JPS56161832A - Gaseous phase treatment device - Google Patents

Gaseous phase treatment device

Info

Publication number
JPS56161832A
JPS56161832A JP6200780A JP6200780A JPS56161832A JP S56161832 A JPS56161832 A JP S56161832A JP 6200780 A JP6200780 A JP 6200780A JP 6200780 A JP6200780 A JP 6200780A JP S56161832 A JPS56161832 A JP S56161832A
Authority
JP
Japan
Prior art keywords
gas
gaseous phase
container
silicon
silicon wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6200780A
Other languages
English (en)
Inventor
Kazuhiro Sugita
Takeyoshi Uchiyama
Toshiro Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP6200780A priority Critical patent/JPS56161832A/ja
Publication of JPS56161832A publication Critical patent/JPS56161832A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
JP6200780A 1980-05-10 1980-05-10 Gaseous phase treatment device Pending JPS56161832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6200780A JPS56161832A (en) 1980-05-10 1980-05-10 Gaseous phase treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6200780A JPS56161832A (en) 1980-05-10 1980-05-10 Gaseous phase treatment device

Publications (1)

Publication Number Publication Date
JPS56161832A true JPS56161832A (en) 1981-12-12

Family

ID=13187660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6200780A Pending JPS56161832A (en) 1980-05-10 1980-05-10 Gaseous phase treatment device

Country Status (1)

Country Link
JP (1) JPS56161832A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024377A (ja) * 1983-07-21 1985-02-07 Canon Inc 堆積膜の製造方法と製造装置
JPS6034011A (ja) * 1983-08-05 1985-02-21 Agency Of Ind Science & Technol 反応管
JPS60106335U (ja) * 1983-12-24 1985-07-19 株式会社島津製作所 プラズマｃｖｄ装置
JPH01201482A (ja) * 1987-10-01 1989-08-14 Nippon Aneruba Kk 減圧気相成長装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6024377A (ja) * 1983-07-21 1985-02-07 Canon Inc 堆積膜の製造方法と製造装置
JPS6034011A (ja) * 1983-08-05 1985-02-21 Agency Of Ind Science & Technol 反応管
JPS60106335U (ja) * 1983-12-24 1985-07-19 株式会社島津製作所 プラズマｃｖｄ装置
JPH01201482A (ja) * 1987-10-01 1989-08-14 Nippon Aneruba Kk 減圧気相成長装置

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