HK1212027A1 - 光學鏡、 射線熒光分析裝置以及 射線熒光分析方法 - Google Patents
光學鏡、 射線熒光分析裝置以及 射線熒光分析方法Info
- Publication number
- HK1212027A1 HK1212027A1 HK15112747.4A HK15112747A HK1212027A1 HK 1212027 A1 HK1212027 A1 HK 1212027A1 HK 15112747 A HK15112747 A HK 15112747A HK 1212027 A1 HK1212027 A1 HK 1212027A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- ray fluorescence
- fluorescence analysis
- optical mirror
- analysis device
- ray
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
- G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102013102270.7A DE102013102270A1 (de) | 2013-03-07 | 2013-03-07 | Optischer Spiegel, Röntgenfluoreszenzanalysegerät und Verfahren zur Röntgenfluoreszenzanalyse |
PCT/EP2014/053799 WO2014135429A1 (de) | 2013-03-07 | 2014-02-27 | Optischer spiegel, röntgenfluoreszenzanalysegerät und verfahren zur röntgenfluoreszenzanalyse |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1212027A1 true HK1212027A1 (zh) | 2016-07-08 |
Family
ID=50190427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK15112747.4A HK1212027A1 (zh) | 2013-03-07 | 2015-12-28 | 光學鏡、 射線熒光分析裝置以及 射線熒光分析方法 |
Country Status (11)
Country | Link |
---|---|
US (1) | US9880329B2 (zh) |
EP (1) | EP2965067B1 (zh) |
JP (1) | JP6521384B2 (zh) |
KR (1) | KR102190465B1 (zh) |
CN (2) | CN110702718A (zh) |
CA (1) | CA2899081C (zh) |
DE (1) | DE102013102270A1 (zh) |
ES (1) | ES2835715T3 (zh) |
HK (1) | HK1212027A1 (zh) |
MX (1) | MX345821B (zh) |
WO (1) | WO2014135429A1 (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101716860B1 (ko) * | 2016-05-30 | 2017-03-27 | 주식회사 아이에스피 | 엑스선 형광분석 장치 |
KR20180052019A (ko) * | 2016-11-09 | 2018-05-17 | 고려대학교 산학협력단 | X선 형광분석 원자층 증착 장치 및 x선 형광분석 원자층 증착 방법 |
US10823688B2 (en) * | 2016-12-15 | 2020-11-03 | Horiba, Ltd. | Radiation detection device |
CN106802428B (zh) * | 2017-01-19 | 2019-01-01 | 中国科学院上海应用物理研究所 | 一种耐辐射和高热负载的x射线成像探测器 |
EP3645115B1 (en) * | 2018-06-25 | 2021-05-12 | Mirion Technologies (Canberra), Inc. | Apparatus for visualizing a movable radiation source |
KR102209768B1 (ko) | 2019-05-20 | 2021-01-29 | (주)고도기연 | 정밀노즐 세척 장치 |
DE102022105838B3 (de) | 2022-03-14 | 2023-08-17 | Helmut Fischer GmbH Institut für Elektronik und Messtechnik | Justiereinheit für eine Röntgenoptik in einem Röntgenfluoreszenzgerät sowie Röntgenfluoreszenzgerät |
CN115993713B (zh) * | 2023-03-22 | 2023-06-09 | 西安玄瑞光电科技有限公司 | 一种折反式超大视场x射线显微耦合光学成像*** |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54178532U (zh) * | 1978-06-06 | 1979-12-17 | ||
JPS5758300U (zh) * | 1980-09-22 | 1982-04-06 | ||
JPS57129156U (zh) * | 1981-02-04 | 1982-08-12 | ||
DE3239379A1 (de) * | 1982-10-23 | 1984-04-26 | Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen | Vorrichtung zum messen der dicke duenner schichten |
DE3314281A1 (de) | 1982-10-23 | 1984-10-25 | Helmut Fischer GmbH & Co Institut für Elektronik und Meßtechnik, 7032 Sindelfingen | Vorrichtung zum messen der dicke duenner schichten |
JPH01257210A (ja) * | 1988-04-06 | 1989-10-13 | Seiko Instr Inc | ケイ光x線膜厚計 |
DE4021388A1 (de) * | 1990-07-05 | 1992-01-16 | Twin City Int Inc | Vorrichtung zum messen der staerke eines ueberzuges |
US5247395A (en) * | 1992-05-11 | 1993-09-21 | Eugene Martinez | Thin film mirror |
US5708696A (en) * | 1996-09-17 | 1998-01-13 | Dentsply Research & Development Corp. | Positioning device for an X-ray machine |
DE19710420C2 (de) | 1997-03-13 | 2001-07-12 | Helmut Fischer Gmbh & Co | Verfahren und Vorrichtung zum Messen der Dicken dünner Schichten mittels Röntgenfluoreszenz |
JP3883153B2 (ja) * | 1998-04-10 | 2007-02-21 | 松下電器産業株式会社 | X線基板検査装置 |
JP3996821B2 (ja) * | 2002-03-27 | 2007-10-24 | 株式会社堀場製作所 | X線分析装置 |
CN1603945A (zh) | 2003-09-29 | 2005-04-06 | Ge医疗***环球技术有限公司 | 光辐照器,灯组件和x射线装置 |
WO2009097323A2 (en) * | 2008-01-28 | 2009-08-06 | Reflective X-Ray Optics Llc | Optical alignment system and alignment method for radiographic x-ray imaging |
DE102009009602A1 (de) * | 2008-10-27 | 2010-04-29 | Ifg - Institute For Scientific Instruments Gmbh | Spektralauflösende elektronische Röntgenkamera |
DE102010017543A1 (de) * | 2010-06-23 | 2011-12-29 | Surgiceye Gmbh | Vorrichtung und Verfahren zur kombinierten optischen und nuklearen Bilderfassung |
-
2013
- 2013-03-07 DE DE102013102270.7A patent/DE102013102270A1/de not_active Withdrawn
-
2014
- 2014-02-27 ES ES14707366T patent/ES2835715T3/es active Active
- 2014-02-27 KR KR1020157025068A patent/KR102190465B1/ko active IP Right Grant
- 2014-02-27 CN CN201911010330.8A patent/CN110702718A/zh active Pending
- 2014-02-27 JP JP2015560622A patent/JP6521384B2/ja active Active
- 2014-02-27 WO PCT/EP2014/053799 patent/WO2014135429A1/de active Application Filing
- 2014-02-27 MX MX2015011729A patent/MX345821B/es active IP Right Grant
- 2014-02-27 CN CN201480011675.4A patent/CN105008905A/zh active Pending
- 2014-02-27 US US14/761,493 patent/US9880329B2/en active Active
- 2014-02-27 CA CA2899081A patent/CA2899081C/en active Active
- 2014-02-27 EP EP14707366.2A patent/EP2965067B1/de active Active
-
2015
- 2015-12-28 HK HK15112747.4A patent/HK1212027A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR20150128721A (ko) | 2015-11-18 |
DE102013102270A1 (de) | 2014-09-11 |
JP6521384B2 (ja) | 2019-05-29 |
CN110702718A (zh) | 2020-01-17 |
EP2965067B1 (de) | 2020-09-09 |
ES2835715T3 (es) | 2021-06-23 |
EP2965067A1 (de) | 2016-01-13 |
JP2016509231A (ja) | 2016-03-24 |
WO2014135429A1 (de) | 2014-09-12 |
CN105008905A (zh) | 2015-10-28 |
US20150362639A1 (en) | 2015-12-17 |
CA2899081A1 (en) | 2014-09-12 |
US9880329B2 (en) | 2018-01-30 |
CA2899081C (en) | 2021-04-06 |
MX345821B (es) | 2017-02-16 |
KR102190465B1 (ko) | 2020-12-14 |
MX2015011729A (es) | 2016-01-15 |
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