KR101015582B1 - 기판 처리 설비 - Google Patents
기판 처리 설비 Download PDFInfo
- Publication number
- KR101015582B1 KR101015582B1 KR1020080089173A KR20080089173A KR101015582B1 KR 101015582 B1 KR101015582 B1 KR 101015582B1 KR 1020080089173 A KR1020080089173 A KR 1020080089173A KR 20080089173 A KR20080089173 A KR 20080089173A KR 101015582 B1 KR101015582 B1 KR 101015582B1
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- KR
- South Korea
- Prior art keywords
- substrate
- processing
- unit
- processing unit
- transfer
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67715—Changing the direction of the conveying path
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67718—Changing orientation of the substrate, e.g. from a horizontal position to a vertical position
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (5)
- 기판에 대한 처리가 이루어지는 제1 처리부;상기 제1 처리부의 하부에 배치되고, 상기 기판에 대한 처리가 이루어지는 제2 처리부;상기 제1 처리부 및 제2 처리부의 일측에 배치되고, 상기 제1 처리부에서 처리가 이루어진 상기 기판을 상기 제1 처리부로부터 상기 제2 처리부로 이송하는 제1 기판 이송부;상기 기판을 이송하는 이송 유닛을 구비하고, 상기 제2 처리부에 대응하는 높이에서 상기 기판을 투입 및 반출하는 인덱스부; 및상기 제1 및 제2 처리부들과 상기 인덱스부 사이에 배치되고, 상기 제1 및 제2 처리부들과 상기 인덱스부 사이에서 상기 기판을 전달하기 위하여 수직 방향으로 상기 기판을 이송하는 제2 기판 이송부를 포함하고,상기 제2 기판 이송부는 상기 인덱스부로부터 이송되는 상기 기판이 놓여지는 제1 기판 지지부, 상기 제1 기판 지지부가 상기 제1 처리부에 대응하는 높이로 승강된 후에 상기 제2 처리부로부터 이송되는 상기 기판을 지지하기 위한 제2 기판 지지부 및 상기 제1 기판 지지부와 연결되고 상기 제1 처리부에 대응하는 높이와 상기 제2 처리부에 대응하는 높이 사이에서 상기 제1 기판 지지부를 승강 및 하강시키는 승강부를 포함하는 기판 처리 설비.
- 삭제
- 제1항에 있어서, 상기 기판 지지부의 일측부 하부에 배치되며, 상기 기판 지지부를 수평 상태 또는 기울어진 상태로 변환시켜주는 경사변환부를 더 포함하는 것을 특징으로 히는 기판 처리 설비.
- 삭제
- 제1항에 있어서, 상기 제1 처리부 및 상기 제2 처리부는 상기 기판에 대한 세정 공정이 이루어지는 세정 설비인 것을 특징으로 하는 기판 처리 설비.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080089173A KR101015582B1 (ko) | 2008-09-10 | 2008-09-10 | 기판 처리 설비 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080089173A KR101015582B1 (ko) | 2008-09-10 | 2008-09-10 | 기판 처리 설비 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100030290A KR20100030290A (ko) | 2010-03-18 |
KR101015582B1 true KR101015582B1 (ko) | 2011-02-17 |
Family
ID=42180267
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080089173A KR101015582B1 (ko) | 2008-09-10 | 2008-09-10 | 기판 처리 설비 |
Country Status (1)
Country | Link |
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KR (1) | KR101015582B1 (ko) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005229131A (ja) | 2005-04-04 | 2005-08-25 | Tokyo Electron Ltd | 塗布、現像装置 |
JP2006131389A (ja) | 2004-11-09 | 2006-05-25 | Tokyo Electron Ltd | 基板処理装置及び平流し型基板搬送装置 |
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2008
- 2008-09-10 KR KR1020080089173A patent/KR101015582B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006131389A (ja) | 2004-11-09 | 2006-05-25 | Tokyo Electron Ltd | 基板処理装置及び平流し型基板搬送装置 |
JP2005229131A (ja) | 2005-04-04 | 2005-08-25 | Tokyo Electron Ltd | 塗布、現像装置 |
Also Published As
Publication number | Publication date |
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KR20100030290A (ko) | 2010-03-18 |
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