JP6819175B2 - 希釈薬液製造装置及び希釈薬液製造方法 - Google Patents
希釈薬液製造装置及び希釈薬液製造方法 Download PDFInfo
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- B01D19/001—Degasification of liquids with one or more auxiliary substances by bubbling steam through the liquid
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
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Description
図1は、本実施形態の希釈薬液製造装置を示しており、図1において希釈薬液の製造装置は、超純水Wの供給ライン1に白金族金属担持樹脂カラム2と、膜式脱気装置3と、ガス溶解膜装置4とを順次備え、白金族金属担持樹脂カラム2と膜式脱気装置3との間に洗浄薬液の注入装置5を設けた構成を有する。そして、膜式脱気装置3の気相側には不活性ガス源6が接続しているとともにガス溶解膜装置4の気相側にも不活性ガス源7が接続していて、ガス溶解膜装置4には排出ライン8が連通している。なお、図1において、符号9は膜式脱気装置3及びガス溶解膜装置4のドレンタンクである。
本実施形態において、希釈水となる超純水Wとは、例えば、抵抗率:18.1MΩ・cm以上、微粒子:粒径50nm以上で1000個/L以下、生菌:1個/L以下、TOC(Total Organic Carbon):1μg/L以下、全シリコン:0.1μg/L以下、金属類:1ng/L以下、イオン類:10ng/L以下、過酸化水素;30μg/L以下、水温:25±2℃のものが好適である。
(白金族金属)
本実施形態において、白金族金属担持樹脂カラム2に用いる白金族金属担持樹脂に担持させる白金族金属としては、ルテニウム、ロジウム、パラジウム、オスミウム、イリジウム及び白金を挙げることができる。こられの白金族金属は、1種を単独で用いることができ、2種以上を組み合わせて用いることもでき、2種以上の合金として用いることもでき、あるいは、天然に産出される混合物の精製品を単体に分離することなく用いることもできる。これらの中で白金、パラジウム、白金/パラジウム合金の単独又はこれらの2種以上の混合物は、触媒活性が強いので特に好適に用いることができる。
白金族金属担持樹脂カラム2において、白金族金属を担持させる担体樹脂としては、イオン交換樹脂を用いることができる。これらの中で、アニオン交換樹脂を特に好適に用いることができる。白金系金属は、負に帯電しているので、アニオン交換樹脂に安定に担持されて剥離しにくいものとなる。アニオン交換樹脂の交換基は、OH形であることが好ましい。OH形アニオン交換樹脂は、樹脂表面がアルカリ性となり、過酸化水素の分解を促進する。
本実施形態において、膜式脱気装置3としては、脱気膜の一方の側(液相側)に超純水Wを流し、他方の側(気相側)を真空ポンプで排気することで、溶存酸素を膜を透過させて気相室側に移行させて除去するようにしたものを用いることができる。なお、この膜の真空側(気相側)には窒素等の不活性ガス源6を接続し、脱気性能を向上させることが好ましい。脱気膜は、酸素、窒素、蒸気等のガスは通過するが水は透過しない膜であれば良く、例えば、シリコンゴム系、ポリテトラフルオロエチレン系、ポリオレフィン系、ポリウレタン系等がある。この脱気膜としては市販の各種のものを用いることができる。
本実施形態において、ガス溶解膜装置4は、ガス透過膜の一方の側(液相側)に超純水Wを流し、他方の側(気相側)にガスを流通させて液相側にガスを移行させて溶解させるものであれば特に制限はなく、例えば、ポリプロピレン、ポリジメチルシロキサン、ポリカーボネート−ポリジメチルシロキサンブロック共重合体、ポリビニルフェノール−ポリジメチルシロキサン−ポリスルホンブロック共重合体、ポリ(4−メチルペンテン−1)、ポリ(2,6−ジメチルフェニレンオキシド)、ポリテトラフルオロエチレンなどの高分子膜などを用いることができる。 この水に溶解させるガスとしては、本実施形態においては窒素などの不活性ガスを用い、この不活性ガスは不活性ガス源7から供給する。
本実施形態において、洗浄薬液の注入装置5から注入する洗浄薬液としては、特に制限はなく、塩酸、硝酸、硫酸、フッ酸、アンモニアなどを用いることができる。
前述したような構成を有する本実施形態の希釈薬液の製造装置を用いた高純度の希釈薬液の製造方法について以下説明する。
図1に示す構成で希釈薬液製造装置を構成し、供給ライン1から超純水Wを0.7L/分の流量で供給し、白金族金属として白金を担持した白金族金属担持樹脂カラム2に流通した後、薬液注入装置5から洗浄薬液としてフッ酸(濃度7.5重量%)を薬液注入装置5から0.05L/分の流量で供給して希釈薬液W1を調製した。この希釈薬液W1を膜式脱気装置3及びガス溶解膜装置4で処理して清浄希釈薬液W2を製造した。この清浄希釈薬液W2の溶存酸素濃度と溶存過酸化水素濃度を測定した結果を表1に示す。
図2に示すように、図1に示す装置において薬液注入装置5をガス溶解膜装置4の後段に設けた以外は同様にして希釈薬液製造装置を構成した。この希釈薬液製造装置により実施例1と同じ条件で清浄希釈薬液W2を製造し、溶存酸素濃度と溶存過酸化水素濃度を測定した結果を表1にあわせて示す。
3 膜式脱気装置
4 ガス溶解膜装置
5 洗浄薬液の注入装置
6 不活性ガス源
7 不活性ガス源
W 超純水
W1 希釈薬液
W2 清浄希釈薬液
Claims (6)
- 薬液を超純水で希釈する希釈薬液の製造装置であって、超純水供給ラインに白金族金属担持樹脂カラムと膜式脱気装置とを順次備え、前記白金族金属担持樹脂カラムと前記膜式脱気装置との間に、薬液注入装置を設け、
前記白金族金属担持樹脂カラムが、超純水中の過酸化水素を分解除去し、
前記薬液注入装置が、前記超純水に対し洗浄薬液を注入して希釈薬液を調製し、
前記膜式脱気装置が、前記希釈薬液中の溶存酸素と、前記洗浄薬液から持ち込まれた溶存酸素とを除去する、希釈薬液の製造装置。 - 前記膜式脱気装置の後段に不活性ガス溶解膜装置を設けた請求項1に記載の希釈薬液の製造装置。
- 前記膜式脱気装置が不活性ガスを吸入する方式である請求項1又は2に記載の希釈薬液の製造装置。
- 薬液を超純水で希釈する希釈薬液の製造方法であって、
希釈用の超純水を白金族金属担持樹脂カラムに通過させる工程と、
洗浄薬液を薬液注入装置から添加して希釈薬液を調製する工程と、
得られた希釈薬液を膜式脱気装置で脱気する工程とをこの順に備え、
前記白金族金属担持樹脂カラムに通過させる工程において、前記白金族金属担持樹脂カラムが、前記超純水中の過酸化水素を分解除去し、
前記希釈薬液を調製する工程において、前記薬液注入装置が、前記超純水に対し洗浄薬液を注入して希釈薬液を調製し、
前記脱気する工程において、前記膜式脱気装置が、前記希釈薬液中の溶存酸素と、前記洗浄薬液から持ち込まれた溶存酸素とを除去する、希釈薬液の製造方法。 - 前記脱気する工程後の希釈薬液に不活性ガスを溶解する請求項4に記載の希釈薬液の製造方法。
- 前記脱気する工程を気相側に不活性ガスを吸入しながら行う請求項4又は5に記載の希釈薬液の製造方法。
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