JP2019191423A - Retainer and optical device - Google Patents

Retainer and optical device Download PDF

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JP2019191423A
JP2019191423A JP2018085726A JP2018085726A JP2019191423A JP 2019191423 A JP2019191423 A JP 2019191423A JP 2018085726 A JP2018085726 A JP 2018085726A JP 2018085726 A JP2018085726 A JP 2018085726A JP 2019191423 A JP2019191423 A JP 2019191423A
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holding
support member
slope
inclined surface
holding device
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JP7090464B2 (en
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新井　学
Manabu Arai
学 新井
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Canon Inc
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Canon Inc
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Priority to KR1020190045397A priority patent/KR102493919B1/en
Priority to CN201910341338.6A priority patent/CN110412835B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Optics & Photonics (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

To provide a retainer advantageous in a point of positioning of a retaining target object to a temperature change, even when an expansion amount in a gravity direction to an expansion amount in a horizontal direction is very small.SOLUTION: A retainer 100 includes: a structure 110 surrounding an object 101; a retaining member 106 for retaining the object; a base member 103 provided on an inner wall of the structure; and a support member 102 mounted on the base member and supporting the retaining member. On a surface supporting the support member of the base member, a first inclined surface 105 in which a height becomes higher to the outside in a horizontal direction to the object is formed, and, on a surface retaining the retaining member of the support member, a second inclined surface 104 in which a height becomes higher to the outside in the horizontal direction to the object is formed in a state where the support member is mounted on the first inclined surface is formed. The support member is slidable along the first inclined surface, the retaining member is slidable along the second inclined surface, and due to slide of the support member and the retaining member, a positional deviation of the object is maintained within an allowable range.SELECTED DRAWING: Figure 1

Description

本発明は、物体を保持する保持装置、および光学装置に関する。   The present invention relates to a holding device that holds an object, and an optical device.

半導体露光装置や液晶露光装置等の精密機器において、構成要素同士の相対的な位置については高い精度が要求される。なかでも、光学素子についてはとりわけ高い位置精度が要求される。さらに近年では、半導体露光装置や液晶露光装置等においては装置の大型化が顕著であり、そのような大型化に伴う位置精度の維持が厳しく求められる。   In precision equipment such as a semiconductor exposure apparatus and a liquid crystal exposure apparatus, high accuracy is required for the relative positions of the constituent elements. Of these, particularly high positional accuracy is required for optical elements. Further, in recent years, the semiconductor exposure apparatus, the liquid crystal exposure apparatus, and the like have been remarkably increased in size, and maintenance of positional accuracy accompanying such increase in size is strictly required.

半導体露光装置や液晶露光装置等は一般にクリーンルーム内で例えば２３℃付近で使用される。しかし、露光装置の中で照明光学系や投影光学系等の、光が通過する光路付近では温度が高くなる。照明光学系の光源部は、水銀ランプ等を使用するため、特に温度が高くなる。例えば、水銀ランプにおける集光用の楕円ミラーは、稼働中は１００℃程度まで温度が上昇する。つまり、水銀ランプの楕円ミラーは、稼働と稼働停止が行われる度に約２３℃〜１００℃の範囲で温度変化が繰り返される。   Semiconductor exposure apparatuses, liquid crystal exposure apparatuses, and the like are generally used in a clean room at, for example, around 23 ° C. However, in the exposure apparatus, the temperature is high in the vicinity of an optical path through which light passes, such as an illumination optical system and a projection optical system. Since the light source part of the illumination optical system uses a mercury lamp or the like, the temperature is particularly high. For example, the temperature of a condensing elliptical mirror in a mercury lamp rises to about 100 ° C. during operation. That is, the elliptical mirror of the mercury lamp is repeatedly changed in temperature in the range of about 23 ° C. to 100 ° C. every time it is operated and stopped.

このような温度変化の繰り返しは、構成要素の線膨張係数に応じた熱膨張を招き、光学素子の位置関係にずれを発生させる。位置関係のずれを少なくするために低熱膨張材であるインバやセラミックス等を使用する場合があるが、大型化した部品を低熱膨張材で製作するとコスト面で不利となる。多くの構成要素には、コストや重量を考慮して、アルミや鋼材等の材質が選択されることが多いため、部品の大型化に伴う熱膨張が引き起こす位置関係のずれを少なくする工夫が必要となる。   Such repeated temperature changes cause thermal expansion in accordance with the linear expansion coefficient of the constituent elements, causing a shift in the positional relationship of the optical elements. Invar and ceramics, which are low thermal expansion materials, may be used in order to reduce the positional deviation, but it is disadvantageous in terms of cost if large parts are manufactured with low thermal expansion materials. For many components, materials such as aluminum and steel are often selected in consideration of cost and weight, so it is necessary to devise measures to reduce the positional shift caused by thermal expansion accompanying the increase in size of parts. It becomes.

特許文献１では、高い位置精度の要求を満たすために、熱膨張による位置関係のずれを少なくする機構が提案されている。特許文献１においては、光学素子を保持する保持部材が、構造体の搭載部に３点受けで搭載されている。その搭載部は傾斜面を有し、その傾斜面は熱による重力方向の膨張量と水平方向の膨張量を考慮した傾斜角になっている。熱膨張による位置関係のずれをこの傾斜面で逃がすことで、温度変化の前後における光学素子の位置ずれを防止している。   Patent Document 1 proposes a mechanism that reduces a positional shift due to thermal expansion in order to satisfy a high positional accuracy requirement. In Patent Document 1, a holding member that holds an optical element is mounted on a mounting portion of a structure with three points. The mounting portion has an inclined surface, and the inclined surface has an inclination angle considering the amount of expansion in the gravitational direction and the amount of expansion in the horizontal direction due to heat. The displacement of the positional relationship due to thermal expansion is released by this inclined surface, thereby preventing the displacement of the optical element before and after the temperature change.

特許第５５０６４７３号公報Japanese Patent No. 5506473

装置の大型化に伴い光学素子の径が大きくなる一方、径とは垂直な方向の厚さは厚くならず、光学素子の径に対して厚さが極めて薄い場合を考える。この場合、水平方向（径の方向）の膨張量に対して重力方向（厚さ方向）の膨張量は極めて小さい。そのため、重力方向の膨張量と水平方向の膨張量を考慮して傾斜面の角度が一意に決まる特許文献１では、傾斜面の角度が浅くなってしまう。傾斜面の角度が浅くなると、３箇所の傾斜面の摩擦誤差により摩擦が強い方向に光学素子の位置ずれが発生する可能性が高くなる。   Consider the case where the diameter of the optical element increases with the increase in size of the apparatus, while the thickness in the direction perpendicular to the diameter does not increase, and the thickness is extremely small relative to the diameter of the optical element. In this case, the amount of expansion in the gravitational direction (thickness direction) is extremely small compared to the amount of expansion in the horizontal direction (diameter direction). For this reason, in Patent Document 1 in which the angle of the inclined surface is uniquely determined in consideration of the amount of expansion in the gravitational direction and the amount of expansion in the horizontal direction, the angle of the inclined surface becomes shallow. When the angle of the inclined surface becomes shallow, there is a high possibility that the optical element is displaced in the direction in which the friction is strong due to the friction error of the three inclined surfaces.

本発明は、例えば、水平方向の膨張量に対して重力方向の膨張量が極めて小さくなる場合でも、温度変化に対して保持対象物の位置決め精度の点で有利な保持装置を提供することを目的とする。   An object of the present invention is to provide a holding device that is advantageous in terms of positioning accuracy of a holding object with respect to a temperature change, for example, even when the amount of expansion in the gravitational direction is extremely small compared to the amount of expansion in the horizontal direction. And

本発明の一側面によれば、物体を保持する保持装置であって、前記物体を取り囲む構造体と、前記物体を保持する保持部材と、前記構造体の内壁に設けられたベース部材と、前記ベース部材の上に搭載されて、前記保持部材を支持する支持部材とを有し、前記ベース部材の前記支持部材を支持する面には、前記物体に対して水平方向の外側に向けて高さが高くなる第１斜面が形成されており、前記支持部材の前記保持部材を支持する面には、前記支持部材が前記第１斜面に搭載された状態において前記物体に対して水平方向の外側に向けて高さが高くなる第２斜面が形成されており、前記支持部材は前記第１斜面に沿って摺動可能であり、前記保持部材は前記第２斜面に沿って摺動可能であり、前記支持部材および前記保持部材の摺動によって前記物体の位置ずれを許容範囲内に維持することを特徴とする保持装置が提供される。   According to an aspect of the present invention, there is provided a holding device that holds an object, a structure that surrounds the object, a holding member that holds the object, a base member provided on an inner wall of the structure, A support member that is mounted on the base member and supports the holding member, and the surface of the base member that supports the support member has a height toward the outside in the horizontal direction with respect to the object. A first inclined surface is formed, and the surface of the support member that supports the holding member is arranged on a laterally outer side with respect to the object in a state where the support member is mounted on the first inclined surface. A second slope that increases in height is formed, the support member is slidable along the first slope, and the holding member is slidable along the second slope, By sliding the support member and the holding member, Holding device is provided which is characterized by maintaining the positional deviation of the object within the allowable range.

本発明によれば、例えば、水平方向の膨張量に対して重力方向の膨張量が極めて小さくなる場合でも、温度変化に対して保持対象物の位置決め精度の点で有利な保持装置を提供することができる。   According to the present invention, for example, even when the amount of expansion in the gravitational direction is extremely small with respect to the amount of expansion in the horizontal direction, a holding device that is advantageous in terms of positioning accuracy of the object to be held with respect to a temperature change is provided. Can do.

実施形態における保持装置の構成を示す図。The figure which shows the structure of the holding | maintenance apparatus in embodiment. 物体の位置および水平状態が維持されるようすを説明する図。The figure explaining how the position and horizontal state of an object are maintained. 保持装置における摺動機構の構成例を示す図。The figure which shows the structural example of the sliding mechanism in a holding | maintenance apparatus. 保持装置における摺動機構の他の構成例を示す図。The figure which shows the other structural example of the sliding mechanism in a holding | maintenance apparatus. 第１斜面と第２斜面の傾斜角度を異ならせる態様を説明する図。The figure explaining the aspect which varies the inclination-angle of a 1st slope and a 2nd slope. 実施形態における光学装置の構成を示す図。The figure which shows the structure of the optical apparatus in embodiment.

以下、図面を参照して本発明の実施形態について詳細に説明する。なお、以下の実施形態は本発明の実施の具体例を示すにすぎないものであり、本発明は以下の実施形態に限定されるものではない。また、以下の実施形態の中で説明されている特徴の組み合わせの全てが本発明の課題解決のために必須のものであるとは限らない。   Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, the following embodiment is only what shows the specific example of implementation of this invention, and this invention is not limited to the following embodiment. Moreover, not all combinations of features described in the following embodiments are indispensable for solving the problems of the present invention.

＜第１実施形態＞
図１は、第１実施形態における保持装置１００の構成を示す図である。保持装置１００は、保持対象物である物体１０１を、熱負荷が発生しても位置ずれが許容範囲内となるように保持する保持装置である。なお、本明細書および添付図面では、水平方向をＸＹ平面とするＸＹＺ座標系において方向を示す。図１（ａ）は、保持装置１００の平面図であり、図１（ｂ）は、Ｃ−Ｃ’線に沿う断面図である。 <First Embodiment>
FIG. 1 is a diagram illustrating a configuration of a holding device 100 according to the first embodiment. The holding device 100 is a holding device that holds an object 101 that is an object to be held such that the positional deviation is within an allowable range even when a thermal load is generated. In this specification and the accompanying drawings, directions are shown in an XYZ coordinate system in which the horizontal direction is the XY plane. Fig.1 (a) is a top view of the holding | maintenance apparatus 100, FIG.1 (b) is sectional drawing in alignment with CC 'line.

保持装置１００は、物体１０１を取り囲む構造体１１０を有し、この構造体１１０の内壁には、ベース部材１０３が設けられている。ベース部材１０３は、構造体１１０とは別体であってもよいし、構造体１１０と一体的に構成されていてもよい。物体１０１は、保持部材１０６によって保持されている。実施形態において、保持部材１０６は、物体１０１の縁部を複数の箇所で保持する複数の保持部材を含みうる。複数の保持部材は、例えば、物体１０１の外周に沿って等間隔に配置された複数（例えば３つ）の保持部材として具現化される。ベース部材１０３も、支持部材１０２を介して複数の保持部材を支持する複数のベース部材を含みうる。このとき複数の保持部材は、複数の保持部材に対応する位置に配置される。保持部材１０６は、支持部材１０２によって支持されており、支持部材１０２はベース部材１０３の上に搭載されている。   The holding device 100 includes a structure 110 surrounding the object 101, and a base member 103 is provided on the inner wall of the structure 110. The base member 103 may be separate from the structure 110 or may be configured integrally with the structure 110. The object 101 is held by a holding member 106. In the embodiment, the holding member 106 may include a plurality of holding members that hold the edge of the object 101 at a plurality of locations. The plurality of holding members are embodied as, for example, a plurality of (for example, three) holding members arranged at equal intervals along the outer periphery of the object 101. The base member 103 can also include a plurality of base members that support the plurality of holding members via the support member 102. At this time, the plurality of holding members are arranged at positions corresponding to the plurality of holding members. The holding member 106 is supported by the support member 102, and the support member 102 is mounted on the base member 103.

物体１０１は、レンズ、ミラー等の光学素子でありうる。支持部材１０２は、物体１０１を取り囲む環状部材でありうる。物体１０１がレンズ、ミラー等である場合には、支持部材１０２は、図１（ａ）に示されるように、物体１０１を取り囲んで物体１０１を収容する鏡筒として構成されていてもよい。物体１０１の位置および水平状態は、物体１０１の保持に必要な部品の部品精度で保証された位置および水平状態、または、調整後の位置および水平状態を基準とする。   The object 101 can be an optical element such as a lens or a mirror. The support member 102 may be an annular member that surrounds the object 101. When the object 101 is a lens, a mirror, or the like, the support member 102 may be configured as a lens barrel that surrounds the object 101 and accommodates the object 101 as shown in FIG. The position and horizontal state of the object 101 are based on the position and horizontal state guaranteed by the component accuracy of the parts necessary for holding the object 101, or the adjusted position and horizontal state.

ベース部材１０３の、支持部材１０２を支持する面には、物体１０１に対して水平方向の外側に向けて高さが高くなる第１斜面１０５が形成されている。支持部材１０２の、保持部材１０６を支持する面には、支持部材１０２が第１斜面１０５に搭載された状態において物体１０１の水平方向の外側に向けて高さが高くなる第２斜面１０４が形成されている。また、支持部材１０２は、第１斜面１０５に沿って摺動可能であり、保持部材１０６は、第２斜面１０４に沿って摺動可能である。   A surface of the base member 103 that supports the support member 102 is formed with a first inclined surface 105 that increases in height toward the outside in the horizontal direction with respect to the object 101. On the surface of the support member 102 that supports the holding member 106, a second slope 104 is formed that increases in height toward the outer side in the horizontal direction of the object 101 when the support member 102 is mounted on the first slope 105. Has been. Further, the support member 102 can slide along the first inclined surface 105, and the holding member 106 can slide along the second inclined surface 104.

なお、保持部材１０６は、物体１０１を支持部材１０２の上で直接摺動させるのを避けるために物体１０１と支持部材１０２との間に介在している。支持部材１０２の第２斜面１０４および保持部材１０６の下面の少なくとも一方には、円滑な摺動を実現するための表面処理が施されているとよい。物体１０１を支持部材１０２の上で直接摺動させることが可能な場合は、保持部材１０６は必須ではない。同様に、支持部材１０２の第１斜面１０５およびベース部材１０３の上面の少なくとも一方にも、円滑な摺動を実現するための表面処理が施されているとよい。   The holding member 106 is interposed between the object 101 and the support member 102 in order to avoid sliding the object 101 directly on the support member 102. At least one of the second inclined surface 104 of the support member 102 and the lower surface of the holding member 106 may be subjected to a surface treatment for realizing smooth sliding. When the object 101 can be slid directly on the support member 102, the holding member 106 is not essential. Similarly, it is preferable that at least one of the first inclined surface 105 of the support member 102 and the upper surface of the base member 103 is subjected to a surface treatment for realizing smooth sliding.

保持装置１００は、熱負荷が与えられ支持部材１０２が熱膨張した場合でも、物体１０１の位置ずれを許容範囲内に収め、それにより物体１０１の水平状態を維持する。本実施形態において、物体１０１には、硝子やセラミックスなど低熱膨張材が使用され、物体１０１の熱膨張が、物体１０１の位置および水平状態の必要精度に対して極めて小さいものとする。保持部材１０６は、物体１０１を小さい範囲で保持するのが好ましい。そのため保持部材１０６の熱膨張は、物体１０１の位置および水平状態の必要精度に対して極めて小さいものとする。ベース部材１０３もまた、熱容量が大きいため温度上昇が少なく、ベース部材１０３の熱膨張も、物体１０１の位置および水平状態の必要精度に対して極めて小さいものとする。   The holding device 100 keeps the positional displacement of the object 101 within an allowable range even when a thermal load is applied and the support member 102 is thermally expanded, thereby maintaining the horizontal state of the object 101. In this embodiment, a low thermal expansion material such as glass or ceramics is used for the object 101, and the thermal expansion of the object 101 is extremely small with respect to the required accuracy of the position of the object 101 and the horizontal state. The holding member 106 preferably holds the object 101 within a small range. Therefore, the thermal expansion of the holding member 106 is extremely small with respect to the required accuracy of the position of the object 101 and the horizontal state. Since the base member 103 also has a large heat capacity, the temperature rise is small, and the thermal expansion of the base member 103 is extremely small with respect to the required accuracy of the position of the object 101 and the horizontal state.

図２を参照して、保持装置１００に熱負荷が与えられても物体１０１の位置および水平状態が維持されるようすを説明する。図２（ａ）は図１（ｂ）と同じ状態を示している。物体１０１および保持装置１００は軸対称な形状を有し、保持も軸対称であるため、水平面内の形状の変化も軸対称に発生する。保持装置１００に熱負荷が与えられた場合、支持部材１０２は水平方向に熱膨張するが、ベース部材１０３の熱膨張は極めて小さいため、支持部材１０２は、ベース部材１０３の第１斜面１０５に沿って上方に変形または移動する。それに伴い、熱膨張が極めて小さい物体１０１と保持部材１０６は、保持部材１０６と物体１０１との自重により、支持部材１０２の第２斜面１０４に沿って、支持部材１０２が第１斜面１０５に沿って上昇した量と略同等量分だけ下降するように摺動する。こうして、保持部材１０６（すなわち物体１０１）は、支持部材１０２が熱膨張によって変形または移動してもその高さを一定に維持する。これにより、熱膨張による物体１０１の位置ずれを許容範囲内に収め、その結果として物体１０１の水平状態ずれを許容範囲内に抑えることができる。本実施形態のように、支持部材１０２の熱膨張が物体１０１の位置および水平状態の必要精度に影響を与える主要因である場合、第１斜面１０５と第２斜面１０４は同じ傾斜角度を持つとよい。   With reference to FIG. 2, how the position and horizontal state of the object 101 are maintained even when a heat load is applied to the holding device 100 will be described. FIG. 2A shows the same state as FIG. Since the object 101 and the holding device 100 have an axisymmetric shape and the holding is also axisymmetric, the shape change in the horizontal plane also occurs axisymmetrically. When a heat load is applied to the holding device 100, the support member 102 thermally expands in the horizontal direction. However, since the thermal expansion of the base member 103 is extremely small, the support member 102 extends along the first inclined surface 105 of the base member 103. Deform or move upward. Accordingly, the object 101 and the holding member 106 with extremely small thermal expansion are moved along the second inclined surface 104 of the supporting member 102 and the supporting member 102 is moved along the first inclined surface 105 due to the weight of the holding member 106 and the object 101. Slide so that it is lowered by an amount approximately equal to the raised amount. In this way, the holding member 106 (that is, the object 101) maintains its height constant even if the support member 102 is deformed or moved by thermal expansion. Thereby, the positional deviation of the object 101 due to thermal expansion can be kept within the allowable range, and as a result, the horizontal state deviation of the object 101 can be suppressed within the allowable range. When the thermal expansion of the support member 102 is a main factor that affects the required accuracy of the position and the horizontal state of the object 101 as in the present embodiment, the first inclined surface 105 and the second inclined surface 104 have the same inclination angle. Good.

物体１０１の大型化に伴い支持部材１０２の径も同様に大型化されるが、重量やスペースの関係で重力方向に厚さが取れない場合がある。特許文献１（特許第５５０６４７３号公報）の場合、重力方向の膨張量と水平方向の膨張量を考慮して傾斜面の角度が一意に決まるため、水平方向の膨張量に対して重力方向の膨張量が極めて小さくなる場合は、一意に決まる傾斜面の角度が浅くなってしまう。傾斜面の角度が浅くなると、摩擦などにより位置ずれ、ひいては水平状態ずれが発生する可能性がある。本実施形態では、第１斜面１０５と第２斜面１０４の傾斜角度は支持部材１０２の径や厚さで一意に決まることはないため、第１斜面１０５と第２斜面１０４の摩擦等を考慮した任意の傾斜角度に設定することができる。そのため、水平方向の膨張量に対して重力方向の膨張量が極めて小さくなる場合でも、物体１０１の位置ずれを許容範囲内に抑えることができる。   As the object 101 increases in size, the diameter of the support member 102 increases in the same manner, but there may be a case where the thickness cannot be obtained in the direction of gravity due to weight or space. In the case of Patent Document 1 (Japanese Patent No. 5506473), the angle of the inclined surface is uniquely determined in consideration of the amount of expansion in the gravity direction and the amount of expansion in the horizontal direction. When the amount is extremely small, the angle of the uniquely determined inclined surface becomes shallow. When the angle of the inclined surface becomes shallow, there is a possibility that a positional shift due to friction or the like and a horizontal shift may occur. In the present embodiment, since the inclination angle of the first inclined surface 105 and the second inclined surface 104 is not uniquely determined by the diameter and thickness of the support member 102, the friction between the first inclined surface 105 and the second inclined surface 104 is taken into consideration. An arbitrary inclination angle can be set. Therefore, even when the amount of expansion in the gravitational direction is extremely small with respect to the amount of expansion in the horizontal direction, the positional deviation of the object 101 can be suppressed within an allowable range.

第１斜面１０５と第２斜面１０４の傾斜角度は、温度変化にかかわらず一定であるため、保持装置１００は、環境温度が変化する場合であっても、物体１０１の位置および水平状態を常に一定に維持することができる。   Since the inclination angles of the first inclined surface 105 and the second inclined surface 104 are constant regardless of the temperature change, the holding device 100 always maintains the position and horizontal state of the object 101 even when the environmental temperature changes. Can be maintained.

第１斜面１０５に沿う支持部材１０２の摺動および第２斜面１０４に沿う保持部材１０６の摺動を、より確実かつ円滑に行うための構成例を、図３および図４に示す。図３および図４は、図１（ｂ）と同様の状態を示している。図３において、ベース部材１０３の第１斜面１０５には、第１斜面１０５の傾斜方向に沿って延びる第１ガイド部３１が配置されている。また、支持部材１０２の、第１斜面１０５と対向する面には、第１ガイド部３１に案内されて摺動する第１摺動部材３２が設けられている。また、図３の例では、支持部材１０２の第２斜面１０４には、第２斜面１０４の傾斜方向に沿って延びる第２ガイド部３３が配置されている。さらに、保持部材１０６の、第２斜面１０４と対向する面には、第２ガイド部３３に案内されて摺動する第２摺動部材３４が設けられている。なお、図３の例では、第１ガイド部３１と第１摺動部材３２の組と、第２ガイド部３３と第２摺動部材３４の組とが設けられているが、いずれかの組だけが設けられていてもよい。   FIGS. 3 and 4 show a configuration example for more reliably and smoothly sliding the support member 102 along the first slope 105 and sliding the holding member 106 along the second slope 104. 3 and 4 show a state similar to that in FIG. In FIG. 3, the first guide portion 31 extending along the inclination direction of the first slope 105 is disposed on the first slope 105 of the base member 103. A first sliding member 32 that is guided by the first guide portion 31 and slides is provided on the surface of the support member 102 that faces the first inclined surface 105. In the example of FIG. 3, the second guide portion 33 extending along the inclination direction of the second slope 104 is disposed on the second slope 104 of the support member 102. Furthermore, a second sliding member 34 that is guided by the second guide portion 33 and slides is provided on the surface of the holding member 106 that faces the second inclined surface 104. In the example of FIG. 3, a set of the first guide portion 31 and the first sliding member 32 and a set of the second guide portion 33 and the second sliding member 34 are provided. Only may be provided.

物体１０１の水平状態は、例えば、物体１０１および保持部材１０６の自重、第１斜面１０５の傾斜角度、第２斜面１０４の傾斜角度、第１ガイド部３１の摺動性、第２ガイド部３３の摺動性で決まる。そのため、第１ガイド部３１および第２ガイド部３３は、摩擦が少なく直線案内が可能な部材であるとよい。例えば、図３に示されるように、第１ガイド部３１および第２ガイド部３３にはリニアガイドを使用することができる。   The horizontal state of the object 101 is, for example, the weight of the object 101 and the holding member 106, the inclination angle of the first inclined surface 105, the inclination angle of the second inclined surface 104, the slidability of the first guide portion 31, and the second guide portion 33. Determined by slidability. For this reason, the first guide part 31 and the second guide part 33 are preferably members that can be linearly guided with little friction. For example, as shown in FIG. 3, linear guides can be used for the first guide portion 31 and the second guide portion 33.

なお、ガイド部と摺動部材との配置関係は反対でもよい。例えば、図４に示されるように、ベース部材１０３の第１斜面１０５に第１摺動部材３２が設けられ、支持部材１０２の、第１斜面１０５と対向する面に第１ガイド部３１が配置されてもよい。図４の例では、第１ガイド部３１および第２ガイド部３３はＶ字溝により構成され、第１摺動部材３２および第２摺動部材３４はボールで構成される。あるいは、一方をリニアガイド、他方のＶ字溝等で構成してもよい。図４に示す、Ｖ字型溝にボールを配置する構成は、Ｖ字型溝がボールを２点で受けるため、この構成を物体１０１の３箇所で行うことで、自由度を過不足なく拘束でき、歪みを物体１０１に伝達しない保持を実現できる。   The arrangement relationship between the guide portion and the sliding member may be reversed. For example, as shown in FIG. 4, the first sliding member 32 is provided on the first inclined surface 105 of the base member 103, and the first guide portion 31 is disposed on the surface of the support member 102 that faces the first inclined surface 105. May be. In the example of FIG. 4, the first guide portion 31 and the second guide portion 33 are configured by V-shaped grooves, and the first sliding member 32 and the second sliding member 34 are configured by balls. Or you may comprise one side with a linear guide and the other V-shaped groove | channel. The configuration in which the ball is disposed in the V-shaped groove shown in FIG. 4 is that the V-shaped groove receives the ball at two points. It is possible to realize the holding without transmitting the distortion to the object 101.

前述したように、支持部材１０２の熱膨張が物体１０１の位置および水平状態の必要精度に影響を与える主要因である場合、第１斜面１０５と第２斜面１０４は同じ傾斜角度を持つとよい。しかし、保持部材１０６やベース部材１０３の熱膨張が物体１０１の位置ずれの許容範囲に対し影響を及ぼす場合もありうる。そのような場合には、保持部材１０６やベース部材１０３の熱膨張を考慮して、第１斜面１０５と第２斜面１０４には異なる傾斜角度を持たせるようにしてもよい。   As described above, when the thermal expansion of the support member 102 is a main factor affecting the position of the object 101 and the required accuracy of the horizontal state, the first inclined surface 105 and the second inclined surface 104 may have the same inclination angle. However, the thermal expansion of the holding member 106 and the base member 103 may affect the allowable range of displacement of the object 101. In such a case, considering the thermal expansion of the holding member 106 and the base member 103, the first inclined surface 105 and the second inclined surface 104 may have different inclination angles.

図５を用いて説明する。例えば、装置に熱負荷が与えられると、例えば以下の３つの熱膨張作用によって、物体１０１の位置ずれの許容範囲に対して影響が及ぶとする。図５（ａ）はそのような影響が及んでいない状態を示している。
（１）支持部材１０２が水平方向および重力方向（Ｚ方向）に熱膨張する。
（２）ベース部材１０３の支持部材１０２を保持している部分に熱負荷がかかり、その部分が水平方向と重力方向に熱膨張する。
（３）保持部材１０６が重力方向に熱膨張する。 This will be described with reference to FIG. For example, when a thermal load is applied to the apparatus, for example, the following three thermal expansion effects affect the allowable range of displacement of the object 101. FIG. 5A shows a state where such influence is not exerted.
(1) The support member 102 is thermally expanded in the horizontal direction and the gravitational direction (Z direction).
(2) A thermal load is applied to the portion of the base member 103 holding the support member 102, and the portion thermally expands in the horizontal direction and the gravity direction.
(3) The holding member 106 is thermally expanded in the direction of gravity.

図５（ｂ）に示されるように、支持部材１０２は、ベース部材１０３の水平方向の熱膨張と支持部材１０２の水平方向の熱膨張の分、ベース部材１０３の第１斜面１０５に沿って上方に変形するため、反重力方向に位置ずれする。それに加えて、ベース部材１０３の重力方向の熱膨張と、支持部材１０２の重力方向の熱膨張と、保持部材１０６の重力方向の熱膨張の分、物体１０１は反重力方向に位置ずれしうる。物体１０１は、支持部材１０２がベース部材１０３の第１斜面１０５に沿って上方に変形して位置ずれした分と、ベース部材１０３、支持部材１０２、保持部材１０６それぞれが重力方向に熱膨張して位置ずれした分、重力方向に下がる必要がある。そのため、第２斜面１０４の傾斜角度は、ベース部材１０３の水平方向に熱膨張した分と、ベース部材１０３、支持部材１０２、保持部材１０６それぞれが重力方向に熱膨張して位置ずれした分とを考慮した角度だけ第１斜面１０５よりも急になっている。   As shown in FIG. 5B, the support member 102 moves upward along the first inclined surface 105 of the base member 103 by the amount of horizontal thermal expansion of the base member 103 and the horizontal thermal expansion of the support member 102. Because of deformation, the position shifts in the antigravity direction. In addition, the object 101 can be displaced in the antigravity direction by the thermal expansion of the base member 103 in the gravitational direction, the thermal expansion of the support member 102 in the gravitational direction, and the thermal expansion of the holding member 106 in the gravitational direction. In the object 101, the base member 103, the support member 102, and the holding member 106 are each thermally expanded in the direction of gravity due to the displacement of the support member 102 due to the upward deformation along the first inclined surface 105 of the base member 103. It is necessary to move down in the direction of gravity by the amount of displacement. Therefore, the inclination angle of the second inclined surface 104 includes the amount of thermal expansion in the horizontal direction of the base member 103 and the amount of displacement of the base member 103, the support member 102, and the holding member 106 due to thermal expansion in the gravitational direction. It is steeper than the first slope 105 by the considered angle.

このように、第１斜面１０５と第２斜面１０４には異なる傾斜角度を持たせることもできる。このとき、第１斜面１０５と第２斜面１０４との角度差は、保持部材１０６、支持部材１０２、およびベース部材１０３それぞれの熱膨張量に基づいて設定されうる。これにより、物体１０１は、ベース部材１０３、支持部材１０２、保持部材１０６それぞれの熱膨張による位置ずれを許容範囲内に抑えることができ、その結果、物体１０１の水平状態を維持することができる。   As described above, the first inclined surface 105 and the second inclined surface 104 can have different inclination angles. At this time, the angle difference between the first inclined surface 105 and the second inclined surface 104 can be set based on the respective thermal expansion amounts of the holding member 106, the support member 102, and the base member 103. Thereby, the object 101 can suppress the positional shift due to thermal expansion of each of the base member 103, the support member 102, and the holding member 106 within an allowable range, and as a result, the object 101 can be maintained in a horizontal state.

＜第２実施形態＞
次に、前述の保持装置を利用した光学装置の実施形態を説明する。この実施形態における光学装置は、光学素子と、前述の保持装置とを有し、保持装置は、前述の保持対象物である物体として光学素子を保持するものである。 Second Embodiment
Next, an embodiment of an optical device using the above-described holding device will be described. The optical device in this embodiment includes an optical element and the above-described holding device, and the holding device holds the optical element as an object that is the above-described holding object.

図６は、本実施形態における光学装置の一例である光源装置４００の構成を示す図である。光源装置４００は、光源４０７と、光源４０７からの光を所定方向に反射させる光学素子としてのリフレクタとを有する。本実施形態において、光源４０７は、例えば水銀ランプやハロゲンランプでありうる。また、リフレクタは、楕円ミラー４０１ａと球面ミラー４０１ｂとを含みうる。   FIG. 6 is a diagram illustrating a configuration of a light source device 400 that is an example of the optical device according to the present embodiment. The light source device 400 includes a light source 407 and a reflector as an optical element that reflects light from the light source 407 in a predetermined direction. In the present embodiment, the light source 407 can be, for example, a mercury lamp or a halogen lamp. The reflector may include an elliptical mirror 401a and a spherical mirror 401b.

球面ミラー４０１ｂは、光源４０７の電極間にある輝点が反射球面の中心になるように配置される。球面ミラー４０１ｂは、光源４０７からの光を反射させて光源の輝点に一度戻し、そのまま陰側電極４０９ａと陽側電極４０９ｂとの間を通過させ、楕円ミラー４０１ａへと導く。楕円ミラー４０１ａは、光源４０７の陰側電極４０９ａと陽側電極４０９ｂとの間にある輝点が反射楕円面の第一焦点になるように配置される。楕円ミラー４０１ａは、光源４０７からの光と球面ミラー４０１ｂから反射された光とを第二焦点に集光させる。   The spherical mirror 401b is disposed so that the bright spot between the electrodes of the light source 407 is at the center of the reflective spherical surface. The spherical mirror 401b reflects the light from the light source 407 and returns it to the bright spot of the light source once, passes between the negative electrode 409a and the positive electrode 409b as it is, and guides it to the elliptical mirror 401a. The elliptical mirror 401a is arranged so that the bright spot between the negative electrode 409a and the positive electrode 409b of the light source 407 becomes the first focal point of the reflective ellipsoid. The elliptical mirror 401a collects the light from the light source 407 and the light reflected from the spherical mirror 401b on the second focal point.

これら楕円ミラー４０１ａおよび球面ミラー４０１ｂはそれぞれ、図示のように、保持装置１００によって保持される。なお、楕円ミラー４０１ａを保持する保持装置１００は、駆動機構４０８の上に設置されている。駆動機構４０８は、保持装置１００を介して楕円ミラー４０１を重力方向に移動させ、それにより第二焦点での光の集光度合を変化させることができる。   Each of the elliptical mirror 401a and the spherical mirror 401b is held by the holding device 100 as illustrated. The holding device 100 that holds the elliptical mirror 401 a is installed on the drive mechanism 408. The drive mechanism 408 can move the elliptical mirror 401 in the gravitational direction via the holding device 100, thereby changing the light collection degree at the second focal point.

保持装置１００が球面ミラー４０１ｂを保持することにより、光源４０７により熱負荷が与えられたとしても、球面ミラー４０１ｂの位置ずれを許容範囲内に抑えることができる。これにより、反射した光を陰側電極４０９ａと陽側電極４０９ｂに当てることなく通過させることができる。   Since the holding device 100 holds the spherical mirror 401b, even if a thermal load is applied by the light source 407, the positional deviation of the spherical mirror 401b can be suppressed within an allowable range. Thereby, the reflected light can be passed through without hitting the negative electrode 409a and the positive electrode 409b.

また、保持装置１００が楕円ミラー４０１ａを保持することにより、光源４０７により熱負荷が与えられたとしても、楕円ミラー４０１ａの位置ずれを許容範囲内に抑えことができる。これにより、光源４０７からの光と球面ミラー４０１ｂから反射された光とを、精度よく第二焦点に集光させることができる。   In addition, since the holding device 100 holds the elliptical mirror 401a, even if a heat load is applied by the light source 407, the positional deviation of the elliptical mirror 401a can be suppressed within an allowable range. Thereby, the light from the light source 407 and the light reflected from the spherical mirror 401b can be accurately focused on the second focal point.

以上、本発明の好ましい実施形態について説明したが、本発明は、これらの実施形態に限定されず、その要旨の範囲内で種々の変形及び変更が可能である。   As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

１００：保持装置、１０１：物体、１０２：支持部材、１０３：ベース部材、１０６：保持部材、１１０：構造体 100: holding device, 101: object, 102: support member, 103: base member, 106: holding member, 110: structure

Claims (10)

物体を保持する保持装置であって、
前記物体を取り囲む構造体と、
前記物体を保持する保持部材と、
前記構造体の内壁に設けられたベース部材と、
前記ベース部材の上に搭載されて、前記保持部材を支持する支持部材と、
を有し、
前記ベース部材の前記支持部材を支持する面には、前記物体に対して水平方向の外側に向けて高さが高くなる第１斜面が形成されており、
前記支持部材の前記保持部材を支持する面には、前記支持部材が前記第１斜面に搭載された状態において前記物体に対して水平方向の外側に向けて高さが高くなる第２斜面が形成されており、
前記支持部材は前記第１斜面に沿って摺動可能であり、前記保持部材は前記第２斜面に沿って摺動可能であり、
前記支持部材および前記保持部材の摺動によって前記物体の位置ずれを許容範囲内に維持することを特徴とする保持装置。 A holding device for holding an object,
A structure surrounding the object;
A holding member for holding the object;
A base member provided on an inner wall of the structure;
A support member mounted on the base member and supporting the holding member;
Have
The surface of the base member that supports the support member is formed with a first slope that increases in height toward the outside in the horizontal direction with respect to the object,
A surface of the support member that supports the holding member is formed with a second slope that increases in height toward the outside in the horizontal direction with respect to the object in a state where the support member is mounted on the first slope. Has been
The support member is slidable along the first slope, and the holding member is slidable along the second slope;
A holding apparatus that maintains a positional deviation of the object within an allowable range by sliding of the support member and the holding member. 前記支持部材が前記第１斜面に沿って摺動するのに伴い、前記保持部材は、該保持部材と前記物体との自重により前記第２斜面に沿って摺動することにより前記物体の高さを一定に維持することを特徴とする請求項１に記載の保持装置。   As the support member slides along the first slope, the holding member slides along the second slope due to its own weight and the height of the object. The holding device according to claim 1, wherein the holding device is kept constant. 前記支持部材は、熱膨張による変形によって前記第１斜面に沿って摺動することを特徴とする請求項２に記載の保持装置。   The holding device according to claim 2, wherein the support member slides along the first inclined surface by deformation due to thermal expansion. 前記保持部材は、前記物体を複数の箇所で保持する複数の保持部材を含み、
前記ベース部材は、前記支持部材を介して前記複数の保持部材を支持する複数のベース部材を含み、
前記支持部材は、前記物体を取り囲む環状部材である
ことを特徴とする請求項１乃至３のいずれか１項に記載の保持装置。 The holding member includes a plurality of holding members that hold the object at a plurality of locations;
The base member includes a plurality of base members that support the plurality of holding members via the support member;
The holding device according to claim 1, wherein the support member is an annular member that surrounds the object. 前記ベース部材の前記第１斜面に設けられ、該第１斜面の傾斜方向に沿って延びる第１ガイド部と、
前記支持部材の前記第１斜面と対向する面に設けられ、前記第１ガイド部に案内されて摺動する第１摺動部材と、
を更に有することを特徴とする請求項１乃至４のいずれか１項に記載の保持装置。 A first guide portion provided on the first slope of the base member and extending along an inclination direction of the first slope;
A first sliding member provided on a surface of the support member facing the first inclined surface and slidingly guided by the first guide portion;
The holding device according to claim 1, further comprising: 前記支持部材の前記第２斜面に設けられ、該第２斜面の傾斜方向に沿って延びる第２ガイド部と、
前記保持部材の前記第２斜面と対向する面に設けられ、前記第２ガイド部に案内されて摺動する第２摺動部材と、
を更に有することを特徴とする請求項１乃至５のいずれか１項に記載の保持装置。 A second guide portion provided on the second slope of the support member and extending along an inclination direction of the second slope;
A second sliding member that is provided on a surface of the holding member facing the second inclined surface and slides while being guided by the second guide portion;
The holding device according to claim 1, further comprising: 前記第１斜面と前記第２斜面は同じ傾斜角度を持つことを特徴とする請求項１乃至６のいずれか１項に記載の保持装置。   The holding device according to claim 1, wherein the first slope and the second slope have the same inclination angle. 前記第１斜面と前記第２斜面は異なる傾斜角度を持ち、前記第１斜面と前記第２斜面との角度差は、前記保持部材、前記支持部材、および前記ベース部材それぞれの熱膨張量に基づいて設定されることを特徴とする請求項１乃至６のいずれか１項に記載の保持装置。   The first inclined surface and the second inclined surface have different inclination angles, and the angle difference between the first inclined surface and the second inclined surface is based on respective thermal expansion amounts of the holding member, the support member, and the base member. The holding device according to any one of claims 1 to 6, wherein the holding device is set. 光学素子と、
請求項１乃至８のいずれか１項に記載の保持装置と、
を有し、
前記保持装置は、前記物体として前記光学素子を保持する
ことを特徴とする光学装置。 An optical element;
A holding device according to any one of claims 1 to 8,
Have
The holding device holds the optical element as the object. 前記光学装置は、光源と、前記光源からの光を所定方向に反射させるリフレクタとを有する光源装置であり、
前記保持装置は、前記光学素子として前記リフレクタを保持する
ことを特徴とする請求項９に記載の光学装置。 The optical device is a light source device having a light source and a reflector that reflects light from the light source in a predetermined direction,
The optical device according to claim 9, wherein the holding device holds the reflector as the optical element.
JP2018085726A 2018-04-26 2018-04-26 Holding device and optical device Active JP7090464B2 (en)

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