Espejo optico, dispositivo para analisis de fluorescencia de rayos x y metodo para analisis de fluorescencia de rayos x. - Google Patents

Espejo optico, dispositivo para analisis de fluorescencia de rayos x y metodo para analisis de fluorescencia de rayos x.

Info

Publication number
MX2015011729A
MX2015011729A MX2015011729A MX2015011729A MX2015011729A MX 2015011729 A MX2015011729 A MX 2015011729A MX 2015011729 A MX2015011729 A MX 2015011729A MX 2015011729 A MX2015011729 A MX 2015011729A MX 2015011729 A MX2015011729 A MX 2015011729A
Authority
MX
Mexico
Prior art keywords
ray fluorescence
fluorescence analysis
sample
carrier
ray
Prior art date
Application number
MX2015011729A
Other languages
English (en)
Other versions
MX345821B (es
Inventor
Volker Rössiger
Original Assignee
Helmut Fischer Gmbh Inst Für Elektronik Und Messtechnik
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Helmut Fischer Gmbh Inst Für Elektronik Und Messtechnik filed Critical Helmut Fischer Gmbh Inst Für Elektronik Und Messtechnik
Publication of MX2015011729A publication Critical patent/MX2015011729A/es
Publication of MX345821B publication Critical patent/MX345821B/es

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

La presente invención se refiere a un dispositivo para análisis de fluorescencia de rayos X, que comprende una fuente de rayos X para radiar una muestra con radiación de rayos X, un detector de rayos X para medir la radiación de fluorescencia de rayos X emitida por la muestra, y una cámara para producir una imagen óptica de control del punto de medición radiado de la muestra mediante el espejo óptico dispuesto a un ángulo en la trayectoria del haz de la fuente de rayos X, en donde el espejo óptico comprende un soporte que tiene una capa reflejante provista sobre el soporte. A fin de crear un dispositivo de fluorescencia de rayos X mediante el que son posibles registros de control realistas de la muestra a analizarse, la presente invención suministra un espejo óptico con una ventanilla de paso para la radiación de rayos X, que está formado por una abertura en el soporte y una hoja que forma la capa reflejante y que cubre la abertura sobre una superficie exterior del soporte.
MX2015011729A 2013-03-07 2014-02-27 Espejo óptico, dispositivo para análisis de fluorescencia de rayos x y método para análisis de fluorescencia de rayos x. MX345821B (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102013102270.7A DE102013102270A1 (de) 2013-03-07 2013-03-07 Optischer Spiegel, Röntgenfluoreszenzanalysegerät und Verfahren zur Röntgenfluoreszenzanalyse
PCT/EP2014/053799 WO2014135429A1 (de) 2013-03-07 2014-02-27 Optischer spiegel, röntgenfluoreszenzanalysegerät und verfahren zur röntgenfluoreszenzanalyse

Publications (2)

Publication Number Publication Date
MX2015011729A true MX2015011729A (es) 2016-01-15
MX345821B MX345821B (es) 2017-02-16

Family

ID=50190427

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2015011729A MX345821B (es) 2013-03-07 2014-02-27 Espejo óptico, dispositivo para análisis de fluorescencia de rayos x y método para análisis de fluorescencia de rayos x.

Country Status (11)

Country Link
US (1) US9880329B2 (es)
EP (1) EP2965067B1 (es)
JP (1) JP6521384B2 (es)
KR (1) KR102190465B1 (es)
CN (2) CN110702718A (es)
CA (1) CA2899081C (es)
DE (1) DE102013102270A1 (es)
ES (1) ES2835715T3 (es)
HK (1) HK1212027A1 (es)
MX (1) MX345821B (es)
WO (1) WO2014135429A1 (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101716860B1 (ko) * 2016-05-30 2017-03-27 주식회사 아이에스피 엑스선 형광분석 장치
KR20180052019A (ko) * 2016-11-09 2018-05-17 고려대학교 산학협력단 X선 형광분석 원자층 증착 장치 및 x선 형광분석 원자층 증착 방법
JP6952055B2 (ja) * 2016-12-15 2021-10-20 株式会社堀場製作所 放射線検出装置
CN106802428B (zh) * 2017-01-19 2019-01-01 中国科学院上海应用物理研究所 一种耐辐射和高热负载的x射线成像探测器
US11819286B2 (en) * 2018-06-25 2023-11-21 Mirion Technologies (Canberra) Sas Apparatus for visualizing a movable radiation source
KR102209768B1 (ko) 2019-05-20 2021-01-29 (주)고도기연 정밀노즐 세척 장치
DE102022105838B3 (de) 2022-03-14 2023-08-17 Helmut Fischer GmbH Institut für Elektronik und Messtechnik Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät
CN115993713B (zh) * 2023-03-22 2023-06-09 西安玄瑞光电科技有限公司 一种折反式超大视场x射线显微耦合光学成像***

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54178532U (es) * 1978-06-06 1979-12-17
JPS5758300U (es) * 1980-09-22 1982-04-06
JPS57129156U (es) 1981-02-04 1982-08-12
DE3314281A1 (de) 1982-10-23 1984-10-25 Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen Vorrichtung zum messen der dicke duenner schichten
DE3239379A1 (de) * 1982-10-23 1984-04-26 Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen Vorrichtung zum messen der dicke duenner schichten
JPH01257210A (ja) * 1988-04-06 1989-10-13 Seiko Instr Inc ケイ光ｘ線膜厚計
DE4021388A1 (de) * 1990-07-05 1992-01-16 Twin City Int Inc Vorrichtung zum messen der staerke eines ueberzuges
US5247395A (en) * 1992-05-11 1993-09-21 Eugene Martinez Thin film mirror
US5708696A (en) * 1996-09-17 1998-01-13 Dentsply Research & Development Corp. Positioning device for an X-ray machine
DE19710420C2 (de) 1997-03-13 2001-07-12 Helmut Fischer Gmbh & Co Verfahren und Vorrichtung zum Messen der Dicken dünner Schichten mittels Röntgenfluoreszenz
JP3883153B2 (ja) * 1998-04-10 2007-02-21 松下電器産業株式会社 Ｘ線基板検査装置
JP3996821B2 (ja) * 2002-03-27 2007-10-24 株式会社堀場製作所 Ｘ線分析装置
CN1603945A (zh) 2003-09-29 2005-04-06 Ge医疗***环球技术有限公司 光辐照器，灯组件和x射线装置
JP5231574B2 (ja) * 2008-01-28 2013-07-10 リフレクティブ エックス−レイ オプティクス エルエルシー Ｘ線撮影法によるｘ線撮像のための光学位置合わせシステムおよび位置合わせ方法
DE102009009602A1 (de) * 2008-10-27 2010-04-29 Ifg - Institute For Scientific Instruments Gmbh Spektralauflösende elektronische Röntgenkamera
DE102010017543A1 (de) * 2010-06-23 2011-12-29 Surgiceye Gmbh Vorrichtung und Verfahren zur kombinierten optischen und nuklearen Bilderfassung

Also Published As

Publication number Publication date
HK1212027A1 (zh) 2016-07-08
US9880329B2 (en) 2018-01-30
US20150362639A1 (en) 2015-12-17
DE102013102270A1 (de) 2014-09-11
ES2835715T3 (es) 2021-06-23
MX345821B (es) 2017-02-16
CA2899081A1 (en) 2014-09-12
CN110702718A (zh) 2020-01-17
EP2965067B1 (de) 2020-09-09
CA2899081C (en) 2021-04-06
JP2016509231A (ja) 2016-03-24
EP2965067A1 (de) 2016-01-13
KR102190465B1 (ko) 2020-12-14
CN105008905A (zh) 2015-10-28
KR20150128721A (ko) 2015-11-18
JP6521384B2 (ja) 2019-05-29
WO2014135429A1 (de) 2014-09-12

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