JP7017525B2 - 多段表面パッシベーション構造及びそれを製造するための方法 - Google Patents
多段表面パッシベーション構造及びそれを製造するための方法 Download PDFInfo
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- 238000000034 method Methods 0.000 title description 33
- 238000004519 manufacturing process Methods 0.000 title description 18
- 238000002161 passivation Methods 0.000 title description 12
- 230000004888 barrier function Effects 0.000 claims description 58
- 239000002184 metal Substances 0.000 claims description 51
- 229910052751 metal Inorganic materials 0.000 claims description 51
- 239000012212 insulator Substances 0.000 claims description 39
- 230000005684 electric field Effects 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 24
- 150000004767 nitrides Chemical class 0.000 claims description 22
- 230000007704 transition Effects 0.000 claims description 14
- 229910002704 AlGaN Inorganic materials 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 10
- 230000005533 two-dimensional electron gas Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 128
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 92
- 229910002601 GaN Inorganic materials 0.000 description 90
- 230000008569 process Effects 0.000 description 28
- 230000004048 modification Effects 0.000 description 26
- 238000012986 modification Methods 0.000 description 26
- 239000004065 semiconductor Substances 0.000 description 17
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- 230000000694 effects Effects 0.000 description 6
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- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
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- 239000002784 hot electron Substances 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
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- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- -1 Ni and Au) Chemical class 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910008814 WSi2 Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
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- 230000001747 exhibiting effect Effects 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
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- 239000010936 titanium Substances 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
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- H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
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- General Physics & Mathematics (AREA)
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- Junction Field-Effect Transistors (AREA)
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Description
101は、基板である
102は、遷移層である
103は、アンドープのGaNバッファ層であり、典型的に0.5-10μm厚である
104は、アンドープのAlGaNバリア層であり、典型的に50Å-300Å厚であり、Al%は12%-28%である
105は、補償半導体層である
139は、絶縁膜1である
140は、絶縁膜2である
201は、ソースコンタクトである
202は、ゲートコンタクトである
203は、ドレインコンタクトである
301は、バリア104の上のメタルであり、メタルフィールドプレートとして機能する
302は、メタル301のドレイン側エッジであり、バリア/絶縁膜2の界面の上にある
注:この構造では、ソース201とメタル301とが接続されている。これに代えて、それらは分離されてもよい
プロセスシーケンス:絶縁膜1→(次いで)絶縁膜2(すなわち、絶縁膜1が最初に形成され、次いで、絶縁膜2)。
Claims (12)
- III族窒化物トランジスタであって、
基板と、
前記基板の上に位置する遷移層であり、III族窒化物材料を有する遷移層と、
前記遷移層の上に位置するバッファ層であり、III族窒化物材料を有するバッファ層と、
前記バッファ層の直上に位置するバリア層であり、III族窒化物材料を有するバリア層と、
前記バリア層とのジャンクションにおいて前記バッファ層内に形成される導電性の二次元電子ガス(2DEG)を有するチャネルと、
前記バリア層の上に位置するゲートコンタクト、ドレインコンタクト、及びソースコンタクトであり、当該ゲートコンタクトが当該ソースコンタクトと当該ドレインコンタクトとの間に位置している、ゲートコンタクト、ドレインコンタクト、及びソースコンタクトと、
前記バリア層の上且つ少なくとも前記ゲートコンタクトと前記ドレインコンタクトとの間に位置する第1の絶縁膜及び第2の絶縁膜であり、当該第1の絶縁膜の方が、当該第2の絶縁膜よりも、前記ゲートコンタクトに近く、当該第2の絶縁膜は、前記第1の絶縁膜から前記ドレインコンタクトまで延在し、当該第2の絶縁膜は、前記ドレインコンタクトにおける電界を最小化するとともに、低い抵抗のための高密度の電荷を当該第2の絶縁膜の下の前記チャネル内に提供する、第1の絶縁膜及び第2の絶縁膜と、
前記第2の絶縁膜の上にはなく、前記第1の絶縁膜の上、且つ少なくとも前記ゲートコンタクトと前記ドレインコンタクトとの間に位置するメタルフィールドプレートと、
を有し、
前記第1の絶縁膜は、前記第2の絶縁膜よりも低い密度の電子ドナーを有し、それにより、前記第2の絶縁膜の下の前記チャネル内の2DEG密度が、前記第1の絶縁膜の下の前記チャネル内の2DEG密度よりも高くなるよう、前記第1の絶縁膜と前記チャネルとの間の領域におけるネット電子ドナー密度が、前記第2の絶縁膜と前記チャネルとの間の領域におけるネット電子ドナー密度よりも低い、
トランジスタ。 - 前記第1の絶縁膜の下で、前記第2の絶縁膜の下でよりも、バッファ層-バリア層界面に隣接する前記バッファ層の表面準位内に、より少ない電子が存在する、請求項1に記載のトランジスタ。
- 前記バッファ層及び/又は前記バリア層が有する前記III族窒化物材料は、GaN材料を有する、請求項1に記載のトランジスタ。
- 少なくとも前記第2の絶縁膜と前記バリア層との間に位置する絶縁体オフセット層、を更に有する請求項1に記載のトランジスタ。
- 前記絶縁体オフセット層はIII族窒化物材料を有する、請求項4に記載のトランジスタ。
- 前記絶縁体オフセット層が有する前記III族窒化物材料は、AlN、AlGaN、及びGaN材料のうちの1つ以上を有する、請求項5に記載のトランジスタ。
- 前記絶縁体オフセット層が有する前記III族窒化物材料はドープされている、請求項6に記載のトランジスタ。
- 前記ドレインコンタクトは、前記絶縁体オフセット層の除去された部分を介して前記バリア層と接触している、請求項4に記載のトランジスタ。
- 前記絶縁体オフセット層は更に、前記ドレインコンタクトと前記バリア層との間に位置している、請求項4に記載のトランジスタ。
- 前記第2の絶縁膜の上且つ少なくとも前記ゲートコンタクトと前記ドレインコンタクトとの間及び前記第1の絶縁膜の上に位置する第3の絶縁膜、を更に有する請求項1に記載のトランジスタ。
- 当該トランジスタは更に、
(i)前記第2の絶縁膜の上にはなく、前記第1の絶縁膜及び前記第3の絶縁膜の上、且つ少なくとも前記ゲートコンタクトと前記ドレインコンタクトとの間、又は
(ii)前記第1の絶縁膜、前記第2の絶縁膜及び前記第3の絶縁膜の上、且つ少なくとも前記ゲートコンタクトと前記ドレインコンタクトとの間、
に位置するメタルフィールドプレートを有する、請求項10に記載のトランジスタ。 - 前記バリア層は、InxAlyGa(1-x-y)Nを有し、ただし、x+y≦1である、請求項2に記載のトランジスタ。
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US62/468,151 | 2017-03-07 | ||
PCT/US2017/035090 WO2017210235A1 (en) | 2016-06-01 | 2017-05-31 | Multi-step surface passivation structures and methods for fabricating same |
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US10720497B2 (en) | 2017-10-24 | 2020-07-21 | Raytheon Company | Transistor having low capacitance field plate structure |
TWI673868B (zh) * | 2018-05-29 | 2019-10-01 | 世界先進積體電路股份有限公司 | 半導體裝置及其製造方法 |
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US10707322B2 (en) | 2018-10-22 | 2020-07-07 | Vanguard International Semiconductor Corporation | Semiconductor devices and methods for fabricating the same |
US11121245B2 (en) * | 2019-02-22 | 2021-09-14 | Efficient Power Conversion Corporation | Field plate structures with patterned surface passivation layers and methods for manufacturing thereof |
US10818787B1 (en) | 2019-04-18 | 2020-10-27 | Semiconductor Components Industries, Llc | Electronic device including a high electron mobility transistor including a gate electrode and a dielectric film |
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