JPS5534413A - Pattern forming method - Google Patents
Pattern forming methodInfo
- Publication number
- JPS5534413A JPS5534413A JP10618778A JP10618778A JPS5534413A JP S5534413 A JPS5534413 A JP S5534413A JP 10618778 A JP10618778 A JP 10618778A JP 10618778 A JP10618778 A JP 10618778A JP S5534413 A JPS5534413 A JP S5534413A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- corners
- charged
- beams
- assuming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:In a charged beam exposure, to use correction charged beams in the vicinities of corners of a pattern thereby to make it possible to form in a high precision an exposed pattern having corners each assuming an angle of less than 180 deg.. CONSTITUTION:The contour of an exposed pattern formed in the case where electron beams are irradiated on a photoresist corresponding to a square pattern is rounded at its four corners due to shortage in irradiation as shown by (c) in the drawing. When correction charged beams not exceeding an allowable charge quantity capable of showing the reaction of the resist are irradiated onto points P1, P2, P3 and P4, both charged beams are overlapped at the corner parts, and a pattern shown by (d) in the drawing is formed. As a result, an exposed pattern having corners each assuming an angle of less than 180 deg. can be formed by use of a charged beam exposing device at a high precision.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10618778A JPS5534413A (en) | 1978-09-01 | 1978-09-01 | Pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10618778A JPS5534413A (en) | 1978-09-01 | 1978-09-01 | Pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5534413A true JPS5534413A (en) | 1980-03-11 |
JPS6157697B2 JPS6157697B2 (en) | 1986-12-08 |
Family
ID=14427193
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10618778A Granted JPS5534413A (en) | 1978-09-01 | 1978-09-01 | Pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5534413A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5745238A (en) * | 1980-07-10 | 1982-03-15 | Ibm | Method of correcting proximity effect |
-
1978
- 1978-09-01 JP JP10618778A patent/JPS5534413A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5745238A (en) * | 1980-07-10 | 1982-03-15 | Ibm | Method of correcting proximity effect |
JPS6219048B2 (en) * | 1980-07-10 | 1987-04-25 | Intaanashonaru Bijinesu Mashiinzu Corp |
Also Published As
Publication number | Publication date |
---|---|
JPS6157697B2 (en) | 1986-12-08 |
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