JP5624829B2 - 磁気記録媒体用ガラス基板の製造方法 - Google Patents

磁気記録媒体用ガラス基板の製造方法 Download PDF

Info

Publication number: JP5624829B2
Authority: JP; Japan
Prior art keywords: glass substrate; polishing; lapping; diamond; abrasive grains
Prior art date: 2010-08-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

JP2010182330A

Other languages

English (en)

Japanese (ja)

Other versions

JP2012043492A (ja

Inventor

和幸羽根田

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Showa Denko KK

Original Assignee

Showa Denko KK

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2010-08-17

Filing date

2010-08-17

Publication date

2014-11-12

2010-08-17 Application filed by Showa Denko KK filed Critical Showa Denko KK

2010-08-17 Priority to JP2010182330A priority Critical patent/JP5624829B2/ja

2011-08-15 Priority to US13/209,873 priority patent/US20120045971A1/en

2011-08-15 Priority to CN201110233835.8A priority patent/CN102376314B/zh

2012-03-01 Publication of JP2012043492A publication Critical patent/JP2012043492A/ja

2014-11-12 Application granted granted Critical

2014-11-12 Publication of JP5624829B2 publication Critical patent/JP5624829B2/ja

Status Expired - Fee Related legal-status Critical Current

2030-08-17 Anticipated expiration legal-status Critical

Links

239000000758 substrate Substances 0.000 title claims description 191
239000011521 glass Substances 0.000 title claims description 189
238000000034 method Methods 0.000 title claims description 90
238000004519 manufacturing process Methods 0.000 title claims description 32
238000005498 polishing Methods 0.000 claims description 149
239000010432 diamond Substances 0.000 claims description 124
229910003460 diamond Inorganic materials 0.000 claims description 124
239000006061 abrasive grain Substances 0.000 claims description 69
238000007517 polishing process Methods 0.000 claims description 43
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 24
239000002245 particle Substances 0.000 claims description 20
229910000420 cerium oxide Inorganic materials 0.000 claims description 15
BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 15
239000011230 binding agent Substances 0.000 claims description 14
229910052814 silicon oxide Inorganic materials 0.000 claims description 11
239000004640 Melamine resin Substances 0.000 claims description 6
229920000877 Melamine resin Polymers 0.000 claims description 6
239000005011 phenolic resin Substances 0.000 claims description 6
229920005749 polyurethane resin Polymers 0.000 claims description 6
239000003795 chemical substances by application Substances 0.000 claims description 5
230000002093 peripheral effect Effects 0.000 description 112
239000007788 liquid Substances 0.000 description 34
239000002002 slurry Substances 0.000 description 17
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
230000003746 surface roughness Effects 0.000 description 11
229910004298 SiO 2 Inorganic materials 0.000 description 9
239000012530 fluid Substances 0.000 description 9
229910018072 Al 2 O 3 Inorganic materials 0.000 description 8
238000004140 cleaning Methods 0.000 description 7
239000000126 substance Substances 0.000 description 7
239000000969 carrier Substances 0.000 description 6
CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 6
229910000422 cerium(IV) oxide Inorganic materials 0.000 description 6
239000008119 colloidal silica Substances 0.000 description 6
239000002241 glass-ceramic Substances 0.000 description 6
238000007689 inspection Methods 0.000 description 6
239000011734 sodium Substances 0.000 description 6
125000006850 spacer group Chemical group 0.000 description 6
230000000052 comparative effect Effects 0.000 description 5
239000000110 cooling liquid Substances 0.000 description 5
239000013078 crystal Substances 0.000 description 5
239000000428 dust Substances 0.000 description 5
OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 4
229910010413 TiO 2 Inorganic materials 0.000 description 4
239000007767 bonding agent Substances 0.000 description 4
229910052708 sodium Inorganic materials 0.000 description 4
QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 3
239000012964 benzotriazole Substances 0.000 description 3
239000005345 chemically strengthened glass Substances 0.000 description 3
239000010410 layer Substances 0.000 description 3
229920000620 organic polymer Polymers 0.000 description 3
239000000243 solution Substances 0.000 description 3
KFJDQPJLANOOOB-UHFFFAOYSA-N 2h-benzotriazole-4-carboxylic acid Chemical compound OC(=O)C1=CC=CC2=NNN=C12 KFJDQPJLANOOOB-UHFFFAOYSA-N 0.000 description 2
JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
239000004677 Nylon Substances 0.000 description 2
229920002125 Sokalan® Polymers 0.000 description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
229910052782 aluminium Inorganic materials 0.000 description 2
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
150000001565 benzotriazoles Chemical class 0.000 description 2
239000003599 detergent Substances 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
239000004744 fabric Substances 0.000 description 2
239000011777 magnesium Substances 0.000 description 2
239000000463 material Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
239000006060 molten glass Substances 0.000 description 2
238000000465 moulding Methods 0.000 description 2
229920001778 nylon Polymers 0.000 description 2
239000003921 oil Substances 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
150000003839 salts Chemical class 0.000 description 2
239000000377 silicon dioxide Substances 0.000 description 2
-1 sodium carboxylate Chemical class 0.000 description 2
239000007787 solid Substances 0.000 description 2
239000006104 solid solution Substances 0.000 description 2
BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
239000002699 waste material Substances 0.000 description 2
ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 1
229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
239000005069 Extreme pressure additive Substances 0.000 description 1
229910018068 Li 2 O Inorganic materials 0.000 description 1
239000002202 Polyethylene glycol Substances 0.000 description 1
235000021355 Stearic acid Nutrition 0.000 description 1
229910052783 alkali metal Inorganic materials 0.000 description 1
SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
CNLWCVNCHLKFHK-UHFFFAOYSA-N aluminum;lithium;dioxido(oxo)silane Chemical compound [Li+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O CNLWCVNCHLKFHK-UHFFFAOYSA-N 0.000 description 1
150000001412 amines Chemical class 0.000 description 1
125000003277 amino group Chemical group 0.000 description 1
239000003945 anionic surfactant Substances 0.000 description 1
239000004760 aramid Substances 0.000 description 1
229920006231 aramid fiber Polymers 0.000 description 1
MXJIHEXYGRXHGP-UHFFFAOYSA-N benzotriazol-1-ylmethanol Chemical compound C1=CC=C2N(CO)N=NC2=C1 MXJIHEXYGRXHGP-UHFFFAOYSA-N 0.000 description 1
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
125000002843 carboxylic acid group Chemical group 0.000 description 1
239000003518 caustics Substances 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
239000013256 coordination polymer Substances 0.000 description 1
229910052878 cordierite Inorganic materials 0.000 description 1
229910052906 cristobalite Inorganic materials 0.000 description 1
238000005520 cutting process Methods 0.000 description 1
230000007547 defect Effects 0.000 description 1
WVMPCBWWBLZKPD-UHFFFAOYSA-N dilithium oxido-[oxido(oxo)silyl]oxy-oxosilane Chemical compound [Li+].[Li+].[O-][Si](=O)O[Si]([O-])=O WVMPCBWWBLZKPD-UHFFFAOYSA-N 0.000 description 1
JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
230000000694 effects Effects 0.000 description 1
229910052634 enstatite Inorganic materials 0.000 description 1
239000003822 epoxy resin Substances 0.000 description 1
229910052839 forsterite Inorganic materials 0.000 description 1
239000003365 glass fiber Substances 0.000 description 1
125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
230000001050 lubricating effect Effects 0.000 description 1
HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
BBCCCLINBSELLX-UHFFFAOYSA-N magnesium;dihydroxy(oxo)silane Chemical compound [Mg+2].O[Si](O)=O BBCCCLINBSELLX-UHFFFAOYSA-N 0.000 description 1
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
229910052759 nickel Inorganic materials 0.000 description 1
QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
239000008188 pellet Substances 0.000 description 1
229920000647 polyepoxide Polymers 0.000 description 1
229920001223 polyethylene glycol Polymers 0.000 description 1
239000011241 protective layer Substances 0.000 description 1
239000010453 quartz Substances 0.000 description 1
229920005989 resin Polymers 0.000 description 1
239000011347 resin Substances 0.000 description 1
238000006748 scratching Methods 0.000 description 1
230000002393 scratching effect Effects 0.000 description 1
DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
229910052596 spinel Inorganic materials 0.000 description 1
239000011029 spinel Substances 0.000 description 1
229910052642 spodumene Inorganic materials 0.000 description 1
239000008117 stearic acid Substances 0.000 description 1
125000000542 sulfonic acid group Chemical group 0.000 description 1
239000004094 surface-active agent Substances 0.000 description 1
239000010936 titanium Substances 0.000 description 1
229910052719 titanium Inorganic materials 0.000 description 1
229910052905 tridymite Inorganic materials 0.000 description 1
239000004034 viscosity adjusting agent Substances 0.000 description 1

Images

Classifications

- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

Engineering & Computer Science (AREA)
Manufacturing & Machinery (AREA)
Manufacturing Of Magnetic Record Carriers (AREA)
Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Surface Treatment Of Glass (AREA)
Polishing Bodies And Polishing Tools (AREA)

JP2010182330A 2010-08-17 2010-08-17 磁気記録媒体用ガラス基板の製造方法 Expired - Fee Related JP5624829B2 (ja)

Priority Applications (3)

Application Number	Priority Date	Filing Date	Title
JP2010182330A JP5624829B2 (ja)	2010-08-17	2010-08-17	磁気記録媒体用ガラス基板の製造方法
US13/209,873 US20120045971A1 (en)	2010-08-17	2011-08-15	Method of manufacturing glass substrate for magnetic recording media
CN201110233835.8A CN102376314B (zh)	2010-08-17	2011-08-15	磁记录介质用玻璃基板的制造方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2010182330A JP5624829B2 (ja)	2010-08-17	2010-08-17	磁気記録媒体用ガラス基板の製造方法

Publications (2)

Publication Number	Publication Date
JP2012043492A JP2012043492A (ja)	2012-03-01
JP5624829B2 true JP5624829B2 (ja)	2014-11-12

Family

ID=45594437

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2010182330A Expired - Fee Related JP5624829B2 (ja)	2010-08-17	2010-08-17	磁気記録媒体用ガラス基板の製造方法

Country Status (3)

Country	Link
US (1)	US20120045971A1 (zh)
JP (1)	JP5624829B2 (zh)
CN (1)	CN102376314B (zh)

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JP2012064295A (ja) *	2009-11-10	2012-03-29	Showa Denko Kk	磁気記録媒体用ガラス基板の製造方法
JP2012089221A (ja) *	2010-10-22	2012-05-10	Showa Denko Kk	磁気記録媒体用ガラス基板の製造方法
JP2012169024A (ja) *	2011-02-16	2012-09-06	Showa Denko Kk	磁気記録媒体用ガラス基板の製造方法
CN104838444B (zh) *	2012-12-27	2018-06-29	Hoya株式会社	硬盘用玻璃基板的制造方法
SG10201502081VA (en) *	2014-04-08	2015-11-27	Showa Denko Kk	Method of manufacturing perpendicular magnetic recording medium

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CN1993298A (zh) *	2004-08-27	2007-07-04	昭和电工株式会社	制造用于磁记录介质的玻璃基底的方法及通过该方法制得的用于磁记录介质的玻璃基底
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JP2009259309A (ja) *	2008-04-14	2009-11-05	Showa Denko Kk	磁気記録媒体用基板の製造方法
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CN102812514B (zh) *	2010-04-01	2016-05-25	Hoya株式会社	磁盘用玻璃基板的制造方法
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JP2012099172A (ja) *	2010-10-29	2012-05-24	Showa Denko Kk	磁気記録媒体用ガラス基板の製造方法

2010
- 2010-08-17 JP JP2010182330A patent/JP5624829B2/ja not_active Expired - Fee Related
2011
- 2011-08-15 CN CN201110233835.8A patent/CN102376314B/zh not_active Expired - Fee Related
- 2011-08-15 US US13/209,873 patent/US20120045971A1/en not_active Abandoned

Also Published As

Publication number	Publication date
JP2012043492A (ja)	2012-03-01
US20120045971A1 (en)	2012-02-23
CN102376314A (zh)	2012-03-14
CN102376314B (zh)	2014-08-13

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Publication	Publication Date	Title
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