JP2013168475A - 半導体装置及びその製造方法 - Google Patents
半導体装置及びその製造方法 Download PDFInfo
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- JP2013168475A JP2013168475A JP2012030383A JP2012030383A JP2013168475A JP 2013168475 A JP2013168475 A JP 2013168475A JP 2012030383 A JP2012030383 A JP 2012030383A JP 2012030383 A JP2012030383 A JP 2012030383A JP 2013168475 A JP2013168475 A JP 2013168475A
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Abstract
【解決手段】半導体装置は、一主面を有し、該一主面に複数のMIS型FETが形成された半導体チップの前記一主面上を、櫛歯形状を有する複数の金属板配線で覆い、前記櫛歯部が前記一主面上において、交互に平面配置され、さらに前記複数の金属板配線は複数の端子に電気的に接続される構造とするものである。
【選択図】図1
Description
ハイサイドスイッチ用のパワーMOSFETとハイサイドスイッチ用のパワーMOSFETを駆動するドライバ回路とローサイドスイッチ用のパワーMOSFETを駆動するドライバ回路とを1つの半導体チップに形成する。ローサイドスイッチ用のパワーMOSFETを別のチップに形成する。これら2つの半導体チップを1つのパッケージに収納する。
ハイサイドスイッチ用のパワーMOSFETとローサイドスイッチ用のパワーMOSFETとそれらのドライバと制御回路とを1つの半導体基板に形成する。
図1は、実施の形態1に係わる半導体装置を示す斜視図(a)であり、(b)は後で説明する図2に記載される箇所を点線で示した半導体装置の斜視図である。なお、図1は封止樹脂を取り除いた状態の半導体装置を示した図である。
図11に示すように、半導体ウエハを構成する半導体基板17の一主面の選択的な第一領域R1と、第一領域R1とは異なる他の第二領域R2とに、N−型ウエル領域18a、18bを形成し、各N−型ウエル領域18a、18b中にP−型ウエル領域19a、19bを形成する。そして、N−型ウエル領域18a、18bが形成された一主面上にゲート絶縁膜GIa、GIbを介してゲート電極24、25を形成する。
図12に示すように、ソース領域S1、S2上にソース電極20、21が、ドレイン領域D1、D2上にドレイン電極22、23がそれぞれ形成される。
図13に示すように、ゲート電極24、25、ソース電極20、21、及びドレイン電極22、23上にこれらを覆う第1層間絶縁膜49を形成する。第1層間絶縁膜49としては、CVD−SiO2膜などのCVD膜を用いる。
図14に示すように、ソースパッド26、及びドレインパッド29上に複数の半田バンプ30、31を選択的に形成する。このとき、隣接するソースパッド26とドレインパッド29との互いにより近い箇所に半田バンプ30、31を形成する(図2(b)に示すような配置とする)。
図15に示すように、ソースパッド26、及びドレインパッド29上に、半田バンプ30、31を埋め込みかつ半田バンプ30、31の上面は露出するように第2層間絶縁膜50を形成する。
(e)工程が終了した半導体ウエハを、それぞれが第一領域R1及び第二領域R2を有する複数の半導体チップ2に分割する。ここで、半導体チップ2が準備される。
図16に示すように、半導体チップ2の露出した半田バンプ30、31上面及び第2層間絶縁膜50上に第1の金属板配線3、3a、3b、第2の金属板配線4、4a、4b、4c、4d、及び第3の金属板配線5、5a、5b、5c、を搭載して半田バンプ30、31との接続を行う。尚、図16では金属板配線4d、5cは示していないが、図1よりその存在は明らかであり、前記と同様に半田バンプとの接続を構成する。
図18は、実施の形態2に係わる半導体装置を示す斜視図である。
図19は実施の形態3に係わる半導体装置を示す斜視図である。
図23は実施の形態4に係わる半導体装置を示す斜視図である。
図24は実施の形態5に係わる半導体装置を示す斜視図である。
図27は実施の形態6に係わる半導体装置を示す斜視図である。
図27(a)は、封止樹脂で封止していない状態を示し、図27(b)は、図27(a)の第1の金属板配線、第2の金属板配線、第3の金属板配線を除去した状態を示すものである。
1a、1Ba、1Ca、1Da:半導体装置
2、2B、2E:半導体チップ
3、3a、3b:第1の金属板配線
4、4a、4b、4c、4d:第2の金属板配線
5、5a、5b、5c:第3の金属板配線
6:入力端子
7:出力端子
8:接地端子
9:第1の(ハイサイド)ゲート端子
10:第2の(ローサイド)ゲート端子
11:ヒートシンク
12:第1のゲート電極パッド(ハイサイドゲート電極パッド)
13:第2のゲート電極パッド(ローサイドゲート電極パッド)
14:第1のボンディングワイヤ
15:第2のボンディングワイヤ
16:半導体装置1の選択的な取り出し範囲を示す領域
17:半導体基板
18a、18b:N−型ウエル領域
19a、19b:P−型ウエル領域
20、21:ソース電極
22、23:ドレイン電極
24、25:ゲート電極
26、27、26E、27E:ソースパッド
28、29、28E、29E:ドレインパッド
30、31:半田バンプ
32:ドライバIC
32B:駆動制御回路
33:配線基板
34:サーマルビア
35、36、37、38、39、40、41、42:基板の配線
43:スルーホール
46:封止樹脂
47、48:接続プラグ
49:第1層間絶縁膜
50:第2層間絶縁膜
51:第3のボンディングワイヤ
52:接着材
53:端子
54:第4の金属板配線
55:第5の金属板配線
56:ボンディングパッド
S1、S2:ソース領域
D1、D2:ドレイン領域
T1:ハイサイドスイッチ
T2:ローサイドスイッチ
C1、C2:コンデンサ
L1:チョークコイル
CPU:中央処理装置
Claims (23)
- 一主面を有し、該一主面に複数のMIS型FETが形成された半導体チップと、
前記一主面上を覆うように形成されたそれぞれが櫛歯形状を有する複数の金属板配線とを有し、
前記複数の金属板配線は互いの櫛歯部分が交互に平面配置されるように前記一主面上を覆い、
前記複数の金属板配線は前記半導体チップの外側に位置している複数の端子に電気的に接続されている半導体装置。 - 前記複数の金属板配線は、第1の金属板配線、第2の金属板配線、及び第3の金属板配線を有し、前記複数の端子は、入力端子、出力端子、及び接地端子を有し、
前記第1の金属板配線は入力端子と、第2の金属板配線は出力端子と、第3の金属板配線は接地端子とにそれぞれ電気的に接続され、
前記入力端子、出力端子、及び接地端子はそれぞれ前記半導体チップの外側に位置している請求項1に記載の半導体装置。 - 前記半導体チップの一主面上で前記櫛歯形状の第1、第2、第3の金属板配線の下に位置して前記第1、第2、第3の金属板配線を横切る方向に伸び、かつ前記第1、第2、第3の金属板配線と電気的に接続された平面形状が短冊状のソースパッドとドレインパッドを有する請求項2に記載の半導体装置。
- 前記ソースパッドとドレインパッドが前記半導体チップの一主面上に交互に平面配置されている請求項3に記載の半導体装置。
- 前記複数のMIS型FETは第1のMIS型FETと第2のMIS型FETとを有し、
前記第1のMIS型FETは前記一主面の第一領域に形成され、
前記第2のMIS型FETは前記一主面の第二領域に形成され、
前記ソースパッドとドレインパッドは、前記一主面の前記第一領域上と該第一領域とは異なる前記一主面の前記第二領域上とにそれぞれ配置されている請求項4に記載の半導体装置。 - 前記第1、第2のMIS型FETは横型MISトランジスタであり、
前記第一領域上に位置する前記ソースパッドとドレインパッドはそれぞれ前記第1のMIS型FETに電気的に接続し、
前記第二領域上に位置する前記ソースパッドとドレインパッドはそれぞれ前記第2のMIS型FETに電気的に接続する請求項5に記載の半導体装置。 - 前記第2の金属板配線の前記櫛歯形状の一部が前記第一領域上に位置する前記ソースパッドと前記第二領域上に位置する前記ドレインパッドとに共通接続している請求項5に記載の半導体装置。
- 前記第1の金属板配線は前記第一領域上に位置する前記ドレインパッドに前記櫛歯形状を介して選択的に接続している請求項5に記載の半導体装置。
- 前記第3の金属板配線は前記第二領域上に位置する前記ソースパッドに前記櫛歯形状を介して選択的に接続している請求項5に記載の半導体装置。
- 前記第一領域上に位置する前記ソースパッドとドレインパッドと、前記第二領域上に位置する前記ソースパッドとドレインパッドとは、それぞれ同一方向に伸び、かつ前記第一領域上の前記ソースパッドと前記第二領域上の前記ドレインパッドとは同一線上に位置するよう配置されている請求項5に記載の半導体装置。
- 前記第一領域には第1導電型の第1のウエル領域が存在し、前記第二領域には第1導電型の第2のウエル領域がそれぞれ存在し、前記第1のウエル領域には前記第1のMIS型FETが存在し、前記第2のウエル領域には前記第2のMIS型FETが存在する請求項5に記載の半導体装置。
- 前記半導体チップ、前記ソースパッドとドレインパッド、前記第1、第2、第3の金属板配線、入力端子、出力端子及び接地端子を覆う封止樹脂を有し、前記入力端子、出力端子、及び接地端子のそれぞれの一部は前記封止樹脂から露出している請求項3に記載の半導体装置。
- 前記入力端子は前記第1の金属板配線の一部で構成され、前記出力端子は前記第2の金属板配線の一部で構成され、前記接地端子は前記第3の金属板配線の一部で構成されている請求項2に記載の半導体装置。
- 前記半導体チップの一主面とは反対側の他の主面に接続されたヒートシンクを有する請求項1に記載の半導体装置。
- 前記半導体チップの一主面の第一領域及び第二領域以外の第三領域に駆動制御回路を有し、前記駆動制御回路用のパッドをボンディングワイヤを介し前記半導体チップ外側の端子に接続した請求項1に記載の半導体装置。
- 平面形状が短冊状または長方形状のソースパッド及びドレインパッドをそれぞれ有する第1及び第2のパワーMISFETが形成された半導体チップを準備する工程と、
前記半導体チップの前記ソースパッド及びドレインパッド上に第1の金属板配線、第2の金属板配線、第3の金属板配線を搭載して前記ソースパッド及びドレインパッド及び複数の端子との接続を行う工程を有する半導体装置の製造方法。 - 前記ソースパッド及びドレインパッドと、前記第1の金属板配線、第2の金属板配線、及び第3の金属板配線との接続は、半田バンプで行う請求項16に記載の半導体装置の製造方法。
- 前記複数の端子は、入力端子、出力端子、及び接地端子である請求項16に記載の半導体装置の製造方法。
- 一主面を有し、該一主面に複数のMIS型FETが形成された半導体チップと、
前記一主面上を覆うように形成された複数の金属板配線と、
前記半導体チップの一主面とは反対側の他の主面に接続されたヒートシンクと、
前記複数の金属板配線は前記半導体チップの外側に位置している複数の端子に電気的に接続されている半導体装置。 - 前記半導体チップ、前記複数の端子、前記複数の金属板配線及び前記ヒートシンクを覆う封止樹脂を有し、
前記複数の端子および前記ヒートシンクは前記封止樹脂から選択的に露出している請求項19に記載の半導体装置。 - 前記複数の金属板配線と前記半導体チップの間にソースパッドとドレインパッドを有する請求項19に記載の半導体装置。
- 前記ソースパッドとドレインパッドは前記半導体基板の一主面上に交互に配置されている請求項21に記載の半導体装置。
- 前記ソースパッドとドレインパッドは前記金属板配線を横切る方向に伸びている請求項21に記載の半導体装置。
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EP (1) | EP2629329A3 (ja) |
JP (1) | JP5787784B2 (ja) |
KR (1) | KR20130094234A (ja) |
CN (1) | CN103268877B (ja) |
TW (1) | TWI601269B (ja) |
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JP2016039440A (ja) * | 2014-08-06 | 2016-03-22 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP2017216405A (ja) * | 2016-06-01 | 2017-12-07 | 株式会社ジェイテクト | 半導体モジュール |
JP2018535641A (ja) * | 2015-11-27 | 2018-11-29 | ロベルト・ボッシュ・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツングRobert Bosch Gmbh | 電動機のための電力モジュール |
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JP6238121B2 (ja) * | 2013-10-01 | 2017-11-29 | ローム株式会社 | 半導体装置 |
CN108565254B (zh) * | 2013-10-21 | 2021-08-24 | 日本精工株式会社 | 半导体模块 |
TWI607675B (zh) * | 2013-12-13 | 2017-12-01 | 台達電子企業管理(上海)有限公司 | Dc/dc電源模組及dc/dc電源系統組裝結構 |
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JP2019046991A (ja) * | 2017-09-04 | 2019-03-22 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
DE112017008031T5 (de) * | 2017-09-13 | 2020-07-02 | Intel Corporation | Aktive silizium-brücke |
JP2019114675A (ja) * | 2017-12-25 | 2019-07-11 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
CN109742069A (zh) * | 2019-02-28 | 2019-05-10 | 深圳市泰德半导体有限公司 | 电源芯片封装结构 |
DE102020207401A1 (de) * | 2020-06-16 | 2021-12-16 | Zf Friedrichshafen Ag | Leistungsmodul zum Betreiben eines Elektrofahrzeugantriebs mit einer verbesserten Wärmeleitung für eine Ansteuerelektronik |
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Also Published As
Publication number | Publication date |
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JP5787784B2 (ja) | 2015-09-30 |
US9236321B2 (en) | 2016-01-12 |
CN103268877B (zh) | 2017-04-12 |
EP2629329A3 (en) | 2017-07-12 |
TWI601269B (zh) | 2017-10-01 |
US20160049315A1 (en) | 2016-02-18 |
EP2629329A2 (en) | 2013-08-21 |
TW201349456A (zh) | 2013-12-01 |
US20130207256A1 (en) | 2013-08-15 |
KR20130094234A (ko) | 2013-08-23 |
CN103268877A (zh) | 2013-08-28 |
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