JP6532218B2 - ガラス - Google Patents
ガラス Download PDFInfo
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- JP6532218B2 JP6532218B2 JP2014235159A JP2014235159A JP6532218B2 JP 6532218 B2 JP6532218 B2 JP 6532218B2 JP 2014235159 A JP2014235159 A JP 2014235159A JP 2014235159 A JP2014235159 A JP 2014235159A JP 6532218 B2 JP6532218 B2 JP 6532218B2
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- 239000011521 glass Substances 0.000 title claims description 154
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 55
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 51
- 238000005530 etching Methods 0.000 claims description 26
- 239000000203 mixture Substances 0.000 claims description 17
- 239000004973 liquid crystal related substance Substances 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 5
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 2
- 229920005591 polysilicon Polymers 0.000 claims description 2
- 239000013078 crystal Substances 0.000 description 45
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 26
- 238000000034 method Methods 0.000 description 23
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 20
- 238000004031 devitrification Methods 0.000 description 18
- 230000001965 increasing effect Effects 0.000 description 17
- 239000000126 substance Substances 0.000 description 17
- 230000007423 decrease Effects 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 13
- 229910052697 platinum Inorganic materials 0.000 description 12
- 239000003513 alkali Substances 0.000 description 9
- 239000006060 molten glass Substances 0.000 description 9
- 238000002834 transmittance Methods 0.000 description 9
- 238000002844 melting Methods 0.000 description 8
- 230000008018 melting Effects 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 229910006404 SnO 2 Inorganic materials 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 6
- 238000007500 overflow downdraw method Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 description 5
- 229910052661 anorthite Inorganic materials 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 5
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052863 mullite Inorganic materials 0.000 description 5
- 239000002244 precipitate Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910052906 cristobalite Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000000465 moulding Methods 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 238000003280 down draw process Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000006025 fining agent Substances 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000006066 glass batch Substances 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000009774 resonance method Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000013585 weight reducing agent Substances 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910006501 ZrSiO Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 229910000514 dolomite Inorganic materials 0.000 description 1
- 239000010459 dolomite Substances 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000003389 potentiating effect Effects 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Electroluminescent Light Sources (AREA)
- Glass Compositions (AREA)
Description
(2)成膜、アニール等の工程で、ガラス板は数100℃に熱処理される。熱処理の際に、ガラス板が熱収縮すると、パターンズレ等が発生し易くなる。よって、熱収縮し難いこと、特に歪点が高いこと。
(3)熱膨張係数が、ガラス板上に成膜される部材(例えば、a−Si、p−Si)に近いこと。例えば、熱膨張係数が30〜45×10−7/℃であること。なお、熱膨張係数が40×10−7/℃以下であると、耐熱衝撃性も向上する。
(4)ガラス板の撓みに起因する不具合を抑制するために、ヤング率(又は比ヤング率)が高いこと。
(5)泡、ブツ、脈理等の溶融欠陥を防止するために、溶融性に優れていること。
(6)ガラス板中の異物発生を避けるために、耐失透性に優れていること。
β−OH値 = (1/X)log(T1/T2)
X:ガラス肉厚(mm)
T1:参照波長3846cm−1における透過率(%)
T2:水酸基吸収波長3600cm−1付近における最小透過率(%)
Claims (12)
- ガラス組成として、質量%で、SiO2 55〜65%、Al2O3 15〜25%、B2O3 0〜7%、MgO 0〜5%、CaO 2〜10%、SrO 0〜5%、BaO 0〜7%、P2O5 0.1〜7%を含有し、モル比(MgO+CaO+SrO+BaO)/Al2O3が0.8〜1.4、モル比CaO/Al2O3が0.55〜0.9であることを特徴とするガラス。
- モル%で、{2×[SiO2]−[MgO]−[CaO]−[SrO]−[BaO]}≦130%の関係を満たすことを特徴とする請求項1に記載のガラス。
- ガラス組成中のLi2O+Na2O+K2Oの含有量が0.5質量%以下であることを特徴とする請求項1又は2に記載のガラス。
- ガラス組成中のB2O3の含有量が2.5質量%以上であることを特徴とする請求項1〜3の何れか一項に記載のガラス。
- ガラス組成中のFe2O3+Cr2O3の含有量が0.012質量%以下であることを特徴とする請求項1〜4の何れか一項に記載のガラス。
- 歪点が710℃以上であることを特徴とする請求項1〜5の何れか一項に記載のガラス。
- 10質量%HF水溶液に室温で30分間浸漬した時のエッチング深さが25μm以上になることを特徴とする請求項1〜6の何れか一項に記載のガラス。
- ヤング率が75GPa以上であることを特徴とする請求項1〜7の何れか一項に記載のガラス。
- 比ヤング率が30GPa/(g/cm3)以上であることを特徴とする請求項1〜8の何れか一項に記載のガラス。
- 液晶ディスプレイに用いることを特徴とする請求項1〜9の何れか一項に記載のガラス基板。
- OLEDディスプレイに用いることを特徴とする請求項1〜9の何れか一項に記載のガラス基板。
- ポリシリコン又は酸化物TFT駆動の高精細ディスプレイに用いることを特徴とする請求項1〜11の何れか一項に記載のガラス基板。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014235159A JP6532218B2 (ja) | 2014-05-27 | 2014-11-20 | ガラス |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014108908 | 2014-05-27 | ||
JP2014108908 | 2014-05-27 | ||
JP2014235159A JP6532218B2 (ja) | 2014-05-27 | 2014-11-20 | ガラス |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2016005999A JP2016005999A (ja) | 2016-01-14 |
JP6532218B2 true JP6532218B2 (ja) | 2019-06-19 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2014235159A Active JP6532218B2 (ja) | 2014-05-27 | 2014-11-20 | ガラス |
Country Status (1)
Country | Link |
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JP (1) | JP6532218B2 (ja) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7004488B2 (ja) * | 2015-03-10 | 2022-01-21 | 日本電気硝子株式会社 | ガラス基板 |
CN116282904A (zh) * | 2016-09-13 | 2023-06-23 | Agc株式会社 | 高频器件用玻璃基板和高频器件用电路基板 |
JP2018177556A (ja) * | 2017-04-05 | 2018-11-15 | 日本電気硝子株式会社 | ガラス基板 |
CN108467197A (zh) * | 2018-06-05 | 2018-08-31 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种适用于浮法成型的无碱玻璃配合料 |
CN108483901A (zh) * | 2018-06-05 | 2018-09-04 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种硅砂粒度级配的无碱玻璃配合料 |
CN108483900A (zh) * | 2018-06-05 | 2018-09-04 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种适用于浮法成型的低磷无碱玻璃配合料 |
JP7389400B2 (ja) * | 2018-10-15 | 2023-11-30 | 日本電気硝子株式会社 | 無アルカリガラス板 |
JP7478340B2 (ja) * | 2018-10-17 | 2024-05-07 | 日本電気硝子株式会社 | 無アルカリガラス板 |
CN109775963B (zh) * | 2018-12-28 | 2020-12-15 | 中建材蚌埠玻璃工业设计研究院有限公司 | 一种无碱玻璃减压熔制澄清方法 |
JP2021075410A (ja) * | 2019-11-06 | 2021-05-20 | 日本電気硝子株式会社 | ガラス板及びガラス板の製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5831838B2 (ja) * | 2011-03-08 | 2015-12-09 | 日本電気硝子株式会社 | 無アルカリガラス |
US8785336B2 (en) * | 2011-03-14 | 2014-07-22 | Nippon Electric Glass Co., Ltd. | Alkali-free glass |
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2014
- 2014-11-20 JP JP2014235159A patent/JP6532218B2/ja active Active
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JP2016005999A (ja) | 2016-01-14 |
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