KR970077314A - Semiconductor dry etching method - Google Patents
Semiconductor dry etching method Download PDFInfo
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- KR970077314A KR970077314A KR1019960017917A KR19960017917A KR970077314A KR 970077314 A KR970077314 A KR 970077314A KR 1019960017917 A KR1019960017917 A KR 1019960017917A KR 19960017917 A KR19960017917 A KR 19960017917A KR 970077314 A KR970077314 A KR 970077314A
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- South Korea
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- etching
- etching step
- dry etching
- wafer
- helium
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- Drying Of Semiconductors (AREA)
Abstract
웨이퍼 상에 사다리꼴형상의 프로파일(Profile)을 형성할 수 있는 반도체 건식식각방법에 관한 것이다.To a semiconductor dry etching method capable of forming a trapezoidal profile on a wafer.
본 발명은, 통상의 사진공정이 진행된 웨이퍼를 헬륨(He)과 설퍼 헥사플루오라이드(SF6)가 혼합된 가스를 이용하여 식각하는 제1식각단계, 및 상기 제1단계를 수행한 웨이퍼를 헬륨(He)과 설퍼 헥사플루오라이드(SF6) 그리고 산소(O2)가 혼합된 가스를 이용하여 식각하는 제2식각단계를 구비하여 이루어진다.The present invention relates to a method of manufacturing a semiconductor device, comprising: a first etching step of etching a wafer on which a normal photolithography step has been performed using a gas in which helium (He) and sulfur hexafluoride (SF 6 ) And a second etching step of performing etching using a mixed gas of helium (He), sulfur hexafluoride (SF 6 ), and oxygen (O 2 ).
따라서, 건식식각시 산소가스를 이용하여 웨이퍼 상에 사다리꼴 형상의 프로파일을 형성할 수 있는 효과가 있다.Accordingly, it is possible to form a trapezoidal profile on the wafer by using oxygen gas during dry etching.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제1도는 본 발명에 따른 반도체 건식식각방법의 일 실시예를 나타내는 공정도이다.FIG. 1 is a process diagram showing an embodiment of a semiconductor dry etching method according to the present invention.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960017917A KR970077314A (en) | 1996-05-25 | 1996-05-25 | Semiconductor dry etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960017917A KR970077314A (en) | 1996-05-25 | 1996-05-25 | Semiconductor dry etching method |
Publications (1)
Publication Number | Publication Date |
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KR970077314A true KR970077314A (en) | 1997-12-12 |
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ID=66220359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1019960017917A KR970077314A (en) | 1996-05-25 | 1996-05-25 | Semiconductor dry etching method |
Country Status (1)
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KR (1) | KR970077314A (en) |
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1996
- 1996-05-25 KR KR1019960017917A patent/KR970077314A/en not_active Application Discontinuation
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