JPS55120038A - Resist coating and developing device - Google Patents

Resist coating and developing device

Info

Publication number
JPS55120038A
JPS55120038A JP2797579A JP2797579A JPS55120038A JP S55120038 A JPS55120038 A JP S55120038A JP 2797579 A JP2797579 A JP 2797579A JP 2797579 A JP2797579 A JP 2797579A JP S55120038 A JPS55120038 A JP S55120038A
Authority
JP
Japan
Prior art keywords
resist
back side
inert gas
liquid agent
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2797579A
Other languages
Japanese (ja)
Inventor
Sanji Kawashiro
Shinichi Suzuki
Hisashi Suemitsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pioneer Corp
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Priority to JP2797579A priority Critical patent/JPS55120038A/en
Publication of JPS55120038A publication Critical patent/JPS55120038A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To uniformly coat a resist and enhance the accuracy of a semiconductor producing process by feeding inert gas to the back side of a substrate or the like to be coated with the resist to prevent adhesion of the liquid agent to the back side by scattering it horizontally. CONSTITUTION:An upper portion of spinner head 2 set on rotary shaft 1 is provided with vacuum chuck 3, and silicon wafer 4 is held by suction of the portion. Head 2 has inert gas blow holes 5 at its upper edge portion to blow up inert gas toward the back side of the substrate under a predetermined press. When resist 6 is dropped onto the substrate fixed on head 2 by vacuum suction, an excess of the liquid agent is removed horizontally with inert gas currents and discharged from discharge outlet 7. Thus, the liquid agent such as resist 6 can be coated uniformly without adhesion to the back side.
JP2797579A 1979-03-10 1979-03-10 Resist coating and developing device Pending JPS55120038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2797579A JPS55120038A (en) 1979-03-10 1979-03-10 Resist coating and developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2797579A JPS55120038A (en) 1979-03-10 1979-03-10 Resist coating and developing device

Publications (1)

Publication Number Publication Date
JPS55120038A true JPS55120038A (en) 1980-09-16

Family

ID=12235864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2797579A Pending JPS55120038A (en) 1979-03-10 1979-03-10 Resist coating and developing device

Country Status (1)

Country Link
JP (1) JPS55120038A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036534A (en) * 1973-08-06 1975-04-05

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036534A (en) * 1973-08-06 1975-04-05

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