JP5139073B2 - ナノ構造のバルク熱電材料 - Google Patents
ナノ構造のバルク熱電材料 Download PDFInfo
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- JP5139073B2 JP5139073B2 JP2007545449A JP2007545449A JP5139073B2 JP 5139073 B2 JP5139073 B2 JP 5139073B2 JP 2007545449 A JP2007545449 A JP 2007545449A JP 2007545449 A JP2007545449 A JP 2007545449A JP 5139073 B2 JP5139073 B2 JP 5139073B2
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- thermoelectric
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/852—Thermoelectric active materials comprising inorganic compositions comprising tellurium, selenium or sulfur
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/857—Thermoelectric active materials comprising compositions changing continuously or discontinuously inside the material
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/02—Treatment of water, waste water, or sewage by heating
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
Description
本発明に係わる材料及びデバイスを製造するために、いろいろな方法を用いることができる。例えば1)多孔質マトリクス、例えばメソ多孔質シリカセラミックマトリクス又は多孔質モノリスを電気化学的方法によって充填する、2)セラミック/半導体ナノ複合粒子(例えば、セラミックマトリクス中を通っている半導体ナノワイヤを有する粒子)を含む粉末をホットプレスする、及び3)セラミック粒子と半導体ナノ粒子の混合物を含む粉末をホットプレスする、などである。「粉末」という用語は、一つ以上のタイプの粒子を含む粒状物質を指す。多孔質モノリスはセラミック粉末をホットプレスして形成できる。これらのアプローチやその他のアプローチについては以下でさらに詳しく説明する。
メソ多孔質シリカモノリスをテンプレートとして用いて、電着によってナノワイヤ及びナノメッシュモノリスを製造する方法は次の二つのステップを含む。1)シリカテンプレートの作成、及び2)テンプレートのメソ多孔質チャンネル内部での金属又は半導体の電気化学的成長。メソ多孔質シリカはいろいろな方法で製造できる。マトリクス物質はまたどんな多孔質物質であってもよく、ポア(孔)構造はナノスケールの特徴を含むものでもよい。
多孔質シリカテンプレートが界面活性剤をポロゲンとして用いて調製された。用いられた界面活性剤は、PLURONIC界面活性剤P123(EO20PO70EO20), F127 (EO100PO70EO100), Brij-58(C16H33EO20),及びセチルトリメチル臭化アンモニウム(CTAB)などである、ここでEOとPOはそれぞれ、エチレン及びプロピレンオキシドを表す。テンプレートは界面活性剤テンプレート化プロセスによって調製された。F127, P123, Brij-58, 及びCTABによってテンプレート化されたポア(孔)の平均ポア直径はそれぞれ、約12、9、6、及び2nmであった。
PLURONIC界面活性剤P123をテンプレートとしてゾル−ゲル法によって、キセロゲルメソ多孔質シリカが作製された。調製された状態の六角形メソ構造シリカのポア(孔)直径は約9nmであった。Bi2Te3の前駆体溶液は、60℃の150mL 6M HNO3に0.00225 mol Teと0.015 mol Bi(NO3)35H2Oを溶かして調製された。
電着の条件及び前駆体組成を変えることによって、化学的組成とドーピングに対するコントロールを改善できる。例えば、CdSe, CdTe, CdS, PbSe, PbTe, 及びPbSなどの半導体をメソ多孔質チャンネル内部にデポジットできる。このような組成コントロールは、さらにデバイスの輸送性質の調整を可能にする。
粒子は内部ナノ構造を有するものであってもよい。粒子は、半導体を浸潤させたナノ多孔質絶縁物質を粉砕して形成できる。粒子はセラミック又はその他の電気的に絶縁性の物質内部にナノ構造の包含物を有する。
熱電複合材料を形成するプロセスの一例は次のようなものである。第一のステップで、半導体とセラミックのナノ粒子が高エネルギーボールミル粉砕又はその他の機械的又は化学的方法によって形成される。第二のステップで、ナノ粒子が適当な比で混合され、機械プレスで予備プレスされ、不活性気体中で高温等方プレス(HIP)によって2000℃までの温度で60,000psiを超える圧力に圧縮される。この方法の一つの利点は、比較的複雑な形をHIPプロセス又は他の固化プロセスで作製することができ、サンプルに非等方性が生じないことである。さらに、金属電極などの追加される層をHIPプロセスで熱電材料の表面に直接融合できる。温度、圧力、及び加圧気体の組成をすべてHIPステップでコントロールできるこのプロセスで得られる生成物の密度は理論値に近い。
第一の成分は、半導体又は金属などの導電性物質が可能である。第一の成分は無機物質であっても、導電性ポリマーや有機半導体などの有機物質であってもよい。
本発明に係わる熱電複合材料はさらに、他の物質及び/又は構造、例えば空気(ボイド内に)、半導体又は電気絶縁体のナノ層がデポジットされる電気絶縁性コア、及び機械的強度を高めるための結合剤又はファイバー、を含むことができる。
本発明に係わる熱電材料及びデバイスのその他の応用は当業者には明らかであろう。応用は、自動車などの車両、飛行機、及び宇宙船における電力発生を含む。熱的な勾配を、エンジンの運転、燃料の燃焼、太陽エネルギー、又はその他のエネルギー源によって生成できる。
Claims (5)
- 第一の電気接点、
第二の電気接点、及び
前記第一の電気接点と第二の電気接点の間の電気的経路内部に配置された熱電バルク材料
を備えた熱電デバイスであって、前記熱電バルク材料が
導電性でありかつナノ構造である第一の成分、
第二の成分、この第二の成分の導電度は前記第一の成分より実質的に小さい、
を含み、前記熱電バルク材料は前記第一の成分の連続な半導体ネットワークを含み、この第一の成分はこの連続な半導体ネットワーク中に分散した連続なセラミックマトリクスを形成する第二の成分のナノ粒子を有する熱電デバイス。 - 第一の成分が金属である、請求項1に記載の熱電デバイス。
- 第二の成分が電気絶縁体である、請求項1に記載の熱電デバイス。
- 第二の成分が電気絶縁性の無機酸化物である、請求項1に記載の熱電デバイス。
- 熱電材料を含むデバイスの少なくとも一部に熱的勾配が拡がったときに第一の電気接点と第二の電気接点の間に電位を生ずる、請求項1に記載の熱電デバイス。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US63391804P | 2004-12-07 | 2004-12-07 | |
US60/633,918 | 2004-12-07 | ||
US11/120,731 | 2005-05-03 | ||
US11/120,731 US7309830B2 (en) | 2005-05-03 | 2005-05-03 | Nanostructured bulk thermoelectric material |
PCT/US2005/037304 WO2006062582A2 (en) | 2004-12-07 | 2005-10-18 | Nanostructured bulk thermoelectric material |
Related Child Applications (1)
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JP2010153262A Division JP5529653B2 (ja) | 2004-12-07 | 2010-07-05 | ナノ構造のバルク熱電材料 |
Publications (2)
Publication Number | Publication Date |
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JP2008523614A JP2008523614A (ja) | 2008-07-03 |
JP5139073B2 true JP5139073B2 (ja) | 2013-02-06 |
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JP2007545449A Expired - Fee Related JP5139073B2 (ja) | 2004-12-07 | 2005-10-18 | ナノ構造のバルク熱電材料 |
JP2010153262A Expired - Fee Related JP5529653B2 (ja) | 2004-12-07 | 2010-07-05 | ナノ構造のバルク熱電材料 |
Family Applications After (1)
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JP2010153262A Expired - Fee Related JP5529653B2 (ja) | 2004-12-07 | 2010-07-05 | ナノ構造のバルク熱電材料 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7309830B2 (ja) |
EP (1) | EP1820224B1 (ja) |
JP (2) | JP5139073B2 (ja) |
CN (2) | CN100550450C (ja) |
WO (1) | WO2006062582A2 (ja) |
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US5448109B1 (en) * | 1994-03-08 | 1997-10-07 | Tellurex Corp | Thermoelectric module |
JP3458587B2 (ja) * | 1995-06-28 | 2003-10-20 | 松下電工株式会社 | 熱電変換材料及びその製法 |
JP3529576B2 (ja) * | 1997-02-27 | 2004-05-24 | 財団法人電力中央研究所 | 熱電材料及びその製造方法 |
JP2905878B1 (ja) * | 1998-05-11 | 1999-06-14 | 工業技術院長 | 複合熱電材料の作製方法 |
JP2001007407A (ja) | 1999-06-23 | 2001-01-12 | Sumitomo Special Metals Co Ltd | 熱電変換材料とその製造方法 |
JP3443640B2 (ja) * | 2000-02-09 | 2003-09-08 | 独立行政法人産業技術総合研究所 | 熱電材料の製造方法 |
CA2404013A1 (en) * | 2000-04-21 | 2001-11-01 | Hongyou Fan | Prototyping of patterned functional nanostructures |
JP3559962B2 (ja) * | 2000-09-04 | 2004-09-02 | 日本航空電子工業株式会社 | 熱電変換材料及びその製造方法 |
EP1374309A1 (en) | 2001-03-30 | 2004-01-02 | The Regents Of The University Of California | Methods of fabricating nanostructures and nanowires and devices fabricated therefrom |
US6670539B2 (en) * | 2001-05-16 | 2003-12-30 | Delphi Technologies, Inc. | Enhanced thermoelectric power in bismuth nanocomposites |
US7098393B2 (en) * | 2001-05-18 | 2006-08-29 | California Institute Of Technology | Thermoelectric device with multiple, nanometer scale, elements |
US7342169B2 (en) * | 2001-10-05 | 2008-03-11 | Nextreme Thermal Solutions | Phonon-blocking, electron-transmitting low-dimensional structures |
JP2003326143A (ja) * | 2002-05-14 | 2003-11-18 | Asahi Kasei Corp | 新規濾過膜 |
CN1159212C (zh) * | 2002-06-21 | 2004-07-28 | 清华大学 | 一种纳米级金属碲化物的制备方法 |
JP4434575B2 (ja) * | 2002-12-13 | 2010-03-17 | キヤノン株式会社 | 熱電変換素子及びその製造方法 |
JP2004265988A (ja) | 2003-02-28 | 2004-09-24 | Matsushita Electric Ind Co Ltd | 熱電体およびその製造方法 |
US20040187905A1 (en) * | 2003-03-27 | 2004-09-30 | Heremans Joseph Pierre | Thermoelectric materials with enhanced seebeck coefficient |
US20050257821A1 (en) * | 2004-05-19 | 2005-11-24 | Shriram Ramanathan | Thermoelectric nano-wire devices |
US7465871B2 (en) * | 2004-10-29 | 2008-12-16 | Massachusetts Institute Of Technology | Nanocomposites with high thermoelectric figures of merit |
EP1686117A1 (en) * | 2005-01-27 | 2006-08-02 | Sandoz AG | Polymorph and solvates of aripiprazole |
-
2005
- 2005-05-03 US US11/120,731 patent/US7309830B2/en active Active
- 2005-10-18 WO PCT/US2005/037304 patent/WO2006062582A2/en active Application Filing
- 2005-10-18 EP EP20050817061 patent/EP1820224B1/en not_active Not-in-force
- 2005-10-18 CN CNB2005800465120A patent/CN100550450C/zh not_active Expired - Fee Related
- 2005-10-18 JP JP2007545449A patent/JP5139073B2/ja not_active Expired - Fee Related
- 2005-10-18 CN CN2009101688041A patent/CN101656293B/zh not_active Expired - Fee Related
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US20060118158A1 (en) | 2006-06-08 |
EP1820224A2 (en) | 2007-08-22 |
JP5529653B2 (ja) | 2014-06-25 |
CN101156255A (zh) | 2008-04-02 |
JP2010278449A (ja) | 2010-12-09 |
CN101656293B (zh) | 2012-01-11 |
WO2006062582A2 (en) | 2006-06-15 |
EP1820224B1 (en) | 2015-04-29 |
WO2006062582A3 (en) | 2007-03-01 |
JP2008523614A (ja) | 2008-07-03 |
CN100550450C (zh) | 2009-10-14 |
US7309830B2 (en) | 2007-12-18 |
EP1820224A4 (en) | 2012-10-31 |
CN101656293A (zh) | 2010-02-24 |
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