JP5813536B2 - イオン源 - Google Patents
イオン源 Download PDFInfo
- Publication number
- JP5813536B2 JP5813536B2 JP2012046416A JP2012046416A JP5813536B2 JP 5813536 B2 JP5813536 B2 JP 5813536B2 JP 2012046416 A JP2012046416 A JP 2012046416A JP 2012046416 A JP2012046416 A JP 2012046416A JP 5813536 B2 JP5813536 B2 JP 5813536B2
- Authority
- JP
- Japan
- Prior art keywords
- ions
- target
- electrode
- ion source
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/24—Ion sources; Ion guns using photo-ionisation, e.g. using laser beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
- H01J27/024—Extraction optics, e.g. grids
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N5/00—Radiation therapy
- A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
- A61N2005/1085—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy characterised by the type of particles applied to the patient
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Electron Sources, Ion Sources (AREA)
- Particle Accelerators (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
Description
まず、図1を参照して、本発明の第1の実施形態に係るイオン源について説明する。図1は、本実施形態に係るイオン源の構成の概略を示す。本実施形態に係るイオン源は、例えばレーザ光をターゲットに集光照射し、当該レーザ光のエネルギーによって当該ターゲットに含まれる元素を蒸発・イオン化することによってイオンを発生させるレーザイオン源である。
次に、図4を参照して、本発明の第2の実施形態に係るイオン源について説明する。図4は、本実施形態に係るイオン源の構成の概略を示す。なお、図4においては、前述した図1と同様の部分には同一参照符号を付してその詳しい説明を省略する。
Claims (3)
- 下流機器である線形加速器と接続されたイオン源であって、
真空排気された真空容器と、
前記真空容器内に配置され、レーザ光の照射により複数の価数のイオンを発生するターゲットと、
前記ターゲットによって発生されたイオンを加速させるために電圧が印加され、イオンを加速・集束するための電場を生成する加速電極と、
前記ターゲットと前記加速電極との間に設けられ、前記ターゲットによって発生された複数の価数のイオンのうち予め定められた価数のイオンに応じた電圧値として前記加速電極に印加される電圧の逆電圧が印加され、イオンを集束させる中間電極と
を具備することを特徴とするイオン源。 - 前記中間電極は、前記ターゲットによって発生された複数の価数のイオンのうち予め定められた価数のイオンの飛行速度に応じたタイミングで当該イオンを前記加速電極に輸送するようにパルス駆動電圧が印加されることを特徴とする請求項1記載のイオン源。
- 前記加速電極の下流に設置された補助電極を更に具備し、
前記補助電極は、前記加速電極において加速されたイオンのうち前記予め定められた価数のイオンを前記補助電極の下流に輸送するようにパルス駆動電圧が印加される
ことを特徴とする請求項1または2記載のイオン源。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012046416A JP5813536B2 (ja) | 2012-03-02 | 2012-03-02 | イオン源 |
DE102013003501.5A DE102013003501B4 (de) | 2012-03-02 | 2013-02-28 | Verfahren zum Verwenden einer Ionenquelle |
CN201310064976.0A CN103298232B (zh) | 2012-03-02 | 2013-03-01 | 离子源 |
US13/781,913 US9859086B2 (en) | 2012-03-02 | 2013-03-01 | Ion source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012046416A JP5813536B2 (ja) | 2012-03-02 | 2012-03-02 | イオン源 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013182804A JP2013182804A (ja) | 2013-09-12 |
JP5813536B2 true JP5813536B2 (ja) | 2015-11-17 |
Family
ID=48985177
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012046416A Active JP5813536B2 (ja) | 2012-03-02 | 2012-03-02 | イオン源 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9859086B2 (ja) |
JP (1) | JP5813536B2 (ja) |
CN (1) | CN103298232B (ja) |
DE (1) | DE102013003501B4 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9872374B2 (en) * | 2014-05-22 | 2018-01-16 | Ohio State Innovation Foundation | Liquid thin-film laser target |
CN114850495A (zh) * | 2018-12-06 | 2022-08-05 | 通用电气航空***有限责任公司 | 用于增材制造的设备和方法 |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3406349A (en) * | 1965-06-16 | 1968-10-15 | Atomic Energy Commission Usa | Ion beam generator having laseractivated ion source |
US3593018A (en) * | 1969-04-01 | 1971-07-13 | Franklin Gmo Corp | Time of flight ion analysis with a pulsed ion source employing ion-molecule reactions |
JPS57432A (en) | 1980-06-02 | 1982-01-05 | Matsushita Seiko Co Ltd | Heat pump type cooling and heating device |
US4649278A (en) * | 1985-05-02 | 1987-03-10 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Generation of intense negative ion beams |
US5245192A (en) * | 1991-10-07 | 1993-09-14 | Houseman Barton L | Selective ionization apparatus and methods |
JP3609131B2 (ja) * | 1994-12-06 | 2005-01-12 | 株式会社半導体エネルギー研究所 | イオンドーピング装置のクリーニング方法 |
JPH08190886A (ja) | 1995-01-10 | 1996-07-23 | Mitsubishi Electric Corp | イオン注入装置、イオン注入方法および半導体装置 |
US5614711A (en) * | 1995-05-04 | 1997-03-25 | Indiana University Foundation | Time-of-flight mass spectrometer |
US5569917A (en) * | 1995-05-19 | 1996-10-29 | Varian Associates, Inc. | Apparatus for and method of forming a parallel ion beam |
US5742049A (en) * | 1995-12-21 | 1998-04-21 | Bruker-Franzen Analytik Gmbh | Method of improving mass resolution in time-of-flight mass spectrometry |
RU2096856C1 (ru) | 1995-12-29 | 1997-11-20 | Машковцев Борис Николаевич | Способ получения ионного пучка и устройство для его осуществления |
JPH11111185A (ja) | 1997-10-03 | 1999-04-23 | Agency Of Ind Science & Technol | レーザアブレーション型イオン源 |
JP2000146914A (ja) | 1998-11-09 | 2000-05-26 | Jeol Ltd | Frit−レーザーイオン源 |
US6787723B2 (en) * | 1999-03-24 | 2004-09-07 | The Regents Of The University Of Michigan | Method for laser induced isotope enrichment |
JP3713524B2 (ja) | 2001-08-08 | 2005-11-09 | 独立行政法人理化学研究所 | イオン加速装置 |
US6744225B2 (en) | 2001-05-02 | 2004-06-01 | Riken | Ion accelerator |
US6642526B2 (en) * | 2001-06-25 | 2003-11-04 | Ionfinity Llc | Field ionizing elements and applications thereof |
JP3941434B2 (ja) * | 2001-08-09 | 2007-07-04 | 日新イオン機器株式会社 | イオン注入装置およびその運転方法 |
US6768120B2 (en) * | 2001-08-31 | 2004-07-27 | The Regents Of The University Of California | Focused electron and ion beam systems |
US6917036B2 (en) * | 2002-02-08 | 2005-07-12 | Ionalytics Corporation | FAIMS with non-destructive detection of selectively transmitted ions |
EP1602119A4 (en) | 2003-03-03 | 2010-05-12 | Univ Brigham Young | NOVEL ELECTROIONISATION SOURCE TO ORTHOGONAL ACCELERATION TIME-OF-FLIGHT MASS SPECTROMETRY |
US7196337B2 (en) * | 2003-05-05 | 2007-03-27 | Cabot Microelectronics Corporation | Particle processing apparatus and methods |
US20090224700A1 (en) * | 2004-01-15 | 2009-09-10 | Yu-Jiuan Chen | Beam Transport System and Method for Linear Accelerators |
US8003934B2 (en) * | 2004-02-23 | 2011-08-23 | Andreas Hieke | Methods and apparatus for ion sources, ion control and ion measurement for macromolecules |
CN1933092A (zh) | 2005-01-21 | 2007-03-21 | 安捷伦科技有限公司 | 用于离子产生增强的设备和方法 |
US7385186B2 (en) * | 2005-05-13 | 2008-06-10 | Applera Corporation | Methods of operating ion optics for mass spectrometry |
JP2007057432A (ja) * | 2005-08-25 | 2007-03-08 | Institute Of Physical & Chemical Research | イオンの抽出方法およびその装置 |
US8405326B2 (en) * | 2006-01-13 | 2013-03-26 | Technion Research & Development Foundation Limited | Method and apparatus for generating ion beam |
EP1959476A1 (de) * | 2007-02-19 | 2008-08-20 | Technische Universität Hamburg-Harburg | Massenspektrometer |
JP4771230B2 (ja) | 2007-07-31 | 2011-09-14 | 独立行政法人日本原子力研究開発機構 | イオンビーム引出加速方法及び装置 |
JP5777062B2 (ja) * | 2009-03-27 | 2015-09-09 | 国立大学法人大阪大学 | イオン源、およびそれを備える質量分析装置 |
US7999479B2 (en) * | 2009-04-16 | 2011-08-16 | Varian Semiconductor Equipment Associates, Inc. | Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control |
US8153964B2 (en) * | 2009-05-29 | 2012-04-10 | Academia Sinica | Ultrasound ionization mass spectrometer |
US8217366B2 (en) * | 2009-11-02 | 2012-07-10 | Electronics And Telecommunications Research Institute | Carbon ion generating device and tumor treatment apparatus using the same |
US8872127B2 (en) * | 2011-02-22 | 2014-10-28 | Brookhaven Science Associates, Llc | Beam current controller for laser ion source |
CN102290315B (zh) | 2011-07-21 | 2013-02-13 | 厦门大学 | 一种适合于飞行时间质谱仪的离子源 |
JP5801144B2 (ja) * | 2011-08-30 | 2015-10-28 | 株式会社東芝 | イオン源 |
-
2012
- 2012-03-02 JP JP2012046416A patent/JP5813536B2/ja active Active
-
2013
- 2013-02-28 DE DE102013003501.5A patent/DE102013003501B4/de active Active
- 2013-03-01 US US13/781,913 patent/US9859086B2/en active Active
- 2013-03-01 CN CN201310064976.0A patent/CN103298232B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
US20130228699A1 (en) | 2013-09-05 |
JP2013182804A (ja) | 2013-09-12 |
CN103298232A (zh) | 2013-09-11 |
US9859086B2 (en) | 2018-01-02 |
DE102013003501A1 (de) | 2013-09-05 |
DE102013003501B4 (de) | 2022-09-01 |
CN103298232B (zh) | 2017-04-12 |
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