JPS6470168A - Liquid chemical applicator - Google Patents

Liquid chemical applicator

Info

Publication number
JPS6470168A
JPS6470168A JP22658087A JP22658087A JPS6470168A JP S6470168 A JPS6470168 A JP S6470168A JP 22658087 A JP22658087 A JP 22658087A JP 22658087 A JP22658087 A JP 22658087A JP S6470168 A JPS6470168 A JP S6470168A
Authority
JP
Japan
Prior art keywords
chemical
hole
substrate
air
liq
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22658087A
Other languages
Japanese (ja)
Other versions
JPH0685903B2 (en
Inventor
Juichi Kishida
Yutaka Kidai
Kusuo Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62226580A priority Critical patent/JPH0685903B2/en
Publication of JPS6470168A publication Critical patent/JPS6470168A/en
Publication of JPH0685903B2 publication Critical patent/JPH0685903B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To reduce the variance in the thickness of a liq. chemical film to be formed on a square-shaped substrate by providing the hole of an air current control plate above the center of rotation of the substrate, and dripping the chemical from the hole. CONSTITUTION:The air introduced by the exhaust from an exhaust pipe 5b from air holes 4b is passed through the hole 7 bored in the air current control plate 6 and having about 15mm diameter. It is concentrated toward the rotation center of the substrate 1 attached on the lower cup 5 rotating at 30r.p.m. and flows in the direction E at a high speed. Consequently, the liq. chemical supplied from a liq. chemical nozzle 3 is passed through the hole 7, dripped toward the center of rotation of the substrate 1, and dried by the air from the hole 7, and the viscosity of the chemical is increased. The substrate 1 is rotated at 300r.p.m. to extend the chemical, and then rotated at 3,000r.p.m. to apply the chemical on the whole substrate 1. Since the drying of the chemical is promoted by the air current from the hole 7 in this way and the viscosity is regulated, the variance in the film thickness is reduced.
JP62226580A 1987-09-11 1987-09-11 Chemical coating device Expired - Lifetime JPH0685903B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62226580A JPH0685903B2 (en) 1987-09-11 1987-09-11 Chemical coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62226580A JPH0685903B2 (en) 1987-09-11 1987-09-11 Chemical coating device

Publications (2)

Publication Number Publication Date
JPS6470168A true JPS6470168A (en) 1989-03-15
JPH0685903B2 JPH0685903B2 (en) 1994-11-02

Family

ID=16847397

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62226580A Expired - Lifetime JPH0685903B2 (en) 1987-09-11 1987-09-11 Chemical coating device

Country Status (1)

Country Link
JP (1) JPH0685903B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0356140A2 (en) * 1988-08-19 1990-02-28 Hitachi Maxell Ltd. Optical data recording medium and manufacturing apparatus and method thereof
WO1998034736A1 (en) * 1997-02-07 1998-08-13 The Fairchild Corporation Method and apparatus for spin-coating compact discs
US5908661A (en) * 1997-05-30 1999-06-01 The Fairchild Corporation Apparatus and method for spin coating substrates
US5916368A (en) * 1997-02-27 1999-06-29 The Fairchild Corporation Method and apparatus for temperature controlled spin-coating systems
US5916631A (en) * 1997-05-30 1999-06-29 The Fairchild Corporation Method and apparatus for spin-coating chemicals
JP2004311738A (en) * 2003-04-08 2004-11-04 Toppan Printing Co Ltd Method for supplying clean air to rotary coating equipment
US7046760B2 (en) 2003-02-28 2006-05-16 Samsung Electronics Co., Ltd. Method of measuring and controlling concentration of dopants of a thin film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5472973A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Rotary applying unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5472973A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Rotary applying unit

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0356140A2 (en) * 1988-08-19 1990-02-28 Hitachi Maxell Ltd. Optical data recording medium and manufacturing apparatus and method thereof
US5199988A (en) * 1988-08-19 1993-04-06 Hitachi Maxell, Ltd. Manufacturing apparatus and method for recording medium
WO1998034736A1 (en) * 1997-02-07 1998-08-13 The Fairchild Corporation Method and apparatus for spin-coating compact discs
US5840365A (en) * 1997-02-07 1998-11-24 The Fairchild Corporation Method and apparatus for spin-coating compact discs
US5916368A (en) * 1997-02-27 1999-06-29 The Fairchild Corporation Method and apparatus for temperature controlled spin-coating systems
US5908661A (en) * 1997-05-30 1999-06-01 The Fairchild Corporation Apparatus and method for spin coating substrates
US5916631A (en) * 1997-05-30 1999-06-29 The Fairchild Corporation Method and apparatus for spin-coating chemicals
US7046760B2 (en) 2003-02-28 2006-05-16 Samsung Electronics Co., Ltd. Method of measuring and controlling concentration of dopants of a thin film
JP2004311738A (en) * 2003-04-08 2004-11-04 Toppan Printing Co Ltd Method for supplying clean air to rotary coating equipment

Also Published As

Publication number Publication date
JPH0685903B2 (en) 1994-11-02

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