JPS5473572A - Spin coater - Google Patents

Spin coater

Info

Publication number
JPS5473572A
JPS5473572A JP14000777A JP14000777A JPS5473572A JP S5473572 A JPS5473572 A JP S5473572A JP 14000777 A JP14000777 A JP 14000777A JP 14000777 A JP14000777 A JP 14000777A JP S5473572 A JPS5473572 A JP S5473572A
Authority
JP
Japan
Prior art keywords
wafer
spin coater
center
flat plate
coater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14000777A
Other languages
Japanese (ja)
Inventor
Ryoichi Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14000777A priority Critical patent/JPS5473572A/en
Publication of JPS5473572A publication Critical patent/JPS5473572A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE: To suppress air current from the periphery of the object to be coated to the center and perform even coating in a spin coater.
CONSTITUTION: A flat plate 4 of a diameter larger than that of a wafer 3 is removably mounted onto the wafer 3 on a rotary table 2 within the cup 1 of the coater. The air current from the periphery toward the center on the wafer may be suppressed by this flat plate 4 and the even film may be spin coated.
COPYRIGHT: (C)1979,JPO&Japio
JP14000777A 1977-11-24 1977-11-24 Spin coater Pending JPS5473572A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14000777A JPS5473572A (en) 1977-11-24 1977-11-24 Spin coater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14000777A JPS5473572A (en) 1977-11-24 1977-11-24 Spin coater

Publications (1)

Publication Number Publication Date
JPS5473572A true JPS5473572A (en) 1979-06-12

Family

ID=15258755

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14000777A Pending JPS5473572A (en) 1977-11-24 1977-11-24 Spin coater

Country Status (1)

Country Link
JP (1) JPS5473572A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60193339A (en) * 1984-03-14 1985-10-01 Fujitsu Ltd Method of coating resist film
JPS61280618A (en) * 1985-05-17 1986-12-11 Asahi Glass Co Ltd Spin coating and spin coating device
JPS62136265A (en) * 1985-12-10 1987-06-19 Matsushita Electric Ind Co Ltd Apparatus for applying treatment liquid
JPH0260121A (en) * 1988-08-26 1990-02-28 Nec Corp Device for coating semiconductor substrate
JPH03267169A (en) * 1990-03-15 1991-11-28 Matsushita Electric Ind Co Ltd Thin film producing equipment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60193339A (en) * 1984-03-14 1985-10-01 Fujitsu Ltd Method of coating resist film
JPS61280618A (en) * 1985-05-17 1986-12-11 Asahi Glass Co Ltd Spin coating and spin coating device
JPS62136265A (en) * 1985-12-10 1987-06-19 Matsushita Electric Ind Co Ltd Apparatus for applying treatment liquid
JPH0260121A (en) * 1988-08-26 1990-02-28 Nec Corp Device for coating semiconductor substrate
JPH03267169A (en) * 1990-03-15 1991-11-28 Matsushita Electric Ind Co Ltd Thin film producing equipment

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