DE69327355T2 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69327355T2
DE69327355T2 DE69327355T DE69327355T DE69327355T2 DE 69327355 T2 DE69327355 T2 DE 69327355T2 DE 69327355 T DE69327355 T DE 69327355T DE 69327355 T DE69327355 T DE 69327355T DE 69327355 T2 DE69327355 T2 DE 69327355T2
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69327355T
Other languages
English (en)
Other versions
DE69327355D1 (de
Inventor
Hideo Todokoro
Tadashi Ohtaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69327355D1 publication Critical patent/DE69327355D1/de
Publication of DE69327355T2 publication Critical patent/DE69327355T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/026—Shields
    • H01J2237/0268—Liner tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H01J2237/04756—Changing particle velocity decelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24435—Microchannel plates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69327355T 1992-03-19 1993-03-15 Rasterelektronenmikroskop Expired - Lifetime DE69327355T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4092441A JP2919170B2 (ja) 1992-03-19 1992-03-19 走査電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69327355D1 DE69327355D1 (de) 2000-01-27
DE69327355T2 true DE69327355T2 (de) 2000-08-10

Family

ID=14054509

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69327355T Expired - Lifetime DE69327355T2 (de) 1992-03-19 1993-03-15 Rasterelektronenmikroskop
DE69334284T Expired - Lifetime DE69334284D1 (de) 1992-03-19 1993-03-15 Rasterelektronenmikroskop

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69334284T Expired - Lifetime DE69334284D1 (de) 1992-03-19 1993-03-15 Rasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US5424541A (de)
EP (2) EP0561584B1 (de)
JP (1) JP2919170B2 (de)
KR (1) KR100309323B1 (de)
DE (2) DE69327355T2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021122390B3 (de) 2021-08-30 2023-01-26 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät, Verfahren zum Betreiben des Teilchenstrahlgeräts und Computerprogrammprodukt

Families Citing this family (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2927627B2 (ja) * 1992-10-20 1999-07-28 株式会社日立製作所 走査電子顕微鏡
JP3291880B2 (ja) * 1993-12-28 2002-06-17 株式会社日立製作所 走査形電子顕微鏡
JP3323021B2 (ja) * 1994-12-28 2002-09-09 株式会社日立製作所 走査形電子顕微鏡及びそれを用いた試料像観察方法
JP3372138B2 (ja) * 1995-06-26 2003-01-27 株式会社日立製作所 走査形電子顕微鏡
JPH09106777A (ja) * 1995-10-11 1997-04-22 Hamamatsu Photonics Kk 電子顕微鏡用電子増倍器
JP3774953B2 (ja) * 1995-10-19 2006-05-17 株式会社日立製作所 走査形電子顕微鏡
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
JP3966350B2 (ja) * 1995-10-19 2007-08-29 株式会社日立製作所 走査形電子顕微鏡
JP4179390B2 (ja) * 1995-10-19 2008-11-12 株式会社日立製作所 走査形電子顕微鏡
GB2314926B (en) * 1996-07-01 1999-08-25 K E Developments Ltd Detector devices
JP3432091B2 (ja) * 1996-11-05 2003-07-28 日本電子株式会社 走査電子顕微鏡
JP3434165B2 (ja) * 1997-04-18 2003-08-04 株式会社日立製作所 走査電子顕微鏡
JP3514070B2 (ja) * 1997-04-25 2004-03-31 株式会社日立製作所 走査電子顕微鏡
EP0988646A1 (de) * 1997-06-13 2000-03-29 Gatan, Inc. Verfahren und gerät zur auflösungerhöhung und rauschenreduzierung in einem abbildungs-detektor für elektronenmikroskop
DE19732093B4 (de) * 1997-07-25 2008-09-25 Carl Zeiss Nts Gmbh Korpuskularstrahlgerät
JPH1167139A (ja) * 1997-08-25 1999-03-09 Hitachi Ltd 走査電子顕微鏡
GB9719417D0 (en) * 1997-09-13 1997-11-12 Univ York Electron microscope
JP4302316B2 (ja) * 1998-03-09 2009-07-22 株式会社日立製作所 走査形電子顕微鏡
US6661008B2 (en) 1998-06-22 2003-12-09 Nikon Corporation Electron-optical system and inspection method using the same
US6300629B1 (en) 1998-09-30 2001-10-09 Applied Materials, Inc. Defect review SEM with automatically switchable detector
EP1022766B1 (de) * 1998-11-30 2004-02-04 Advantest Corporation Teilchenstrahlgerät
WO2000079565A1 (en) * 1999-06-22 2000-12-28 Philips Electron Optics B.V. Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current
US6960766B2 (en) * 2000-02-25 2005-11-01 Hermes-Microvision, Inc. Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method
US6392231B1 (en) 2000-02-25 2002-05-21 Hermes-Microvision, Inc. Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method
DE10012314A1 (de) * 2000-03-14 2001-09-20 Leo Elektronenmikroskopie Gmbh Detektorsystem für ein Korpuskularstrahlgerät und Korpuskularstrahlgerät mit einem solchen Detektorsystem
US6847038B2 (en) 2002-07-15 2005-01-25 Hitachi, Ltd. Scanning electron microscope
WO2001075929A1 (fr) * 2000-03-31 2001-10-11 Hitachi, Ltd. Microscope electronique a balayage
US7241993B2 (en) 2000-06-27 2007-07-10 Ebara Corporation Inspection system by charged particle beam and method of manufacturing devices using the system
TW579536B (en) * 2001-07-02 2004-03-11 Zeiss Carl Semiconductor Mfg Examining system for the particle-optical imaging of an object, deflector for charged particles as well as method for the operation of the same
US6717141B1 (en) * 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
JP3794983B2 (ja) * 2002-05-27 2006-07-12 川崎重工業株式会社 Ｘ線顕微鏡の電子加速空間構造
WO2004027809A2 (en) * 2002-09-18 2004-04-01 Fei Company Charged particle beam system
PL207238B1 (pl) * 2003-10-14 2010-11-30 Politechnika Wroclawska Układ detekcyjny elektronów wtórnych i wstecznie rozproszonych do skaningowego mikroskopu elektronowego
US7212017B2 (en) * 2003-12-25 2007-05-01 Ebara Corporation Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus
EP1605492B1 (de) 2004-06-11 2015-11-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Teilchenstrahlgerät mit Gegenfeldspektrometer
JP4519567B2 (ja) * 2004-08-11 2010-08-04 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡およびこれを用いた試料観察方法
US7141791B2 (en) * 2004-09-07 2006-11-28 Kla-Tencor Technologies Corporation Apparatus and method for E-beam dark field imaging
US7525090B1 (en) 2007-03-16 2009-04-28 Kla-Tencor Technologies Corporation Dynamic centering for behind-the-lens dark field imaging
US7714287B1 (en) 2008-06-05 2010-05-11 Kla-Tencor Corporation Apparatus and method for obtaining topographical dark-field images in a scanning electron microscope
CZ307557B6 (cs) 2010-10-07 2018-12-05 Tescan Orsay Holding, A.S. Scintilační detekční jednotka pro detekci zpětně odražených elektronů pro elektronové nebo iontové mikroskopy
JP5860642B2 (ja) 2011-09-07 2016-02-16 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP6307315B2 (ja) * 2013-03-28 2018-04-04 株式会社荏原製作所 電子線検査装置
JP6178296B2 (ja) * 2014-10-20 2017-08-09 株式会社 テクネックス工房 電子線放射管
JP6677657B2 (ja) * 2015-02-05 2020-04-08 株式会社荏原製作所 検査装置
JP6573835B2 (ja) * 2016-01-12 2019-09-11 株式会社荏原製作所 検査装置及び高圧基準管の製造方法
EP4156227A1 (de) * 2021-09-27 2023-03-29 ASML Netherlands B.V. Ladungsteilchenvorrichtung und -verfahren

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3787696A (en) * 1972-03-15 1974-01-22 Etec Corp Scanning electron microscope electron-optical column construction
JPS5910688Y2 (ja) * 1977-09-14 1984-04-03 富士通株式会社 電子検出器
FR2499314A1 (fr) * 1981-02-04 1982-08-06 Centre Nat Rech Scient Ensemble de microscope electronique a balayage a fonctionnement in situ
GB8327737D0 (en) * 1983-10-17 1983-11-16 Texas Instruments Ltd Electron detector
US4675524A (en) * 1985-03-11 1987-06-23 Siemens Aktiengesellschaft Scanning particle microscope with diminished boersch effect
JPH0736321B2 (ja) * 1985-06-14 1995-04-19 イーツエーテー、インテグレイテツド、サーキツト、テスチング、ゲゼルシヤフト、フユア、ハルプライタープリユーフテヒニク、ミツト、ベシユレンクテル、ハフツング 定量的電位測定用スペクトロメ−タ−対物レンズ装置
DE3532781A1 (de) * 1985-09-13 1987-03-19 Siemens Ag Anordnung zur detektion von sekundaer- und/oder rueckstreuelektronen in einem elektronenstrahlgeraet
GB2201288B (en) * 1986-12-12 1990-08-22 Texas Instruments Ltd Electron beam apparatus
US4766372A (en) * 1987-02-10 1988-08-23 Intel Corporation Electron beam tester
JPS64637A (en) * 1987-06-23 1989-01-05 Jeol Ltd Secondary electron detection device
JPS6452370A (en) * 1987-08-24 1989-02-28 Hitachi Ltd Potential measuring apparatus
US4926054A (en) * 1988-03-17 1990-05-15 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Objective lens for focusing charged particles in an electron microscope
JPH0221551A (ja) * 1988-07-08 1990-01-24 Jeol Ltd 電子線を用いた電位測定装置
JP2636381B2 (ja) * 1988-11-11 1997-07-30 日本電子株式会社 電子線装置
JP2934707B2 (ja) * 1989-06-19 1999-08-16 株式会社ニコン 走査電子顕微鏡
DE3925949A1 (de) * 1989-08-05 1991-02-07 Herbert Dr Specht Elektronenrastermikroskop mit nachruestmodul
US5146090A (en) * 1990-06-11 1992-09-08 Siemens Aktiengesellschaft Particle beam apparatus having an immersion lens arranged in an intermediate image of the beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021122390B3 (de) 2021-08-30 2023-01-26 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät, Verfahren zum Betreiben des Teilchenstrahlgeräts und Computerprogrammprodukt

Also Published As

Publication number Publication date
EP0918350B1 (de) 2009-05-06
KR930020553A (ko) 1993-10-20
KR100309323B1 (ko) 2001-12-15
DE69334284D1 (de) 2009-06-18
EP0561584A1 (de) 1993-09-22
DE69327355D1 (de) 2000-01-27
EP0561584B1 (de) 1999-12-22
US5424541A (en) 1995-06-13
EP0918350A1 (de) 1999-05-26
JP2919170B2 (ja) 1999-07-12
JPH05266855A (ja) 1993-10-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition