DE60219365D1 - Strömungssteuereinrichtung - Google Patents

Strömungssteuereinrichtung

Info

Publication number
DE60219365D1
DE60219365D1 DE60219365T DE60219365T DE60219365D1 DE 60219365 D1 DE60219365 D1 DE 60219365D1 DE 60219365 T DE60219365 T DE 60219365T DE 60219365 T DE60219365 T DE 60219365T DE 60219365 D1 DE60219365 D1 DE 60219365D1
Authority
DE
Germany
Prior art keywords
control device
flow control
flow
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60219365T
Other languages
English (en)
Other versions
DE60219365T2 (de
Inventor
Tadahiro Ohmi
Tomio Uno
Osamu Nakamura
Nobukazu Ikeda
Ryousuke Dohi
Kouji Nishino
Atsushi Matsumoto
Kazuhiko Sugiyama
Shujiro Inui
Taiji Sakai
Masanori Ueyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Fujikin Inc
Original Assignee
Tokyo Electron Ltd
Fujikin Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=19189469&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60219365(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Tokyo Electron Ltd, Fujikin Inc filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE60219365D1 publication Critical patent/DE60219365D1/de
Publication of DE60219365T2 publication Critical patent/DE60219365T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7759—Responsive to change in rate of fluid flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/7722—Line condition change responsive valves
    • Y10T137/7758—Pilot or servo controlled
    • Y10T137/7761—Electrically actuated valve

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Flow Control (AREA)
  • Measuring Volume Flow (AREA)
DE60219365T 2001-12-28 2002-11-22 Strömungssteuereinrichtung Expired - Fee Related DE60219365T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001399433A JP4102564B2 (ja) 2001-12-28 2001-12-28 改良型圧力式流量制御装置
JP2001399433 2001-12-28
PCT/JP2002/012250 WO2003058363A1 (fr) 2001-12-28 2002-11-22 Dispositif perfectionne de regulation d'ecoulement du type commande par la pression

Publications (2)

Publication Number Publication Date
DE60219365D1 true DE60219365D1 (de) 2007-05-16
DE60219365T2 DE60219365T2 (de) 2007-08-09

Family

ID=19189469

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60219365T Expired - Fee Related DE60219365T2 (de) 2001-12-28 2002-11-22 Strömungssteuereinrichtung

Country Status (10)

Country Link
US (1) US6964279B2 (de)
EP (1) EP1475684B1 (de)
JP (1) JP4102564B2 (de)
KR (1) KR100601803B1 (de)
CN (1) CN1279416C (de)
CA (1) CA2423342C (de)
DE (1) DE60219365T2 (de)
IL (2) IL155358A0 (de)
TW (1) TW552491B (de)
WO (1) WO2003058363A1 (de)

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US8376312B2 (en) 2003-08-28 2013-02-19 Horiba, Ltd. Flow restrictor
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US6973375B2 (en) 2004-02-12 2005-12-06 Mykrolis Corporation System and method for flow monitoring and control
US7740024B2 (en) * 2004-02-12 2010-06-22 Entegris, Inc. System and method for flow monitoring and control
JP2005307233A (ja) * 2004-04-19 2005-11-04 Tokyo Electron Ltd 成膜装置及び成膜方法及びプロセスガスの供給方法
JP4572139B2 (ja) * 2005-05-23 2010-10-27 株式会社フジキン 改良型圧力式流量制御装置
US9921089B2 (en) 2005-06-27 2018-03-20 Fujikin Incorporated Flow rate range variable type flow rate control apparatus
US9383758B2 (en) 2005-06-27 2016-07-05 Fujikin Incorporated Flow rate range variable type flow rate control apparatus
JP4856905B2 (ja) * 2005-06-27 2012-01-18 国立大学法人東北大学 流量レンジ可変型流量制御装置
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JP2007058352A (ja) * 2005-08-22 2007-03-08 Asahi Organic Chem Ind Co Ltd 流体制御装置
JP2007058337A (ja) * 2005-08-22 2007-03-08 Asahi Organic Chem Ind Co Ltd 流体制御装置
JP4690827B2 (ja) 2005-08-26 2011-06-01 株式会社フジキン ガスケット型オリフィス及びこれを用いた圧力式流量制御装置
JP4866682B2 (ja) 2005-09-01 2012-02-01 株式会社フジキン 圧力センサを保有する流量制御装置を用いた流体供給系の異常検出方法
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JP5372353B2 (ja) 2007-09-25 2013-12-18 株式会社フジキン 半導体製造装置用ガス供給装置
US8265794B2 (en) * 2007-10-01 2012-09-11 Westlock Controls Corporation Knowledge based valve control method
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JP5461786B2 (ja) * 2008-04-01 2014-04-02 株式会社フジキン 気化器を備えたガス供給装置
CN102037423B (zh) * 2008-05-21 2014-02-05 株式会社富士金 使用压力流量控制装置的流体非连续式流量切换控制方法
JP5195527B2 (ja) * 2009-03-03 2013-05-08 株式会社明電舎 流量制御装置及びプロセス装置
CN102640070B (zh) 2009-12-01 2015-04-22 株式会社富士金 压力式流量控制装置
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JP5761960B2 (ja) 2010-10-29 2015-08-12 三菱重工業株式会社 熱源装置
KR101284052B1 (ko) 2011-04-15 2013-07-10 한국건설기술연구원 차압을 이용한 분배기 분배유량 산출방법
JP5175965B2 (ja) * 2011-10-03 2013-04-03 国立大学法人東北大学 流量レンジ可変型流量制御装置
US20130240045A1 (en) * 2012-03-15 2013-09-19 Xiufeng Pang Method for Determining a Fluid Flow Rate With a Fluid Control Valve
US20130312421A1 (en) * 2012-05-24 2013-11-28 Solar Turbines Incorporated Fuel control system for a gas turbine engine
ES2905838T3 (es) * 2012-05-24 2022-04-12 Air Prod & Chem Método y aparato para medir el caudal másico de un gas
KR101737373B1 (ko) * 2012-05-31 2017-05-18 가부시키가이샤 후지킨 빌드다운 방식 유량 모니터 장착 유량 제어 장치
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
JP5797246B2 (ja) * 2013-10-28 2015-10-21 株式会社フジキン 流量計及びそれを備えた流量制御装置
KR101887360B1 (ko) * 2013-10-31 2018-08-10 가부시키가이샤 후지킨 압력식 유량 제어 장치
JP6372998B2 (ja) * 2013-12-05 2018-08-15 株式会社フジキン 圧力式流量制御装置
JP6321972B2 (ja) * 2014-01-21 2018-05-09 株式会社フジキン 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
EP3170629B1 (de) * 2014-07-15 2019-05-15 FUJI Corporation Inspektionsverfahren
JP6416529B2 (ja) 2014-07-23 2018-10-31 株式会社フジキン 圧力式流量制御装置
US9904299B2 (en) * 2015-04-08 2018-02-27 Tokyo Electron Limited Gas supply control method
US10401202B2 (en) * 2015-07-10 2019-09-03 Pivotal Systems Corporation Method and apparatus for gas flow control
WO2017040100A1 (en) * 2015-08-31 2017-03-09 Mks Instruments, Inc. Method and apparatus for pressure-based flow measurement in non-critical flow conditions
JP6541584B2 (ja) 2015-09-16 2019-07-10 東京エレクトロン株式会社 ガス供給系を検査する方法
US10274972B2 (en) 2015-09-16 2019-04-30 Tokyo Electron Limited Method of inspecting gas supply system
JP6600568B2 (ja) * 2015-09-16 2019-10-30 東京エレクトロン株式会社 流量制御器の出力流量を求める方法
KR102028372B1 (ko) * 2015-09-24 2019-10-04 가부시키가이샤 후지킨 압력식 유량 제어 장치 및 그 이상 검지 방법
CN108369425B (zh) * 2015-12-25 2021-03-02 株式会社富士金 流量控制装置以及使用流量控制装置的异常检测方法
JP6600854B2 (ja) * 2016-08-24 2019-11-06 株式会社フジキン 圧力式流量制御装置、その流量算出方法および流量制御方法
CN106352931B (zh) * 2016-10-09 2018-02-13 无锡洋湃科技有限公司 一种测量多相流中气液两相各自流量的临界流喷嘴流量计及测量方法
US10983538B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller
US10865635B2 (en) 2017-03-14 2020-12-15 Baker Hughes Oilfield Operations, Llc Method of controlling a gas vent system for horizontal wells
JP7097085B2 (ja) * 2017-07-25 2022-07-07 株式会社フジキン 流体制御装置
US11079774B2 (en) * 2017-11-30 2021-08-03 Fujikin Incorporated Flow rate control device
CN107830902A (zh) * 2017-12-12 2018-03-23 杭州天马计量科技有限公司 一种气体流量计
US11002461B2 (en) 2018-02-15 2021-05-11 Johnson Controls Technology Company System and method for output compensation in flow sensors
US10558227B2 (en) * 2018-02-15 2020-02-11 Johnson Controls Technology Company System and method for output compensation in flow sensors using pulse width modulation
KR102421590B1 (ko) * 2018-04-27 2022-07-15 가부시키가이샤 후지킨 유량 제어 방법 및 유량 제어 장치
CN111103020B (zh) * 2018-10-29 2022-06-03 北京七星华创流量计有限公司 流量检测装置、流量控制***及流量检测方法
CN110543192A (zh) * 2018-10-31 2019-12-06 北京七星华创流量计有限公司 基于压力检测的质量流量控制方法及装置
WO2020218138A1 (ja) * 2019-04-25 2020-10-29 株式会社フジキン 流量制御装置
US20200348702A1 (en) * 2019-04-30 2020-11-05 Illinois Tool Works Inc. Advanced pressure based mass flow controllers and diagnostics
CN113324605B (zh) * 2021-05-26 2023-05-23 北京七星华创流量计有限公司 气体质量流量控制器和气体质量流量控制方法
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Also Published As

Publication number Publication date
EP1475684A1 (de) 2004-11-10
CN1494672A (zh) 2004-05-05
JP4102564B2 (ja) 2008-06-18
WO2003058363A1 (fr) 2003-07-17
US20040204794A1 (en) 2004-10-14
TW200301414A (en) 2003-07-01
US6964279B2 (en) 2005-11-15
CA2423342A1 (en) 2003-06-28
EP1475684A4 (de) 2005-09-07
EP1475684B1 (de) 2007-04-04
CN1279416C (zh) 2006-10-11
JP2003195948A (ja) 2003-07-11
KR20030074743A (ko) 2003-09-19
CA2423342C (en) 2007-03-06
IL155358A (en) 2006-10-05
TW552491B (en) 2003-09-11
DE60219365T2 (de) 2007-08-09
KR100601803B1 (ko) 2006-07-19
IL155358A0 (en) 2003-11-23

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: FUJIKIN INC., OSAKA, JP

Owner name: TOKYO ELECTRON LTD., TOKIO/TOKYO, JP

Owner name: OHMI, TADAHIRO, SENDAI, MIYAGI, JP

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee