KR970067667A - Polymer removal method - Google Patents

Polymer removal method Download PDF

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Publication number
KR970067667A
KR970067667A KR1019960006898A KR19960006898A KR970067667A KR 970067667 A KR970067667 A KR 970067667A KR 1019960006898 A KR1019960006898 A KR 1019960006898A KR 19960006898 A KR19960006898 A KR 19960006898A KR 970067667 A KR970067667 A KR 970067667A
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KR
South Korea
Prior art keywords
based polymer
polymer
removal method
polymer removal
eliminating
Prior art date
Application number
KR1019960006898A
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Korean (ko)
Inventor
조성수
Original Assignee
김주용
현대전자산업 주식회사
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Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019960006898A priority Critical patent/KR970067667A/en
Publication of KR970067667A publication Critical patent/KR970067667A/en

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Abstract

본 발명은 반도체 제조공정중의 프리실리콘 식각시 그 측벽에 형성되는 C1계 폴리머를 제거하는 방법에 관한 것으로, C1계 폴리머를 CF계 폴리머로 변환시킨 다음 폴리즈마에 의해 상기 CF계 폴리머를 제거하는 것을 특징으로 하는 폴리머 제거방법을 제거함으로써 종래의 BOE를 사용한 다단계의 복잡한 세척공정을 생략할 수 있도록 하여 공정의 단순화를 기할 수 있도록 한다.The present invention relates to a method for removing a C1-based polymer formed on a sidewall thereof during a pre-silicon etching process in a semiconductor manufacturing process, wherein the CF-based polymer is converted into a CF-based polymer and then the CF- The present invention can simplify the process by eliminating the multilevel complicated washing process using the conventional BOE by eliminating the polymer removing process.

Description

폴리머 제거방법Polymer removal method

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.

제1도는 본 발명에 의한 폴리머 제거공정을 도시한 순서도.FIG. 1 is a flow chart showing a polymer removing process according to the present invention. FIG.

Claims (3)

반도체장치 제조를 위한 식각공정시 형성되는 C1계 폴리머를 제거하기 위한 폴리머 제거방법에 있어서, 상기 C1계 폴리머를 CF계 폴리머로 변환시킨 다음 폴리즈마에 의해 상기 CF계 폴리머를 제거하는 것을 특징으로 하는 폴리머 제거방법.A polymer removing method for removing a C1-based polymer formed in an etching process for manufacturing a semiconductor device, characterized in that the C1-based polymer is converted into a CF-based polymer and then the CF-based polymer is removed by a polysma Lt; / RTI > 제1항에 있어서, 상기 C1계 폴리머를 CHF3,CF3등의 가스를 이용하여 CF계 폴리머로 변화시키는 것을 특징으로 하는 폴리머 제거방법The polymer removing method according to claim 1, wherein the C1-based polymer is changed to a CF-based polymer by using a gas such as CHF 3 or CF 3 제2항에 있어서, 상기 C1계 폴리머를또는 의 반응에 의해 CF계 폴리머로 변화시키는 것을 특징으로 하는 폴리머 제거방법.The method according to claim 2, wherein the C1-based polymer is or To a CF-based polymer. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is disclosed by the contents of the first application.
KR1019960006898A 1996-03-14 1996-03-14 Polymer removal method KR970067667A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019960006898A KR970067667A (en) 1996-03-14 1996-03-14 Polymer removal method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960006898A KR970067667A (en) 1996-03-14 1996-03-14 Polymer removal method

Publications (1)

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KR970067667A true KR970067667A (en) 1997-10-13

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KR1019960006898A KR970067667A (en) 1996-03-14 1996-03-14 Polymer removal method

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101324544B1 (en) * 2006-01-20 2013-11-01 몰레큘러 임프린츠 인코퍼레이티드 Patterning substrates employing multiple chucks

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101324544B1 (en) * 2006-01-20 2013-11-01 몰레큘러 임프린츠 인코퍼레이티드 Patterning substrates employing multiple chucks

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