KR20070011052A - 노광장치 - Google Patents
노광장치 Download PDFInfo
- Publication number
- KR20070011052A KR20070011052A KR1020050128680A KR20050128680A KR20070011052A KR 20070011052 A KR20070011052 A KR 20070011052A KR 1020050128680 A KR1020050128680 A KR 1020050128680A KR 20050128680 A KR20050128680 A KR 20050128680A KR 20070011052 A KR20070011052 A KR 20070011052A
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- board
- printed wiring
- platen
- dust
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Plasma & Fusion (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2005-00209691 | 2005-07-20 | ||
JP2005209691A JP2007025436A (ja) | 2005-07-20 | 2005-07-20 | 露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20070011052A true KR20070011052A (ko) | 2007-01-24 |
Family
ID=37786262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050128680A KR20070011052A (ko) | 2005-07-20 | 2005-12-23 | 노광장치 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2007025436A (ja) |
KR (1) | KR20070011052A (ja) |
TW (1) | TW200705108A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150084643A (ko) * | 2014-01-14 | 2015-07-22 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 포토마스크의 클리닝 모듈, 클리닝 장치 및 클리닝 방법 |
KR102171068B1 (ko) * | 2020-07-07 | 2020-10-29 | 엔엠시스코(주) | 새도 마스크의 표면 이물질 제거장치 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008216433A (ja) * | 2007-03-01 | 2008-09-18 | Adtec Engineeng Co Ltd | 露光装置 |
JP4880521B2 (ja) * | 2007-05-29 | 2012-02-22 | 株式会社オーク製作所 | 描画装置 |
JP2010199506A (ja) * | 2009-02-27 | 2010-09-09 | Sharp Corp | 半導体装置の製造方法 |
KR101073546B1 (ko) | 2009-08-13 | 2011-10-17 | 삼성모바일디스플레이주식회사 | 스토커 |
JP2013003436A (ja) * | 2011-06-20 | 2013-01-07 | Sumitomo Chemical Co Ltd | 異物除去方法 |
KR101870162B1 (ko) * | 2011-10-07 | 2018-06-26 | 엘지디스플레이 주식회사 | 기판 이송 장치 및 그를 이용한 박막증착 장치 |
JP5893537B2 (ja) * | 2012-09-19 | 2016-03-23 | 株式会社オーク製作所 | 露光装置の除塵装置及び除塵方法 |
CN104395833B (zh) * | 2013-06-18 | 2016-07-06 | 倍科有限公司 | 曝光装置 |
JP6811015B2 (ja) | 2016-02-02 | 2021-01-13 | 株式会社アドテックエンジニアリング | ロールツーロール両面露光装置 |
JP6865609B2 (ja) * | 2017-03-26 | 2021-04-28 | 株式会社アドテックエンジニアリング | 露光装置 |
JP6832412B2 (ja) * | 2019-11-25 | 2021-02-24 | 株式会社アドテックエンジニアリング | ロールツーロール両面露光装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2847808B2 (ja) * | 1989-10-19 | 1999-01-20 | 凸版印刷株式会社 | 基板自動露光機の除塵装置 |
JP3533380B2 (ja) * | 2000-09-12 | 2004-05-31 | 誠一郎 豊田 | 露光機の除塵装置及び除塵方法 |
JP3496008B2 (ja) * | 2001-09-25 | 2004-02-09 | キヤノン株式会社 | 露光装置およびデバイスの製造方法 |
-
2005
- 2005-07-20 JP JP2005209691A patent/JP2007025436A/ja active Pending
- 2005-12-23 KR KR1020050128680A patent/KR20070011052A/ko not_active Application Discontinuation
- 2005-12-27 TW TW094146636A patent/TW200705108A/zh unknown
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20150084643A (ko) * | 2014-01-14 | 2015-07-22 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 포토마스크의 클리닝 모듈, 클리닝 장치 및 클리닝 방법 |
US9857680B2 (en) | 2014-01-14 | 2018-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cleaning module, cleaning apparatus and method of cleaning photomask |
US10747105B2 (en) | 2014-01-14 | 2020-08-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cleaning module, cleaning apparatus and method of cleaning photomask |
US11237478B2 (en) | 2014-01-14 | 2022-02-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cleaning module, cleaning apparatus and method of cleaning photomask |
KR102171068B1 (ko) * | 2020-07-07 | 2020-10-29 | 엔엠시스코(주) | 새도 마스크의 표면 이물질 제거장치 |
Also Published As
Publication number | Publication date |
---|---|
TW200705108A (en) | 2007-02-01 |
JP2007025436A (ja) | 2007-02-01 |
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A201 | Request for examination | ||
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