KR970059087A - Ultrapure Water Manufacturing Equipment - Google Patents

Ultrapure Water Manufacturing Equipment Download PDF

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Publication number
KR970059087A
KR970059087A KR1019970001190A KR19970001190A KR970059087A KR 970059087 A KR970059087 A KR 970059087A KR 1019970001190 A KR1019970001190 A KR 1019970001190A KR 19970001190 A KR19970001190 A KR 19970001190A KR 970059087 A KR970059087 A KR 970059087A
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South Korea
Prior art keywords
pure water
water treatment
desalting
boron
treatment system
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KR1019970001190A
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Korean (ko)
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KR100295399B1 (en
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마도카 다나베
사카에 가네코
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마에다 히로카츠
오르가노 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/02—Reverse osmosis; Hyperfiltration ; Nanofiltration
    • B01D61/025—Reverse osmosis; Hyperfiltration
    • B01D61/026—Reverse osmosis; Hyperfiltration comprising multiple reverse osmosis steps
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/447—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by membrane distillation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
    • C02F1/4693—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis
    • C02F1/4695—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis electrodialysis electrodeionisation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S210/00—Liquid purification or separation
    • Y10S210/90—Ultra pure water, e.g. conductivity water

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nanotechnology (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Molecular Biology (AREA)
  • Electrochemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Removal Of Specific Substances (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Physical Water Treatments (AREA)

Abstract

전처리 장치, 탈염장치, 비이온성 물질 제거장치를 가지는 초순수 제조장치의 탈염장치로서 2단 RO장치(103,104)를 구비한다. 약품재생형 이온 교환장치를 구비하고 있지 않은 2단 RO장치(103,104)에 물을 통과시킨 피처리수를 붕소 선택성 이온 교환수지에 접촉시키는 붕소 제거장치(1)를 배설하였다.As a desalting apparatus of an ultrapure water producing system having a pretreatment apparatus, a desalting apparatus, and a nonionic substance removing apparatus, two stage RO apparatuses 103 and 104 are provided. The boron removal apparatus 1 which contact | connects the to-be-processed water which passed water to the boron selective ion exchange resin in the two stage RO apparatus 103 and 104 which is not equipped with the chemical regeneration ion exchange apparatus was provided.

Description

초순수 제조장치Ultrapure Water Manufacturing Equipment

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1도는 본 발명을 비재생형의 2단 RO장치를 주된 탈염장치로서 구비한 초순수 제조 장치에 적용한 구성 개요의 일례를 도시한 플로우 챠트도.1 is a flow chart showing an example of a configuration outline in which the present invention is applied to an ultrapure water producing system equipped with a non-regenerated two-stage RO device as a main desalting device.

Claims (7)

원수중에 함유되는 현탁물질을 제거하는 전처리 장치 및 염류를 제거하는 탈염 장치를 구비하는 초순수 제조장치에 있어서, 상기 탈염 장치를 2단 역삼투막 장치, 전기 재생식 탈염장치, 중류장치에서 선택되는 적어도 하나를 포함하는 탈염장치와 이 탈염장치의 후단에 이 탈염 장치에 있어서 처리된 처리수를 붕소 선택적 이온교환수지에 접촉시켜 붕소를 제거하는 붕소 제거장치를 설치하는 것을 특징으로 하는 초순수 제조장치.An ultrapure water production system comprising a pretreatment device for removing suspended substances contained in raw water and a desalination device for removing salts, the desalting device comprising at least one selected from a two-stage reverse osmosis membrane device, an electric regeneration desalting device, and a midstream device. And a boron removal device for removing boron by contacting the boron selective ion exchange resin with the treated desalting device and the treated water treated in the desalting device at a rear end of the desalting device. 제1항에 있어서, 상기 붕소 제거장치의 후단에 이 붕소제거 장치로 처리된 처리수를 다시 처리하는 비재생형 이온 교환장치를 설치한 것을 특징으로 하는 초순수 제조장치.The ultrapure water production apparatus according to claim 1, wherein a non-regeneration type ion exchanger for reprocessing the treated water treated with the boron removal device is provided at the rear end of the boron removal device. 제2항에 있어서, 상기 탈염장치, 붕소제거장치 및 비재생형 이온 교환장치는 일차 순수처리 시스템을 구성하고, 이 일차 순수처리 시스템을 가지는 것을 특징으로 하는 초순수 제조장치.The ultrapure water producing system according to claim 2, wherein the desalting unit, the boron removing unit and the non-renewable ion exchange unit constitute a primary pure water treatment system and have the primary pure water treatment system. 제3항에 있어서, 상기 2차 순수처리 시스템은 유기물을 산화 분해하는 자외선 산화장치와 유기물의 산화 생성물을 제거하는 카트리지 폴리셔와 미립자를 제거하는 막분리 장치를 포함하는 것을 특징으로 하는 초순수 제조장치.The ultrapure water production system according to claim 3, wherein the secondary pure water treatment system includes an ultraviolet oxidizer for oxidatively decomposing organic matter, a cartridge polisher for removing oxidized products of organic matter, and a membrane separation device for removing particulates. . 제1항에 있어서, 상기 탈염장치와 붕소 제거장치 사이에 비재생형 이온 교환장치를 배치하고, 비재생형 이온 교환장치의 처리수를 붕소 제거장치에 공급하는 것을 특징으로 하는 초순수 제조장치.The ultrapure water production apparatus according to claim 1, wherein a non-regeneration type ion exchanger is disposed between the desalting unit and the boron removal unit, and the treated water of the non-regeneration type ion exchanger is supplied to the boron removal unit. 제5항에 있어서, 상기 탈염장치, 비재생형 이온 교환장치는 일차 순수처리 시스템을 구성하고, 이 일차 순수처리 시스템에 잔류하는 미량의 이온, 비이온성 물질, 미립자를 다시 제거하는 2차 순수처리 시스템을 설치하고, 이 2차 순수처리 시스템에 붕소제거 장치를 설치하는 것을 특징으로 하는 초순수 제조장치.6. The secondary pure water treatment according to claim 5, wherein the desalting unit and the non-regenerating ion exchange unit constitute a primary pure water treatment system, and the secondary pure water treatment which removes trace ions, nonionic substances and fine particles remaining in the primary pure water treatment system again. An ultrapure water producing system, comprising installing a system and installing a boron removing device in the secondary pure water treatment system. 제6항에 있어서, 상기 2차 순수처리 시스템은 유기물을 산화 분해하는 자외선 산화장치와 유기물의 산화 생성물을 제거하는 카트리지 폴리셔와 미립자를 제거하는 막분리 장치를 포함하고, 붕소 제거장치는 자외선 산화장치의 전단에 배치하는 것을 특징으로 하는 초순수 제조장치.7. The secondary pure water treatment system of claim 6, wherein the secondary pure water treatment system comprises an ultraviolet oxidizer for oxidatively decomposing organic matter, a cartridge polisher for removing oxidized products of organic matter and a membrane separation device for removing particulates, and the boron removal device comprises ultraviolet oxidization. Ultrapure water production apparatus, characterized in that arranged in the front end of the device. ※참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: It is to be disclosed based on the initial application.
KR1019970001190A 1996-01-17 1997-01-16 Ultrapure Water Manufacturing Equipment KR100295399B1 (en)

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JP00561696A JP3426072B2 (en) 1996-01-17 1996-01-17 Ultrapure water production equipment
JP96-5616 1996-01-17

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GB (1) GB2309222B (en)
MY (1) MY120689A (en)
SG (1) SG71692A1 (en)

Families Citing this family (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8758720B2 (en) 1996-08-12 2014-06-24 Debasish Mukhopadhyay High purity water produced by reverse osmosis
US20020153319A1 (en) 1997-08-12 2002-10-24 Debasish Mukhopadhyay Method and apparatus for high efficiency reverse osmosis operation
US6562205B1 (en) * 1997-03-31 2003-05-13 Mitsubishi Denki Kabushiki Kaisha High-temperature ultrapure water production apparatus and liquid medicine preparation apparatus equipped with the production apparatus
US6780328B1 (en) * 1997-06-20 2004-08-24 Li Zhang Fluid purification devices and methods employing deionization followed by ionization followed by deionization
US6110831A (en) * 1997-09-04 2000-08-29 Lucent Technologies Inc. Method of mechanical polishing
JP3951200B2 (en) * 1997-10-31 2007-08-01 栗田工業株式会社 Pure water production equipment
US6398965B1 (en) * 1998-03-31 2002-06-04 United States Filter Corporation Water treatment system and process
US6328896B1 (en) * 1998-04-24 2001-12-11 United States Filter Corporation Process for removing strong oxidizing agents from liquids
US6021791A (en) * 1998-06-29 2000-02-08 Speedfam-Ipec Corporation Method and apparatus for immersion cleaning of semiconductor devices
JP2000271569A (en) * 1999-03-25 2000-10-03 Kurita Water Ind Ltd Production of pure water
US6379518B1 (en) * 1999-08-11 2002-04-30 Kurita Water Industries Ltd. Electrodeionization apparatus and pure water producing apparatus
JP3570304B2 (en) * 1999-08-11 2004-09-29 栗田工業株式会社 Sterilization method of deionized water production apparatus and method of producing deionized water
JP4497387B2 (en) * 2000-05-12 2010-07-07 オルガノ株式会社 Secondary pure water production equipment
DE10196488B4 (en) * 2000-08-07 2007-04-19 Sievers Instruments, Inc., Boulder Detecting and measuring low levels of boron
US7264737B2 (en) * 2001-10-05 2007-09-04 Ionics, Incorporated Control of water treatment system with low level boron detection
AU2003203265B2 (en) * 2002-01-22 2007-10-18 Toray Industries, Inc. Method of generating fresh water and fresh-water generator
JP3966501B2 (en) * 2002-03-18 2007-08-29 オルガノ株式会社 Ultrapure water production equipment
JP4599803B2 (en) * 2002-04-05 2010-12-15 栗田工業株式会社 Demineralized water production equipment
TW200307647A (en) 2002-04-12 2003-12-16 Ionics Ion exchange regeneration system for UPW treatment
US6960302B2 (en) * 2002-12-10 2005-11-01 Miers Jr Jay Alfred Fluid treatment system
TW200426117A (en) * 2002-12-18 2004-12-01 Rohm & Haas Water treatment system with low waste volume
JP3864934B2 (en) * 2003-06-12 2007-01-10 栗田工業株式会社 Pure water production equipment
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US20050127007A1 (en) * 2003-12-11 2005-06-16 Miers Jay A.Jr. Water treatment system with low waste volume
US7959780B2 (en) 2004-07-26 2011-06-14 Emporia Capital Funding Llc Textured ion exchange membranes
EP1681597B1 (en) 2005-01-14 2010-03-10 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7780833B2 (en) 2005-07-26 2010-08-24 John Hawkins Electrochemical ion exchange with textured membranes and cartridge
CN105540763A (en) 2005-10-06 2016-05-04 派克逖克斯公司 Electrochemical ion exchange treatment of fluids
CN101108762B (en) * 2006-07-19 2011-12-14 深圳市海川实业股份有限公司 Process technique for pharmacy wastewater
US7744760B2 (en) * 2006-09-20 2010-06-29 Siemens Water Technologies Corp. Method and apparatus for desalination
US7645387B2 (en) * 2006-12-11 2010-01-12 Diversified Technologies Services, Inc. Method of utilizing ion exchange resin and reverse osmosis to reduce environmental discharges and improve effluent quality to permit recycle of aqueous or radwaste fluid
GR20070100306A (en) * 2007-05-22 2008-12-19 Νικολαος Πηττας Automatic device of desalination treatment of sea water for production by absolute sanitation of potable water of very high specifications.
WO2009009465A1 (en) * 2007-07-06 2009-01-15 Christopher William Heiss Electrocoagulation reactor and water treatment system and method
JP5320723B2 (en) * 2007-11-06 2013-10-23 栗田工業株式会社 Ultrapure water manufacturing method and apparatus, and electronic component member cleaning method and apparatus
WO2009060827A1 (en) * 2007-11-06 2009-05-14 Kurita Water Industries Ltd. Process and apparatus for producing ultrapure water, and method and apparatus for cleaning electronic component members
JP5081690B2 (en) * 2008-03-31 2012-11-28 オルガノ株式会社 Production method of ultra pure water
US20120055875A1 (en) * 2010-09-02 2012-03-08 General Electric Company Method to treat produced waters from thermally induced heavy crude oil production (tar sands)
WO2012106217A1 (en) * 2011-01-31 2012-08-09 Diversified Technologies Services, Inc. Boron recovery treatment method
US11156041B2 (en) * 2012-02-22 2021-10-26 Richard Paul Posa System and method for treating water
WO2014058696A1 (en) * 2012-10-10 2014-04-17 M-I L.L.C. Boron removal system and method
JP5733351B2 (en) * 2013-07-22 2015-06-10 栗田工業株式会社 Method and apparatus for treating boron-containing water
JP6228471B2 (en) * 2014-01-24 2017-11-08 三菱ケミカルアクア・ソリューションズ株式会社 To-be-treated water processing apparatus, pure water production apparatus and to-be-treated water processing method
US9757695B2 (en) 2015-01-03 2017-09-12 Pionetics Corporation Anti-scale electrochemical apparatus with water-splitting ion exchange membrane
JP6119886B1 (en) * 2016-01-28 2017-04-26 栗田工業株式会社 Ultrapure water production apparatus and operation method of ultrapure water production apparatus
JP6415509B2 (en) * 2016-10-04 2018-10-31 野村マイクロ・サイエンス株式会社 Reverse osmosis membrane regeneration method
US20200289986A1 (en) 2016-10-19 2020-09-17 Istanbul Teknik Universitesi Rektorlugu Concurrent desalination and boron removal (cdbr) process
JP6907514B2 (en) 2016-11-28 2021-07-21 栗田工業株式会社 Ultrapure water production system and ultrapure water production method
CN107986534A (en) * 2017-12-25 2018-05-04 浙江华强环境科技有限公司 A kind of novel ultrapure water processing system
JP7225544B2 (en) 2018-02-20 2023-02-21 栗田工業株式会社 Method for producing pure water or ultrapure water
KR102542839B1 (en) * 2018-05-17 2023-06-14 오르가노 코포레이션 Ultrapure water production method, ultrapure water production system, and ion exchanger charging module
JP2020000983A (en) * 2018-06-27 2020-01-09 栗田工業株式会社 Pure water production apparatus and method of producing pure water
CN112154125B (en) 2018-06-27 2023-02-24 野村微科学股份有限公司 Electrodeionization device, ultrapure water production system, and ultrapure water production method
JP7129965B2 (en) * 2019-12-25 2022-09-02 野村マイクロ・サイエンス株式会社 Pure water production method, pure water production system, ultrapure water production method, and ultrapure water production system
JP2023127080A (en) * 2022-03-01 2023-09-13 オルガノ株式会社 Ultrapure water production system and ultrapure water production method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1430578A (en) * 1972-06-08 1976-03-31 United States Borax Chem Selective ion-exchangers moulding plastic articles
US3870033A (en) * 1973-11-30 1975-03-11 Aqua Media Ultra pure water process and apparatus
GB2145709B (en) * 1983-09-01 1986-08-28 Ionics Membrane system for water purification
US4548716A (en) * 1984-07-25 1985-10-22 Lucas Boeve Method of producing ultrapure, pyrogen-free water
US4808287A (en) * 1987-12-21 1989-02-28 Hark Ernst F Water purification process
JP2865389B2 (en) * 1990-07-10 1999-03-08 オルガノ株式会社 Electric deionized water production equipment and frame used for it
IT1243991B (en) * 1990-10-30 1994-06-28 Ionics Italba Spa PROCEDURE FOR WATER PURIFICATION THROUGH A COMBINATION OF MEMBRANE SEPARATION UNIT AND ITS PLANT
JPH0631272A (en) * 1992-07-16 1994-02-08 Japan Organo Co Ltd Film treatment device
US5518624A (en) * 1994-05-06 1996-05-21 Illinois Water Treatment, Inc. Ultra pure water filtration
JP3200301B2 (en) * 1994-07-22 2001-08-20 オルガノ株式会社 Method and apparatus for producing pure or ultrapure water
JP3992299B2 (en) * 1994-09-20 2007-10-17 ダイキン工業株式会社 Ultrapure water production equipment
JP3215277B2 (en) * 1995-03-02 2001-10-02 オルガノ株式会社 Method and apparatus for producing pure water or ultrapure water from which boron has been removed

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MY120689A (en) 2005-11-30
JP3426072B2 (en) 2003-07-14
JPH09192661A (en) 1997-07-29
KR100295399B1 (en) 2001-09-17
US5833846A (en) 1998-11-10
GB9700849D0 (en) 1997-03-05
GB2309222A (en) 1997-07-23
GB2309222B (en) 1998-04-08
SG71692A1 (en) 2000-04-18

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