JP6354943B2 - ガラス - Google Patents
ガラス Download PDFInfo
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- JP6354943B2 JP6354943B2 JP2014113869A JP2014113869A JP6354943B2 JP 6354943 B2 JP6354943 B2 JP 6354943B2 JP 2014113869 A JP2014113869 A JP 2014113869A JP 2014113869 A JP2014113869 A JP 2014113869A JP 6354943 B2 JP6354943 B2 JP 6354943B2
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- 239000011521 glass Substances 0.000 title claims description 146
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 40
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 14
- 239000004973 liquid crystal related substance Substances 0.000 claims description 13
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 9
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 3
- 229920005591 polysilicon Polymers 0.000 claims description 2
- 238000000034 method Methods 0.000 description 31
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 24
- 239000010408 film Substances 0.000 description 20
- 239000000126 substance Substances 0.000 description 18
- 230000007423 decrease Effects 0.000 description 16
- 239000013078 crystal Substances 0.000 description 15
- 230000008569 process Effects 0.000 description 15
- 238000002834 transmittance Methods 0.000 description 13
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 12
- 238000004031 devitrification Methods 0.000 description 12
- 229910052697 platinum Inorganic materials 0.000 description 11
- 239000006060 molten glass Substances 0.000 description 9
- 239000003513 alkali Substances 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 229910006404 SnO 2 Inorganic materials 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 238000007500 overflow downdraw method Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 229910021417 amorphous silicon Inorganic materials 0.000 description 6
- 230000007547 defect Effects 0.000 description 6
- 238000005530 etching Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 239000011787 zinc oxide Substances 0.000 description 6
- 238000005452 bending Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000012535 impurity Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000007795 chemical reaction product Substances 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 238000003280 down draw process Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 229910052661 anorthite Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- GWWPLLOVYSCJIO-UHFFFAOYSA-N dialuminum;calcium;disilicate Chemical compound [Al+3].[Al+3].[Ca+2].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] GWWPLLOVYSCJIO-UHFFFAOYSA-N 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000006066 glass batch Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000009774 resonance method Methods 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910017855 NH 4 F Inorganic materials 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 206010040925 Skin striae Diseases 0.000 description 1
- 229910006501 ZrSiO Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000008395 clarifying agent Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 229910000514 dolomite Inorganic materials 0.000 description 1
- 239000010459 dolomite Substances 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Electroluminescent Light Sources (AREA)
- Glass Compositions (AREA)
Description
(2)耐薬品性に優れていること。フォトリソグラフィーエッチング工程では、種々の酸、アルカリ等の薬液が使用される。耐薬品性が低いと、フォトリソグラフィーエッチング工程でガラス表面に白濁、荒れが発生し易くなる。
(3)熱収縮し難いこと、特に歪点が高いこと。成膜、アニール等の工程で、ガラス板は数百℃の温度で熱処理される。熱処理の際に、ガラス板が熱収縮すると、パターンズレ等が発生し易くなる。
(4)熱膨張係数が、ガラス板上に成膜される部材(例えば、a−Si、p−Si)に近いこと、例えば、熱膨張係数が30〜40×10−7/℃であること。なお、熱膨張係数が40×10−7/℃以下であると、耐熱衝撃性も向上する。
(5)ガラス板の撓みに起因する不具合を抑制するために、ヤング率(又は比ヤング率)が高いこと。
(6)泡、ブツ、脈理等の溶融欠陥を防止するために、溶融性に優れていること。
(7)ガラス板中の異物発生を避けるために、耐失透性に優れていること。
β−OH値 = (1/X)log(T1/T2)
X:ガラス肉厚(mm)
T1:参照波長3846cm−1における透過率(%)
T2:水酸基吸収波長3600cm−1付近における最小透過率(%)
β−OH値 = (1/X)log(T1/T2)
X:ガラス肉厚(mm)
T1:参照波長3846cm−1における透過率(%)
T2:水酸基吸収波長3600cm−1付近における最小透過率(%)
Claims (10)
- ガラス組成として、モル%で、SiO2 60〜78%、Al2O3 11.9〜23%、B2O3 2〜8%、MgO 0〜2%、CaO 3〜16%、SrO+BaO 1.3%以上、SrO 0〜4%、BaO 0〜3%、ZnO 0〜4%を含有し、モル比(MgO+CaO+SrO+BaO)/Al2O3が0.8〜1.3、モル比CaO/Al2O3が0.3〜0.86、モル比(B 2 O 3 +CaO)/(MgO+SrO+BaO)が4.0以上であることを特徴とするガラス。
- ガラス組成中のFe2O3+Cr2O3の含有量が1〜100ppm(質量)であることを特徴とする請求項1に記載のガラス。
- ガラス組成として、モル%で、SiO2 60〜78%、Al2O3 11.9〜23%、B2O3 2〜8%、CaO 3〜16%、SrO+BaO 1.3%以上、SrO 0〜4%、BaO 0〜3%、ZnO 0〜4%を含有し、モル比(MgO+CaO+SrO+BaO)/Al2O3が0.8〜1.3、モル比CaO/Al2O3が0.3〜0.86、モル比(B 2 O 3 +CaO)/(MgO+SrO+BaO)が4.0以上であり、且つガラス組成中のFe2O3+Cr2O3の含有量が1〜100ppm(質量)であることを特徴とするガラス。
- 実質的にLi2OとNa2Oを含有しないことを特徴とする請求項1〜3の何れか一項に記載のガラス。
- 歪点が710℃以上であることを特徴とする請求項1〜4の何れか一項に記載のガラス。
- ヤング率が75GPa以上であることを特徴とする請求項1〜5の何れか一項に記載のガラス。
- 比ヤング率が30GPa/g・cm−3以上であることを特徴とする請求項1〜6の何れか一項に記載のガラス。
- 液晶ディスプレイに用いることを特徴とする請求項1〜7の何れか一項に記載のガラス。
- 有機ELディスプレイに用いることを特徴とする請求項1〜7の何れか一項に記載のガラス。
- ポリシリコンTFT駆動又は酸化物TFT駆動のディスプレイに用いることを特徴とする請求項1〜9の何れか一項に記載のガラス。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014113869A JP6354943B2 (ja) | 2013-12-24 | 2014-06-02 | ガラス |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013264956 | 2013-12-24 | ||
JP2013264956 | 2013-12-24 | ||
JP2014113869A JP6354943B2 (ja) | 2013-12-24 | 2014-06-02 | ガラス |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015143172A JP2015143172A (ja) | 2015-08-06 |
JP6354943B2 true JP6354943B2 (ja) | 2018-07-11 |
Family
ID=53888520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014113869A Active JP6354943B2 (ja) | 2013-12-24 | 2014-06-02 | ガラス |
Country Status (1)
Country | Link |
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JP (1) | JP6354943B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN116375338A (zh) * | 2014-10-23 | 2023-07-04 | Agc株式会社 | 无碱玻璃 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3901757B2 (ja) * | 1994-11-30 | 2007-04-04 | 旭硝子株式会社 | 無アルカリガラス、液晶ディスプレイパネルおよびガラス板 |
JP2002003240A (ja) * | 2000-06-19 | 2002-01-09 | Nippon Electric Glass Co Ltd | 液晶ディスプレイ用ガラス基板 |
TWI469945B (zh) * | 2011-07-01 | 2015-01-21 | Avanstrate Inc | 平面顯示器用玻璃基板及其製造方法 |
JP2013212943A (ja) * | 2012-03-30 | 2013-10-17 | Avanstrate Inc | フラットパネルディスプレイ用ガラス基板の製造方法 |
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- 2014-06-02 JP JP2014113869A patent/JP6354943B2/ja active Active
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