KR20070011052A - 노광장치 - Google Patents

노광장치 Download PDF

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Publication number
KR20070011052A
KR20070011052A KR1020050128680A KR20050128680A KR20070011052A KR 20070011052 A KR20070011052 A KR 20070011052A KR 1020050128680 A KR1020050128680 A KR 1020050128680A KR 20050128680 A KR20050128680 A KR 20050128680A KR 20070011052 A KR20070011052 A KR 20070011052A
Authority
KR
South Korea
Prior art keywords
substrate
board
printed wiring
platen
dust
Prior art date
Application number
KR1020050128680A
Other languages
English (en)
Korean (ko)
Inventor
히로유키 이마이
토시노리 키시이
아키라 이카라시
아쑤시 오구마
키미히토 호시노
유타카 카세
Original Assignee
가부시키가이샤 아도테크 엔지니어링
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 아도테크 엔지니어링 filed Critical 가부시키가이샤 아도테크 엔지니어링
Publication of KR20070011052A publication Critical patent/KR20070011052A/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020050128680A 2005-07-20 2005-12-23 노광장치 KR20070011052A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00209691 2005-07-20
JP2005209691A JP2007025436A (ja) 2005-07-20 2005-07-20 露光装置

Publications (1)

Publication Number Publication Date
KR20070011052A true KR20070011052A (ko) 2007-01-24

Family

ID=37786262

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050128680A KR20070011052A (ko) 2005-07-20 2005-12-23 노광장치

Country Status (3)

Country Link
JP (1) JP2007025436A (ja)
KR (1) KR20070011052A (ja)
TW (1) TW200705108A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150084643A (ko) * 2014-01-14 2015-07-22 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 포토마스크의 클리닝 모듈, 클리닝 장치 및 클리닝 방법
KR102171068B1 (ko) * 2020-07-07 2020-10-29 엔엠시스코(주) 새도 마스크의 표면 이물질 제거장치

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008216433A (ja) * 2007-03-01 2008-09-18 Adtec Engineeng Co Ltd 露光装置
JP4880521B2 (ja) * 2007-05-29 2012-02-22 株式会社オーク製作所 描画装置
JP2010199506A (ja) * 2009-02-27 2010-09-09 Sharp Corp 半導体装置の製造方法
KR101073546B1 (ko) 2009-08-13 2011-10-17 삼성모바일디스플레이주식회사 스토커
JP2013003436A (ja) * 2011-06-20 2013-01-07 Sumitomo Chemical Co Ltd 異物除去方法
KR101870162B1 (ko) * 2011-10-07 2018-06-26 엘지디스플레이 주식회사 기판 이송 장치 및 그를 이용한 박막증착 장치
JP5893537B2 (ja) * 2012-09-19 2016-03-23 株式会社オーク製作所 露光装置の除塵装置及び除塵方法
CN104395833B (zh) * 2013-06-18 2016-07-06 倍科有限公司 曝光装置
JP6811015B2 (ja) 2016-02-02 2021-01-13 株式会社アドテックエンジニアリング ロールツーロール両面露光装置
JP6865609B2 (ja) * 2017-03-26 2021-04-28 株式会社アドテックエンジニアリング 露光装置
JP6832412B2 (ja) * 2019-11-25 2021-02-24 株式会社アドテックエンジニアリング ロールツーロール両面露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2847808B2 (ja) * 1989-10-19 1999-01-20 凸版印刷株式会社 基板自動露光機の除塵装置
JP3533380B2 (ja) * 2000-09-12 2004-05-31 誠一郎 豊田 露光機の除塵装置及び除塵方法
JP3496008B2 (ja) * 2001-09-25 2004-02-09 キヤノン株式会社 露光装置およびデバイスの製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150084643A (ko) * 2014-01-14 2015-07-22 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 포토마스크의 클리닝 모듈, 클리닝 장치 및 클리닝 방법
US9857680B2 (en) 2014-01-14 2018-01-02 Taiwan Semiconductor Manufacturing Company, Ltd. Cleaning module, cleaning apparatus and method of cleaning photomask
US10747105B2 (en) 2014-01-14 2020-08-18 Taiwan Semiconductor Manufacturing Company, Ltd. Cleaning module, cleaning apparatus and method of cleaning photomask
US11237478B2 (en) 2014-01-14 2022-02-01 Taiwan Semiconductor Manufacturing Company, Ltd. Cleaning module, cleaning apparatus and method of cleaning photomask
KR102171068B1 (ko) * 2020-07-07 2020-10-29 엔엠시스코(주) 새도 마스크의 표면 이물질 제거장치

Also Published As

Publication number Publication date
TW200705108A (en) 2007-02-01
JP2007025436A (ja) 2007-02-01

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A201 Request for examination
E601 Decision to refuse application