JP6840041B2 - エッチング方法 - Google Patents
エッチング方法 Download PDFInfo
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- JP6840041B2 JP6840041B2 JP2017121596A JP2017121596A JP6840041B2 JP 6840041 B2 JP6840041 B2 JP 6840041B2 JP 2017121596 A JP2017121596 A JP 2017121596A JP 2017121596 A JP2017121596 A JP 2017121596A JP 6840041 B2 JP6840041 B2 JP 6840041B2
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- 238000005530 etching Methods 0.000 title claims description 87
- 238000000034 method Methods 0.000 title claims description 41
- 239000007789 gas Substances 0.000 claims description 131
- 238000012545 processing Methods 0.000 claims description 66
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 57
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 57
- 238000004380 ashing Methods 0.000 claims description 23
- 239000007795 chemical reaction product Substances 0.000 claims description 21
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 6
- 229910001882 dioxygen Inorganic materials 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 4
- XLUBVTJUEUUZMR-UHFFFAOYSA-B silicon(4+);tetraphosphate Chemical compound [Si+4].[Si+4].[Si+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XLUBVTJUEUUZMR-UHFFFAOYSA-B 0.000 claims description 2
- 239000002356 single layer Substances 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims 1
- 238000007254 oxidation reaction Methods 0.000 claims 1
- 230000008569 process Effects 0.000 description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 239000003507 refrigerant Substances 0.000 description 10
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 235000002918 Fraxinus excelsior Nutrition 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000002956 ash Substances 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002221 fluorine Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H01L21/02041—Cleaning
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/3105—After-treatment
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32135—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only
- H01L21/32136—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only using plasmas
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- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
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- H01L21/76877—Filling of holes, grooves or trenches, e.g. vias, with conductive material
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Description
まず、プラズマ処理装置1の一例について、図1を参照しながら説明する。本実施形態にかかるプラズマ処理装置1は、容量結合型の平行平板プラズマ処理装置であり、略円筒形の処理容器(チャンバ)2を有している。処理容器2の内面には、アルマイト処理(陽極酸化処理)が施されている。処理容器2の内部は、プラズマによりエッチング処理や成膜処理等のプラズマ処理が行われる処理室となっている。
図2を参照して、エッチング時のボーイングの発生について説明する。図2(a)に一例を示す初期状態から、シリコン酸化膜51を、シリコン酸化膜上のマスク52のパターンにプラズマエッチング(メインエッチング)する。エッチング工程では、図2(b)に示すように、エッチングにより生じる反応生成物53が、シリコン酸化膜51とマスク52との界面の開口部54の付近やマスク52の上面及び側面に付着する。
以下では、本実施形態に係るプラズマ処理装置1を用いて実行されるエッチング処理について、図3及び図4を用いて説明する。図3は、一実施形態に係るエッチング処理の一例を示すフローチャートである。図3に示すエッチング処理の制御は、RAM115に記憶されたレシピに基づき、制御装置100のCPU105によって行われる。
マスク52はカーボンであってもよいし、有機膜であってもよい。
エッチング工程(第1の工程)で使用する第1のガスは、フルオロカーボンガスを含むガスに限らず、ハイドロフルオロカーボンガスを含むガスであってもよい。第1のガスとしては、例えば、C4F6ガス、C4F8ガス、CF4ガス、CHF3ガス、CH2F2ガスが挙げられる。また、第1のガスは、フルオロカーボンガス及びハイドロフルオロカーボンガスの少なくともいずれかとO2ガスとArガス等の不活性ガスとを含んだ混合ガスであってもよい。
最後に、本実施形態に係るエッチング処理の効果について、図5を参照しながら説明する。図5は、一実施形態に係るエッチング方法による形状を比較例と比較した結果の一例を示す。
2 処理容器(チャンバ)
3 ステージ
10 静電チャック
10a チャック電極
11 フォーカスリング
12 支持体
12a 冷媒流路
17 ゲートバルブ
20 ガスシャワーヘッド
21 シールドリング
22 ガス導入口
23 ガス供給源
24a、24b ガス拡散室
25 ガス供給孔
26 可変直流電源
30 直流電源
31 スイッチ
32 第1高周波電源
33 第1整合器
34 第2高周波電源
35 第2整合器
36 チラー
37 伝熱ガス供給源
38 排気装置
51 シリコン酸化膜
52 マスク
53 反応生成物
54 開口部
55 ボーイング
60 金属
100 制御装置
Claims (6)
- 処理容器内のステージに、シリコン酸化膜と該シリコン酸化膜の上にマスクのパターンを有する基板を載置する工程と、
第1のフルオロカーボンガスを含む第1のガスを前記処理容器に供給し、前記処理容器内で前記第1のガスから第1のプラズマを生成し、前記シリコン酸化膜をエッチングするために前記基板を前記第1のプラズマに暴露し、それにより前記マスクのパターンを通して前記シリコン酸化膜に凹部を形成するとともに、前記凹部及び前記凹部の開口付近の前記マスクのパターンの上に反応生成物を堆積させる、第1の工程と、
酸素ガスを含む第2のガスを前記処理容器に供給し、前記処理容器内で第1高周波電力と前記第1高周波電力と異なる第2高周波電力とを前記ステージに印加することで前記第2のガスから第2のプラズマを生成し、前記反応生成物を除去しつつ前記マスクのパターンをエッチングするために前記基板を前記第2のプラズマに暴露する、第2の工程と、
前記第1のフルオロカーボンガスと異なる第2のフルオロカーボンガスを含む第3のガスを前記処理容器に供給し、前記処理容器内で前記第3のガスから第3のプラズマを生成し、前記シリコン酸化膜の開口近傍をエッチングするために前記基板を前記第3のプラズマに暴露する、第3の工程と、
を有するエッチング方法。 - 前記第2の工程において、前記処理容器内の圧力は、100mT(13.32Pa)以下に保持されている、
請求項1に記載のエッチング方法。 - アッシングを行う第4の工程を有し、
前記第4の工程では、
酸素ガスを含む第4ガスを前記処理容器に供給し、前記処理容器内で前記第4ガスから第4のプラズマを生成し、前記シリコン酸化膜の上の前記マスクを除去するために前記基板を前記第4のプラズマに暴露する、
請求項1又は2に記載のエッチング方法。 - 前記シリコン酸化膜に形成されたエッチングのパターンに金属を埋め込む第5の工程を有する、
請求項3に記載のエッチング方法。 - 前記処理容器内の圧力は、前記第2の工程の間は100mTorr以下であり、前記第4の工程の間は100mTorrより高い、
請求項3又は4に記載のエッチング方法。 - 前記第1のフルオロカーボンガスは、C 4 F 6 ガスまたはC 4 F 8 ガスであり、
前記第2のフルオロカーボンガスはCF 4 ガスである、
請求項1〜5のいずれか一項に記載のエッチング方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017121596A JP6840041B2 (ja) | 2017-06-21 | 2017-06-21 | エッチング方法 |
KR1020180068496A KR102557053B1 (ko) | 2017-06-21 | 2018-06-15 | 에칭 방법 |
US16/010,794 US10651077B2 (en) | 2017-06-21 | 2018-06-18 | Etching method |
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Application Number | Priority Date | Filing Date | Title |
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JP2017121596A JP6840041B2 (ja) | 2017-06-21 | 2017-06-21 | エッチング方法 |
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JP2005294348A (ja) * | 2004-03-31 | 2005-10-20 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
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