DE69317847D1 - Raster-Elektronenmikroskop - Google Patents

Raster-Elektronenmikroskop

Info

Publication number
DE69317847D1
DE69317847D1 DE69317847T DE69317847T DE69317847D1 DE 69317847 D1 DE69317847 D1 DE 69317847D1 DE 69317847 T DE69317847 T DE 69317847T DE 69317847 T DE69317847 T DE 69317847T DE 69317847 D1 DE69317847 D1 DE 69317847D1
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69317847T
Other languages
English (en)
Other versions
DE69317847T2 (de
Inventor
Mitsugu Sato
Hideo Todokoro
Tadashi Otaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69317847D1 publication Critical patent/DE69317847D1/de
Publication of DE69317847T2 publication Critical patent/DE69317847T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
DE69317847T 1992-10-15 1993-10-01 Raster-Elektronenmikroskop Expired - Lifetime DE69317847T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04301541A JP3081393B2 (ja) 1992-10-15 1992-10-15 走査電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69317847D1 true DE69317847D1 (de) 1998-05-14
DE69317847T2 DE69317847T2 (de) 1998-12-03

Family

ID=17898181

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69332785T Expired - Lifetime DE69332785T2 (de) 1992-10-15 1993-10-01 Rasterelektronenmikroskop
DE69317847T Expired - Lifetime DE69317847T2 (de) 1992-10-15 1993-10-01 Raster-Elektronenmikroskop

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69332785T Expired - Lifetime DE69332785T2 (de) 1992-10-15 1993-10-01 Rasterelektronenmikroskop

Country Status (4)

Country Link
US (1) US5387793A (de)
EP (2) EP0817235B1 (de)
JP (1) JP3081393B2 (de)
DE (2) DE69332785T2 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2277830B (en) * 1993-05-04 1996-10-23 Programme 3 Patent Holdings High temperature storage battery
JP3291880B2 (ja) * 1993-12-28 2002-06-17 株式会社日立製作所 走査形電子顕微鏡
JP3323021B2 (ja) * 1994-12-28 2002-09-09 株式会社日立製作所 走査形電子顕微鏡及びそれを用いた試料像観察方法
JP3341226B2 (ja) * 1995-03-17 2002-11-05 株式会社日立製作所 走査電子顕微鏡
JP3372138B2 (ja) * 1995-06-26 2003-01-27 株式会社日立製作所 走査形電子顕微鏡
EP0769799B1 (de) * 1995-10-19 2010-02-17 Hitachi, Ltd. Rasterelektronenmikroskop
JP3376793B2 (ja) * 1995-12-20 2003-02-10 株式会社日立製作所 走査形電子顕微鏡
DE19605855A1 (de) * 1996-02-16 1997-08-21 Act Advanced Circuit Testing Detektorobjektiv für Korpuskularstrahlgeräte
JP3251875B2 (ja) * 1996-05-10 2002-01-28 株式会社東芝 荷電粒子ビーム露光装置
US6037589A (en) * 1997-01-16 2000-03-14 Seiko Instruments Inc. Electron beam device
JP3514070B2 (ja) * 1997-04-25 2004-03-31 株式会社日立製作所 走査電子顕微鏡
GB9719417D0 (en) * 1997-09-13 1997-11-12 Univ York Electron microscope
WO1999046797A1 (de) * 1998-03-10 1999-09-16 Erik Essers Rasterelektronenmikroskop
WO2000019482A1 (fr) * 1998-09-25 2000-04-06 Hitachi, Ltd. Microscope electronique a balayage
US6642520B2 (en) 1999-04-13 2003-11-04 Kabushiki Kaisha Topcon Scanning electron microscope
GB9916804D0 (en) * 1999-07-16 1999-09-22 Shah Jitendra S Scanning beam instruments
KR100523229B1 (ko) 1999-10-29 2005-10-20 가부시끼가이샤 히다치 세이사꾸쇼 전자빔장치
DE69903439T2 (de) 1999-11-12 2003-07-03 Advantest Corp Ablenkeinheit zur Separation zweier Teilchenstrahlen
GB2367686B (en) * 2000-08-10 2002-12-11 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
JP2004534360A (ja) 2001-06-15 2004-11-11 株式会社荏原製作所 電子線装置及びその電子線装置を用いたデバイスの製造方法
JP4213883B2 (ja) * 2001-08-29 2009-01-21 株式会社日立グローバルストレージテクノロジーズ 磁界の測定方法および磁界測定装置、ならびに電流波形測定方法および電界測定方法
US6717141B1 (en) * 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
PL207199B1 (pl) * 2003-04-17 2010-11-30 Politechnika Wroclawska Układ detekcyjny elektronów wtórnych do skaningowego mikroskopu elektronowego
US7531812B2 (en) * 2003-10-27 2009-05-12 Politechnika Wroclawska Method and system for the directional detection of electrons in a scanning electron microscope
US7041976B1 (en) * 2003-11-03 2006-05-09 Kla-Tencor Technologies Corporation Automated focusing of electron image
JP4194526B2 (ja) * 2004-05-14 2008-12-10 株式会社日立ハイテクノロジーズ 荷電粒子線の調整方法、及び荷電粒子線装置
JP4795883B2 (ja) * 2006-07-21 2011-10-19 株式会社日立ハイテクノロジーズ パターン検査・計測装置
CZ298912B6 (cs) * 2006-11-16 2008-03-12 Tescan, S. R. O. Rastrovací elektronový mikroskop
JP5280174B2 (ja) * 2008-12-10 2013-09-04 日本電子株式会社 電子線装置及び電子線装置の動作方法
DE102009028013B9 (de) * 2009-07-24 2014-04-17 Carl Zeiss Microscopy Gmbh Teilchenstrahlgerät mit einer Blendeneinheit und Verfahren zur Einstellung eines Strahlstroms in einem Teilchenstrahlgerät
KR101167565B1 (ko) * 2009-12-29 2012-07-27 한국기초과학지원연구원 Ｔｅｍ의 3차원 회절패턴분석을 위한 정밀 제어용 전자빔의 회전각도 및 회전속도 제어-표시 시스템
WO2012169665A1 (ko) * 2011-06-07 2012-12-13 한국기초과학지원연구원 Ｐｅｄ 분석을 위한 ｔｅｍ의 디지털 조정코일제어장치 및 이를 이용한 전자빔 회전속도 및 회전각도 표시장치
TWI447774B (zh) * 2011-10-27 2014-08-01 Snu Precision Co Ltd 掃描電子顯微鏡用威恩濾質器的控制方法及具有電子束校準功能的掃描電子顯微鏡
CZ309855B6 (cs) 2017-09-20 2023-12-20 Tescan Group, A.S. Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem
DE112017007822B4 (de) * 2017-09-29 2023-06-01 Hitachi High-Technologies Corporation Rasterelektronenmikroskop
CN108155079B (zh) * 2017-12-04 2019-07-05 中国工程物理研究院激光聚变研究中心 用于扫描电子显微镜中的x射线靶组件

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5291361A (en) * 1976-01-27 1977-08-01 Jeol Ltd Scanning electron microscope
AU521225B2 (en) * 1977-04-19 1982-03-25 Delalande S.A. Alkylenedioxy phenyl derivatives
KR850001390B1 (ko) * 1980-07-31 1985-09-24 니혼 덴시 가부시끼 가이샤 2차 전자 검출장치
JPS60212953A (ja) * 1984-04-06 1985-10-25 Hitachi Ltd 電子線装置
JPS6199960A (ja) * 1985-04-05 1986-05-19 Clarion Co Ltd テ−プ走行モ−ド切換装置
DE3532781A1 (de) * 1985-09-13 1987-03-19 Siemens Ag Anordnung zur detektion von sekundaer- und/oder rueckstreuelektronen in einem elektronenstrahlgeraet
GB8604181D0 (en) * 1986-02-20 1986-03-26 Texas Instruments Ltd Electron beam apparatus
JPS63110543A (ja) * 1986-10-29 1988-05-16 Hitachi Ltd 走査電子顕微鏡の信号検出器

Also Published As

Publication number Publication date
US5387793A (en) 1995-02-07
DE69332785D1 (de) 2003-04-24
DE69332785T2 (de) 2004-02-12
EP0817235B1 (de) 2003-03-19
EP0817235A1 (de) 1998-01-07
EP0592899A1 (de) 1994-04-20
EP0592899B1 (de) 1998-04-08
JP3081393B2 (ja) 2000-08-28
JPH06132002A (ja) 1994-05-13
DE69317847T2 (de) 1998-12-03

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Legal Events

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8364 No opposition during term of opposition