DE69221915D1 - Opto-lithographische Vorrichtung mit kraftkompensiertem Maschinengestell - Google Patents

Opto-lithographische Vorrichtung mit kraftkompensiertem Maschinengestell

Info

Publication number
DE69221915D1
DE69221915D1 DE69221915T DE69221915T DE69221915D1 DE 69221915 D1 DE69221915 D1 DE 69221915D1 DE 69221915 T DE69221915 T DE 69221915T DE 69221915 T DE69221915 T DE 69221915T DE 69221915 D1 DE69221915 D1 DE 69221915D1
Authority
DE
Germany
Prior art keywords
opto
force
machine frame
lithographic device
compensated machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69221915T
Other languages
English (en)
Other versions
DE69221915T2 (de
Inventor
Eijk Jan Van
Engelen Gerard Van
Hendrikus Herman Marie Cox
Henricus Ernest Beekman
Fransiscus Mathijs Jacobs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Electronics NV filed Critical Philips Electronics NV
Application granted granted Critical
Publication of DE69221915D1 publication Critical patent/DE69221915D1/de
Publication of DE69221915T2 publication Critical patent/DE69221915T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
  • Transmission Devices (AREA)
  • Control Of Linear Motors (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
DE69221915T 1991-03-07 1992-02-28 Opto-lithographische Vorrichtung mit kraftkompensiertem Maschinengestell Expired - Fee Related DE69221915T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9100407A NL9100407A (nl) 1991-03-07 1991-03-07 Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.

Publications (2)

Publication Number Publication Date
DE69221915D1 true DE69221915D1 (de) 1997-10-09
DE69221915T2 DE69221915T2 (de) 1998-03-05

Family

ID=19858984

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69221915T Expired - Fee Related DE69221915T2 (de) 1991-03-07 1992-02-28 Opto-lithographische Vorrichtung mit kraftkompensiertem Maschinengestell

Country Status (6)

Country Link
US (1) US5172160A (de)
EP (1) EP0502578B1 (de)
JP (3) JP3524107B2 (de)
KR (1) KR100249379B1 (de)
DE (1) DE69221915T2 (de)
NL (1) NL9100407A (de)

Families Citing this family (86)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5239340A (en) * 1990-11-30 1993-08-24 Sharp Kabushiki Kaisha Linear motor device having vibration reduction unit
US5504407A (en) * 1992-02-21 1996-04-02 Canon Kabushiki Kaisha Stage driving system
US5545962A (en) * 1992-08-18 1996-08-13 Canon Kabushiki Kaisha Positioning system
JP3265670B2 (ja) 1993-01-21 2002-03-11 株式会社ニコン ステージ装置、ステージ駆動方法、及び露光装置
JP3226704B2 (ja) * 1994-03-15 2001-11-05 キヤノン株式会社 露光装置
US7365513B1 (en) 1994-04-01 2008-04-29 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5874820A (en) 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US5528118A (en) 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US6989647B1 (en) 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
JP3363662B2 (ja) * 1994-05-19 2003-01-08 キヤノン株式会社 走査ステージ装置およびこれを用いた露光装置
US5850280A (en) * 1994-06-16 1998-12-15 Nikon Corporation Stage unit, drive table, and scanning exposure and apparatus using same
JP3800616B2 (ja) * 1994-06-27 2006-07-26 株式会社ニコン 目標物移動装置、位置決め装置及び可動ステージ装置
US6246204B1 (en) 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
KR100399812B1 (ko) 1994-10-11 2003-12-01 가부시키가이샤 니콘 스테이지용진동방지장치
TW318255B (de) 1995-05-30 1997-10-21 Philips Electronics Nv
TW316874B (de) * 1995-05-30 1997-10-01 Philips Electronics Nv
US5812420A (en) * 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus
JP3221823B2 (ja) * 1995-11-24 2001-10-22 キヤノン株式会社 投影露光装置およびこれを用いた露光方法ならびに半導体製造方法
JPH09289155A (ja) * 1996-04-19 1997-11-04 Nikon Corp 走査型露光装置
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
KR100483982B1 (ko) * 1996-06-07 2005-08-10 가부시키가이샤 니콘 진동절연장치및노광장치
US6151185A (en) * 1996-09-05 2000-11-21 Canon Kabushiki Kaisha Position detecting apparatus, positioning apparatus, and information recording apparatus using the same
JPH10112433A (ja) * 1996-10-04 1998-04-28 Nikon Corp 除振装置及び露光装置
US6462927B2 (en) * 1997-02-28 2002-10-08 Bae Systems Electronics Limited Apparatus and method for spatially coupling an electro-magnet to a support armature
US6490025B1 (en) 1997-03-17 2002-12-03 Nikon Corporation Exposure apparatus
US20010003028A1 (en) 1997-09-19 2001-06-07 Nikon Corporation Scanning Exposure Method
AU9095798A (en) * 1997-09-19 1999-04-12 Nikon Corporation Stage device, a scanning aligner and a scanning exposure method, and a device manufactured thereby
US6089525A (en) * 1997-10-07 2000-07-18 Ultratech Stepper, Inc. Six axis active vibration isolation and payload reaction force compensation system
JP3535749B2 (ja) * 1997-12-10 2004-06-07 キヤノン株式会社 ステージ装置、露光装置、並びにデバイス製造方法
JPH11189332A (ja) 1997-12-26 1999-07-13 Canon Inc ステージ装置およびこれを用いた露光装置ならびにデバイス製造方法
JP3548411B2 (ja) 1997-12-26 2004-07-28 キヤノン株式会社 ステージ装置、およびこれを用いた露光装置、ならびにデバイス製造方法
US6130517A (en) * 1998-02-12 2000-10-10 Nikon Corporation Magnetic actuator producing large acceleration on fine stage and low RMS power gain
JP3554186B2 (ja) 1998-04-08 2004-08-18 キヤノン株式会社 露光装置、デバイス製造方法および反力受け方法
JPH11294520A (ja) 1998-04-08 1999-10-29 Canon Inc 除振装置、これを用いた露光装置およびデバイス製造方法、ならびに除振方法
JP2000021702A (ja) 1998-06-30 2000-01-21 Canon Inc 露光装置ならびにデバイス製造方法
US6198580B1 (en) 1998-08-17 2001-03-06 Newport Corporation Gimballed optical mount
US6472777B1 (en) 1998-08-25 2002-10-29 Nikon Corporation Capacitive sensor calibration method and apparatus for opposing electro-magnetic actuators
US6144118A (en) * 1998-09-18 2000-11-07 General Scanning, Inc. High-speed precision positioning apparatus
WO2000033318A1 (fr) 1998-11-30 2000-06-08 Nikon Corporation Dispositif d'etagement se son procede de fabrication; dispositif d'alignement et son procede de fabrication
TW468090B (en) * 1998-12-17 2001-12-11 Asm Lithography Bv Servo control method, and its application in a lithographic projection apparatus
JP2002534783A (ja) * 1998-12-29 2002-10-15 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 素子配置機械
US6516130B1 (en) 1998-12-30 2003-02-04 Newport Corporation Clip that aligns a fiber optic cable with a laser diode within a fiber optic module
FR2790115B1 (fr) 1999-02-23 2001-05-04 Micro Controle Procede et dispositif pour deplacer un mobile sur une base montee elastiquement par rapport au sol
US6511035B1 (en) 1999-08-03 2003-01-28 Newport Corporation Active vibration isolation systems with nonlinear compensation to account for actuator saturation
JP2001148341A (ja) 1999-11-19 2001-05-29 Nikon Corp 露光装置
TW546551B (en) * 1999-12-21 2003-08-11 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
JP4474020B2 (ja) 2000-06-23 2010-06-02 キヤノン株式会社 移動装置及び露光装置
US6958808B2 (en) * 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6885430B2 (en) * 2000-11-16 2005-04-26 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6551045B2 (en) * 2000-11-17 2003-04-22 Nikon Corporation Wafer stage chamber
US6655840B2 (en) 2001-02-13 2003-12-02 Newport Corporation Stiff cross roller bearing configuration
EP1243969A1 (de) * 2001-03-20 2002-09-25 Asm Lithography B.V. Lithographischer Projektionsapparat und zugehöriges Positionierungssystem
US6601524B2 (en) 2001-03-28 2003-08-05 Newport Corporation Translation table with a spring biased dovetail bearing
US6791058B2 (en) 2001-04-25 2004-09-14 Newport Corporation Automatic laser weld machine for assembling photonic components
US6568666B2 (en) 2001-06-13 2003-05-27 Newport Corporation Method for providing high vertical damping to pneumatic isolators during large amplitude disturbances of isolated payload
US6788385B2 (en) * 2001-06-21 2004-09-07 Nikon Corporation Stage device, exposure apparatus and method
US6619611B2 (en) 2001-07-02 2003-09-16 Newport Corporation Pneumatic vibration isolator utilizing an elastomeric element for isolation and attenuation of horizontal vibration
US6815699B2 (en) 2001-12-11 2004-11-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1319986B1 (de) * 2001-12-11 2008-02-27 ASML Netherlands B.V. Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
JP4011919B2 (ja) * 2002-01-16 2007-11-21 キヤノン株式会社 移動装置及び露光装置並びに半導体デバイスの製造方法
JP3977086B2 (ja) * 2002-01-18 2007-09-19 キヤノン株式会社 ステージシステム
JP3679776B2 (ja) * 2002-04-22 2005-08-03 キヤノン株式会社 駆動装置、露光装置及びデバイス製造方法
EP1357434A1 (de) * 2002-04-23 2003-10-29 ASML Netherlands B.V. Lithographisches Gerät und Verfahren zur Herstellung einer Vorrichtung
EP1357429A1 (de) * 2002-04-23 2003-10-29 ASML Netherlands B.V. Lithographisches Gerät und Verfahren zur Herstellung einer Vorrichtung
TWI230844B (en) 2002-06-07 2005-04-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1369745B1 (de) * 2002-06-07 2013-02-27 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
JP3962669B2 (ja) * 2002-10-08 2007-08-22 キヤノン株式会社 移動装置及び露光装置並びにデバイスの製造方法
US6983703B2 (en) * 2002-11-05 2006-01-10 Asm Technology Singapore Pte Ltd Driving means to position a load
EP1457834A3 (de) * 2003-03-14 2008-10-29 Canon Kabushiki Kaisha Vorrichtung zur Positionierung, Belichtungsapparat und Verfahren zur Herstellung eines Artikels
KR20060009957A (ko) * 2003-05-27 2006-02-01 가부시키가이샤 니콘 노광 장치 및 디바이스의 제조 방법
US6914351B2 (en) * 2003-07-02 2005-07-05 Tiax Llc Linear electrical machine for electric power generation or motive drive
US7248339B2 (en) 2003-07-04 2007-07-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4323409B2 (ja) 2003-10-21 2009-09-02 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めシステム及び位置決め方法
JP2005203567A (ja) * 2004-01-15 2005-07-28 Canon Inc 駆動装置、露光装置及びデバイス製造方法
US8231098B2 (en) 2004-12-07 2012-07-31 Newport Corporation Methods and devices for active vibration damping of an optical structure
KR101346957B1 (ko) * 2005-06-02 2014-01-02 칼 짜이스 에스엠테 게엠베하 광학 결상 장치
JP2007027331A (ja) * 2005-07-14 2007-02-01 Canon Inc 駆動装置及びこれを用いた露光装置並びにデバイス製造方法
WO2007061920A2 (en) * 2005-11-17 2007-05-31 Tiax Llc Linear electrical machine for electric power generation or motive drive
EP1803967B1 (de) * 2005-12-30 2016-08-03 Integrated Dynamics Engineering GmbH Schwingungsisolationssystem mit Störgrössenaufschaltung von vorhersehbaren Kraftstörungen
JP4834439B2 (ja) * 2006-03-30 2011-12-14 キヤノン株式会社 ステージ装置及びその制御方法、露光装置及びデバイス製造方法
DE102007030202A1 (de) * 2007-06-27 2009-01-22 Vistec Semiconductor Systems Gmbh Koordinaten-Messmaschine mit Schwingungsentkopplung und Verfahren zur Schwingungsentkopplung einer Koordinaten-Messmaschine
US8267388B2 (en) * 2007-09-12 2012-09-18 Xradia, Inc. Alignment assembly
US8857585B2 (en) 2010-12-29 2014-10-14 Newport Corporation Tunable vibration dampers and methods of manufacture and tuning
NL2009902A (en) * 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
EP4382764A1 (de) 2022-12-09 2024-06-12 Etel S.A. Bewegungssystem mit konfigurierbarer vorwärtssteuerung

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6032050A (ja) * 1983-08-02 1985-02-19 Canon Inc 露光装置
US4724466A (en) * 1986-01-17 1988-02-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
US4805000A (en) * 1986-01-17 1989-02-14 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
NL8601547A (nl) * 1986-06-16 1988-01-18 Philips Nv Optisch litografische inrichting met verplaatsbaar lenzenstelsel en werkwijze voor het regelen van de afbeeldingseigenschappen van een lenzenstelsel in een dergelijke inrichting.
EP0393994B1 (de) * 1989-04-17 1994-06-15 SHARP Corporation Linearantriebsgerät

Also Published As

Publication number Publication date
JP2004140401A (ja) 2004-05-13
NL9100407A (nl) 1992-10-01
DE69221915T2 (de) 1998-03-05
JP3491204B2 (ja) 2004-01-26
JP3889395B2 (ja) 2007-03-07
EP0502578A1 (de) 1992-09-09
JPH05121294A (ja) 1993-05-18
EP0502578B1 (de) 1997-09-03
JP2002319535A (ja) 2002-10-31
KR920018868A (ko) 1992-10-22
KR100249379B1 (ko) 2000-06-01
JP3524107B2 (ja) 2004-05-10
US5172160A (en) 1992-12-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: KONINKLIJKE PHILIPS ELECTRONICS N.V., EINDHOVEN, N

8327 Change in the person/name/address of the patent owner

Owner name: ASM LITHOGRAPHY B.V., VELDHOVEN, NL

8339 Ceased/non-payment of the annual fee