JP2001510434A5 - - Google Patents

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Publication number: JP2001510434A5
Authority: JP; Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP1998533687A

Other languages

English (en)

Other versions

JP2001510434A (ja

Filing date

1998-01-22

Publication date

2005-06-16

1998-01-22 Application filed filed Critical

1998-01-22 Priority claimed from PCT/EP1998/000333 external-priority patent/WO1998035075A1/de

2001-07-31 Publication of JP2001510434A publication Critical patent/JP2001510434A/ja

2005-06-16 Publication of JP2001510434A5 publication Critical patent/JP2001510434A5/ja

Status Pending legal-status Critical Current

Links

Description

JP53368798A 1997-02-06 1998-01-22 シリコン保護層を備えた溶融ポット、シリコン保護層を適用する方法及びその使用 Pending JP2001510434A (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
DE19704371.2		1997-02-06
DE19704371		1997-02-06
PCT/EP1998/000333 WO1998035075A1 (de)	1997-02-06	1998-01-22	Mit siliciumschutzschichten versehene schmelztiegel, ein verfahren zum aufbringen der siliciumschutzschicht und deren verwendung

Related Child Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2009184298A Division JP2009298693A (ja)	1997-02-06	2009-08-07	シリコン保護層を備えた溶融ポット、シリコン保護層を適用する方法及びその使用

Publications (2)

Publication Number	Publication Date
JP2001510434A JP2001510434A (ja)	2001-07-31
JP2001510434A5 true JP2001510434A5 (ja)	2005-06-16

Family

ID=7819403

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
JP53368798A Pending JP2001510434A (ja)	1997-02-06	1998-01-22	シリコン保護層を備えた溶融ポット、シリコン保護層を適用する方法及びその使用
JP2009184298A Pending JP2009298693A (ja)	1997-02-06	2009-08-07	シリコン保護層を備えた溶融ポット、シリコン保護層を適用する方法及びその使用

Family Applications After (1)

Application Number	Title	Priority Date	Filing Date
JP2009184298A Pending JP2009298693A (ja)	1997-02-06	2009-08-07	シリコン保護層を備えた溶融ポット、シリコン保護層を適用する方法及びその使用

Country Status (6)

Country	Link
US (1)	US6165425A (ja)
EP (1)	EP0963464B1 (ja)
JP (2)	JP2001510434A (ja)
DE (1)	DE59801041D1 (ja)
NO (1)	NO321946B1 (ja)
WO (1)	WO1998035075A1 (ja)

Families Citing this family (39)

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WO2002040183A1 (en) *	2000-11-15	2002-05-23	G.T. Equipment Technologies Inc.	Improved crucible coating system
US6491971B2 (en) *	2000-11-15	2002-12-10	G.T. Equipment Technologies, Inc	Release coating system for crucibles
NO317080B1 (no) *	2002-08-15	2004-08-02	Crusin As	Silisiumnitriddigler som er bestandige mot silisiumsmelter og fremgangsmate for fremstilling av slike digler
US20040187767A1 (en) *	2002-10-24	2004-09-30	Intel Corporation	Device and method for multicrystalline silicon wafers
UA81278C2 (en) *	2002-12-06	2007-12-25		Vessel for holding a silicon and method for its making
ES2214139B2 (es) *	2003-02-21	2005-03-16	Universidade De Santiago De Compostela	Procedimiento de obtencion de recubrimientos superficiales de nitruro de silicio sobre piezas y componentes ceramicos.
FR2853913B1 (fr) †	2003-04-17	2006-09-29	Apollon Solar	Creuset pour un dispositif de fabrication d'un bloc de materiau cristallin et procede de fabrication
CN100372059C (zh) *	2003-12-24	2008-02-27	上海宏力半导体制造有限公司	形成半导体材料晶片的方法及其结构
DE102005028435B4 (de) *	2004-06-30	2011-05-12	Deutsche Solar Ag	Kokille mit Antihaftbeschichtung ihr Herstellungsverfahren und ihre Verwendung
WO2006002779A1 (de) *	2004-06-30	2006-01-12	Deutsche Solar Ag	Herstellungsverfahren für kokille mit antihaftbeschichtung
WO2006005416A1 (de) *	2004-07-08	2006-01-19	Deutsche Solar Ag	Herstellungsverfahren für kokille mit antihaftbeschichtung
DE102005029039B4 (de) *	2004-07-08	2012-07-12	Deutsche Solar Gmbh	Herstellungsverfahren für Kokille mit Antihaftbeschichtung
US7540919B2 (en) *	2005-04-01	2009-06-02	Gt Solar Incorporated	Solidification of crystalline silicon from reusable crucible molds
TWI400369B (zh) *	2005-10-06	2013-07-01	Vesuvius Crucible Co	用於矽結晶的坩堝及其製造方法
DE102005050593A1 (de) *	2005-10-21	2007-04-26	Esk Ceramics Gmbh & Co. Kg	Dauerhafte siliciumnitridhaltige Hartbeschichtung
US7572334B2 (en)	2006-01-03	2009-08-11	Applied Materials, Inc.	Apparatus for fabricating large-surface area polycrystalline silicon sheets for solar cell application
EP1811064A1 (fr) *	2006-01-12	2007-07-25	Vesuvius Crucible Company	Creuset pour le traitement de silicium à l'état fondu
DE102006003819A1 (de) *	2006-01-26	2007-08-02	Wacker Chemie Ag	Keramischer Formkörper mit hochreiner Si3N4-Beschichtung, Verfahren zu seiner Herstellung und Verwendung
WO2007148985A1 (en) *	2006-06-23	2007-12-27	Rec Scanwafer As	Device and method for production of semiconductor grade silicon
JP4911607B2 (ja) *	2007-03-23	2012-04-04	コバレントマテリアル株式会社	シリコン鋳造用鋳型およびその製造方法
NO327122B1 (no)	2007-03-26	2009-04-27	Elkem Solar As	Beleggingssystem
DE102007053284A1 (de) *	2007-11-08	2009-05-20	Esk Ceramics Gmbh & Co. Kg	Fest haftende siliciumnitridhaltige Trennschicht
EP2263076A1 (de) *	2008-03-28	2010-12-22	Schott AG	Verfahren zur thermographischen prüfung nichtmetallischer werkstoffe, insbesondere beschichteter nichtmetallischer werkstoffe, sowie verfahren zu deren herstellung und verfahrensgemäss hergestellter körper
EP2116637A3 (en) *	2008-05-07	2012-03-21	Covalent Materials Corporation	Crucible for melting silicon and release agent used to the same
DE102008031766A1 (de)	2008-07-04	2009-10-15	Schott Ag	Verfahren zur Herstellung eines beschichteten Tiegels aus einem Tiegelgrünkörper oder aus einem zwischengebrannten Tiegelkörper sowie die Verwendung solch eines beschichteten Tiegels
CN101433890B (zh) *	2008-12-05	2010-12-29	江阴海润太阳能电力有限公司	低压下在石英坩埚内壁上喷涂氮化硅涂层的方法及装置
DE102009048741A1 (de)	2009-03-20	2010-09-30	Access E.V.	Tiegel zum Schmelzen und Kristallisieren eines Metalls, eines Halbleiters oder einer Metalllegierung, Bauteil für einen Tiegelgrundkörper eines Tiegels und Verfahren zum Herstellen eines Bauteils
US20110177284A1 (en) *	2009-07-16	2011-07-21	Memc Singapore Pte Ltd.	Silicon wafers and ingots with reduced oxygen content and methods for producing them
CN101845666B (zh) *	2010-06-03	2013-08-28	王敬	一种掺氮晶体硅及其制备方法
SG191391A1 (en)	2010-12-28	2013-08-30	Ube Industries	Polycrystalline silicon ingot casting mold and method for producing same, and silicon nitride powder for mold release material for polycrystalline silicon ingot casting mold and slurry containing same
KR20140060549A (ko)	2011-08-31	2014-05-20	이에스케이 세라믹스 게엠베하 운트 코. 카게	경도가 큰 질화규소-함유 중간층
US8747538B2 (en) *	2011-09-20	2014-06-10	Chung-Hou Tony Hsiao	Photovoltaic ingot mold release
JP5930637B2 (ja) *	2011-09-28	2016-06-08	デンカ株式会社	離型剤用窒化ケイ素粉末およびその製造方法
JP2013151386A (ja) *	2012-01-25	2013-08-08	Kyodo Fine Ceramics Co Ltd	ポリシリコンインゴット鋳造用鋳型、ポリシリコンインゴット鋳造用鋳型の製造方法、及びポリシリコンインゴット製造方法
WO2013160236A1 (en)	2012-04-24	2013-10-31	Saint-Gobain Ceramic Materials A. S.	Silicon nitride containing crucible and a method of producing the silicon nitride containing crucible
DE102013206993B4 (de)	2013-04-18	2014-12-04	Morgan Advanced Materials Haldenwanger GmbH	Verfahren zur Beschichtung von Formkörpern aus Quarzgut
CN103288357B (zh) *	2013-06-20	2016-03-30	天津英利新能源有限公司	氮化硅溶液及其制备方法、多晶硅铸锭用坩埚及其制备方法
JP6743753B2 (ja)	2017-04-27	2020-08-19	株式会社Sumco	シリコン単結晶の引上げ方法
CN118109895A (zh) *	2024-04-30	2024-05-31	安徽壹石通材料科技股份有限公司	一种氮化硅/熔融石英复合坩埚及其制备方法与应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4515755A (en) *	1981-05-11	1985-05-07	Toshiba Ceramics Co., Ltd.	Apparatus for producing a silicon single crystal from a silicon melt
DE3536933A1 (de) *	1985-10-17	1987-04-23	Bayer Ag	Verbessertes siliciumnitrid und verfahren zu dessen herstellung
US5431869A (en) *	1993-01-12	1995-07-11	Council Of Scientific & Industrial Research	Process for the preparation of polycrystalline silicon ingot
JP2615437B2 (ja) *	1994-09-20	1997-05-28	工業技術院長	高強度・高靱性窒化ケイ素焼結体及びその製造方法

1998
- 1998-01-22 US US09/355,813 patent/US6165425A/en not_active Expired - Lifetime
- 1998-01-22 EP EP98904116A patent/EP0963464B1/de not_active Expired - Lifetime
- 1998-01-22 DE DE59801041T patent/DE59801041D1/de not_active Expired - Lifetime
- 1998-01-22 WO PCT/EP1998/000333 patent/WO1998035075A1/de active IP Right Grant
- 1998-01-22 JP JP53368798A patent/JP2001510434A/ja active Pending
1999
- 1999-07-14 NO NO19993466A patent/NO321946B1/no active IP Right Review Request
2009
- 2009-08-07 JP JP2009184298A patent/JP2009298693A/ja active Pending

Publication	Publication Date	Title
JP2000509637A5 (ja)	2005-10-06
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