JP4891730B2 - 液処理装置及び液処理方法並びに液処理プログラム - Google Patents
液処理装置及び液処理方法並びに液処理プログラム Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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Description
3 キャリア 4 キャリア搬入出部
5 バッチ 6 バッチ編成部
7 基板処理部 8 キャリアステージ
9 開閉扉 10 キャリア搬送機構
11 キャリアストック 12 キャリア載置台
13 開閉扉 14 基板搬送機構
15 バッチ形成機構 16 配列順序変更機構
17 バッチ搬送機構 18 ウエハ収容状態検出センサー
19 ノッチアライナー 20 洗浄乾燥機構
21 洗浄機構 22 昇降機構
23 液処理装置 24 洗浄装置
25 第1の薬液槽 26 第2の薬液槽
27 第3の薬液槽 28 第1の純水槽
29 第2の純水槽 30 第3の純水槽
31 第1の搬送装置 32 第2の搬送装置
33 第3の搬送装置 34 洗浄ユニット
35 乾燥ユニット 36 支持具
37 アーム 38,39,40,41 支持体
42,43 連結体 44,45,46,47 支持溝
48 制御部 49 洗浄処理槽
50,51 左右側壁 52,53 洗浄液供給ノズル
54 底壁 55 排水管
56 開閉バルブ 57 オーバーフロー槽
58 底壁 59 排水管
60 開閉バルブ 61 純水供給源
62 薬液供給源 63 三方コック
64 乾燥処理槽 65 シャッター機構
66 ケーシング 67 シャッター収容部
68 シャッター 69 開閉機構
70 貫通孔 71 パッキン
72 昇降機構 73 フランジ
74,75 乾燥蒸気供給ノズル 76,77 ガス吐出口
78 乾燥蒸気供給源 79 開閉バルブ
80 コントローラ 81 記憶媒体
82 液処理プログラム 83 洗浄サブルーチン
84 乾燥サブルーチン 85 吸引管
86 センサ
Claims (15)
- 処理槽の内部に被処理体を支持するための支持具を昇降可能に配設し、処理槽の内部で支持具で支持した被処理体を供給ノズルから処理槽にそれぞれ供給した薬液又はリンス液に浸漬して薬液処理とリンス処理とを行う液処理装置において、
供給ノズルから処理槽に供給した薬液に被処理体を浸漬して薬液処理を行った後に、供給ノズルから処理槽にリンス液を供給して薬液を処理槽からオーバーフローさせて処理槽の内部を薬液からリンス液に置換し、リンス液に被処理体を浸漬したリンス処理を行い、
被処理体は、薬液処理を行った後に支持具を上昇させて、薬液処理時よりも上昇させた位置でリンス処理を行うことを特徴とする液処理装置。 - リンス処理時に、リンス液の液面位置から被処理体の上端位置までの距離が薬液処理時の薬液の液面位置から被処理体の上端位置までの距離よりも短くなるように、支持具を上昇させることを特徴とする請求項1に記載の液処理装置。
- 薬液処理時に支持具を昇降させるとともに、昇降する被処理体の上端の平均位置を前記薬液処理時の被処理体の上端位置として支持具を上昇させることを特徴とする請求項2に記載の液処理装置。
- 薬液処理時に支持具を昇降させるとともに、昇降する被処理体の上端の最高位置を前記薬液処理時の被処理体の上端位置として支持具を上昇させることを特徴とする請求項2に記載の液処理装置。
- リンス液の液面位置から被処理体の上端位置までの距離がリンス液の底面位置から被処理体の下端位置までの距離よりも短くなるように、支持具を上昇させることを特徴とする請求項1に記載の液処理装置。
- 被処理体を供給ノズルから処理槽にそれぞれ供給した薬液又はリンス液に浸漬して薬液処理とリンス処理とを行う液処理方法において、
供給ノズルから処理槽に供給した薬液に被処理体を浸漬して薬液処理を行った後に、供給ノズルから処理槽にリンス液を供給して薬液を処理槽からオーバーフローさせて処理槽の内部を薬液からリンス液に置換し、リンス液に被処理体を浸漬したリンス処理を行い、
薬液処理時よりも被処理体を上昇させてからリンス処理を行うことを特徴とする液処理方法。 - リンス液の液面位置から被処理体の上端位置までの距離を薬液の液面位置から被処理体の上端位置までの距離よりも短くなるようにしてリンス処理を行うことを特徴とする請求項6に記載の液処理方法。
- 薬液処理時に被処理体を昇降させるとともに、昇降する被処理体の上端の平均位置を前記薬液処理時の被処理体の上端位置とすることを特徴とする請求項7に記載の液処理方法。
- 薬液処理時に被処理体を昇降させるとともに、昇降する被処理体の上端の最高位置を前記薬液処理時の被処理体の上端位置とすることを特徴とする請求項7に記載の液処理方法。
- リンス液の液面位置から被処理体の上端位置までの距離をリンス液の底面位置から被処理体の下端位置までの距離よりも短くなるようにしてリンス処理を行うことを特徴とする請求項6に記載の液処理方法。
- 処理槽の内部に被処理体を支持するための支持具を昇降可能に配設した液処理装置に、処理槽の内部で支持具で支持した被処理体を薬液又はリンス液に浸漬して薬液処理とリンス処理とを行わせる液処理プログラムにおいて、
供給ノズルから処理槽に供給した薬液に被処理体を浸漬して薬液処理を行う薬液処理ステップと、
供給ノズルから処理槽にリンス液を供給して薬液を処理槽からオーバーフローさせて処理槽の内部を薬液からリンス液に置換し、リンス液に被処理体を浸漬したリンス処理を行うリンス処理ステップと、
被処理体を薬液処理時よりも上昇させた位置でリンス処理を行うように薬液処理を行った後に支持具を上昇させる支持具上昇ステップを有することを特徴とする液処理プログラム。 - 前記支持具上昇ステップは、リンス液の液面位置から被処理体の上端位置までの距離が薬液処理時の薬液の液面位置から被処理体の上端位置までの距離よりも短くなるように、支持具を上昇させることを特徴とする請求項11に記載の液処理プログラム。
- 薬液処理時に支持具を昇降させる支持具昇降ステップを有するとともに、昇降する被処理体の上端の平均位置を前記薬液処理時の被処理体の上端位置として前記支持具上昇ステップで支持具を上昇させることを特徴とする請求項12に記載の液処理プログラム。
- 薬液処理時に支持具を昇降させる支持具昇降ステップを有するとともに、昇降する被処理体の上端の最高位置を前記薬液処理時の被処理体の上端位置として前記支持具上昇ステップで支持具を上昇させることを特徴とする請求項12に記載の液処理プログラム。
- リンス液の液面位置から被処理体の上端位置までの距離がリンス液の底面位置から被処理体の下端位置までの距離よりも短くなるように、支持具を上昇させる支持具上昇ステップを有することを特徴とする請求項11に記載の液処理プログラム。
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US11/907,518 US8577502B2 (en) | 2006-10-18 | 2007-10-12 | Liquid processing apparatus, liquid processing method, computer program, and storage medium |
EP07020204A EP1914791B1 (en) | 2006-10-18 | 2007-10-16 | Liquid processing method, computer program, and storage medium |
TW096138699A TW200830389A (en) | 2006-10-18 | 2007-10-16 | Liquid processing apparatus, liquid processing method, and storage media having liquid processing program stored |
KR1020070105089A KR101267641B1 (ko) | 2006-10-18 | 2007-10-18 | 액 처리 장치, 액 처리 방법, 및 액 처리 프로그램을저장한 기억 매체 |
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JP2001015468A (ja) * | 1999-06-30 | 2001-01-19 | Seiko Epson Corp | 被処理基板の処理方法及び薬液処理装置 |
JP2001176833A (ja) * | 1999-12-14 | 2001-06-29 | Tokyo Electron Ltd | 基板処理装置 |
JP3592702B1 (ja) | 2003-08-12 | 2004-11-24 | エス・イー・エス株式会社 | 基板処理方法及び基板処理装置 |
KR100830485B1 (ko) * | 2004-04-02 | 2008-05-20 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치 및 기판 처리 방법 |
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2006
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2007
- 2007-10-12 US US11/907,518 patent/US8577502B2/en active Active
- 2007-10-16 TW TW096138699A patent/TW200830389A/zh unknown
- 2007-10-16 EP EP07020204A patent/EP1914791B1/en not_active Expired - Fee Related
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EP1914791A3 (en) | 2009-07-15 |
TWI372422B (ja) | 2012-09-11 |
KR101267641B1 (ko) | 2013-05-23 |
US8577502B2 (en) | 2013-11-05 |
JP2008103435A (ja) | 2008-05-01 |
EP1914791B1 (en) | 2013-04-03 |
KR20080035489A (ko) | 2008-04-23 |
EP1914791A2 (en) | 2008-04-23 |
TW200830389A (en) | 2008-07-16 |
US20080097647A1 (en) | 2008-04-24 |
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