JPS6447474A - Method for applying high-viscosity resin - Google Patents

Method for applying high-viscosity resin

Info

Publication number
JPS6447474A
JPS6447474A JP20415387A JP20415387A JPS6447474A JP S6447474 A JPS6447474 A JP S6447474A JP 20415387 A JP20415387 A JP 20415387A JP 20415387 A JP20415387 A JP 20415387A JP S6447474 A JPS6447474 A JP S6447474A
Authority
JP
Japan
Prior art keywords
wafer
resin
periphery
gas
blowing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20415387A
Other languages
Japanese (ja)
Inventor
Yoshimichi Yonekura
Tsutomu Miyashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP20415387A priority Critical patent/JPS6447474A/en
Publication of JPS6447474A publication Critical patent/JPS6447474A/en
Pending legal-status Critical Current

Links

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  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To splash the resin accumulated on the periphery of a wafer and to obtain a resin film having uniform thickness by blowing a gas from a nozzle onto the periphery of the wafer to be spin-coated. CONSTITUTION:The device is provided with the nozzle 12 capable of blowing an inert gas such as N2 or a gas 14 such as air from the oblique upper part onto the periphery of the wafer 11 to be vacuum-sucked onto a spinner head 10, the wafer 11 is sucked, and a resin 13 is added dropwise thereon. The wafer 11 is then rotated for 3sec at 500r.p.m. to spread the resin 13 over the whole region of the wafer by the centrifugal force. The rotational speed of the wafer is then increased to 2,000r.p.m., and the wafer is rotated at that speed for 30sec while splashing the resin accumulated on the periphery of the wafer 11 by blowing the gas 14 from the nozzle 12. Meanwhile, the resin is dried, and a resin film 15 having uniform thickness is formed.
JP20415387A 1987-08-19 1987-08-19 Method for applying high-viscosity resin Pending JPS6447474A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20415387A JPS6447474A (en) 1987-08-19 1987-08-19 Method for applying high-viscosity resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20415387A JPS6447474A (en) 1987-08-19 1987-08-19 Method for applying high-viscosity resin

Publications (1)

Publication Number Publication Date
JPS6447474A true JPS6447474A (en) 1989-02-21

Family

ID=16485713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20415387A Pending JPS6447474A (en) 1987-08-19 1987-08-19 Method for applying high-viscosity resin

Country Status (1)

Country Link
JP (1) JPS6447474A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05266472A (en) * 1992-03-19 1993-10-15 Sharp Corp Formation of resin layer
JP2011036847A (en) * 2009-07-13 2011-02-24 Mitsubishi Rayon Co Ltd Film-forming method and spin coater
WO2016152308A1 (en) * 2015-03-25 2016-09-29 株式会社Ｓｃｒｅｅｎホールディングス Coating method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05266472A (en) * 1992-03-19 1993-10-15 Sharp Corp Formation of resin layer
JP2011036847A (en) * 2009-07-13 2011-02-24 Mitsubishi Rayon Co Ltd Film-forming method and spin coater
WO2016152308A1 (en) * 2015-03-25 2016-09-29 株式会社Ｓｃｒｅｅｎホールディングス Coating method
JP2016182531A (en) * 2015-03-25 2016-10-20 株式会社Ｓｃｒｅｅｎホールディングス Coating method
KR20170109024A (en) * 2015-03-25 2017-09-27 가부시키가이샤 스크린 홀딩스 Application method
US10569297B2 (en) 2015-03-25 2020-02-25 SCREEN Holdings Co., Ltd. Coating method

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