DE69903439T2 - Ablenkeinheit zur Separation zweier Teilchenstrahlen - Google Patents

Ablenkeinheit zur Separation zweier Teilchenstrahlen

Info

Publication number
DE69903439T2
DE69903439T2 DE69903439T DE69903439T DE69903439T2 DE 69903439 T2 DE69903439 T2 DE 69903439T2 DE 69903439 T DE69903439 T DE 69903439T DE 69903439 T DE69903439 T DE 69903439T DE 69903439 T2 DE69903439 T2 DE 69903439T2
Authority
DE
Germany
Prior art keywords
separation
deflection unit
particle beams
beams
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69903439T
Other languages
English (en)
Other versions
DE69903439D1 (de
Inventor
Dr Frosien
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of DE69903439D1 publication Critical patent/DE69903439D1/de
Application granted granted Critical
Publication of DE69903439T2 publication Critical patent/DE69903439T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Tubes For Measurement (AREA)
DE69903439T 1999-11-12 1999-11-12 Ablenkeinheit zur Separation zweier Teilchenstrahlen Expired - Lifetime DE69903439T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP99122581A EP1100111B1 (de) 1999-11-12 1999-11-12 Ablenkeinheit zur Separation zweier Teilchenstrahlen

Publications (2)

Publication Number Publication Date
DE69903439D1 DE69903439D1 (de) 2002-11-14
DE69903439T2 true DE69903439T2 (de) 2003-07-03

Family

ID=8239381

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69903439T Expired - Lifetime DE69903439T2 (de) 1999-11-12 1999-11-12 Ablenkeinheit zur Separation zweier Teilchenstrahlen

Country Status (4)

Country Link
US (1) US6509569B1 (de)
EP (1) EP1100111B1 (de)
JP (1) JP2001148227A (de)
DE (1) DE69903439T2 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1296351A4 (de) * 2000-06-27 2009-09-23 Ebara Corp Untersuchungsvorrichtung für geladene teilchenstrahlen und verfahren zur herstellung eines bauelements mit dieser untersuchungsvorrichtung
US6717141B1 (en) * 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
US7012251B2 (en) * 2003-05-22 2006-03-14 Ebara Corporation Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method
US7164139B1 (en) * 2005-02-01 2007-01-16 Kla-Tencor Technologies Corporation Wien filter with reduced chromatic aberration
WO2006093268A1 (ja) 2005-03-03 2006-09-08 Ebara Corporation 写像投影型電子線装置及び該装置を用いた欠陥検査システム
WO2006101116A1 (ja) * 2005-03-22 2006-09-28 Ebara Corporation 電子線装置
WO2007013398A1 (ja) * 2005-07-26 2007-02-01 Ebara Corporation 電子線装置
JP2007141488A (ja) * 2005-11-15 2007-06-07 Ebara Corp 電子線装置及びパターン評価方法
JP2007335125A (ja) 2006-06-13 2007-12-27 Ebara Corp 電子線装置
EP1883094B1 (de) * 2006-07-24 2012-05-02 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Teilchenstrahlapparat und Verfahren zur Untersuchung einer Probe
EP1956630A1 (de) * 2007-02-06 2008-08-13 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Achromatischer Massenseparator
EP2122655A2 (de) * 2007-02-22 2009-11-25 Applied Materials Israel Ltd. Sem-werkzeug mit hohem durchsatz
EP2132763B1 (de) 2007-02-22 2014-05-07 Applied Materials Israel Ltd. Sem-werkzeug mit hohem durchsatz
US8373136B2 (en) 2009-10-15 2013-02-12 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Achromatic beam deflector, achromatic beam separator, charged particle device, method of operating an achromatic beam deflector, and method of operating an achromatic beam separator
EP2333808A1 (de) * 2009-12-11 2011-06-15 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Vorrichtung mit geladenem Teilchenstrahl, Verfahren zum Betrieb der Vorrichtung mit geladenem Teilchenstrahl
KR102650124B1 (ko) 2017-07-28 2024-03-22 에이에스엠엘 네델란즈 비.브이. 단일-빔 또는 멀티-빔 장치에서의 빔 분리기의 분산을 보상하기 위한 시스템들 및 방법들
JP2022112409A (ja) * 2021-01-21 2022-08-02 株式会社ニューフレアテクノロジー マルチビーム画像取得装置及びマルチビーム画像取得方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52103966A (en) * 1976-02-26 1977-08-31 Jeol Ltd Deflection unit for charged particle ray exposure device
DE2937004C2 (de) * 1979-09-13 1984-11-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Chromatisch korrigierte Ablenkvorrichtung für Korpuskularstrahlgeräte
US4590379A (en) * 1980-09-16 1986-05-20 Martin Frederick W Achromatic deflector and quadrupole lens
JPS5975550A (ja) * 1982-10-25 1984-04-28 Jeol Ltd 荷電粒子線の集束方法
DE3532781A1 (de) * 1985-09-13 1987-03-19 Siemens Ag Anordnung zur detektion von sekundaer- und/oder rueckstreuelektronen in einem elektronenstrahlgeraet
NL8602177A (nl) * 1986-08-27 1988-03-16 Philips Nv Electronen detectie met energie discriminatie.
JPS63231853A (ja) * 1987-03-20 1988-09-27 Hitachi Ltd 集束偏向装置
JP2810797B2 (ja) * 1991-01-11 1998-10-15 日本電子株式会社 反射電子顕微鏡
JP3014210B2 (ja) * 1991-08-08 2000-02-28 日本電子株式会社 直接写像型反射電子顕微鏡
JP3081393B2 (ja) 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
JPH07161332A (ja) * 1993-12-02 1995-06-23 Topcon Corp 電子ビーム照射分析装置
EP0917177A1 (de) * 1997-11-17 1999-05-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Korpuskularstrahlgerät
JP3441955B2 (ja) * 1998-02-23 2003-09-02 株式会社日立製作所 投射方式の荷電粒子顕微鏡および基板検査システム
JP3006581B2 (ja) * 1998-04-27 2000-02-07 株式会社日立製作所 荷電粒子線応用装置

Also Published As

Publication number Publication date
EP1100111A1 (de) 2001-05-16
DE69903439D1 (de) 2002-11-14
JP2001148227A (ja) 2001-05-29
EP1100111B1 (de) 2002-10-09
US6509569B1 (en) 2003-01-21

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Legal Events

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