ES2078864A2 - Procedimiento para supervisar el espesor de un revestimiento, y aparato para llevar a cabo dicho procedimiento. - Google Patents

Procedimiento para supervisar el espesor de un revestimiento, y aparato para llevar a cabo dicho procedimiento.

Info

Publication number
ES2078864A2
ES2078864A2 ES09301955A ES9301955A ES2078864A2 ES 2078864 A2 ES2078864 A2 ES 2078864A2 ES 09301955 A ES09301955 A ES 09301955A ES 9301955 A ES9301955 A ES 9301955A ES 2078864 A2 ES2078864 A2 ES 2078864A2
Authority
ES
Spain
Prior art keywords
monitoring
intensity
discrete
coating
lies
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES09301955A
Other languages
English (en)
Other versions
ES2078864B1 (es
ES2078864R (es
Inventor
Michel Hannotiau
Guy Renard
Robert Terneu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Glass Europe SA
Original Assignee
Glaverbel Belgium SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Glaverbel Belgium SA filed Critical Glaverbel Belgium SA
Publication of ES2078864A2 publication Critical patent/ES2078864A2/es
Publication of ES2078864R publication Critical patent/ES2078864R/es
Application granted granted Critical
Publication of ES2078864B1 publication Critical patent/ES2078864B1/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/89—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/892—Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles characterised by the flaw, defect or object feature examined
    • G01N21/896—Optical defects in or on transparent materials, e.g. distortion, surface flaws in conveyed flat sheet or rod
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/8422—Investigating thin films, e.g. matrix isolation method
    • G01N2021/8427—Coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PROCEDIMIENTO PARA SUPERVISAR EL ESPESOR DE UN REVESTIMIENTO, Y APARATO PARA LLEVAR A CABO DICHO PROCEDIMIENTO. EL PROCEDIMIENTO COMPRENDE DIRIGIR LUZ POLICROMATICA HACIA EL REVESTIMIENTO EN UNA PLURALIDAD DE POSICIONAR Y MEDIR LA INTENSIDAD DE LA LUZ REFLEJADA DEL MISMO. EN CADA POSICION, SE MIDE LA INTENSIDAD DE LUZ REFLEJADA PARA POR LO MENOS DOS LONGITUDES DE ONDA DE SUPERVISION DISCRETAS, Y ESTAS MEDICIONES SE PROCESAN PARA GENERAR UNA SEÑAL ELECTRICA QUE PUEDE COMPARARSE CON UNO O MAS VALORES UMBRAL PREDETERMINADOS Y CON LAS SEÑALES ELECTRICAS GENERADAS EN OTRAS POSICIONES, PARA PROPORCIONAR UNA INDICACION DE SI EL ESPESOR Y LA UNIFORMIDAD DEL REVESTIMIENTO SE ENCUENTRAN COMPRENDIDOS ENTRE VALORES DE TOLERANCIA PREDETERMINADOS. LAS DOS LONGITUDES DE ONDA DE SUPERVISION DISCRETAS SE ENCUENTRAN EN EL INTERVALO DE 400 A 480 NM (AZUL), DE 580 A 750 NM (ROJO), RESPECTIVAMENTE. SE PUEDE UTILIZAR TAMBIEN UNA TERCERA LONGITUD DE ONDA DE SUPERVISION DISCRETA, EN EL INTERVALO DE 480 A 580 NM (VERDE). LOS RESULTADOS DE LA SUPERVISION SE PUEDEN UTILIZAR PARA AJUSTAR EL PROCESO DE REVESTIMIENTO.
ES09301955A 1992-09-15 1993-09-14 Procedimiento para supervisar el espesor de un revestimiento, y aparato para llevar a cabo dicho procedimiento. Expired - Lifetime ES2078864B1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB929219450A GB9219450D0 (en) 1992-09-15 1992-09-15 Thin film thickness monitoring and control

Publications (3)

Publication Number Publication Date
ES2078864A2 true ES2078864A2 (es) 1995-12-16
ES2078864R ES2078864R (es) 1996-12-16
ES2078864B1 ES2078864B1 (es) 1997-05-16

Family

ID=10721896

Family Applications (1)

Application Number Title Priority Date Filing Date
ES09301955A Expired - Lifetime ES2078864B1 (es) 1992-09-15 1993-09-14 Procedimiento para supervisar el espesor de un revestimiento, y aparato para llevar a cabo dicho procedimiento.

Country Status (17)

Country Link
US (1) US5396080A (es)
JP (1) JPH06201333A (es)
CN (1) CN1049045C (es)
AU (1) AU664474B2 (es)
BE (1) BE1006795A3 (es)
CA (1) CA2105635A1 (es)
CZ (1) CZ289962B6 (es)
DE (1) DE4331355A1 (es)
ES (1) ES2078864B1 (es)
FI (1) FI933971A (es)
FR (1) FR2695721B1 (es)
GB (2) GB9219450D0 (es)
IT (1) IT1261253B (es)
LU (1) LU88402A1 (es)
NL (1) NL194246C (es)
PT (1) PT101364B (es)
SE (1) SE515115C2 (es)

Families Citing this family (73)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4413745A1 (de) * 1994-04-20 1995-10-26 Gramm Gmbh & Co Kg Verfahren und Vorrichtung zur Kontrolle der Oberfläche von Gegenständen
JP2648098B2 (ja) * 1994-07-29 1997-08-27 日本電気株式会社 薄膜形成装置
JP3308135B2 (ja) * 1994-11-01 2002-07-29 松下電器産業株式会社 インプロセス膜厚モニター装置及び方法
US5835225A (en) * 1994-11-30 1998-11-10 Micron Technology, Inc. Surface properties detection by reflectance metrology
DE19509345A1 (de) * 1995-03-15 1996-09-19 Ver Glaswerke Gmbh Verfahren zum Erkennen und Bewerten von Fehlern in teilreflektierenden Oberflächenschichten
US5619330A (en) * 1995-12-22 1997-04-08 Thomson Consumer Electronics, Inc. Method and apparatus for determining thickness of an OPC layer on a CRT faceplate panel
DE19735246C2 (de) * 1997-08-14 1999-07-15 Bayern Freistaat Verfahren zur Bestimmung eines Volumens
DE19821401C2 (de) * 1998-05-13 2000-05-18 Storz Endoskop Gmbh Schaffhaus Endoskop zur Inspektion eines Beobachtungsraumes
US6392756B1 (en) 1999-06-18 2002-05-21 N&K Technology, Inc. Method and apparatus for optically determining physical parameters of thin films deposited on a complex substrate
EP1069401A1 (en) * 1999-07-13 2001-01-17 ODME International B.V. Optical film thickness measuring device
US6091485A (en) * 1999-12-15 2000-07-18 N & K Technology, Inc. Method and apparatus for optically determining physical parameters of underlayers
US6472238B1 (en) * 2000-02-09 2002-10-29 Therma-Wave, Inc. Evaluation of etching processes in semiconductors
US6570650B1 (en) * 2001-06-21 2003-05-27 Kla-Tenor Corporation Apparatus and methods for reducing thin film color variation in optical inspection of semiconductor devices and other surfaces
US6825933B2 (en) 2002-06-07 2004-11-30 N&K Technology, Inc. Computer-implemented reflectance system and method for non-destructive low dose ion implantation monitoring
KR101188356B1 (ko) 2003-12-02 2012-10-08 가부시키가이샤 한도오따이 에네루기 켄큐쇼 레이저 조사장치, 레이저 조사방법 및 반도체장치의제조방법
EP1553643A3 (en) 2003-12-26 2009-01-21 Sel Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method and method for manufacturing crystalline semiconductor film
DE502004006191D1 (de) * 2004-06-01 2008-03-27 Applied Materials Gmbh & Co Kg Messvorrichtung für die Messung des Transmissionsgrads einer Beschichtung
DE102004034693B4 (de) * 2004-07-17 2006-05-18 Schott Ag Verfahren und Vorrichtung zur berührungslosen optischen Messung der Dicke von heißen Glaskörpern mittels der chromatischen Aberration
DE102004037555B4 (de) * 2004-08-03 2012-09-06 Erlus Aktiengesellschaft Verfahren zur berührungslosen und/oder zerstörungsfreien Prüfung einer photokatalytischen Oberflächenbeschichtung
US20060054843A1 (en) * 2004-09-13 2006-03-16 Electronic Design To Market, Inc. Method and apparatus of improving optical reflection images of a laser on a changing surface location
US8084260B2 (en) * 2004-11-24 2011-12-27 Applied Biosystems, Llc Spectral calibration method and system for multiple instruments
JP4930748B2 (ja) * 2005-01-28 2012-05-16 大日本印刷株式会社 被膜検査装置および方法
CN100337091C (zh) * 2005-11-07 2007-09-12 友达光电股份有限公司 光学膜层厚度均匀性的监测方法
US20100087015A1 (en) * 2008-03-05 2010-04-08 Global Solar Energy, Inc. Feedback for buffer layer deposition
JP5738601B2 (ja) 2008-03-05 2015-06-24 ハナジー・ハイ−テク・パワー・（エイチケー）・リミテッド 薄膜太陽電池セルのための緩衝層蒸着
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US7985188B2 (en) * 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
DK2251453T3 (da) 2009-05-13 2014-07-07 Sio2 Medical Products Inc Beholderholder
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9066072B2 (en) * 2010-07-20 2015-06-23 Semiconductor Components Industries, Llc Systems and methods for calibrating image sensors
CN103201588A (zh) * 2010-08-16 2013-07-10 第一太阳能有限公司 测量***和方法
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US8982362B2 (en) * 2011-10-04 2015-03-17 First Solar, Inc. System and method for measuring layer thickness and depositing semiconductor layers
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
CN103930595A (zh) 2011-11-11 2014-07-16 Sio2医药产品公司 用于药物包装的钝化、pH保护性或润滑性涂层、涂布方法以及设备
US8666202B2 (en) 2012-02-20 2014-03-04 Cardinal Ig Company System and method for measuring properties of a thin film coated glass
US8855450B2 (en) 2012-02-20 2014-10-07 Cardinal Cg Company System and method for measuring properties of a thin film coated glass
KR101897835B1 (ko) * 2012-07-24 2018-09-12 삼성에스디아이 주식회사 극판 두께 측정 장치 및 방법
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
JP6382830B2 (ja) 2012-11-30 2018-08-29 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 医療シリンジ、カートリッジ等上でのｐｅｃｖｄ堆積の均一性制御
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
CN110074968B (zh) 2013-03-11 2021-12-21 Sio2医药产品公司 涂布包装材料
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
DE102014100594A1 (de) * 2014-01-20 2015-07-23 Isra Surface Vision Gmbh Vorrichtung zur Inspektion eines mit einer beschichteten Oberfläche versehenen Materials und entsprechendes Verfahren
BR112016020894B1 (pt) * 2014-03-12 2022-05-03 Swimc Llc Sistema e método implantado por processador para determinar espessuras de revestimento e meio legível por computador
US9996765B2 (en) 2014-03-12 2018-06-12 The Sherwin-Williams Company Digital imaging for determining mix ratio of a coating
EP3122917B1 (en) 2014-03-28 2020-05-06 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
WO2015165503A1 (en) * 2014-04-29 2015-11-05 Hewlett-Packard Indigo B.V. Transparent layer thickness measurement
ES2706877T3 (es) 2014-11-13 2019-04-01 Gerresheimer Glas Gmbh Filtro de partículas de máquina para conformar vidrio, unidad de émbolo, cabeza de soplado, soporte de cabeza de soplado y máquina para conformar vidrio adaptada a dicho filtro o que lo comprende
CN105115430B (zh) * 2015-05-26 2016-08-31 山东建筑大学 一种点栅透射式化学药液涂抹均匀性检测方法及装置
US9702689B2 (en) * 2015-06-18 2017-07-11 Xerox Corporation Use of a full width array imaging sensor to measure real time film thicknesses on film manufacturing equipment
JP2017013408A (ja) * 2015-07-02 2017-01-19 株式会社リコー 被処理物改質装置、被処理物改質システム、画像形成システムおよび画像形成方法
JP2018523538A (ja) 2015-08-18 2018-08-23 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 低酸素透過速度を有する薬剤包装及び他の包装
US10788314B2 (en) * 2016-01-07 2020-09-29 Arkema Inc. Object position independent method to measure the thickness of coatings deposited on curved objects moving at high rates
WO2017120160A1 (en) * 2016-01-07 2017-07-13 Arkema Inc. Optical method to measure the thickness of coatings deposited on substrates
US11125549B2 (en) 2016-01-07 2021-09-21 Arkema Inc. Optical intensity method to measure the thickness of coatings deposited on substrates
CN107179055B (zh) * 2017-05-28 2019-11-01 中国计量大学 用于bopp薄膜生产的薄膜厚度监测方法
CN107782280B (zh) * 2017-10-20 2020-09-01 维沃移动通信有限公司 一种贴膜厚度的检测方法和移动终端
WO2019099415A1 (en) * 2017-11-14 2019-05-23 Kateeva, Inc. Systems and methods for profiling material layers on a substrate
US10138539B1 (en) * 2018-04-03 2018-11-27 Shiping Cheng Method of managing coating uniformity with an optical thickness monitoring system
DE102018110931C5 (de) 2018-05-07 2023-06-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und System zum Erfassen der Oberflächenbelegung einer Beschichtung auf einer Oberfläche eines bandförmigen Prüflings
US20200033723A1 (en) * 2018-07-30 2020-01-30 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor Manufacturing Apparatus and Method Thereof
DE102019112238A1 (de) * 2019-05-10 2020-11-12 HELLA GmbH & Co. KGaA Verfahren zur Kontrolle der Beschichtung eines elektronischen Bauteils
DE102019114242A1 (de) * 2019-05-28 2020-12-03 Infineon Technologies Ag Verfahren zum bereitstellen von beschichteten leadframes oder zum messen einer adhäsionskraft eines verkapselungsmittels auf einem leadframe
FR3116118A1 (fr) * 2020-11-12 2022-05-13 Exelsius Dispositif de caractérisation de l’état de réticulation d’un matériau d’un objet.
CN114292032B (zh) * 2021-12-30 2023-07-25 凯盛信息显示材料(洛阳)有限公司 一种导电玻璃的在线镀膜方法及在线镀膜装置
CN115807219B (zh) * 2023-02-13 2023-05-30 南昌大学 一种光电薄膜材料制备控制***及方法
CN116603716B (zh) * 2023-04-28 2024-03-29 宁波市融嘉轻合金科技有限公司 一种压铸件表面处理方法、***、智能终端及存储介质

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES422223A1 (es) * 1973-01-11 1976-04-16 Saint Gobain Procedimiento y dispositivo para el control de homogeneidadde las capas metalicas depositadas sobre vidrio.
GB2016678A (en) * 1978-03-10 1979-09-26 Asahi Dow Ltd Method and Apparatus for Measuring the Thicknesses of Film Layers Using Infrared Radiation
JPS5840973A (ja) * 1981-09-03 1983-03-10 Toshiba Corp 光学式情報読取装置
US4748329A (en) * 1987-02-17 1988-05-31 Canadian Patents And Development Ltd. Method for on-line thickness monitoring of a transparent film
ES2005961A6 (es) * 1986-12-04 1989-04-01 Libbey Owens Ford Co Un aparato para vigilar catacteristicas seleccionadas de una pelicula sobre un sustrato.
ES2007965A6 (es) * 1988-07-15 1989-07-01 Serrano Juan Jose Monzon Procedimiento y aparato para medir simultaneamente el indice de refraccion, el coeficiente de absorcion y el espesor de laminas planoparalelas.
WO1991019025A1 (de) * 1990-05-30 1991-12-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur messung der schichtdicke und des brechungsindex einer dunnen schicht aur einem substrat und vorrichtung zur durchfuhrung des verfahrens
WO1992009880A2 (en) * 1990-11-27 1992-06-11 Orbot Systems Ltd. Method and apparatus for automatic optical inspection

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3892490A (en) * 1974-03-06 1975-07-01 Minolta Camera Kk Monitoring system for coating a substrate
US4355903A (en) * 1980-02-08 1982-10-26 Rca Corporation Thin film thickness monitor
JPS5830605A (ja) * 1981-08-18 1983-02-23 Kawasaki Steel Corp 表面被膜厚さ測定方法
JPS617445A (ja) * 1984-06-21 1986-01-14 Toshiba Corp 銅酸化被膜の酸化度判別装置
GB8528448D0 (en) * 1985-11-19 1985-12-24 Infrared Eng Ltd Absorption gauge
US4977330A (en) * 1989-02-13 1990-12-11 Batchelder Tom W In-line photoresist thickness monitor
US5101111A (en) * 1989-07-13 1992-03-31 Dainippon Screen Mfg. Co., Ltd. Method of measuring thickness of film with a reference sample having a known reflectance

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES422223A1 (es) * 1973-01-11 1976-04-16 Saint Gobain Procedimiento y dispositivo para el control de homogeneidadde las capas metalicas depositadas sobre vidrio.
GB2016678A (en) * 1978-03-10 1979-09-26 Asahi Dow Ltd Method and Apparatus for Measuring the Thicknesses of Film Layers Using Infrared Radiation
JPS5840973A (ja) * 1981-09-03 1983-03-10 Toshiba Corp 光学式情報読取装置
ES2005961A6 (es) * 1986-12-04 1989-04-01 Libbey Owens Ford Co Un aparato para vigilar catacteristicas seleccionadas de una pelicula sobre un sustrato.
US4748329A (en) * 1987-02-17 1988-05-31 Canadian Patents And Development Ltd. Method for on-line thickness monitoring of a transparent film
ES2007965A6 (es) * 1988-07-15 1989-07-01 Serrano Juan Jose Monzon Procedimiento y aparato para medir simultaneamente el indice de refraccion, el coeficiente de absorcion y el espesor de laminas planoparalelas.
WO1991019025A1 (de) * 1990-05-30 1991-12-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur messung der schichtdicke und des brechungsindex einer dunnen schicht aur einem substrat und vorrichtung zur durchfuhrung des verfahrens
WO1992009880A2 (en) * 1990-11-27 1992-06-11 Orbot Systems Ltd. Method and apparatus for automatic optical inspection

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
BASE DE DATOS PAJ en EPOQUE. Japanese Patent Information Organisation (Tokio, JP) & JP 58040973 A (TOKYO SHIBAURA DENKI KK) 10.03.83 * Resumen; figura * *
BASE DE DATOS PAJ en EPOQUE. Japanese Patent Information Organisation. (Tokio, JP) & JP 5803065 A (KAWASAKI SEITETSU KK) 23.02.83 * Resumen; figura * *

Also Published As

Publication number Publication date
AU664474B2 (en) 1995-11-16
GB2270561B (en) 1996-07-17
DE4331355A1 (de) 1994-03-17
SE9302985D0 (sv) 1993-09-14
NL9301577A (nl) 1994-04-05
CA2105635A1 (en) 1994-03-16
PT101364A (pt) 1994-12-30
ITTO930654A0 (it) 1993-09-08
NL194246C (nl) 2001-10-02
FR2695721A1 (fr) 1994-03-18
AU4487393A (en) 1994-03-24
GB9318814D0 (en) 1993-10-27
CZ289962B6 (cs) 2002-05-15
IT1261253B (it) 1996-05-09
GB2270561A (en) 1994-03-16
ITTO930654A1 (it) 1995-03-08
SE515115C2 (sv) 2001-06-11
CZ9301924A3 (cs) 2001-12-12
FR2695721B1 (fr) 1995-02-24
US5396080A (en) 1995-03-07
CN1085655A (zh) 1994-04-20
FI933971A (fi) 1994-03-16
GB9219450D0 (en) 1992-10-28
JPH06201333A (ja) 1994-07-19
LU88402A1 (fr) 1995-04-05
CN1049045C (zh) 2000-02-02
PT101364B (pt) 1999-11-30
FI933971A0 (fi) 1993-09-10
ES2078864B1 (es) 1997-05-16
NL194246B (nl) 2001-06-01
BE1006795A3 (fr) 1994-12-13
ES2078864R (es) 1996-12-16
SE9302985L (sv) 1994-03-16

Similar Documents

Publication Publication Date Title
ES2078864A2 (es) Procedimiento para supervisar el espesor de un revestimiento, y aparato para llevar a cabo dicho procedimiento.
TW368713B (en) Optical film thickness measurement method, filming method and manufacturing method for semiconductor laser apparatus
US4549079A (en) Apparatus for measuring thickness of paint coating
US4291975A (en) Apparatus for determining the color characteristics of a gem
ATE110794T1 (de) Kontrolle eines verfahrens zur abscheidung eines dünnen filmes mittels plasma.
EP0358936A3 (en) Method of and apparatus for measuring film thickness
IL125964A (en) Method and apparatus for measuring the thickness of a transparent film, particularly of a photoresist film on a semiconductor substrate
ES8706959A1 (es) Procedimiento y aparato para la determinacion rapida de al menos un parametro de un medio de prueba
WO1991014157A3 (de) Ein akusto-optisches abstimmbares zweistrahl-spektrometer
EP0304795B1 (de) Vorrichtung zur Überprüfung von beschichteten und unbeschichteten Folien
EP0121340A3 (en) Method and apparatus for measuring thin film thickness
CA2128600A1 (en) Method and apparatus for determination of refiner mechanical pulp properties
GB1283111A (en) Methods of monitoring the thickness of a transparent film
EP0236568A3 (en) Apparatus for monitoring thickness variations in a film web
ES484441A1 (es) Dispositivo para la medicion de la claridad de productos de-molienda.
US4676644A (en) Device for monitoring the thickness of thin layers
JPS6441375A (en) Gradation and color tone correction system
CA2093704A1 (en) Method and system for monitoring quality of phosphate coating
GB1069910A (en) Method of and apparatus for continuously measuring applied coatings
EP0749000B1 (en) Method and apparatus for color thickness testing
JPS56115905A (en) Measuring method for thickness of transparent film and device therefor
SU1233208A1 (ru) Способ измерени толщины многослойной полимерной пленки
JPH0346386A (ja) 反射防止皮膜の厚み制御方法及び装置
JPS57206042A (en) Method for checking wiring pattern of wafer
JPS54145163A (en) Measuring method for thickness of thin films on solid plate

Legal Events

Date Code Title Description
EC2A Search report published

Date of ref document: 19951216

Kind code of ref document: R

Effective date: 19951216