JPS5568626A - Pattern formation - Google Patents
Pattern formationInfo
- Publication number
- JPS5568626A JPS5568626A JP14120778A JP14120778A JPS5568626A JP S5568626 A JPS5568626 A JP S5568626A JP 14120778 A JP14120778 A JP 14120778A JP 14120778 A JP14120778 A JP 14120778A JP S5568626 A JPS5568626 A JP S5568626A
- Authority
- JP
- Japan
- Prior art keywords
- film
- electron beam
- pattern
- scattering
- accuracy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To achieve a high-accurate fine patterning through a decreased proximity- effect in an electron beam exposure by forming a resist film on a pattern-forming surface through an interposed scattering-inhibiting film.
CONSTITUTION: A silicon oxide film 2 is formed on a silicon substrate 1. The silicon oxide film 2 is coated with a scattering-inhibiting film 3 which has no sensitivity to electron beam nor solubility to a specified developing solution. Furthermore, the film 3 consists of a material from which impinging electrons are given a smaller average scattering angle than that given from the silicon oxide film 2. On the film 3, an electron beam-sensitive resist film 4 is formed by coating. Then, an electron beam exposure is used to form a pattern drawing on the film 4, which is then developed in a specific developing solution. This produces a high-accuracy resist film pattern 4'. Using the pattern 4' as a mask, the film 3 is selectively removed, thereby providing a high-accuracy patterned scattering-inhibiting film 3'. Next, using the patterns 4' and 3' as masks, the film 2 is selectively removed so that a high-accuracy patterned oxide film 2' can be obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14120778A JPS5568626A (en) | 1978-11-17 | 1978-11-17 | Pattern formation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14120778A JPS5568626A (en) | 1978-11-17 | 1978-11-17 | Pattern formation |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5568626A true JPS5568626A (en) | 1980-05-23 |
Family
ID=15286627
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14120778A Pending JPS5568626A (en) | 1978-11-17 | 1978-11-17 | Pattern formation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5568626A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58140120A (en) * | 1982-02-16 | 1983-08-19 | Sanyo Electric Co Ltd | Pattern formation |
EP1457979A2 (en) * | 2003-02-28 | 2004-09-15 | Pioneer Corporation | Electron beam recording substrate |
WO2005114332A1 (en) * | 2004-05-21 | 2005-12-01 | Pioneer Corporation | Electronic beam recording board |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50113171A (en) * | 1974-02-13 | 1975-09-05 |
-
1978
- 1978-11-17 JP JP14120778A patent/JPS5568626A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50113171A (en) * | 1974-02-13 | 1975-09-05 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58140120A (en) * | 1982-02-16 | 1983-08-19 | Sanyo Electric Co Ltd | Pattern formation |
EP1457979A2 (en) * | 2003-02-28 | 2004-09-15 | Pioneer Corporation | Electron beam recording substrate |
EP1457979A3 (en) * | 2003-02-28 | 2007-05-09 | Pioneer Corporation | Electron beam recording substrate |
WO2005114332A1 (en) * | 2004-05-21 | 2005-12-01 | Pioneer Corporation | Electronic beam recording board |
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