JPS5473572A - Spin coater - Google Patents
Spin coaterInfo
- Publication number
- JPS5473572A JPS5473572A JP14000777A JP14000777A JPS5473572A JP S5473572 A JPS5473572 A JP S5473572A JP 14000777 A JP14000777 A JP 14000777A JP 14000777 A JP14000777 A JP 14000777A JP S5473572 A JPS5473572 A JP S5473572A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- spin coater
- center
- flat plate
- coater
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Coating Apparatus (AREA)
Abstract
PURPOSE: To suppress air current from the periphery of the object to be coated to the center and perform even coating in a spin coater.
CONSTITUTION: A flat plate 4 of a diameter larger than that of a wafer 3 is removably mounted onto the wafer 3 on a rotary table 2 within the cup 1 of the coater. The air current from the periphery toward the center on the wafer may be suppressed by this flat plate 4 and the even film may be spin coated.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14000777A JPS5473572A (en) | 1977-11-24 | 1977-11-24 | Spin coater |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14000777A JPS5473572A (en) | 1977-11-24 | 1977-11-24 | Spin coater |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5473572A true JPS5473572A (en) | 1979-06-12 |
Family
ID=15258755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14000777A Pending JPS5473572A (en) | 1977-11-24 | 1977-11-24 | Spin coater |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5473572A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60193339A (en) * | 1984-03-14 | 1985-10-01 | Fujitsu Ltd | Method of coating resist film |
JPS61280618A (en) * | 1985-05-17 | 1986-12-11 | Asahi Glass Co Ltd | Spin coating and spin coating device |
JPS62136265A (en) * | 1985-12-10 | 1987-06-19 | Matsushita Electric Ind Co Ltd | Apparatus for applying treatment liquid |
JPH0260121A (en) * | 1988-08-26 | 1990-02-28 | Nec Corp | Device for coating semiconductor substrate |
JPH03267169A (en) * | 1990-03-15 | 1991-11-28 | Matsushita Electric Ind Co Ltd | Thin film producing equipment |
-
1977
- 1977-11-24 JP JP14000777A patent/JPS5473572A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60193339A (en) * | 1984-03-14 | 1985-10-01 | Fujitsu Ltd | Method of coating resist film |
JPS61280618A (en) * | 1985-05-17 | 1986-12-11 | Asahi Glass Co Ltd | Spin coating and spin coating device |
JPS62136265A (en) * | 1985-12-10 | 1987-06-19 | Matsushita Electric Ind Co Ltd | Apparatus for applying treatment liquid |
JPH0260121A (en) * | 1988-08-26 | 1990-02-28 | Nec Corp | Device for coating semiconductor substrate |
JPH03267169A (en) * | 1990-03-15 | 1991-11-28 | Matsushita Electric Ind Co Ltd | Thin film producing equipment |
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