JPS6443370A - Spin coating device and spin coating method - Google Patents
Spin coating device and spin coating methodInfo
- Publication number
- JPS6443370A JPS6443370A JP19682287A JP19682287A JPS6443370A JP S6443370 A JPS6443370 A JP S6443370A JP 19682287 A JP19682287 A JP 19682287A JP 19682287 A JP19682287 A JP 19682287A JP S6443370 A JPS6443370 A JP S6443370A
- Authority
- JP
- Japan
- Prior art keywords
- coated
- materials
- spin coating
- mounts
- recessed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
PURPOSE:To reduce bad effect of coating unevenness generated by recessed and projected patterns on a base to a large extent by revolving a mount mounting materials to be coated and dispersing liquid dropped on the materials to be coated in a given direction. CONSTITUTION:Liquid dropped on materials 1a and 1b to be coated is applied to the materials to be coated by moving the materials to be coated by utilizing centrifugal power generated in the liquid. The materials to be coated are mounted on mounts 2a and 2b, while the mounts are revolved around the axis 51 passing through a point away from the materials to be coated mounted on the mounts. As a result, bad effect of coating unevenness generated from recessed and projected patterns on a base can be reduced to a large extent, and one device can treat a plurality of bases.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19682287A JPS6443370A (en) | 1987-08-05 | 1987-08-05 | Spin coating device and spin coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19682287A JPS6443370A (en) | 1987-08-05 | 1987-08-05 | Spin coating device and spin coating method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6443370A true JPS6443370A (en) | 1989-02-15 |
Family
ID=16364240
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19682287A Pending JPS6443370A (en) | 1987-08-05 | 1987-08-05 | Spin coating device and spin coating method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6443370A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007069313A1 (en) * | 2005-12-14 | 2007-06-21 | Fujitsu Limited | Resist application method |
JP2007201048A (en) * | 2006-01-25 | 2007-08-09 | Seiko Epson Corp | Semiconductor substrate processing apparatus, and manufacturing method of semiconductor device |
CN108212688A (en) * | 2018-03-22 | 2018-06-29 | 王磊 | A kind of surface applying liquid device |
-
1987
- 1987-08-05 JP JP19682287A patent/JPS6443370A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007069313A1 (en) * | 2005-12-14 | 2007-06-21 | Fujitsu Limited | Resist application method |
JP2007201048A (en) * | 2006-01-25 | 2007-08-09 | Seiko Epson Corp | Semiconductor substrate processing apparatus, and manufacturing method of semiconductor device |
CN108212688A (en) * | 2018-03-22 | 2018-06-29 | 王磊 | A kind of surface applying liquid device |
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