TW200705108A - Exposing device - Google Patents

Exposing device

Info

Publication number
TW200705108A
TW200705108A TW094146636A TW94146636A TW200705108A TW 200705108 A TW200705108 A TW 200705108A TW 094146636 A TW094146636 A TW 094146636A TW 94146636 A TW94146636 A TW 94146636A TW 200705108 A TW200705108 A TW 200705108A
Authority
TW
Taiwan
Prior art keywords
carry
hand
cleaning head
dust removal
movement
Prior art date
Application number
TW094146636A
Other languages
English (en)
Inventor
Hiroyuki Imai
Toshinori Kishi
Akira Ikarashi
Atsushi Oguma
Kimihito Hoshino
Yutaka Kase
Original Assignee
Adtec Eng Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adtec Eng Co Ltd filed Critical Adtec Eng Co Ltd
Publication of TW200705108A publication Critical patent/TW200705108A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094146636A 2005-07-20 2005-12-27 Exposing device TW200705108A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005209691A JP2007025436A (ja) 2005-07-20 2005-07-20 露光装置

Publications (1)

Publication Number Publication Date
TW200705108A true TW200705108A (en) 2007-02-01

Family

ID=37786262

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094146636A TW200705108A (en) 2005-07-20 2005-12-27 Exposing device

Country Status (3)

Country Link
JP (1) JP2007025436A (zh)
KR (1) KR20070011052A (zh)
TW (1) TW200705108A (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427426B (zh) * 2007-05-29 2014-02-21 Orc Mfg Co Ltd Drawing device
CN104508561A (zh) * 2012-09-19 2015-04-08 株式会社Orc制作所 曝光装置的除尘装置和除尘方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008216433A (ja) * 2007-03-01 2008-09-18 Adtec Engineeng Co Ltd 露光装置
JP2010199506A (ja) * 2009-02-27 2010-09-09 Sharp Corp 半導体装置の製造方法
KR101073546B1 (ko) 2009-08-13 2011-10-17 삼성모바일디스플레이주식회사 스토커
JP2013003436A (ja) * 2011-06-20 2013-01-07 Sumitomo Chemical Co Ltd 異物除去方法
KR101870162B1 (ko) * 2011-10-07 2018-06-26 엘지디스플레이 주식회사 기판 이송 장치 및 그를 이용한 박막증착 장치
CN104395833B (zh) * 2013-06-18 2016-07-06 倍科有限公司 曝光装置
US9857680B2 (en) 2014-01-14 2018-01-02 Taiwan Semiconductor Manufacturing Company, Ltd. Cleaning module, cleaning apparatus and method of cleaning photomask
JP6811015B2 (ja) 2016-02-02 2021-01-13 株式会社アドテックエンジニアリング ロールツーロール両面露光装置
JP6865609B2 (ja) * 2017-03-26 2021-04-28 株式会社アドテックエンジニアリング 露光装置
JP6832412B2 (ja) * 2019-11-25 2021-02-24 株式会社アドテックエンジニアリング ロールツーロール両面露光装置
KR102171068B1 (ko) * 2020-07-07 2020-10-29 엔엠시스코(주) 새도 마스크의 표면 이물질 제거장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2847808B2 (ja) * 1989-10-19 1999-01-20 凸版印刷株式会社 基板自動露光機の除塵装置
JP3533380B2 (ja) * 2000-09-12 2004-05-31 誠一郎 豊田 露光機の除塵装置及び除塵方法
JP3496008B2 (ja) * 2001-09-25 2004-02-09 キヤノン株式会社 露光装置およびデバイスの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427426B (zh) * 2007-05-29 2014-02-21 Orc Mfg Co Ltd Drawing device
CN104508561A (zh) * 2012-09-19 2015-04-08 株式会社Orc制作所 曝光装置的除尘装置和除尘方法
CN104508561B (zh) * 2012-09-19 2016-09-21 株式会社Orc制作所 曝光装置的除尘装置和除尘方法
TWI603159B (zh) * 2012-09-19 2017-10-21 Orc Manufacturing Co Ltd Dust removing device and dust removing method of exposure device

Also Published As

Publication number Publication date
KR20070011052A (ko) 2007-01-24
JP2007025436A (ja) 2007-02-01

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