JP5826942B2 - 走査電子顕微鏡及びこれを用いた１次電子の電流量測定方法 - Google Patents

走査電子顕微鏡及びこれを用いた１次電子の電流量測定方法 Download PDF

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Publication number
JP5826942B2
JP5826942B2 JP2014533170A JP2014533170A JP5826942B2 JP 5826942 B2 JP5826942 B2 JP 5826942B2 JP 2014533170 A JP2014533170 A JP 2014533170A JP 2014533170 A JP2014533170 A JP 2014533170A JP 5826942 B2 JP5826942 B2 JP 5826942B2
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Japan
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primary
filter
detector
electrons
specimen
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Expired - Fee Related
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JP2014533170A
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Japanese (ja)
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JP2014528154A (ja
Inventor
キム，ソウク
ヒョン アン，ジェ
ヒョン アン，ジェ
ボン カン，ソン
ボン カン，ソン
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SNU Precision Co Ltd
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SNU Precision Co Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
    • H01J2237/24535—Beam current

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2014533170A 2011-09-27 2011-09-28 走査電子顕微鏡及びこれを用いた１次電子の電流量測定方法 Expired - Fee Related JP5826942B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2011-0097829 2011-09-27
KR1020110097829A KR101348581B1 (ko) 2011-09-27 2011-09-27 주사전자현미경 및 이를 이용한 1차전자의 전류량 측정 방법
PCT/KR2011/007129 WO2013047920A1 (ko) 2011-09-27 2011-09-28 주사전자현미경 및 이를 이용한 1차전자의 전류량 측정 방법

Publications (2)

Publication Number Publication Date
JP2014528154A JP2014528154A (ja) 2014-10-23
JP5826942B2 true JP5826942B2 (ja) 2015-12-02

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ID=47995930

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JP2014533170A Expired - Fee Related JP5826942B2 (ja) 2011-09-27 2011-09-28 走査電子顕微鏡及びこれを用いた１次電子の電流量測定方法

Country Status (5)

Country Link
JP (1) JP5826942B2 (ko)
KR (1) KR101348581B1 (ko)
CN (1) CN103890896B (ko)
TW (1) TWI456622B (ko)
WO (1) WO2013047920A1 (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101493215B1 (ko) * 2013-07-31 2015-02-16 케이맥(주) 이온 및 전자 빔 전류 측정을 위한 패러데이 컵
WO2015016632A1 (ko) * 2013-07-31 2015-02-05 케이맥(주) 비행시간을 이용한 조성 및 정량 분석 장치 및 방법, 이에 이용되는 패러데이 컵 어셈블리
KR101756171B1 (ko) 2015-12-15 2017-07-12 (주)새론테크놀로지 주사 전자 현미경
US20220254599A1 (en) * 2019-07-26 2022-08-11 Asml Netherlands B.V. Multiple landing energy scanning electron microscopy systems and methods

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04115447A (ja) * 1990-09-04 1992-04-16 Jeol Ltd イオンビーム装置
JP3148353B2 (ja) * 1991-05-30 2001-03-19 ケーエルエー・インストルメンツ・コーポレーション 電子ビーム検査方法とそのシステム
JP3101114B2 (ja) * 1993-02-16 2000-10-23 日本電子株式会社 走査電子顕微鏡
JPH07105888A (ja) * 1993-10-05 1995-04-21 Jeol Ltd 走査電子顕微鏡
JP3376793B2 (ja) * 1995-12-20 2003-02-10 株式会社日立製作所 走査形電子顕微鏡
JP2003187733A (ja) * 2001-12-14 2003-07-04 Ebara Corp 電子線装置及びこの装置を用いたデバイス製造方法
JP4636897B2 (ja) * 2005-02-18 2011-02-23 株式会社日立ハイテクサイエンスシステムズ 走査電子顕微鏡
JP5075375B2 (ja) 2006-08-11 2012-11-21 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP4889105B2 (ja) * 2006-08-23 2012-03-07 エスアイアイ・ナノテクノロジー株式会社 荷電粒子ビーム装置
JP5276860B2 (ja) 2008-03-13 2013-08-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US7960697B2 (en) * 2008-10-23 2011-06-14 Hermes-Microvision, Inc. Electron beam apparatus

Also Published As

Publication number Publication date
TW201314732A (zh) 2013-04-01
TWI456622B (zh) 2014-10-11
JP2014528154A (ja) 2014-10-23
WO2013047920A1 (ko) 2013-04-04
CN103890896B (zh) 2016-08-17
KR20130033877A (ko) 2013-04-04
CN103890896A (zh) 2014-06-25
KR101348581B1 (ko) 2014-01-09

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