DE69515285D1 - Ionenimplantationsgerät und -verfahren sowie Halbleitervorrichtung - Google Patents

Ionenimplantationsgerät und -verfahren sowie Halbleitervorrichtung

Info

Publication number
DE69515285D1
DE69515285D1 DE69515285T DE69515285T DE69515285D1 DE 69515285 D1 DE69515285 D1 DE 69515285D1 DE 69515285 T DE69515285 T DE 69515285T DE 69515285 T DE69515285 T DE 69515285T DE 69515285 D1 DE69515285 D1 DE 69515285D1
Authority
DE
Germany
Prior art keywords
ion implantation
semiconductor device
implantation device
semiconductor
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69515285T
Other languages
English (en)
Inventor
Atsuhiro Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of DE69515285D1 publication Critical patent/DE69515285D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/24—Ion sources; Ion guns using photo-ionisation, e.g. using laser beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31705—Impurity or contaminant control

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
DE69515285T 1995-01-10 1995-11-13 Ionenimplantationsgerät und -verfahren sowie Halbleitervorrichtung Expired - Lifetime DE69515285D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7002037A JPH08190886A (ja) 1995-01-10 1995-01-10 イオン注入装置、イオン注入方法および半導体装置

Publications (1)

Publication Number Publication Date
DE69515285D1 true DE69515285D1 (de) 2000-04-06

Family

ID=11518135

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69515285T Expired - Lifetime DE69515285D1 (de) 1995-01-10 1995-11-13 Ionenimplantationsgerät und -verfahren sowie Halbleitervorrichtung

Country Status (5)

Country Link
US (1) US6140656A (de)
EP (1) EP0722180B1 (de)
JP (1) JPH08190886A (de)
KR (1) KR100198235B1 (de)
DE (1) DE69515285D1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2450351C (en) 2001-06-11 2010-09-21 Isis Pharmaceuticals Inc. Systems and methods for inducing infrared multiphoton dissociation with a hollow fiber waveguide
JP2004079930A (ja) * 2002-08-22 2004-03-11 Toshiba Corp 半導体材料、その製造方法、及びｓｏｉ型半導体基板
US20120122101A1 (en) 2003-09-11 2012-05-17 Rangarajan Sampath Compositions for use in identification of bacteria
US8546082B2 (en) * 2003-09-11 2013-10-01 Ibis Biosciences, Inc. Methods for identification of sepsis-causing bacteria
US8097416B2 (en) 2003-09-11 2012-01-17 Ibis Biosciences, Inc. Methods for identification of sepsis-causing bacteria
US8598022B2 (en) 2009-10-27 2013-12-03 Advanced Technology Materials, Inc. Isotopically-enriched boron-containing compounds, and methods of making and using same
TWI386983B (zh) * 2010-02-26 2013-02-21 Advanced Tech Materials 用以增進離子植入系統中之離子源的壽命及性能之方法與設備
JP5813536B2 (ja) 2012-03-02 2015-11-17 株式会社東芝 イオン源
CN109690724A (zh) * 2016-11-11 2019-04-26 日新离子机器株式会社 离子源
GB2577918A (en) * 2018-10-10 2020-04-15 Univ Manchester Method and apparatus for determining the presence of ions in a sample

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1391738A (fr) * 1963-10-21 1965-03-12 Comp Generale Electricite Procédé de séparation isotopique
US3772519A (en) * 1970-03-25 1973-11-13 Jersey Nuclear Avco Isotopes Method of and apparatus for the separation of isotopes
US3914655A (en) * 1973-06-28 1975-10-21 Ibm High brightness ion source
US4158139A (en) * 1976-10-06 1979-06-12 Jersey Nuclear-Avco Isotopes, Inc. Isotopically selective excitation from plural low levels to distinct excited levels
US4442354A (en) * 1982-01-22 1984-04-10 Atom Sciences, Inc. Sputter initiated resonance ionization spectrometry
JPS58157043A (ja) * 1982-03-15 1983-09-19 Nippon Telegr & Teleph Corp <Ntt> イオンビ−ム発生装置
JPS60208035A (ja) * 1984-04-02 1985-10-19 Mitsubishi Electric Corp イオンビ−ム発生装置
US4670064A (en) * 1985-04-10 1987-06-02 Eaton Corporation Generating high purity ions by non-thermal excimer laser processing
DE3535062A1 (de) * 1985-10-01 1987-04-09 Mitsubishi Electric Corp Ionenstrahlerzeuger
US4845836A (en) * 1988-04-18 1989-07-11 Westinghouse Electric Corp. Method for feeding a through-bolt through a bore in a stator core
JPH02288048A (ja) * 1989-04-27 1990-11-28 Nec Corp 光イオン化イオン源
JPH0395969A (ja) * 1989-09-07 1991-04-22 Canon Inc 半導体装置
JPH03165443A (ja) * 1989-11-24 1991-07-17 Shimadzu Corp イオン注入方法
JPH04242049A (ja) * 1991-01-10 1992-08-28 Nissin Electric Co Ltd イオン源
JPH0562420A (ja) * 1991-08-30 1993-03-12 Mitsubishi Rayon Co Ltd フロツピーデイスク用ライナー

Also Published As

Publication number Publication date
JPH08190886A (ja) 1996-07-23
KR100198235B1 (ko) 1999-06-15
KR960030324A (ko) 1996-08-17
US6140656A (en) 2000-10-31
EP0722180A3 (de) 1997-12-29
EP0722180A2 (de) 1996-07-17
EP0722180B1 (de) 2000-03-01

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Legal Events

Date Code Title Description
8332 No legal effect for de